JP6818522B2 - インプリント装置、および物品製造方法 - Google Patents

インプリント装置、および物品製造方法 Download PDF

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Publication number
JP6818522B2
JP6818522B2 JP2016224473A JP2016224473A JP6818522B2 JP 6818522 B2 JP6818522 B2 JP 6818522B2 JP 2016224473 A JP2016224473 A JP 2016224473A JP 2016224473 A JP2016224473 A JP 2016224473A JP 6818522 B2 JP6818522 B2 JP 6818522B2
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JP
Japan
Prior art keywords
control
mold
substrate
unit
period
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016224473A
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English (en)
Japanese (ja)
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JP2018082101A (ja
Inventor
縄田　亮
亮 縄田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016224473A priority Critical patent/JP6818522B2/ja
Priority to KR1020170148502A priority patent/KR102233663B1/ko
Publication of JP2018082101A publication Critical patent/JP2018082101A/ja
Application granted granted Critical
Publication of JP6818522B2 publication Critical patent/JP6818522B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016224473A 2016-11-17 2016-11-17 インプリント装置、および物品製造方法 Active JP6818522B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016224473A JP6818522B2 (ja) 2016-11-17 2016-11-17 インプリント装置、および物品製造方法
KR1020170148502A KR102233663B1 (ko) 2016-11-17 2017-11-09 임프린트 장치, 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016224473A JP6818522B2 (ja) 2016-11-17 2016-11-17 インプリント装置、および物品製造方法

Publications (2)

Publication Number Publication Date
JP2018082101A JP2018082101A (ja) 2018-05-24
JP6818522B2 true JP6818522B2 (ja) 2021-01-20

Family

ID=62197876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016224473A Active JP6818522B2 (ja) 2016-11-17 2016-11-17 インプリント装置、および物品製造方法

Country Status (2)

Country Link
JP (1) JP6818522B2 (ko)
KR (1) KR102233663B1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7116552B2 (ja) * 2018-02-13 2022-08-10 キヤノン株式会社 インプリント装置、および、物品製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5020844B2 (ja) * 2007-02-06 2012-09-05 キヤノン株式会社 インプリント方法及びインプリント装置、インプリント方法を用いた部材の製造方法
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP2011129720A (ja) * 2009-12-17 2011-06-30 Canon Inc インプリント装置、モールド及び物品の製造方法
WO2011077584A1 (ja) * 2009-12-26 2011-06-30 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6420606B2 (ja) * 2013-11-05 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品製造方法
JP6497849B2 (ja) * 2014-04-15 2019-04-10 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6445792B2 (ja) * 2014-06-13 2018-12-26 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6552329B2 (ja) * 2014-09-12 2019-07-31 キヤノン株式会社 インプリント装置、インプリントシステム及び物品の製造方法
JP6562795B2 (ja) * 2015-02-12 2019-08-21 キヤノン株式会社 インプリント装置、および物品の製造方法

Also Published As

Publication number Publication date
JP2018082101A (ja) 2018-05-24
KR102233663B1 (ko) 2021-03-31
KR20180055709A (ko) 2018-05-25

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