JP6813719B1 - 照射ラインを生成するための光学系 - Google Patents

照射ラインを生成するための光学系 Download PDF

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Publication number
JP6813719B1
JP6813719B1 JP2020537181A JP2020537181A JP6813719B1 JP 6813719 B1 JP6813719 B1 JP 6813719B1 JP 2020537181 A JP2020537181 A JP 2020537181A JP 2020537181 A JP2020537181 A JP 2020537181A JP 6813719 B1 JP6813719 B1 JP 6813719B1
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Prior art keywords
laser beam
lens group
optical system
shutter element
lens
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Japanese (ja)
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JP2021508857A (ja
Inventor
ブルクハルト ベルトホルト
ブルクハルト ベルトホルト
カーラート ハンス−ユルゲン
カーラート ハンス−ユルゲン
リヒター ヨハネス
リヒター ヨハネス
Original Assignee
イノバベント ゲゼルシャフト ミット ベシュレンクテル ハフツング
イノバベント ゲゼルシャフト ミット ベシュレンクテル ハフツング
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0911—Anamorphotic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0738—Shaping the laser spot into a linear shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
    • H01L21/02678—Beam shaping, e.g. using a mask

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Laser Beam Processing (AREA)
  • Recrystallisation Techniques (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Lasers (AREA)
JP2020537181A 2018-01-04 2019-01-03 照射ラインを生成するための光学系 Active JP6813719B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102018200078.6A DE102018200078B4 (de) 2018-01-04 2018-01-04 Optisches System und Verfahren zum Erzeugen einer Beleuchtungslinie
DE102018200078.6 2018-01-04
PCT/EP2019/050063 WO2019134924A1 (de) 2018-01-04 2019-01-03 Optisches system zum erzeugen einer beleuchtungslinie

Publications (2)

Publication Number Publication Date
JP6813719B1 true JP6813719B1 (ja) 2021-01-13
JP2021508857A JP2021508857A (ja) 2021-03-11

Family

ID=65009757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020537181A Active JP6813719B1 (ja) 2018-01-04 2019-01-03 照射ラインを生成するための光学系

Country Status (5)

Country Link
JP (1) JP6813719B1 (ko)
KR (1) KR102459299B1 (ko)
CN (1) CN111465889B (ko)
DE (1) DE102018200078B4 (ko)
WO (1) WO2019134924A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019118676B4 (de) * 2019-07-10 2021-10-21 Innovavent Gmbh Optisches System zur Homogenisierung der Intensität von Lichtstrahlung und Anlage zur Bearbeitung einer Halbleitermaterialschicht
DE102020121440A1 (de) 2020-08-14 2022-02-17 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene
DE102020122410B3 (de) 2020-08-27 2021-11-04 Trumpf Laser- Und Systemtechnik Gmbh Fokussiervorrichtung und Verfahren zum Fokussieren einer Objektivlinse
DE102020126267A1 (de) 2020-10-07 2022-04-07 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer Laserlinie auf einer Arbeitsebene
DE102020130651B3 (de) * 2020-11-19 2022-05-05 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene
DE102021125623B3 (de) 2021-10-04 2023-03-02 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene
DE102022104083A1 (de) 2022-02-22 2023-08-24 Trumpf Laser- Und Systemtechnik Gmbh Linienoptiksystem
DE102022104082A1 (de) 2022-02-22 2023-08-24 Trumpf Laser- Und Systemtechnik Gmbh Linienoptiksystem

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DE69212579T2 (de) * 1991-12-12 1997-03-06 Eastman Kodak Co Optische Vorrichtung eines Laser-Abtastgerätes zur Verringerung thermischer Empfindlichkeit
US6478452B1 (en) * 2000-01-19 2002-11-12 Coherent, Inc. Diode-laser line-illuminating system
TW528879B (en) * 2001-02-22 2003-04-21 Ishikawajima Harima Heavy Ind Illumination optical system and laser processor having the same
JP3977038B2 (ja) * 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
US20060176916A1 (en) * 2003-01-23 2006-08-10 Eckhard Zanger Laser resonator and frequency-converted laser
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
DE102007057868B4 (de) * 2007-11-29 2020-02-20 LIMO GmbH Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung
US7891821B2 (en) * 2007-12-17 2011-02-22 Coherent, Inc. Laser beam transformer and projector having stacked plates
CN101436752A (zh) * 2008-11-20 2009-05-20 武汉凌云光电科技有限责任公司 一种端面泵浦主动调q腔外倍频绿光激光器
US8215776B2 (en) * 2009-01-07 2012-07-10 Eastman Kodak Company Line illumination apparatus using laser arrays
US20130223846A1 (en) * 2009-02-17 2013-08-29 Trilumina Corporation High speed free-space optical communications
CN101877556B (zh) * 2009-04-30 2014-02-19 鸿富锦精密工业（深圳）有限公司 太阳能收集装置
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
KR100984727B1 (ko) * 2010-04-30 2010-10-01 유병소 대상물 가공 방법 및 대상물 가공 장치
JP5678333B2 (ja) * 2010-05-27 2015-03-04 株式会社ブイ・テクノロジー レーザアニール方法及び装置
EP2601714A4 (en) * 2010-08-08 2014-12-17 Kla Tencor Corp DYNAMIC WAVE FRONT CONTROL OF A LASER SYSTEM WITH FREQUENCY CONVERSION
DE102012007601A1 (de) 2012-04-16 2013-10-17 Innovavent Gmbh Optisches System für eine Anlage zur Bearbeitung von Dünnfilmschichten
JP5863568B2 (ja) * 2012-06-01 2016-02-16 株式会社日本製鋼所 レーザ光照射方法およびレーザ光照射装置
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DE102013021151B3 (de) * 2013-12-13 2014-10-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Anordnung zur passiven Kompensation thermischer Linsen in optischen Systemen
EP3167316B1 (en) * 2014-07-11 2021-02-17 National Research Council of Canada Forming an optical grating with an apparatus providing an adjustable interference pattern
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EP3165873B1 (en) * 2015-11-04 2020-03-04 Hexagon Technology Center GmbH Laser module comprising a micro-lens array
DE102016006960B4 (de) * 2016-06-08 2019-05-02 Innovavent Gmbh Optisches System zum Beseitigen von Inhomogenitäten in der Intensitätsverteilung von Laserstrahlung, Anlage zur Bearbeitung von Dünnfilmschichten mit einem optischen System und optisches Verfahren

Also Published As

Publication number Publication date
KR20200101987A (ko) 2020-08-28
WO2019134924A1 (de) 2019-07-11
KR102459299B1 (ko) 2022-10-25
JP2021508857A (ja) 2021-03-11
DE102018200078B4 (de) 2020-07-02
CN111465889A (zh) 2020-07-28
DE102018200078A1 (de) 2019-07-04
CN111465889B (zh) 2022-04-05

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