CN111465889B - 用于产生照明线的光学系统 - Google Patents

用于产生照明线的光学系统 Download PDF

Info

Publication number
CN111465889B
CN111465889B CN201980006423.5A CN201980006423A CN111465889B CN 111465889 B CN111465889 B CN 111465889B CN 201980006423 A CN201980006423 A CN 201980006423A CN 111465889 B CN111465889 B CN 111465889B
Authority
CN
China
Prior art keywords
laser beam
lens group
shutter element
optical system
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201980006423.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN111465889A (zh
Inventor
B·伯格哈特
H·卡勒特
J·里克特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inneva Ltd
Original Assignee
Inneva Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inneva Ltd filed Critical Inneva Ltd
Publication of CN111465889A publication Critical patent/CN111465889A/zh
Application granted granted Critical
Publication of CN111465889B publication Critical patent/CN111465889B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0911—Anamorphotic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0738—Shaping the laser spot into a linear shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
    • H01L21/02678—Beam shaping, e.g. using a mask

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Laser Beam Processing (AREA)
  • Recrystallisation Techniques (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Lasers (AREA)
CN201980006423.5A 2018-01-04 2019-01-03 用于产生照明线的光学系统 Active CN111465889B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102018200078.6A DE102018200078B4 (de) 2018-01-04 2018-01-04 Optisches System und Verfahren zum Erzeugen einer Beleuchtungslinie
DE102018200078.6 2018-01-04
PCT/EP2019/050063 WO2019134924A1 (de) 2018-01-04 2019-01-03 Optisches system zum erzeugen einer beleuchtungslinie

Publications (2)

Publication Number Publication Date
CN111465889A CN111465889A (zh) 2020-07-28
CN111465889B true CN111465889B (zh) 2022-04-05

Family

ID=65009757

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980006423.5A Active CN111465889B (zh) 2018-01-04 2019-01-03 用于产生照明线的光学系统

Country Status (5)

Country Link
JP (1) JP6813719B1 (ko)
KR (1) KR102459299B1 (ko)
CN (1) CN111465889B (ko)
DE (1) DE102018200078B4 (ko)
WO (1) WO2019134924A1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019118676B4 (de) * 2019-07-10 2021-10-21 Innovavent Gmbh Optisches System zur Homogenisierung der Intensität von Lichtstrahlung und Anlage zur Bearbeitung einer Halbleitermaterialschicht
DE102020121440A1 (de) 2020-08-14 2022-02-17 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene
DE102020122410B3 (de) 2020-08-27 2021-11-04 Trumpf Laser- Und Systemtechnik Gmbh Fokussiervorrichtung und Verfahren zum Fokussieren einer Objektivlinse
DE102020126267A1 (de) 2020-10-07 2022-04-07 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer Laserlinie auf einer Arbeitsebene
DE102020130651B3 (de) * 2020-11-19 2022-05-05 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene
DE102021125623B3 (de) 2021-10-04 2023-03-02 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene
DE102022104083A1 (de) 2022-02-22 2023-08-24 Trumpf Laser- Und Systemtechnik Gmbh Linienoptiksystem
DE102022104082A1 (de) 2022-02-22 2023-08-24 Trumpf Laser- Und Systemtechnik Gmbh Linienoptiksystem

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0546404A1 (en) * 1991-12-12 1993-06-16 Eastman Kodak Company Optical design of laser scanner to reduce thermal sensitivity
CN101436752A (zh) * 2008-11-20 2009-05-20 武汉凌云光电科技有限责任公司 一种端面泵浦主动调q腔外倍频绿光激光器
WO2009068192A1 (de) * 2007-11-29 2009-06-04 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur strahlformung
WO2011148788A1 (ja) * 2010-05-27 2011-12-01 株式会社ブイ・テクノロジー レーザアニール方法及び装置
WO2012021311A2 (en) * 2010-08-08 2012-02-16 Kla-Tencor Corporation Dynamic wavefront control of a frequency converted laser system
JP2013248656A (ja) * 2012-06-01 2013-12-12 Japan Steel Works Ltd:The レーザ光照射方法およびレーザ光照射装置
DE102013021151B3 (de) * 2013-12-13 2014-10-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Anordnung zur passiven Kompensation thermischer Linsen in optischen Systemen
WO2016004511A1 (en) * 2014-07-11 2016-01-14 National Research Council Of Canada Forming an optical grating with an apparatus providing an adjustable interference pattern
JP2016032832A (ja) * 2014-07-31 2016-03-10 株式会社キーエンス レーザ加工装置
WO2017001220A1 (de) * 2015-06-29 2017-01-05 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Laserbearbeitungskopf und laserbearbeitungsmaschine damit
CN107044847A (zh) * 2015-11-04 2017-08-15 赫克斯冈技术中心 包括微透镜阵列的激光器模块
DE102016006960A1 (de) * 2016-06-08 2017-12-14 Innovavent Gmbh Optisches System zum Beseitigen von Inhomogenitäten in der Intensitätsverteilung von Laserstrahlung

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6478452B1 (en) * 2000-01-19 2002-11-12 Coherent, Inc. Diode-laser line-illuminating system
TW528879B (en) * 2001-02-22 2003-04-21 Ishikawajima Harima Heavy Ind Illumination optical system and laser processor having the same
JP3977038B2 (ja) * 2001-08-27 2007-09-19 株式会社半導体エネルギー研究所 レーザ照射装置およびレーザ照射方法
US20060176916A1 (en) * 2003-01-23 2006-08-10 Eckhard Zanger Laser resonator and frequency-converted laser
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
US7891821B2 (en) * 2007-12-17 2011-02-22 Coherent, Inc. Laser beam transformer and projector having stacked plates
US8215776B2 (en) * 2009-01-07 2012-07-10 Eastman Kodak Company Line illumination apparatus using laser arrays
US20130223846A1 (en) * 2009-02-17 2013-08-29 Trilumina Corporation High speed free-space optical communications
CN101877556B (zh) * 2009-04-30 2014-02-19 鸿富锦精密工业（深圳）有限公司 太阳能收集装置
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
KR100984727B1 (ko) * 2010-04-30 2010-10-01 유병소 대상물 가공 방법 및 대상물 가공 장치
DE102012007601A1 (de) 2012-04-16 2013-10-17 Innovavent Gmbh Optisches System für eine Anlage zur Bearbeitung von Dünnfilmschichten
US9228825B2 (en) * 2013-03-15 2016-01-05 Ricoh Company, Ltd. Positional change measurement device, positional change measurement method, and image forming apparatus
DE102015002537B4 (de) 2015-02-27 2017-11-09 Innovavent Gmbh Optisches System und optisches Verfahren zum Homogenisieren der Intensität von Laserstrahlung sowie Anlage zur Bearbeitung von Dünnfilmschichten

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0546404A1 (en) * 1991-12-12 1993-06-16 Eastman Kodak Company Optical design of laser scanner to reduce thermal sensitivity
WO2009068192A1 (de) * 2007-11-29 2009-06-04 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur strahlformung
CN101436752A (zh) * 2008-11-20 2009-05-20 武汉凌云光电科技有限责任公司 一种端面泵浦主动调q腔外倍频绿光激光器
WO2011148788A1 (ja) * 2010-05-27 2011-12-01 株式会社ブイ・テクノロジー レーザアニール方法及び装置
WO2012021311A2 (en) * 2010-08-08 2012-02-16 Kla-Tencor Corporation Dynamic wavefront control of a frequency converted laser system
JP2013248656A (ja) * 2012-06-01 2013-12-12 Japan Steel Works Ltd:The レーザ光照射方法およびレーザ光照射装置
DE102013021151B3 (de) * 2013-12-13 2014-10-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Anordnung zur passiven Kompensation thermischer Linsen in optischen Systemen
WO2016004511A1 (en) * 2014-07-11 2016-01-14 National Research Council Of Canada Forming an optical grating with an apparatus providing an adjustable interference pattern
JP2016032832A (ja) * 2014-07-31 2016-03-10 株式会社キーエンス レーザ加工装置
WO2017001220A1 (de) * 2015-06-29 2017-01-05 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Laserbearbeitungskopf und laserbearbeitungsmaschine damit
CN107044847A (zh) * 2015-11-04 2017-08-15 赫克斯冈技术中心 包括微透镜阵列的激光器模块
DE102016006960A1 (de) * 2016-06-08 2017-12-14 Innovavent Gmbh Optisches System zum Beseitigen von Inhomogenitäten in der Intensitätsverteilung von Laserstrahlung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"倍频激光直接驱动透镜列阵均匀照明系统的优化设计与实验考核";黄秀光等;《工程物理研究院科技年报》;20041231(第1期);全文 *

Also Published As

Publication number Publication date
KR20200101987A (ko) 2020-08-28
WO2019134924A1 (de) 2019-07-11
KR102459299B1 (ko) 2022-10-25
JP6813719B1 (ja) 2021-01-13
JP2021508857A (ja) 2021-03-11
DE102018200078B4 (de) 2020-07-02
CN111465889A (zh) 2020-07-28
DE102018200078A1 (de) 2019-07-04

Similar Documents

Publication Publication Date Title
CN111465889B (zh) 用于产生照明线的光学系统
JP5231234B2 (ja) ラインビームとして整形されたレーザー光を生成するためのシステム
US6943086B2 (en) Laser annealing apparatus, TFT device and annealing method of the same
US7317179B2 (en) Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
KR100711155B1 (ko) 평면 표시 장치의 제조 장치
WO2009150733A1 (ja) レーザアニール方法及びレーザアニール装置
KR101268107B1 (ko) 레이저 조사장치, 레이저 조사방법, 및 반도체장치 제조방법
US20050213022A1 (en) Method and apparatus for correcting a defective pixel of a liquid crystal display
JP6644580B2 (ja) レーザ光照射装置及びレーザ光照射方法
KR101918203B1 (ko) 레이저 처리 장치 및 방법
JP2007214388A (ja) 結晶化装置、および位置決めステージ
KR102509883B1 (ko) 비정질 실리콘 기재의 균일한 결정화를 위한 섬유 레이저-기반 시스템
JP5120685B2 (ja) レーザアニール方法及びレーザアニール装置
JP2006344844A (ja) レーザ処理装置
JP2006351977A (ja) レーザ処理装置およびレーザ処理方法
US7679029B2 (en) Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
JP2023537606A (ja) 作業面上に規定のレーザラインを生成するための装置
JP2007150245A (ja) 光照射装置、光照射装置の調整方法、結晶化装置、結晶化方法、およびデバイス
JP2009224373A (ja) 平面表示装置の製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant