JP6803296B2 - 露光装置および基板処理装置 - Google Patents
露光装置および基板処理装置 Download PDFInfo
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- JP6803296B2 JP6803296B2 JP2017105673A JP2017105673A JP6803296B2 JP 6803296 B2 JP6803296 B2 JP 6803296B2 JP 2017105673 A JP2017105673 A JP 2017105673A JP 2017105673 A JP2017105673 A JP 2017105673A JP 6803296 B2 JP6803296 B2 JP 6803296B2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017105673A JP6803296B2 (ja) | 2017-05-29 | 2017-05-29 | 露光装置および基板処理装置 |
| PCT/JP2018/017408 WO2018221115A1 (ja) | 2017-05-29 | 2018-05-01 | 露光装置および基板処理装置 |
| TW107115851A TWI666525B (zh) | 2017-05-29 | 2018-05-10 | 曝光裝置及基板處理裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017105673A JP6803296B2 (ja) | 2017-05-29 | 2017-05-29 | 露光装置および基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018200420A JP2018200420A (ja) | 2018-12-20 |
| JP6803296B2 true JP6803296B2 (ja) | 2020-12-23 |
Family
ID=64454569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017105673A Active JP6803296B2 (ja) | 2017-05-29 | 2017-05-29 | 露光装置および基板処理装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6803296B2 (zh) |
| TW (1) | TWI666525B (zh) |
| WO (1) | WO2018221115A1 (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI747490B (zh) | 2019-09-19 | 2021-11-21 | 日商斯庫林集團股份有限公司 | 曝光裝置 |
| JP7295755B2 (ja) * | 2019-09-19 | 2023-06-21 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| KR102359376B1 (ko) * | 2020-06-03 | 2022-02-08 | 한국고요써모시스템(주) | 기판의 열처리 오븐 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3356354B2 (ja) * | 1994-05-30 | 2002-12-16 | 東京エレクトロン株式会社 | 処理装置 |
| JP3028462B2 (ja) * | 1995-05-12 | 2000-04-04 | 東京エレクトロン株式会社 | 熱処理装置 |
| JP3823027B2 (ja) * | 2001-01-31 | 2006-09-20 | 東京エレクトロン株式会社 | 基板処理装置 |
| JP3892327B2 (ja) * | 2002-03-28 | 2007-03-14 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP5484373B2 (ja) * | 2011-02-14 | 2014-05-07 | 東京エレクトロン株式会社 | パターン形成方法 |
| US9669984B2 (en) * | 2011-07-22 | 2017-06-06 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method |
| JP5890255B2 (ja) * | 2012-04-02 | 2016-03-22 | 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
| CN108336011B (zh) * | 2012-11-30 | 2022-08-02 | 株式会社尼康 | 搬入方法、搬送系统及曝光装置、和器件制造方法 |
| CN106255924B (zh) * | 2014-05-06 | 2019-12-10 | Asml荷兰有限公司 | 衬底支座、用于在衬底支撑位置上加载衬底的方法、光刻设备和器件制造方法 |
| NL2017433A (en) * | 2015-10-09 | 2017-04-11 | Asml Netherlands Bv | Substrate table and lithographic apparatus |
-
2017
- 2017-05-29 JP JP2017105673A patent/JP6803296B2/ja active Active
-
2018
- 2018-05-01 WO PCT/JP2018/017408 patent/WO2018221115A1/ja active Application Filing
- 2018-05-10 TW TW107115851A patent/TWI666525B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2018221115A1 (ja) | 2018-12-06 |
| TW201901307A (zh) | 2019-01-01 |
| JP2018200420A (ja) | 2018-12-20 |
| TWI666525B (zh) | 2019-07-21 |
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