JP6793236B2 - Coating device for film-forming substrate - Google Patents

Coating device for film-forming substrate Download PDF

Info

Publication number
JP6793236B2
JP6793236B2 JP2019184951A JP2019184951A JP6793236B2 JP 6793236 B2 JP6793236 B2 JP 6793236B2 JP 2019184951 A JP2019184951 A JP 2019184951A JP 2019184951 A JP2019184951 A JP 2019184951A JP 6793236 B2 JP6793236 B2 JP 6793236B2
Authority
JP
Japan
Prior art keywords
substrate
film
recess
concave groove
forming region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2019184951A
Other languages
Japanese (ja)
Other versions
JP2020021090A (en
Inventor
西中 勝喜
勝喜 西中
梶原 慎二
慎二 梶原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of JP2020021090A publication Critical patent/JP2020021090A/en
Application granted granted Critical
Publication of JP6793236B2 publication Critical patent/JP6793236B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Magnetic Record Carriers (AREA)

Description

本発明は、膜形成基板の塗布装置に関する。 The present invention relates to a coating device for a film-forming substrate.

従来、液晶表示装置では、基板の表示領域及びその周辺の領域からなる膜形成領域に、膜形成材料である液体(ここでは、配向膜材料液)がインクジェット法により塗布される。そして、基板の膜形成領域の周囲に一定の間隔をおいた位置にシール剤がディスペンス法により環状に塗布され、基板上のシール剤で囲まれた領域に液晶材料がディスペンス法により滴下塗布される。 Conventionally, in a liquid crystal display device, a liquid (here, an alignment film material liquid) as a film forming material is applied by an inkjet method to a film forming region consisting of a display region of a substrate and a region around the substrate. Then, the sealant is cyclically applied by the dispensing method at positions at regular intervals around the film-forming region of the substrate, and the liquid crystal material is dropped and applied to the region surrounded by the sealing agent on the substrate by the dispensing method. ..

ところで、インクジェット法で上述の膜形成材料である液体を基板の膜形成領域に塗布すると、この液体が基板上で濡れ広がり、シール剤を形成する領域まで到達してしまうことがある。液体がシール剤の形成領域まで広がって、シール剤形成領域に配向膜が形成されてしまうと、この配向膜の部分でシール剤の基板に対する密着性が悪くなる。 By the way, when the liquid which is the film-forming material described above is applied to the film-forming region of the substrate by the inkjet method, the liquid may wet and spread on the substrate and reach the region where the sealant is formed. When the liquid spreads to the area where the sealant is formed and an alignment film is formed in the area where the sealant is formed, the adhesion of the sealant to the substrate is deteriorated at the part of the alignment film.

そこで、基板に塗布される膜形成材料の液体の膜形成領域外側への濡れ広がりを抑制するため、特許文献1に記載のように、基板上の膜形成領域と、それよりも外側のシール剤塗布領域との間に、膜形成領域を囲む凹溝を形成したものがある。基板上の凹溝より内側に塗布された液体が、周辺に向って濡れ広がる過程で、シール剤塗布領域まで濡れ広がらないように、液体の濡れ広がりを凹溝で止めるものである。 Therefore, in order to suppress the wetting and spreading of the liquid of the film-forming material applied to the substrate to the outside of the film-forming region, as described in Patent Document 1, the film-forming region on the substrate and the sealing agent outside the film-forming region. In some cases, a concave groove surrounding the film-forming region is formed between the coating region and the coating region. In the process in which the liquid applied to the inside of the concave groove on the substrate is wetted and spread toward the periphery, the wet spread of the liquid is stopped by the concave groove so as not to spread to the sealant application area.

特開2007−322627号公報JP-A-2007-322627

近年の動向として、携帯電話に代表される携帯端末等の液晶表示装置では、製品本体の大きさに対して表示領域の大きさをできるだけ大きくとることが要求されている。この結果、基板の一定の外形寸法の範囲内で、表示領域の外側領域が狭くなる傾向がある。 As a recent trend, in liquid crystal display devices such as mobile terminals represented by mobile phones, it is required to make the size of the display area as large as possible with respect to the size of the product body. As a result, the outer region of the display region tends to be narrowed within a certain external dimension of the substrate.

従って、基板上で膜形成領域を囲む領域に形成される凹溝と、表示領域との距離が近くなる。このため、基板上で凹溝より内側に滴下され、外側周辺に向けて濡れ広がる膜形成材料の液体が、凹溝に達するまでの過程で液量を減少せず、凹溝の縁で生ずる表面張力によって凹溝際に土手状に盛り上がった液溜まりを一時的に形成する。この液溜まりができると、基板上の内側から外側周縁に濡れ広がってきた液体の一部が、該液溜まりで跳ね返り、膜形成領域の内側に向って逆流する。これにより、表示領域の内部にまで、膜形成材料の膜厚のむらを生ずる。 Therefore, the distance between the concave groove formed in the region surrounding the film forming region on the substrate and the display region becomes short. For this reason, the liquid of the film-forming material that is dropped on the substrate inside the concave groove and spreads wet toward the outer periphery does not reduce the amount of the liquid in the process of reaching the concave groove, and the surface generated at the edge of the concave groove. Due to the tension, a liquid pool that rises like a bank is temporarily formed near the groove. When this liquid pool is formed, a part of the liquid that has been wet and spread from the inside to the outer peripheral edge on the substrate is repelled by the liquid pool and flows back toward the inside of the film forming region. As a result, the film thickness of the film-forming material becomes uneven even inside the display area.

本発明の課題は、膜形成領域に生ずる膜厚のむらを抑制することにある。 An object of the present invention is to suppress the unevenness of the film thickness that occurs in the film forming region.

本発明は、基板の膜形成領域に、膜を塗布する塗布装置であって、前記基板の前記膜形成領域に膜形成材料である液体の液滴を滴下する塗布ヘッドと、前記塗布ヘッドを制御する制御装置と、を有し、前記基板は、前記膜形成領域の外周に沿う凹溝が形成された基板であって、前記凹溝と前記膜形成領域との間に、複数の凹部が並置された凹部群を備えるとともに、前記凹部群の各凹部の形状は、前記基板上に塗布された液体が、前記膜形成領域から前記凹溝に向かう方向に比べて前記凹溝から前記膜形成領域に向かう方向には流れ難い形状をなし、前記制御装置は、前記塗布ヘッドが、前記基板の前記凹溝または前記凹部に前記液滴を滴下した後に前記膜形成領域に滴下するように前記塗布ヘッドを制御することを特徴とする。 The present invention is a coating device that applies a film to a film-forming region of a substrate, and controls a coating head that drops a liquid droplet of a film-forming material onto the film-forming region of the substrate and the coating head. The substrate is a substrate on which a concave groove is formed along the outer periphery of the film-forming region, and a plurality of recesses are juxtaposed between the concave groove and the film-forming region. The shape of each recess in the recess group is such that the liquid applied on the substrate is from the concave groove to the film forming region as compared with the direction from the film forming region to the concave groove. The control device has a shape that makes it difficult to flow in the direction toward the direction of the coating head, so that the coating head drops the droplets on the concave groove or the concave portion of the substrate and then drops on the film-forming region. It is characterized by controlling.

本発明によれば、膜形成領域に生ずる膜厚のむらを抑制することができる。 According to the present invention, it is possible to suppress the unevenness of the film thickness that occurs in the film forming region.

図1は本発明が適用されてなる液晶表示パネルの一例を示す模式平面図であ る。FIG. 1 is a schematic plan view showing an example of a liquid crystal display panel to which the present invention is applied. 図2は塗布装置の一例を示す模式斜視図である。FIG. 2 is a schematic perspective view showing an example of a coating device. 図3は実施例1の基板を示す模式断面図である。FIG. 3 is a schematic cross-sectional view showing the substrate of the first embodiment. 図4は実施例1の基板の要部を示す模式平面図である。FIG. 4 is a schematic plan view showing a main part of the substrate of the first embodiment. 図5は実施例2の基板の要部を示す模式平面図である。FIG. 5 is a schematic plan view showing a main part of the substrate of the second embodiment. 図6は実施例3の基板の要部を示す模式平面図である。FIG. 6 is a schematic plan view showing a main part of the substrate of the third embodiment. 図7は実施例4の基板の要部を示す模式平面図である。FIG. 7 is a schematic plan view showing a main part of the substrate of the fourth embodiment. 図8は実施例5の基板の要部を示す模式平面図である。FIG. 8 is a schematic plan view showing a main part of the substrate of the fifth embodiment. 図9は実施例6の基板の要部を示す模式平面図である。FIG. 9 is a schematic plan view showing a main part of the substrate of the sixth embodiment. 図10は液滴の凹溝への滴下状態を示す模式図である。FIG. 10 is a schematic view showing a state in which the droplet is dropped into the concave groove. 図11は凹溝、凹部の断面図である。FIG. 11 is a cross-sectional view of the concave groove and the concave portion.

(実施例1)(図1〜図4)
本発明が適用されてなる液晶表示パネルは、図1に示すように、一点鎖線で示す膜形成領域2が、矩形状の基板1の表示領域DA及びその周辺の僅かな領域からなり、この膜形成領域2に、膜形成材料である液体(ここでは、配向膜材料液)が図2に示したインクジェット塗布装置100により塗布される。そして、基板1の膜形成領域2の周囲には、一定の間隔をおいた位置にシール剤3がディスペンス法により環状に塗布され、基板1上のシール剤3で囲まれた領域に液晶材料(不図示)がディスペンス法により滴下塗布される。その後、対向基板(不図示)がシール剤3を介して貼り合わされて液晶材料が封入され、液晶表示パネルが形成される。なお「膜形成領域2」とは、塗布された液体によって膜が形成された領域ではなく、膜を形成する領域として設定した設計上の領域のことである。
(Example 1) (FIGS. 1 to 4)
In the liquid crystal display panel to which the present invention is applied, as shown in FIG. 1, the film forming region 2 indicated by the alternate long and short dash line is composed of the display region DA of the rectangular substrate 1 and a small region around it, and this film. A liquid crystal forming material (here, an alignment film material liquid) is applied to the formation region 2 by the inkjet coating apparatus 100 shown in FIG. Then, around the film-forming region 2 of the substrate 1, the sealant 3 is cyclically applied at positions at regular intervals by the dispensing method, and the liquid crystal material (liquid crystal material) is applied to the region surrounded by the sealant 3 on the substrate 1. (Not shown) is dropped and applied by the dispense method. After that, the facing substrate (not shown) is bonded to each other via the sealant 3, the liquid crystal material is sealed, and the liquid crystal display panel is formed. The "film forming region 2" is not a region where the film is formed by the applied liquid, but a design region set as a region where the film is formed.

塗布装置100は、図2に示す通り、架台101の上にY軸方向移動ステージ102を備え、Y軸方向移動ステージ102の上面に設けた基板保持部材103の上に基板1を支持する。架台101の上には、Y軸方向移動ステージ102を跨ぐ門型フレーム104が設けられ、門型フレーム104はX軸方向に並置された複数の塗布ヘッド105を備える。塗布装置100は、Y軸方向移動ステージ102によって基板1をY軸方向に移動しつつ、塗布ヘッド105のX軸方向に一定の間隔で設けられている多数のノズルから滴下される膜形成材料の液体を基板1のY軸方向に沿う各位置に滴下塗布する。塗布装置100は、Y軸方向移動ステージ102の移動、塗布ヘッド105の各ノズルからの液滴の滴下(ノズルから滴下される液滴の量や液滴の滴下間隔(周波数)等)を制御する制御装置106を備えている。 As shown in FIG. 2, the coating device 100 includes a Y-axis direction moving stage 102 on the gantry 101, and supports the substrate 1 on a substrate holding member 103 provided on the upper surface of the Y-axis direction moving stage 102. A gate-shaped frame 104 straddling the Y-axis direction moving stage 102 is provided on the gantry 101, and the gate-shaped frame 104 includes a plurality of coating heads 105 juxtaposed in the X-axis direction. The coating device 100 moves the substrate 1 in the Y-axis direction by the Y-axis direction moving stage 102, and is a film-forming material dropped from a large number of nozzles provided at regular intervals in the X-axis direction of the coating head 105. The liquid is dropped and applied to each position of the substrate 1 along the Y-axis direction. The coating device 100 controls the movement of the Y-axis direction moving stage 102 and the dropping of droplets (the amount of droplets dropped from the nozzles, the dropping interval (frequency), etc.) of the droplets from each nozzle of the coating head 105. It includes a control device 106.

図3は図1に示した基板1のA−A断面を示し、図4は図1に示した基板1のAR領域を示す。即ち、基板1にあっては、膜形成領域2の外周の辺に沿って、所定深さの長尺状をなす凹溝10を形成し、本実施例では複数の凹溝10が並置されてなる凹溝群10Nを形成している。凹溝群10Nは、膜形成領域2の外周に沿って互いに離隔する複数の凹溝10(第1〜第n凹溝11、12、13…1n(不図示))からなる。各凹溝11、12、13…は、膜形成領域2の外周の各辺に平行に形成され、互いに複数重をなす。塗布装置100は、凹溝群10Nの各凹溝11、12、13…が形成された基板1に、膜形成材料である液体を滴下塗布するものである。 FIG. 3 shows an AA cross section of the substrate 1 shown in FIG. 1, and FIG. 4 shows an AR region of the substrate 1 shown in FIG. That is, in the substrate 1, a long recessed groove 10 having a predetermined depth is formed along the outer peripheral side of the film forming region 2, and in this embodiment, a plurality of recessed grooves 10 are juxtaposed. The concave groove group 10N is formed. The concave groove group 10N is composed of a plurality of concave grooves 10 (first to nth concave grooves 11, 12, 13 ... 1n (not shown)) separated from each other along the outer periphery of the film forming region 2. The concave grooves 11, 12, 13 ... Are formed parallel to each side of the outer periphery of the film forming region 2 and form a plurality of layers with each other. The coating device 100 drops and coats a liquid, which is a film-forming material, on the substrate 1 on which the concave grooves 11, 12, 13 ... Of the concave groove group 10N are formed.

以下、本実施例をより詳細に説明する。
(a)塗布装置100の塗布ヘッド105から滴下される膜形成材料の液体が、基板1の膜形成領域2に塗布されるのに先立って、膜形成領域2の外周に形成した凹溝10(第1〜第n凹溝11、12、13…1n)にも塗布される。従って、膜形成領域2に塗布され、外側周辺に向って濡れ広がり、凹溝10の縁に到達した液体は、この凹溝10の縁が既にこの凹溝10内に塗布された液体で濡れているので、この凹溝10の縁の液体と接触し一体化して、液溜りを形成することなくこの凹溝10内に浸入する。
Hereinafter, this embodiment will be described in more detail.
(A) The concave groove 10 (a) formed on the outer periphery of the film forming region 2 prior to being applied to the film forming region 2 of the substrate 1 by the liquid of the film forming material dropped from the coating head 105 of the coating apparatus 100. It is also applied to the first to nth concave grooves 11, 12, 13 ... 1n). Therefore, the liquid that has been applied to the film forming region 2 and spreads wet toward the outer periphery and reaches the edge of the concave groove 10 is wet with the liquid that has already been applied to the edge of the concave groove 10. Therefore, it comes into contact with the liquid at the edge of the concave groove 10 and integrates with the liquid to penetrate into the concave groove 10 without forming a liquid pool.

具体的には、図2の塗布装置100に、まず、基板1が供給される。このとき、基板1は、長辺方向がY方向と平行になるように、基板保持部材103の上に供給される。基板保持部材103は、基板1の搬入/搬出ポジションである図2のY軸方向手前側に位置づけられている。基板1の供給が完了すると制御装置106が、Y軸方向移動ステージ102を制御して基板保持部材103を図2のY軸方向奥側に向かって移動を開始させる。この移動中に、基板1上の凹溝群10Nのうち、最も表示領域DAに近い側、つまり、最も内側の凹溝11に対して、塗布ヘッド105の各ノズルから液滴が吐出されて滴下される。 Specifically, the substrate 1 is first supplied to the coating device 100 of FIG. At this time, the substrate 1 is supplied onto the substrate holding member 103 so that the long side direction is parallel to the Y direction. The substrate holding member 103 is positioned on the front side in the Y-axis direction of FIG. 2, which is the carry-in / carry-out position of the board 1. When the supply of the substrate 1 is completed, the control device 106 controls the Y-axis direction moving stage 102 to start the substrate holding member 103 toward the back side in the Y-axis direction in FIG. During this movement, droplets are ejected from each nozzle of the coating head 105 to the side of the concave groove group 10N on the substrate 1 closest to the display area DA, that is, the innermost concave groove 11. Will be done.

凹溝11は、X方向に沿う凹溝と、Y方向に沿う凹溝があるが、X方向に沿う凹溝に対しては、基板1の先頭側に位置するX方向に沿う凹溝と後方側に位置する凹溝それぞれについて、その凹溝が塗布ヘッド105の各ノズルの下を通過するタイミングに合わせて、X方向に沿う凹溝に対応して位置する各ノズルから液滴を吐出させる。また、Y方向に沿う凹溝については、その凹溝の先頭側の端部が塗布ヘッド105の下に到達してから後方側の端部が塗布ヘッド105の下を通過するまでの期間中、その凹溝に対向して位置するノズルから、液滴をY方向において予め設定された配置間隔で吐出させる。この液滴の滴下は、制御装置106によって制御される。つまり、制御装置106は、液体の液滴を、膜形成領域2に滴下する前に、凹溝10に滴下するように、塗布ヘッド105を制御する。 The concave groove 11 has a concave groove along the X direction and a concave groove along the Y direction, but with respect to the concave groove along the X direction, the concave groove along the X direction located on the front side of the substrate 1 and the rear portion. For each of the concave grooves located on the side, droplets are ejected from each nozzle located corresponding to the concave groove along the X direction at the timing when the concave groove passes under each nozzle of the coating head 105. Further, with respect to the concave groove along the Y direction, during the period from when the front end of the concave groove reaches under the coating head 105 to when the rear end passes under the coating head 105. Droplets are ejected from the nozzles located opposite the concave groove at preset arrangement intervals in the Y direction. The dropping of the droplet is controlled by the control device 106. That is, the control device 106 controls the coating head 105 so that the liquid droplets are dropped into the concave groove 10 before being dropped into the film forming region 2.

基板保持部材103が図2のY軸方向奥側の端部あるいは基板1が塗布ヘッド105を通過しきった位置に到達したら、今度は、搬入/搬出ポジションのある側へ向けて基板保持部材103が移動され、この移動中に、膜形成領域2内に対する液体の滴下塗布が行なわれる。この液体の滴下塗布は、塗布ヘッド105の下を基板1の膜形成領域2が通過するタイミングに合わせて、膜形成領域2に対向して位置する塗布ヘッド105における各ノズルから、膜形成領域2に対して予め設定された配置間隔で液滴が滴下されるように液滴を吐出させる。つまり、制御装置106は、液体の液滴を、凹溝10に滴下した後に、膜形成領域2に滴下するように塗布ヘッド105を制御する。 When the substrate holding member 103 reaches the end on the back side in the Y-axis direction of FIG. 2 or the position where the substrate 1 has passed through the coating head 105, this time, the substrate holding member 103 moves toward the side with the carry-in / carry-out position. It is moved, and during this movement, a liquid is dropped and applied to the inside of the film forming region 2. This liquid is dropped and applied from each nozzle in the coating head 105 located opposite to the film forming region 2 at the timing when the film forming region 2 of the substrate 1 passes under the coating head 105. The droplets are ejected so that the droplets are dropped at a preset arrangement interval. That is, the control device 106 controls the coating head 105 so that the liquid droplets are dropped into the concave groove 10 and then into the film forming region 2.

基板1が塗布ヘッド105の下を通過し終わり、基板1に対する液体の滴下塗布が完了し、基板保持部材103が搬入/搬出ポジションに到達すると、液体が塗布された基板1が搬出される。続いて処理する基板1があるのなら、入れ替わりに次の基板1が基板保持部材103に供給され、続いて処理する基板1が無くなるまで、上述の動作が繰り返し行なわれる。 When the substrate 1 has passed under the coating head 105, the liquid drop application to the substrate 1 is completed, and the substrate holding member 103 reaches the carry-in / carry-out position, the liquid-coated substrate 1 is carried out. If there is a substrate 1 to be subsequently processed, the next substrate 1 is supplied to the substrate holding member 103 instead, and the above operation is repeated until there is no substrate 1 to be subsequently processed.

また、上述の凹溝10に滴下する液滴の量は、滴下された液滴が凹溝10における内側(表示領域DAに近い側)に位置する縁部に接する量で滴下するものとし、その量(大きさ)は、実験によって決定することができ、凹溝の深さが大きくなる程、必要な液滴の量は大きくなる。上述の凹溝10に滴下する液滴の量は、凹溝10の同じ位置に滴下する液滴の量のことで、1滴で滴下しても、同じ位置に複数回滴下するようにしてもよい。 Further, the amount of the droplets dropped on the concave groove 10 described above shall be such that the dropped droplets are in contact with the edge portion located inside (the side closer to the display area DA) in the concave groove 10. The amount (size) can be determined experimentally, and the greater the depth of the groove, the greater the amount of droplets required. The amount of droplets dropped on the concave groove 10 described above is the amount of droplets dropped on the same position of the concave groove 10, and even if one drop is dropped or the same position is dropped multiple times. Good.

このとき、液滴は、図10の(A)又は(B)に示すように凹溝10の溝幅全体に行き渡っても良いし、図10の(C)又は(D)に示すように凹溝10の溝幅全体に行き渡らなくても良い。液滴は、少なくとも凹溝10における内側(表示領域DAに近い側)の縁に接するような位置となるように滴下すると良い。また、液滴は、凹溝10に対して、連続して連なって滴下されても良いし、間隔をおいて滴下されても良い。間隔をおいて滴下されていても、膜形成領域2から濡れ広がってくる液体は、凹溝10に滴下されて濡れている部分から液溜りを形成することなく凹溝10内に侵入する。いずれにしても、凹溝10内に、膜形成領域2から濡れ広がってきた液体を収容するスペースを確保できれば、膜形成領域2の内側から濡れ広がってきた液体の広がりを抑制できる。したがって、この点を考慮して凹溝10へ滴下する液滴の量や液滴の滴下間隔を決める。この液滴の量や滴下間隔についても、実験で求めることができる。また、凹溝10内における場所によって滴下量を変えても良い。 At this time, the droplet may spread over the entire groove width of the concave groove 10 as shown in (A) or (B) of FIG. 10, or may be concave as shown in (C) or (D) of FIG. It is not necessary to cover the entire groove width of the groove 10. The droplets may be dropped so as to be in contact with at least the inner edge (the side closer to the display area DA) of the concave groove 10. Further, the droplets may be continuously dropped on the concave groove 10 or may be dropped at intervals. Even if the liquid is dropped at intervals, the liquid that is wet and spreads from the film forming region 2 is dropped into the recessed groove 10 and enters the recessed groove 10 without forming a liquid pool from the wet portion. In any case, if a space for accommodating the liquid wet and spread from the film forming region 2 can be secured in the concave groove 10, the spread of the liquid wet and spread from the inside of the film forming region 2 can be suppressed. Therefore, in consideration of this point, the amount of droplets dropped into the concave groove 10 and the dropping interval of the droplets are determined. The amount and interval of the droplets can also be determined experimentally. Further, the dropping amount may be changed depending on the location in the concave groove 10.

更に、図10では凹溝10の最も内側の凹溝11だけに液滴を滴下する例を示したがこれに限られず、それよりも外側の凹溝12、13…1nにも液体を滴下しても良い。こうすることで、例え一番内側の凹溝11を乗り越えて液体が濡れ広がったとしても、その外側の凹溝12、13…1nのいずれかで濡れ広がりを留めることができる。もちろん、すべての凹溝10に液滴を滴下することも、任意の凹溝10のみに液滴を滴下することも同様である。膜形成領域2の液体の濡れ広がり状態によって適宜決定すれば良い。ただし、凹溝11の縁に生じる液溜りによって、濡れ広がってきた液体の一部が跳ね返って表示領域DAに及ぶことにより生じる膜形成材料の膜厚むらを効果的に抑制するためには、一番内側の凹溝11に液滴を滴下しておくことが有効である。 Further, FIG. 10 shows an example in which a droplet is dropped only on the innermost concave groove 11 of the concave groove 10, but the present invention is not limited to this, and the liquid is also dropped on the outer concave grooves 12, 13 ... 1n. You may. By doing so, even if the liquid gets wet and spreads over the innermost concave groove 11, the wet spread can be stopped at any of the outer concave grooves 12, 13 ... 1n. Of course, it is the same whether the droplets are dropped on all the concave grooves 10 or only on the arbitrary concave grooves 10. It may be appropriately determined depending on the wet and spread state of the liquid in the film forming region 2. However, in order to effectively suppress the film thickness unevenness of the film-forming material caused by the liquid pool generated at the edge of the concave groove 11 causing a part of the liquid that has been wet and spread to bounce off and reach the display area DA. It is effective to drop the droplet into the concave groove 11 on the innermost side.

また、凹溝10に対する液体の滴下と、膜形成領域2に対する液体の滴下とを別々に行なう例で説明したが、一緒に行なうようにしても良い。すなわち、基板1が塗布ヘッド105直下を通過する際に、凹溝10への液滴の滴下を行うとともに、基板1の膜形成領域2にも液体の滴下を行う。これにより一回の基板保持部材103の移動で塗布が完了し、効率的な塗布ができる。また、Y軸方向移動ステージ102の移動両端を基板1の搬入/搬出ポジションとすることで、さらに効率的に繰り返し基板1への塗布が行うことができる。 Further, although the example in which the liquid is dropped into the concave groove 10 and the liquid is dropped into the film forming region 2 separately has been described, they may be dropped together. That is, when the substrate 1 passes directly under the coating head 105, the droplets are dropped into the concave groove 10, and the liquid is also dropped into the film forming region 2 of the substrate 1. As a result, the coating is completed by moving the substrate holding member 103 once, and efficient coating can be performed. Further, by setting both ends of the movement of the Y-axis direction movement stage 102 as the carry-in / carry-out positions of the substrate 1, the coating can be repeatedly applied to the substrate 1 more efficiently.

塗布装置100による上述(a)の液体の塗布は、凹溝10に塗布(液滴を滴下)した後に、膜形成領域2に塗布する。つまり、膜形成領域2に塗布された液体が外側周辺に濡れ広がって凹溝10の縁に到達するときには、すでに先行して凹溝10に塗布済の液体が凹溝10の縁を確実に濡らしている。従って、凹溝10の縁に到達した液体による液溜りの形成を確実に生じにくくし、この液溜りによる液体の跳ね返りを確実に抑制し、膜厚むらの発生を確実に抑制できる。 The liquid of (a) described above is applied to the film forming region 2 by the coating device 100 after being applied to the concave groove 10 (droplets are dropped). That is, when the liquid applied to the film forming region 2 wets and spreads to the outer periphery and reaches the edge of the concave groove 10, the liquid already applied to the concave groove 10 in advance surely wets the edge of the concave groove 10. ing. Therefore, the formation of a liquid pool due to the liquid reaching the edge of the concave groove 10 is unlikely to occur, the rebound of the liquid due to the liquid pool is reliably suppressed, and the occurrence of film thickness unevenness can be reliably suppressed.

また、凹溝10は、膜形成領域2の内側から表示領域DAを超えて濡れ広がってきた液体がその中に浸入する分だけ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。 Further, in the concave groove 10, the amount of the liquid that wets and spreads from the inside of the film forming region 2 beyond the display area DA penetrates into the groove, and the amount of the liquid that wets and spreads to the outer periphery is reduced, and the sealant is applied. It also has a great effect of suppressing the spread of wetness to the area.

(b)基板1に形成された上述(a)の凹溝10は、前述したように膜形成領域2の外周に互いに離隔する複数重をなすように設けられる凹溝群10Nを形成し、更に、膜形成領域2の外周から離隔する外側の凹溝10ほど溝幅Li(i=1、2、3…)が小さいものとする。即ち、凹溝群10Nを形成する複数の第1凹溝11〜第n凹溝1nのうち、膜形成領域2の外周に最も近接する第1凹溝11の溝幅L1を最も大きくするものになり、濡れ広がってくる多量の液体を広幅の第1凹溝11に受容して跳ね返り及び濡れ広がりを抑制し、その後、各凹溝11、12、13…を通過してより少量となる液体をより狭幅L2、L3…の各凹溝12、13…内に順に受容して跳ね返り及び濡れ広がりを抑制する(L1>L2>L3…)。 (B) The concave groove 10 of the above-mentioned (a) formed on the substrate 1 forms a concave groove group 10N provided on the outer periphery of the film forming region 2 so as to form a plurality of layers so as to be separated from each other, and further. It is assumed that the groove width Li (i = 1, 2, 3 ...) Is smaller as the outer concave groove 10 is separated from the outer circumference of the film forming region 2. That is, among the plurality of first concave grooves 11 to nth concave grooves 1n forming the concave groove group 10N, the groove width L1 of the first concave groove 11 closest to the outer periphery of the film forming region 2 is set to be the largest. A large amount of liquid that becomes wet and spreads is received by the wide first concave groove 11 to suppress rebound and wet spread, and then a smaller amount of liquid passes through each of the concave grooves 11, 12, 13 ... It is sequentially received in the concave grooves 12, 13 ... Of the narrower widths L2, L3 ... To suppress rebound and wet spread (L1> L2> L3 ...).

つまり、液体を各凹溝11、12、13…内に確実に受容し、塗布液のシール材塗布領域への濡れ広がりおよび、各凹溝11、12、13…による上述(a)の液体跳ね返りの抑制効果によって膜形成領域2内の膜厚むらの発生を抑制しつつ、凹溝群10Nが膜形成領域2の外周に直交する方向に沿ってなす全幅Wを、全ての凹溝10が広幅とされる場合に比して小寸法化でき、製品本体内における凹溝群10Nの占有スペースを小さくし、製品本体に対してより大きな表示領域DAを確保できる。 That is, the liquid is reliably received in the recessed grooves 11, 12, 13 ..., the coating liquid is wetted and spread to the sealing material coating region, and the liquid bounces in the above-mentioned (a) by the recessed grooves 11, 12, 13 ... All the concave grooves 10 have a wide width W formed by the concave groove group 10N along the direction orthogonal to the outer periphery of the film forming region 2 while suppressing the occurrence of film thickness unevenness in the film forming region 2. The size can be reduced as compared with the case where the size is reduced, the space occupied by the concave groove group 10N in the product body can be reduced, and a larger display area DA can be secured for the product body.

(c)基板1に形成された上述(b)の相隣る凹溝10と凹溝10の間の間隔Si(i=1、2…)は、凹溝10の溝幅Liよりも小さい。これにより、上述(b)の凹溝群10Nにおいて、凹溝10と凹溝10の間の間隔Siを凹溝10の溝幅Li以上としたものに比し、各溝幅Liの合計値に相隣る凹溝10の間隔Siの合計値を加えた凹溝群10Nの全幅Wを一層小寸法化できる。従って、製品本体内における凹溝群10Nの占有スペースを一層小さくし、製品本体に対して一層大きな表示領域DAを確保できる。 (C) The distance Si (i = 1, 2, ...) Formed on the substrate 1 between the adjacent concave grooves 10 and the concave grooves 10 of the above-mentioned (b) is smaller than the groove width Li of the concave grooves 10. As a result, in the concave groove group 10N of the above-mentioned (b), the total value of each groove width Li is compared with the case where the distance Si between the concave groove 10 and the concave groove 10 is equal to or larger than the groove width Li of the concave groove 10. The overall width W of the concave groove group 10N to which the total value of the intervals Si of the adjacent concave grooves 10 is added can be further reduced in size. Therefore, the space occupied by the concave groove group 10N in the product body can be further reduced, and a larger display area DA can be secured with respect to the product body.

本実施例の凹溝群10Nでは、第1凹溝11〜第3凹溝13の溝幅L1〜L3を、L1=0.18mm、L2=0.09mm、L3=0.06mmとしている。また、第1凹溝11と第2凹溝12の間隔S1、第2凹溝12と第3凹溝13の間隔S2を、S1=S2=0.01mmとしている。このような寸法の凹溝10を形成した基板1に対して、上述の塗布を行なったところ、表示領域DA内に形成された配向膜のむらを抑制することができた。 In the concave groove group 10N of this embodiment, the groove widths L1 to L3 of the first concave groove 11 to the third concave groove 13 are L1 = 0.18 mm, L2 = 0.09 mm, and L3 = 0.06 mm. Further, the distance S1 between the first concave groove 11 and the second concave groove 12 and the distance S2 between the second concave groove 12 and the third concave groove 13 are set to S1 = S2 = 0.01 mm. When the above coating was applied to the substrate 1 on which the concave groove 10 having such a size was formed, unevenness of the alignment film formed in the display region DA could be suppressed.

(実施例2)(図5)
実施例2の基板1を説明する。
(d)基板1に形成された凹溝10と表示領域DAとの間に、所定深さの複数の凹部20が並置された凹部群20Nを配置し、各凹部20の形状は、膜形成領域2に塗布された液体が膜形成領域2から凹溝10に向かう方向に比べて、その反対方向である凹溝10から膜形成領域2に向かう方向の方が流れ難くなる形状からなる。なお、本実施例において、各凹部20は、膜形成領域2の外周縁に沿って所定のピッチ間隔で配置される。
(Example 2) (Fig. 5)
The substrate 1 of the second embodiment will be described.
(D) A recess group 20N in which a plurality of recesses 20 having a predetermined depth are juxtaposed is arranged between the concave groove 10 formed on the substrate 1 and the display area DA, and the shape of each recess 20 is a film forming region. The shape is such that the liquid applied to No. 2 is less likely to flow in the direction from the concave groove 10 to the film forming region 2 in the opposite direction than in the direction from the film forming region 2 to the concave groove 10. In this embodiment, the recesses 20 are arranged at predetermined pitch intervals along the outer peripheral edge of the film forming region 2.

凹部群20Nは、膜形成領域2の内側から外側への液体の流れに比べ、その反対方向への逆流を流れ難くする。具体的には、凹部群20Nの各凹部20によって形成される各凹部20の間が、膜形成領域2に塗布された液体が濡れ広がる時の主な道筋となる。そして、各凹部20の間は、膜形成領域2内側(表示領域DAに近い側)が広く、外側に向かって狭まるように構成する。また、表示領域DAに向かう側は、凹部20を形成する面が表示領域DAに対して平行とならないように構成する。すなわち、凹溝10側から表示領域DA側に向かっては各凹部20の間は狭くなっているので、液体が流れにくくなっていて、膜形成領域2の内側から濡れ広がって凹溝10の溝際に液溜まりができ、この液溜まりで液の流れの跳ね返りが生じたとしても、その跳ね返りのために生じた内側へ向かう流れ(逆流)を抑制する(減衰させる)ものになる。 The recess group 20N makes it difficult for the backflow in the opposite direction to flow as compared with the flow of the liquid from the inside to the outside of the film forming region 2. Specifically, the space between the recesses 20 formed by the recesses 20 of the recess group 20N is the main route when the liquid applied to the film forming region 2 gets wet and spreads. The inside of the film forming region 2 (the side closer to the display region DA) is wide and narrows toward the outside between the recesses 20. Further, the side facing the display area DA is configured so that the surface forming the recess 20 is not parallel to the display area DA. That is, since the space between the recesses 20 is narrowed from the concave groove 10 side toward the display region DA side, it is difficult for the liquid to flow, and the groove of the concave groove 10 spreads wet from the inside of the film forming region 2. At that time, a liquid pool is formed, and even if the liquid flow rebounds due to the liquid pool, the inward flow (backflow) caused by the rebound is suppressed (attenuated).

凹部群20Nは、凹部群20Nが無い場合に比べて、外側(膜形成領域2から凹溝10に向かう方向)に向かって濡れ広がる流れに対して抵抗になるので、凹溝10の溝際に到達するときの流れの速さを、凹部群20Nが無い場合と比べて低減させることができる。液体が液溜まりにぶつかる速度が遅いほど液の流れの跳ね返りは小さくなるので、結果的に、凹部群20Nは跳ね返りの抑制に寄与する。更に、濡れ広がる液体は凹部群20Nを通過するときに各凹部20内に流れ込むので、このことによって、凹溝群10Nに向かって流れる液体の量が低減され、結果として、凹溝10の縁際での液体の跳ね返りが抑制され、膜形成領域2内に生ずる膜厚のむらを抑制できる。 Compared with the case where the recess group 20N is not provided, the recess group 20N becomes resistant to the flow of wetting and spreading toward the outside (the direction from the film forming region 2 toward the recess groove 10). The speed of the flow at the time of reaching can be reduced as compared with the case where the recess group 20N is not provided. The slower the speed at which the liquid hits the liquid pool, the smaller the rebound of the liquid flow. As a result, the recess group 20N contributes to the suppression of the rebound. Further, since the liquid that spreads wet flows into each recess 20 when passing through the recesses 20N, this reduces the amount of liquid flowing toward the recesses 10N, and as a result, the edge of the recesses 10. The rebound of the liquid in the film can be suppressed, and the unevenness of the film thickness generated in the film forming region 2 can be suppressed.

また、凹部20に液体が流れ込んで、凹部20に液体が溜まった状態になったときでも、凹溝10側から膜形成領域2に向かう方向への流れを抑制する効果が得られることは実験によって確認されている。基板1の表面および凹部20を覆った液体の膜を観察したところ、凹部20の輪郭に沿って液体膜に土手状の盛り上がりが認められ、凹部20の輪郭に沿って形成された液体膜の盛り上がり部分が、凹溝10側から膜形成領域2に向かう方向への流れに対して抵抗となり、この流れが抑制されていると推測される。 Further, it has been experimentally found that even when the liquid flows into the recess 20 and the liquid is accumulated in the recess 20, the effect of suppressing the flow from the concave groove 10 side toward the film forming region 2 can be obtained. It has been confirmed. When the liquid film covering the surface of the substrate 1 and the recess 20 was observed, a bank-like swelling was observed on the liquid film along the contour of the recess 20, and the swelling of the liquid film formed along the contour of the recess 20 was observed. It is presumed that the portion acts as a resistance to the flow in the direction from the concave groove 10 side toward the film forming region 2, and this flow is suppressed.

凹部20内に液体が侵入していてもしていなくても、凹部20の輪郭で液体が盛り上がるが、その輪郭を形成する線は、表示領域DAと平行とならず角度をなしている。このため、この凹部20の輪郭部での液体の盛り上がりによって生じる跳ね返りは、直接表示領域DA側に向かわず、また並置される各凹部20の輪郭からの跳ね返り同士が干渉し合い弱めるので、膜形成領域2内に生ずる膜厚のむらを抑制できる。 Whether or not the liquid has entered the recess 20, the liquid rises at the contour of the recess 20, but the lines forming the contour are not parallel to the display area DA and are at an angle. Therefore, the rebound caused by the swelling of the liquid at the contour portion of the recess 20 does not directly face the display area DA side, and the bounce from the contour of each recess 20 juxtaposed interferes with each other to weaken the film formation. It is possible to suppress the unevenness of the film thickness that occurs in the region 2.

(e)基板1に形成された上述の凹部群20Nを構成する各凹部20は、頂角が鋭角の二等辺三角形からなる凹部21であり、底辺が、凹溝10の延在方向に平行かつ凹溝10側に位置するように配置することにより、上述(d)の液体の流れを確実に形成できる。 (E) Each of the recesses 20 forming the above-mentioned recess group 20N formed on the substrate 1 is a recess 21 composed of an isosceles triangle having an acute angle, and the base is parallel to the extending direction of the recess groove 10. By arranging the liquid so as to be located on the concave groove 10 side, the above-mentioned liquid flow (d) can be reliably formed.

尚、膜形成領域2の外周縁において、相直交する2辺(縦辺と横辺)のコーナー部に直に臨む位置には二等辺三角形からなる凹部22が配置される。凹部22は、凹部21と同一形状の二等辺三角形をなし、底辺が凹溝10側に位置し、底辺に直交する中心軸が膜形成領域2の外周の縦辺と横辺に対して45度をなすように斜めに配置される。 In the outer peripheral edge of the film forming region 2, a recess 22 made of an isosceles triangle is arranged at a position directly facing the corners of two sides (vertical side and horizontal side) orthogonal to each other. The recess 22 has an isosceles triangle having the same shape as the recess 21, the base is located on the concave groove 10 side, and the central axis orthogonal to the bottom is 45 degrees with respect to the vertical and horizontal sides of the outer periphery of the film forming region 2. It is arranged diagonally so as to form a.

また、膜形成領域2の外周において、相直交する二辺(縦辺と横辺)のコーナー部に直に臨む位置で、上述の二等辺三角形からなる凹部22の両側には、凹部21、22よりも例えば辺の長さを半分とした小形状の二等辺三角形からなる凹部23が配置される。凹部23は、底辺が凹溝10の延在方向に平行で、凹溝10側に位置するように配置される。各凹部23の底辺は各凹部21の底辺と同一直線上に配置される。 Further, on the outer circumference of the film forming region 2, recesses 21 and 22 are formed on both sides of the recess 22 formed of the above-mentioned isosceles triangle at a position directly facing the corners of the two sides (vertical side and horizontal side) that are orthogonal to each other. For example, a recess 23 made of a small isosceles triangle whose side length is halved is arranged. The recess 23 is arranged so that the bottom surface is parallel to the extending direction of the concave groove 10 and is located on the concave groove 10 side. The bottom of each recess 23 is arranged on the same straight line as the bottom of each recess 21.

本実施例の凹部群20Nでは、凹部21、22の底辺の長さa、高さbを、a=0.06mm、b=0.10mmとし、凹部23の長さc、高さdを、c=0.03mm、d=0.05mmとしている。また、相隣る凹部21のピッチ間隔p1を、p1=0.1mmとし、相隣る凹部21と凹部23の配置間隔pcを、pc=0.085mmとしている。このような寸法の凹部群20Nを形成することで、表示領域DA内に形成された配向膜のむらがより一層抑制された。 In the recess group 20N of this embodiment, the length a and the height b of the bottoms of the recesses 21 and 22 are set to a = 0.06 mm and b = 0.10 mm, and the length c and the height d of the recess 23 are set to. It is set that c = 0.03 mm and d = 0.05 mm. Further, the pitch spacing p1 of the adjacent recesses 21 is set to p1 = 0.1 mm, and the arrangement spacing pc of the adjacent recesses 21 and the recesses 23 is set to pc = 0.085 mm. By forming the recess group 20N having such dimensions, the unevenness of the alignment film formed in the display region DA was further suppressed.

尚、凹部群20Nにあっては、例えば相隣る二等辺三角形からなる凹部21のピッチ間隔p1を、p1=0.08mmとし、凹部21の密度を大きくすることもできる。 In the recess group 20N, for example, the pitch interval p1 of the recesses 21 composed of adjacent isosceles triangles can be set to p1 = 0.08 mm, and the density of the recesses 21 can be increased.

(実施例3)(図6)
実施例3が実施例1と異なる点は、基板1に形成される凹部群20Nの構成である。実施例3の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に、凹部22の両側に配置した凹部23と同一形状である小形状の二等辺三角形からなる凹部24を配置したことにある。各凹部24の頂点は各凹部21、22の頂点と同一直線上に配置され、かつ相隣る凹部21、22の間の中央、及び相隣る凹部21と凹部22の間の中央に配置される。相隣る凹部24のピッチ間隔p2を、p2=0.1mmとしている。このような寸法で凹部24を配置したことによっても、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 3) (Fig. 6)
The difference between the third embodiment and the first embodiment is the configuration of the recess group 20N formed on the substrate 1. The recess group 20N of the third embodiment has a small shape having the same shape as the recesses 23 arranged on both sides of the recesses 22 between the adjacent recesses 21 and the recesses 21 and between the adjacent recesses 21 and the recesses 22. The recess 24 made of an isosceles triangle is arranged. The vertices of each recess 24 are arranged on the same straight line as the vertices of the recesses 21 and 22, and are arranged in the center between the adjacent recesses 21 and 22 and in the center between the adjacent recesses 21 and 22. To. The pitch interval p2 of the adjacent recesses 24 is set to p2 = 0.1 mm. By arranging the recess 24 with such dimensions, the unevenness of the alignment film formed in the display region DA was suppressed.

(実施例4)(図7)
実施例4が実施例3と異なる点は、基板1に形成される凹部群20Nの構成である。実施例4の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に配置される各凹部24の頂点を、各凹部21、22の頂点を結ぶ直線よりも凹溝10の側に距離e=0.025mmだけ後退させたものである。このような寸法で凹部24を配置したことによっても、実施例3と同様に、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 4) (Fig. 7)
The difference between the fourth embodiment and the third embodiment is the configuration of the recess group 20N formed on the substrate 1. In the recess group 20N of the fourth embodiment, the vertices of the recesses 24 arranged between the adjacent recesses 21 and the recesses 21 and between the adjacent recesses 21 and the recesses 22 are set to the vertices of the recesses 21 and 22. It is retracted to the side of the concave groove 10 from the straight line to be connected by a distance e = 0.025 mm. By arranging the recesses 24 with such dimensions, unevenness of the alignment film formed in the display region DA was suppressed as in Example 3.

(実施例5)(図8)
実施例5が実施例1と異なる点は、基板1に形成される凹部群20Nの構成にある。実施例5の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に、菱形からなる凹部25を配置したものである。凹部25の短い方の対角線の長さf、長い方の対角線の長さgを、f=0.03mm、g=0.10mmとしている。各凹部25の長い方の対角線上にある2つの頂点のそれぞれは各凹部21、22の頂点と底辺のそれぞれと同一直線上に配置され、かつ相隣る凹部21と凹部21の間の中央、及び相隣る凹部21と凹部22の間の中央に配置される。このような形状及び寸法で凹部25を配置した場合でも、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 5) (Fig. 8)
The difference between the fifth embodiment and the first embodiment is the configuration of the recess group 20N formed on the substrate 1. In the recess group 20N of the fifth embodiment, the recess 25 having a rhombus shape is arranged between the adjacent recesses 21 and 21 and between the adjacent recesses 21 and 22. The length f of the shorter diagonal line of the recess 25 and the length g of the longer diagonal line are set to f = 0.03 mm and g = 0.10 mm. Each of the two vertices on the longer diagonal of each recess 25 is located on the same straight line as each of the vertices and bottoms of each recess 21, 22 and at the center between the adjacent recesses 21 and 21. It is arranged in the center between the recesses 21 and the recesses 22 adjacent to each other. Even when the recess 25 was arranged with such a shape and size, the unevenness of the alignment film formed in the display region DA was suppressed.

(実施例6)(図9)
実施例6が実施例4と異なる点は、基板1に形成される凹部群20Nの構成にある。実施例6の凹部群20Nは、実施例4の凹部群20Nにおける各凹部21を、実施例5で用いた凹部25と同一形状の菱形からなる凹部26に代えたものである。このような形状および寸法で凹部26を配置した場合でも、実施例3と同様に、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 6) (Fig. 9)
The difference between the sixth embodiment and the fourth embodiment is the configuration of the recess group 20N formed on the substrate 1. In the recess group 20N of Example 6, each recess 21 in the recess group 20N of Example 4 is replaced with a recess 26 having a diamond shape having the same shape as the recess 25 used in Example 5. Even when the recess 26 was arranged with such a shape and size, unevenness of the alignment film formed in the display region DA was suppressed as in Example 3.

以上、本発明の実施例を図面により詳述したが、本発明の具体的な構成はこの実施例に限られるものではなく、本発明の要旨を逸脱しない範囲の設計の変更等があっても本発明に含まれる。例えば、本発明の基板1は、複数の凹溝10からなる凹溝群10Nを配置するものに限らず、単一の凹溝10を配置してなるものでも良い。 Although the embodiment of the present invention has been described in detail with reference to the drawings, the specific configuration of the present invention is not limited to this embodiment, and even if there is a design change or the like within a range not deviating from the gist of the present invention. Included in the present invention. For example, the substrate 1 of the present invention is not limited to the one in which the concave groove group 10N composed of the plurality of concave grooves 10 is arranged, and may be the one in which a single concave groove 10 is arranged.

また、上述の実施例2〜6では、膜形成領域2の外周縁に沿って、相直交する2辺(縦辺と横辺)のコーナー部に直に臨む位置に、二等辺三角形からなる凹部22が配置されている。但し、この凹部22は、配置されていなくても良い。また、上述の実施例2〜6では、相隣る凹部21と凹部22の間であって、凹部22の両側に、小形状の二等辺三角形の凹部23が配置されている。また、実施例3、4では、相隣る凹部21と凹部21の間及び相隣る凹部21と凹部22の間に、凹部23と同一形状である凹部24が配置されている。これらの凹部23、凹部24についても、必ずしも配置しなくても良い。さらに、上述の実施例におけるコーナー部に、三角形状の凹部22、凹部23、凹部24、菱形の凹部25又は凹部26を適宜置き換えて配置しても良く、あるいはこれらを適宜組み合わせて配置しても良い。 Further, in Examples 2 to 6 described above, a recess made of an isosceles triangle is located at a position directly facing the corners of the two sides (vertical side and horizontal side) orthogonal to each other along the outer peripheral edge of the film forming region 2. 22 are arranged. However, the recess 22 may not be arranged. Further, in Examples 2 to 6 described above, small isosceles triangular recesses 23 are arranged between the recesses 21 and the recesses 22 adjacent to each other on both sides of the recesses 22. Further, in Examples 3 and 4, a recess 24 having the same shape as the recess 23 is arranged between the adjacent recesses 21 and 21 and between the adjacent recesses 21 and 22. These recesses 23 and 24 do not necessarily have to be arranged. Further, the triangular recess 22, the recess 23, the recess 24, the diamond-shaped recess 25 or the recess 26 may be appropriately replaced and arranged at the corner portion in the above-described embodiment, or these may be appropriately combined and arranged. good.

また、実施例2では、膜形成領域2への液体の塗布に先立って、凹溝10への液滴の滴下を行うことは必ずしも必要ではない。但し、凹部20に、実施例1のように、塗布すべき液体の液滴を、膜形成領域2への塗布に先立って、凹部20に滴下しておいても良い。このようにすれば、膜形成領域2への液体の滴下によって濡れ広がる液体が、凹部群20Nを通過するときに、各凹部20内に流れ込むことを促進できる。もちろん、膜形成領域2への滴下の前に、実施例1と同様に、凹溝10に液滴を滴下しておいても良い。これにより、凹溝10の縁際での液体の跳ね返りがより一層抑制され、膜形成領域2内に生ずる膜厚のむらを抑制できる。 Further, in the second embodiment, it is not always necessary to drop the droplet into the concave groove 10 prior to the application of the liquid to the film forming region 2. However, as in Example 1, droplets of the liquid to be applied to the recess 20 may be dropped into the recess 20 prior to application to the film forming region 2. In this way, it is possible to promote the liquid that spreads by dropping the liquid into the film forming region 2 to flow into each of the recesses 20 when passing through the recesses 20N. Of course, the droplet may be dropped into the concave groove 10 in the same manner as in Example 1 before dropping into the film forming region 2. As a result, the rebound of the liquid at the edge of the concave groove 10 is further suppressed, and the unevenness of the film thickness generated in the film forming region 2 can be suppressed.

さらに、実施例1と同様に、凹部20を有する基板の凹溝10の幅を、膜形成領域2より遠ざかるに従って狭くなるようにしても良いし、相隣る凹溝10と凹溝10の間の間隔Siを、凹溝10の溝幅Liよりも小さくしても良い。これにより、実施例1と同様に、表示領域DA内に形成された配向膜のむらを抑制しつつ、製品本体内における凹溝群10Nの占有スペースを小さくし、製品本体に対してより大きな表示領域DAを確保できる。 Further, similarly to the first embodiment, the width of the concave groove 10 of the substrate having the concave portion 20 may be narrowed as the distance from the film forming region 2 increases, or between the concave groove 10 and the concave groove 10 adjacent to each other. The interval Si may be smaller than the groove width Li of the concave groove 10. As a result, as in the first embodiment, the space occupied by the concave groove group 10N in the product body is reduced while suppressing the unevenness of the alignment film formed in the display area DA, and the display area larger than the product body. DA can be secured.

尚、凹溝は、膜形成領域2の外周を囲む環状であっても良いし、長尺な凹溝を複数配列したものであっても良い。また、凹溝10は、膜形成領域2の外周で閉じた環状とすることには限定されず、一部に隙間がある形状であってもよい。 The concave groove may be an annular shape surrounding the outer periphery of the film forming region 2, or may be an array of a plurality of long concave grooves. Further, the concave groove 10 is not limited to an annular shape closed at the outer periphery of the film forming region 2, and may have a shape having a gap in a part thereof.

また、前述の実施例では凹部群を二等辺三角形及び菱形の凹部で構成したが、他の形状、例えば、円形、楕円形、三角形や菱形以外の多角形、星型等であっても良い。各凹部20の形状は、膜形成領域2に塗布された液体が、膜形成領域2から凹溝10に向かう方向に比べて、凹溝10から膜形成領域2に向かう方向の方が流れ難くなる形状、配置であればよく、異なる形状、配置の組合せであっても良い。 Further, in the above-described embodiment, the recess group is composed of an isosceles triangle and a rhombus recess, but other shapes such as a circle, an ellipse, a polygon other than a triangle or a rhombus, and a star shape may be used. As for the shape of each recess 20, the liquid applied to the film forming region 2 is less likely to flow in the direction from the concave groove 10 to the film forming region 2 than in the direction from the film forming region 2 to the concave groove 10. The shape and arrangement may be used, and different shapes and arrangements may be combined.

また、凹溝や凹部の縁は曲面あるいは斜面を有していてもよい。例えば、膜形成領域2の外周に沿う凹溝10が形成された基板1であって、凹溝10と膜形成領域2との間に、複数の凹部20が並置された凹部群20Nを備えるとともに、この凹部群20Nの各凹部20の形状は、基板1上に塗布された液体が、膜形成領域2から凹溝10に向かう方向に比べて凹溝10から膜形成領域2に向かう方向には流れ難い形状をなし、凹溝10及び凹部20の一方若しくは双方の縁に、曲面若しくは斜面を有する基板1であってもよい。図11に、基板1の凹溝10、凹部20の縁に垂直面を有する例(A)、斜面を有する例(B)、曲面を有する例(C)を示す。 Further, the concave groove and the edge of the concave portion may have a curved surface or a slope. For example, it is a substrate 1 in which a concave groove 10 is formed along the outer periphery of the film forming region 2, and is provided with a recess group 20N in which a plurality of concave grooves 20 are juxtaposed between the concave groove 10 and the film forming region 2. The shape of each recess 20 of the recess group 20N is such that the liquid applied on the substrate 1 is directed from the concave groove 10 to the film forming region 2 as compared with the direction from the film forming region 2 to the concave groove 10. The substrate 1 may be a substrate 1 having a shape that is difficult to flow and having a curved surface or a slope on one or both edges of the concave groove 10 and the concave portion 20. FIG. 11 shows an example (A) having a vertical surface at the edge of the concave groove 10 and the concave portion 20 of the substrate 1, an example having a slope (B), and an example having a curved surface (C).

このように曲面あるいは斜面とすることで、縁に生じる表面張力を弱めて、凹溝10や凹部20の輪郭部での液体の盛り上がりが抑制され、この盛り上がりによって生じる液体の跳ね返りも抑制される。また、液体の凹溝10や凹部20内への侵入が容易となり、液体の濡れ広がりを受容して濡れ広がりを抑制することがより確実にできる。このような曲面あるいは斜面は、凹溝10や凹部20の全周あるいはすべての縁に設けてもよいし、縁の一部、例えば、表示領域DA側の縁にのみ設けてもよい。表示領域DA側の縁に設けると、液体の表示領域DA側への跳ね返りを抑制しつつ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。もちろん、凹溝10や凹部20の縁を曲面あるいは斜面としたうえで、実施例1同様に液滴を滴下してもよい。これにより、上記の効果をさらに高めることができる。 By forming the curved surface or the slope in this way, the surface tension generated at the edge is weakened, the swelling of the liquid at the contour portion of the concave groove 10 and the concave portion 20 is suppressed, and the rebound of the liquid caused by the swelling is also suppressed. In addition, the liquid can easily enter the concave groove 10 and the concave portion 20, and the wet spreading of the liquid can be received and the wet spreading can be suppressed more reliably. Such a curved surface or a slope may be provided on the entire circumference or all edges of the concave groove 10 or the concave portion 20, or may be provided only on a part of the edge, for example, the edge on the display area DA side. When provided on the edge of the display area DA side, the effect of suppressing the rebound of the liquid to the display area DA side, reducing the amount of liquid that wets and spreads to the outer periphery, and suppressing the wet spread to the sealant application area is also obtained. large. Of course, the edges of the concave groove 10 and the concave portion 20 may be curved or sloped, and then droplets may be dropped as in the first embodiment. Thereby, the above-mentioned effect can be further enhanced.

また、膜形成領域の外周に沿う第1の流動調整部が形成された基板1であって、第1の流動調整部と膜形成領域2との間に、複数の第2の流動調整部が並置された第2の流動調整部群を備えるとともに、各第2の流動調整部の形状は、基板1上に塗布された液体が、膜形成領域2から第1の流動調整部に向かう方向に比べて、第1の流動調整部から膜形成領域2に向かう方向には流れ難い形状をなす基板1であってもよい。 Further, in the substrate 1 in which the first flow adjusting portion is formed along the outer periphery of the film forming region, a plurality of second flow adjusting portions are formed between the first flow adjusting portion and the film forming region 2. A group of second flow adjusting portions arranged side by side is provided, and the shape of each second flow adjusting portion is such that the liquid applied on the substrate 1 is directed from the film forming region 2 toward the first flow adjusting portion. In comparison, the substrate 1 may have a shape that makes it difficult to flow in the direction from the first flow adjusting portion toward the film forming region 2.

第1の流動調整部、第2の流動調整部における「流動調整」は、液体の流動を抑制又は促進することをいう。ここで、第1の流動調整部、第2の流動調整部は、凹部20であっても、凸部であってもよい。つまり、基板1における表示領域DAと同一の高さの平坦面に対して、窪んでいるか、突出しているかは問わない。第1の流動調整部及び第2の流動調整部が双方とも凹部20であってもよいし、双方とも凸部であってもよい。第1の流動調整部及び第2の流動調整部のいずれか一方が凹部20で、他方が凸部であってもよい。 "Flow adjustment" in the first flow adjustment unit and the second flow adjustment unit means suppressing or promoting the flow of the liquid. Here, the first flow adjusting unit and the second flow adjusting unit may be a concave portion 20 or a convex portion. That is, it does not matter whether the substrate 1 is recessed or protrudes from a flat surface having the same height as the display area DA. Both the first flow adjusting portion and the second flow adjusting portion may be concave portions 20, or both may be convex portions. Either one of the first flow adjusting portion and the second flow adjusting portion may be a concave portion 20 and the other may be a convex portion.

また、第2の流動調整部は、頂角が鋭角の二等辺三角形で、この二等辺三角形の底辺が、第1の流動調整部の延在方向に平行で、かつ第1の流動調整部側に位置するように配置されていてもよい。 The second flow adjustment unit is an isosceles triangle with an acute angle, and the base of the isosceles triangle is parallel to the extending direction of the first flow adjustment unit and is on the side of the first flow adjustment unit. It may be arranged so as to be located at.

第1の流動調整部は、膜形成領域の外周に互いに離隔する複数重をなすように設けられる第1の流動調整部群を形成し、膜形成領域2の外周から離隔する外側の第1の流動調整部ほど幅が小さくてもよい。 The first flow adjusting part forms a group of first flow adjusting parts provided so as to form a plurality of layers that are separated from each other on the outer periphery of the film forming region, and the first outer side that is separated from the outer periphery of the film forming region 2. The width may be smaller as the flow adjusting portion.

さらに、第1の流動調整部、第2の流動調整部における縁に、曲面あるいは斜面を有してもよい。例えば、第1の流動調整部又は第2の流動調整部が凸部の場合に、縁部の側面を曲面あるいは傾斜面を有する形状としてもよい。 Further, the edges of the first flow adjusting section and the second flow adjusting section may have a curved surface or a slope. For example, when the first flow adjusting portion or the second flow adjusting portion is a convex portion, the side surface of the edge portion may have a curved surface or an inclined surface.

また、前述の実施例では、インクジェット式の塗布ヘッドを用いる例で説明したが、液体を液滴状にして滴下するものであれば、他の方式の塗布ヘッドを用いるものにも適用可能である。 Further, in the above-described embodiment, the example in which the inkjet type coating head is used has been described, but it can be applied to the one using another type of coating head as long as the liquid is dropped in the form of droplets. ..

1 基板
2 膜形成領域
10N 凹溝群
10、11、12、13 凹溝
20N 凹部群
20、21、22、23、24、25、26 凹部
100 塗布装置
1 Substrate 2 Film forming region 10N Recessed groove group 10, 11, 12, 13 Recessed groove 20N Recessed groove group 20, 21, 22, 23, 24, 25, 26 Recessed 100 coating device

Claims (3)

基板の膜形成領域に、膜を塗布する塗布装置であって、
前記基板の前記膜形成領域に膜形成材料である液体の液滴を滴下する塗布ヘッドと、
前記塗布ヘッドを制御する制御装置と、を有し、
前記基板は、前記膜形成領域の外周に沿う凹溝が形成された基板であって、前記凹溝と前記膜形成領域との間に、複数の凹部が並置された凹部群を備えるとともに、前記凹部群の各凹部の形状は、前記基板上に塗布された液体が、前記膜形成領域から前記凹溝に向かう方向に比べて前記凹溝から前記膜形成領域に向かう方向には流れ難い形状をなし、
前記制御装置は、前記塗布ヘッドが、前記基板の前記凹溝または前記凹部に前記液滴を滴下した後に前記膜形成領域に滴下するように前記塗布ヘッドを制御することを特徴とする膜形成基板の塗布装置。
A coating device that applies a film to the film-forming region of a substrate.
A coating head that drops a liquid droplet of a film-forming material onto the film-forming region of the substrate, and a coating head.
It has a control device for controlling the coating head, and has
The substrate is a substrate on which a concave groove is formed along the outer periphery of the film-forming region, and includes a group of recesses in which a plurality of recesses are juxtaposed between the concave groove and the film-forming region. The shape of each recess in the recess group is such that the liquid applied on the substrate is less likely to flow in the direction from the recess to the film-forming region than in the direction from the film-forming region to the recess. None,
The control device is characterized in that the coating head controls the coating head so that the droplet is dropped into the recessed groove or the recess of the substrate and then dropped onto the film forming region. Coating device.
前記基板の前記凹部群は、頂角が鋭角で、底辺が、前記凹溝の延在方向に平行で、かつ前記凹溝側に位置するように配置される二等辺三角形の凹部であることを特徴とする請求項1記載の膜形成基板の塗布装置。 The recess group of the substrate is an isosceles triangular recess arranged so that the apex angle is an acute angle, the base is parallel to the extending direction of the recess, and the recess is located on the recess side. The coating apparatus for a film-forming substrate according to claim 1. 前記基板の前記凹溝は、前記膜形成領域の外周に互いに離隔する複数重をなすように設けられる凹溝群を形成し、
前記制御装置は、最も内側の前記凹溝にのみ前記液滴を滴下するよう、前記塗布ヘッドを制御することを特徴とする請求項1または2記載の膜形成基板の塗布装置。
The recessed grooves of the substrate form a group of recessed grooves provided on the outer periphery of the film forming region so as to form a plurality of layers that are separated from each other.
The coating device for a film-forming substrate according to claim 1 or 2, wherein the control device controls the coating head so that the droplets are dropped only into the innermost concave groove.
JP2019184951A 2014-09-26 2019-10-08 Coating device for film-forming substrate Expired - Fee Related JP6793236B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014197486 2014-09-26
JP2014197486 2014-09-26

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2015175722A Division JP6602610B2 (en) 2014-09-26 2015-09-07 Substrate, film-forming substrate manufacturing method and coating apparatus

Publications (2)

Publication Number Publication Date
JP2020021090A JP2020021090A (en) 2020-02-06
JP6793236B2 true JP6793236B2 (en) 2020-12-02

Family

ID=55866872

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015175722A Expired - Fee Related JP6602610B2 (en) 2014-09-26 2015-09-07 Substrate, film-forming substrate manufacturing method and coating apparatus
JP2019184951A Expired - Fee Related JP6793236B2 (en) 2014-09-26 2019-10-08 Coating device for film-forming substrate

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2015175722A Expired - Fee Related JP6602610B2 (en) 2014-09-26 2015-09-07 Substrate, film-forming substrate manufacturing method and coating apparatus

Country Status (2)

Country Link
JP (2) JP6602610B2 (en)
TW (1) TWI672548B (en)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100987678B1 (en) * 2004-12-03 2010-10-13 엘지디스플레이 주식회사 Liquid Crystal Display and Method of Fabricating the Same
JP4768393B2 (en) * 2005-10-21 2011-09-07 Nec液晶テクノロジー株式会社 Liquid crystal display device and manufacturing method thereof
WO2007129489A1 (en) * 2006-04-11 2007-11-15 Sharp Kabushiki Kaisha Board for display device and display device
JP4651580B2 (en) * 2006-05-31 2011-03-16 株式会社 日立ディスプレイズ Liquid crystal display device
JP2009198633A (en) * 2008-02-20 2009-09-03 Brother Ind Ltd Method of manufacturing display panel, and display panel and display device manufactured with method thereof
US8913221B2 (en) * 2010-04-16 2014-12-16 Sharp Kabushiki Kaisha Display device
CN102236208A (en) * 2010-04-22 2011-11-09 北京京东方光电科技有限公司 Liquid crystal display
JP5693943B2 (en) * 2010-12-22 2015-04-01 芝浦メカトロニクス株式会社 Alignment film forming liquid coating apparatus and alignment film forming substrate manufacturing method
US20130235310A1 (en) * 2012-03-06 2013-09-12 Guofu Tang LCD Panel and LCD Device
JP5726829B2 (en) * 2012-09-21 2015-06-03 株式会社東芝 Film forming method and liquid crystal display device
KR102059801B1 (en) * 2013-03-22 2020-02-12 삼성디스플레이 주식회사 Display panel and manufacturing method of the same
CN105556382B (en) * 2013-09-26 2019-02-19 夏普株式会社 Display member and display device

Also Published As

Publication number Publication date
JP2016071352A (en) 2016-05-09
TWI672548B (en) 2019-09-21
TW201612603A (en) 2016-04-01
JP6602610B2 (en) 2019-11-06
JP2020021090A (en) 2020-02-06

Similar Documents

Publication Publication Date Title
JP6232564B2 (en) Display panel
TWI594804B (en) Touch panel manufacturing method
JP6793236B2 (en) Coating device for film-forming substrate
CN105467685B (en) Substrate, method for manufacturing film-forming substrate, and coating apparatus
KR101713813B1 (en) Method for forming film and apparatus for forming the same
JP2013101780A (en) Ink jet application device and ink jet application method
US9827763B2 (en) Liquid ejecting head and liquid ejecting apparatus
JP6952243B2 (en) Printing method and printing equipment
CN103752450A (en) Spraying device
JP5412282B2 (en) Film formation method
KR20160085811A (en) Device for treating a surface
TWI717320B (en) Coating device and dropping method using the device
JP2006309241A5 (en)
JP6289880B2 (en) Thin film forming method and thin film forming apparatus
TWI705591B (en) Printing method, printing device and manufacturing method of EL and solar cell
JP2010269219A (en) Nozzle and method for forming coating film
WO2016075889A1 (en) Liquid jetting head, line head, and liquid jetting device
JP2008302312A (en) Nozzle and coating film forming method
US10046575B2 (en) Liquid spray device
JP6119657B2 (en) Painting method
JP2013052379A (en) Coating device
JP5993641B2 (en) Coating method
JP5591516B2 (en) Turbulence generator for atomizer
WO2016051896A1 (en) Coating device and coating method
JP2012128174A (en) Die head and application method of paint

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191009

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200923

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201013

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20201109

R150 Certificate of patent or registration of utility model

Ref document number: 6793236

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees