JP2020021090A - Coating device for film formation substrate - Google Patents

Coating device for film formation substrate Download PDF

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JP2020021090A
JP2020021090A JP2019184951A JP2019184951A JP2020021090A JP 2020021090 A JP2020021090 A JP 2020021090A JP 2019184951 A JP2019184951 A JP 2019184951A JP 2019184951 A JP2019184951 A JP 2019184951A JP 2020021090 A JP2020021090 A JP 2020021090A
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concave
substrate
groove
liquid
film formation
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JP6793236B2 (en
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西中 勝喜
Katsuki Nishinaka
勝喜 西中
梶原 慎二
Shinji Kajiwara
慎二 梶原
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Shibaura Mechatronics Corp
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Abstract

To suppress variation in film thickness generated in a film formation area.SOLUTION: A coating device 100 for coating a film formation area of a substrate 1 with a film comprises a coating head 105 for delivering liquid, which is film formation material, by drops into the film formation area of the substrate and a control device 106 for controlling the coating head. The substrate with a concave groove formed along the outer periphery of the film formation area includes a concave part group consisting of a plurality of concave parts arranged in parallel between the concave groove and the film formation area. Each concave part of the concave part group is shaped into such a form that liquid coating the substrate is harder to flow in a direction from the concave groove toward the film formation area than a direction from the film formation area toward the concave groove. The control device controls the coating head so that the coating head delivers liquid by drops into the film formation area after delivering liquid by drops into the concave group of the substrate or the concave parts.SELECTED DRAWING: Figure 2

Description

本発明は、膜形成基板の塗布装置に関する。   The present invention relates to a film forming substrate coating apparatus.

従来、液晶表示装置では、基板の表示領域及びその周辺の領域からなる膜形成領域に、膜形成材料である液体(ここでは、配向膜材料液)がインクジェット法により塗布される。そして、基板の膜形成領域の周囲に一定の間隔をおいた位置にシール剤がディスペンス法により環状に塗布され、基板上のシール剤で囲まれた領域に液晶材料がディスペンス法により滴下塗布される。   2. Description of the Related Art Conventionally, in a liquid crystal display device, a liquid (here, an alignment film material liquid) that is a film forming material is applied to a film forming region including a display region of a substrate and a peripheral region thereof by an inkjet method. A sealant is annularly applied by a dispense method to a position around the film formation area of the substrate at a predetermined interval, and a liquid crystal material is applied by a dispense method to a region surrounded by the sealant on the substrate. .

ところで、インクジェット法で上述の膜形成材料である液体を基板の膜形成領域に塗布すると、この液体が基板上で濡れ広がり、シール剤を形成する領域まで到達してしまうことがある。液体がシール剤の形成領域まで広がって、シール剤形成領域に配向膜が形成されてしまうと、この配向膜の部分でシール剤の基板に対する密着性が悪くなる。   By the way, when the liquid as the above-mentioned film forming material is applied to the film forming region of the substrate by the ink jet method, the liquid may spread on the substrate and spread to the region where the sealant is formed. If the liquid spreads to the region where the sealant is formed and an alignment film is formed in the region where the sealant is formed, the adhesion of the sealant to the substrate at the portion of the alignment film deteriorates.

そこで、基板に塗布される膜形成材料の液体の膜形成領域外側への濡れ広がりを抑制するため、特許文献1に記載のように、基板上の膜形成領域と、それよりも外側のシール剤塗布領域との間に、膜形成領域を囲む凹溝を形成したものがある。基板上の凹溝より内側に塗布された液体が、周辺に向って濡れ広がる過程で、シール剤塗布領域まで濡れ広がらないように、液体の濡れ広がりを凹溝で止めるものである。   In order to prevent the liquid of the film forming material applied to the substrate from spreading to the outside of the film forming region, as described in Patent Document 1, the film forming region on the substrate and the sealant outside the film forming region are disclosed. In some cases, a groove surrounding the film formation region is formed between the film and the application region. In the process in which the liquid applied to the inside of the groove on the substrate is wet-spread toward the periphery, the wet-spread of the liquid is stopped by the groove so as not to spread to the sealant application region.

特開2007−322627号公報JP 2007-322627 A

近年の動向として、携帯電話に代表される携帯端末等の液晶表示装置では、製品本体の大きさに対して表示領域の大きさをできるだけ大きくとることが要求されている。この結果、基板の一定の外形寸法の範囲内で、表示領域の外側領域が狭くなる傾向がある。   As a recent trend, in a liquid crystal display device such as a mobile terminal represented by a mobile phone, it is required that the size of the display area be as large as possible with respect to the size of the product body. As a result, the area outside the display area tends to be narrower within a certain range of the external dimensions of the substrate.

従って、基板上で膜形成領域を囲む領域に形成される凹溝と、表示領域との距離が近くなる。このため、基板上で凹溝より内側に滴下され、外側周辺に向けて濡れ広がる膜形成材料の液体が、凹溝に達するまでの過程で液量を減少せず、凹溝の縁で生ずる表面張力によって凹溝際に土手状に盛り上がった液溜まりを一時的に形成する。この液溜まりができると、基板上の内側から外側周縁に濡れ広がってきた液体の一部が、該液溜まりで跳ね返り、膜形成領域の内側に向って逆流する。これにより、表示領域の内部にまで、膜形成材料の膜厚のむらを生ずる。   Therefore, the distance between the groove formed in the region surrounding the film formation region on the substrate and the display region is reduced. For this reason, the liquid of the film-forming material which is dropped on the substrate inside the groove and spreads to the outer periphery does not decrease the amount of liquid in the process of reaching the groove, and the surface formed at the edge of the groove. Due to the tension, a liquid pool which rises up like a bank at the time of the groove is temporarily formed. When this liquid pool is formed, a part of the liquid that has spread from the inside to the outer peripheral edge of the substrate rebounds in the liquid pool and flows backward toward the inside of the film formation region. As a result, the film thickness of the film forming material becomes uneven even inside the display area.

本発明の課題は、膜形成領域に生ずる膜厚のむらを抑制することにある。   An object of the present invention is to suppress unevenness in film thickness occurring in a film formation region.

本発明は、基板の膜形成領域に、膜を塗布する塗布装置であって、前記基板の前記膜形成領域に膜形成材料である液体の液滴を滴下する塗布ヘッドと、前記塗布ヘッドを制御する制御装置と、を有し、前記基板は、前記膜形成領域の外周に沿う凹溝が形成された基板であって、前記凹溝と前記膜形成領域との間に、複数の凹部が並置された凹部群を備えるとともに、前記凹部群の各凹部の形状は、前記基板上に塗布された液体が、前記膜形成領域から前記凹溝に向かう方向に比べて前記凹溝から前記膜形成領域に向かう方向には流れ難い形状をなし、前記制御装置は、前記塗布ヘッドが、前記基板の前記凹溝または前記凹部に前記液滴を滴下した後に前記膜形成領域に滴下するように前記塗布ヘッドを制御することを特徴とする。   The present invention is a coating apparatus for coating a film on a film forming region of a substrate, wherein the coating device controls the coating head by dropping a liquid droplet of a film forming material on the film forming region of the substrate. The substrate is a substrate in which a concave groove is formed along the outer periphery of the film forming region, and a plurality of concave portions are juxtaposed between the concave groove and the film forming region. And the shape of each of the recesses of the recess group is such that the liquid applied on the substrate is moved from the groove toward the film formation region in a direction from the film formation region toward the groove. Has a shape that is difficult to flow in the direction toward, and the control device is configured to control the application head so that the application head drops the droplet in the concave groove or the concave portion of the substrate and then drops into the film formation region. Is controlled.

本発明によれば、膜形成領域に生ずる膜厚のむらを抑制することができる。   According to the present invention, it is possible to suppress unevenness in film thickness occurring in a film formation region.

図1は本発明が適用されてなる液晶表示パネルの一例を示す模式平面図であ る。FIG. 1 is a schematic plan view showing an example of a liquid crystal display panel to which the present invention is applied. 図2は塗布装置の一例を示す模式斜視図である。FIG. 2 is a schematic perspective view showing an example of the coating apparatus. 図3は実施例1の基板を示す模式断面図である。FIG. 3 is a schematic sectional view showing the substrate of the first embodiment. 図4は実施例1の基板の要部を示す模式平面図である。FIG. 4 is a schematic plan view illustrating a main part of the substrate according to the first embodiment. 図5は実施例2の基板の要部を示す模式平面図である。FIG. 5 is a schematic plan view illustrating a main part of the substrate according to the second embodiment. 図6は実施例3の基板の要部を示す模式平面図である。FIG. 6 is a schematic plan view illustrating a main part of the substrate according to the third embodiment. 図7は実施例4の基板の要部を示す模式平面図である。FIG. 7 is a schematic plan view illustrating a main part of the substrate of the fourth embodiment. 図8は実施例5の基板の要部を示す模式平面図である。FIG. 8 is a schematic plan view showing a main part of the substrate of the fifth embodiment. 図9は実施例6の基板の要部を示す模式平面図である。FIG. 9 is a schematic plan view illustrating a main part of a substrate according to the sixth embodiment. 図10は液滴の凹溝への滴下状態を示す模式図である。FIG. 10 is a schematic view showing a state in which a droplet is dropped into a concave groove. 図11は凹溝、凹部の断面図である。FIG. 11 is a sectional view of a concave groove and a concave portion.

(実施例1)(図1〜図4)
本発明が適用されてなる液晶表示パネルは、図1に示すように、一点鎖線で示す膜形成領域2が、矩形状の基板1の表示領域DA及びその周辺の僅かな領域からなり、この膜形成領域2に、膜形成材料である液体(ここでは、配向膜材料液)が図2に示したインクジェット塗布装置100により塗布される。そして、基板1の膜形成領域2の周囲には、一定の間隔をおいた位置にシール剤3がディスペンス法により環状に塗布され、基板1上のシール剤3で囲まれた領域に液晶材料(不図示)がディスペンス法により滴下塗布される。その後、対向基板(不図示)がシール剤3を介して貼り合わされて液晶材料が封入され、液晶表示パネルが形成される。なお「膜形成領域2」とは、塗布された液体によって膜が形成された領域ではなく、膜を形成する領域として設定した設計上の領域のことである。
(Example 1) (FIGS. 1 to 4)
In a liquid crystal display panel to which the present invention is applied, as shown in FIG. 1, a film forming area 2 indicated by a dashed line is composed of a display area DA of a rectangular substrate 1 and a small area around the display area DA. A liquid which is a film forming material (here, an alignment film material liquid) is applied to the formation region 2 by the ink jet coating apparatus 100 shown in FIG. Then, around the film forming region 2 of the substrate 1, a sealant 3 is applied in a ring shape by a dispense method at a predetermined interval, and a liquid crystal material ( (Not shown) is applied dropwise by a dispensing method. Thereafter, an opposing substrate (not shown) is bonded via a sealant 3 to enclose a liquid crystal material, thereby forming a liquid crystal display panel. The “film formation region 2” is not a region where a film is formed by the applied liquid, but a design region set as a film formation region.

塗布装置100は、図2に示す通り、架台101の上にY軸方向移動ステージ102を備え、Y軸方向移動ステージ102の上面に設けた基板保持部材103の上に基板1を支持する。架台101の上には、Y軸方向移動ステージ102を跨ぐ門型フレーム104が設けられ、門型フレーム104はX軸方向に並置された複数の塗布ヘッド105を備える。塗布装置100は、Y軸方向移動ステージ102によって基板1をY軸方向に移動しつつ、塗布ヘッド105のX軸方向に一定の間隔で設けられている多数のノズルから滴下される膜形成材料の液体を基板1のY軸方向に沿う各位置に滴下塗布する。塗布装置100は、Y軸方向移動ステージ102の移動、塗布ヘッド105の各ノズルからの液滴の滴下(ノズルから滴下される液滴の量や液滴の滴下間隔(周波数)等)を制御する制御装置106を備えている。   As shown in FIG. 2, the coating apparatus 100 includes a Y-axis direction moving stage 102 on a gantry 101, and supports the substrate 1 on a substrate holding member 103 provided on an upper surface of the Y-axis direction moving stage 102. On the gantry 101, a portal frame 104 that straddles the Y-axis moving stage 102 is provided, and the portal frame 104 includes a plurality of coating heads 105 juxtaposed in the X-axis direction. The coating apparatus 100 is configured to move the substrate 1 in the Y-axis direction by the Y-axis direction moving stage 102 and to apply a film-forming material dropped from a number of nozzles provided at regular intervals in the X-axis direction of the coating head 105. The liquid is applied dropwise to each position of the substrate 1 along the Y-axis direction. The coating apparatus 100 controls the movement of the Y-axis direction moving stage 102 and the dropping of droplets from each nozzle of the coating head 105 (the amount of droplets dropped from the nozzles, the dropping interval (frequency), etc.). The control device 106 is provided.

図3は図1に示した基板1のA−A断面を示し、図4は図1に示した基板1のAR領域を示す。即ち、基板1にあっては、膜形成領域2の外周の辺に沿って、所定深さの長尺状をなす凹溝10を形成し、本実施例では複数の凹溝10が並置されてなる凹溝群10Nを形成している。凹溝群10Nは、膜形成領域2の外周に沿って互いに離隔する複数の凹溝10(第1〜第n凹溝11、12、13…1n(不図示))からなる。各凹溝11、12、13…は、膜形成領域2の外周の各辺に平行に形成され、互いに複数重をなす。塗布装置100は、凹溝群10Nの各凹溝11、12、13…が形成された基板1に、膜形成材料である液体を滴下塗布するものである。   3 shows an AA cross section of the substrate 1 shown in FIG. 1, and FIG. 4 shows an AR region of the substrate 1 shown in FIG. That is, in the substrate 1, a long concave groove 10 having a predetermined depth is formed along the outer peripheral side of the film forming region 2, and in the present embodiment, a plurality of concave grooves 10 are juxtaposed. A groove group 10N is formed. The groove group 10 </ b> N is composed of a plurality of grooves 10 (first to n-th grooves 11, 12, 13... 1 n (not shown)) separated from each other along the outer periphery of the film formation region 2. Each of the concave grooves 11, 12, 13,... Is formed in parallel with each side of the outer periphery of the film formation region 2 and overlaps each other. The coating apparatus 100 is for dropping and applying a liquid as a film forming material to the substrate 1 on which the grooves 11, 12, 13,... Of the groove group 10N are formed.

以下、本実施例をより詳細に説明する。
(a)塗布装置100の塗布ヘッド105から滴下される膜形成材料の液体が、基板1の膜形成領域2に塗布されるのに先立って、膜形成領域2の外周に形成した凹溝10(第1〜第n凹溝11、12、13…1n)にも塗布される。従って、膜形成領域2に塗布され、外側周辺に向って濡れ広がり、凹溝10の縁に到達した液体は、この凹溝10の縁が既にこの凹溝10内に塗布された液体で濡れているので、この凹溝10の縁の液体と接触し一体化して、液溜りを形成することなくこの凹溝10内に浸入する。
Hereinafter, this embodiment will be described in more detail.
(A) Before the liquid of the film forming material dropped from the coating head 105 of the coating apparatus 100 is applied to the film forming area 2 of the substrate 1, the concave groove 10 ( It is also applied to the first to n-th concave grooves 11, 12, 13,... 1n). Therefore, the liquid applied to the film formation region 2, spreads to the outer periphery, and reaches the edge of the groove 10, and the edge of the groove 10 is wet by the liquid already applied to the groove 10. Therefore, it comes into contact with the liquid at the edge of the groove 10 and is integrated therewith, and penetrates into the groove 10 without forming a liquid pool.

具体的には、図2の塗布装置100に、まず、基板1が供給される。このとき、基板1は、長辺方向がY方向と平行になるように、基板保持部材103の上に供給される。基板保持部材103は、基板1の搬入/搬出ポジションである図2のY軸方向手前側に位置づけられている。基板1の供給が完了すると制御装置106が、Y軸方向移動ステージ102を制御して基板保持部材103を図2のY軸方向奥側に向かって移動を開始させる。この移動中に、基板1上の凹溝群10Nのうち、最も表示領域DAに近い側、つまり、最も内側の凹溝11に対して、塗布ヘッド105の各ノズルから液滴が吐出されて滴下される。   Specifically, first, the substrate 1 is supplied to the coating apparatus 100 in FIG. At this time, the substrate 1 is supplied onto the substrate holding member 103 such that the long side direction is parallel to the Y direction. The substrate holding member 103 is positioned on the near side in the Y-axis direction in FIG. When the supply of the substrate 1 is completed, the control device 106 controls the Y-axis direction moving stage 102 to start moving the substrate holding member 103 toward the back side in the Y-axis direction in FIG. During this movement, droplets are ejected from each nozzle of the coating head 105 to the side of the groove group 10N on the substrate 1 closest to the display area DA, that is, the innermost groove 11. Is done.

凹溝11は、X方向に沿う凹溝と、Y方向に沿う凹溝があるが、X方向に沿う凹溝に対しては、基板1の先頭側に位置するX方向に沿う凹溝と後方側に位置する凹溝それぞれについて、その凹溝が塗布ヘッド105の各ノズルの下を通過するタイミングに合わせて、X方向に沿う凹溝に対応して位置する各ノズルから液滴を吐出させる。また、Y方向に沿う凹溝については、その凹溝の先頭側の端部が塗布ヘッド105の下に到達してから後方側の端部が塗布ヘッド105の下を通過するまでの期間中、その凹溝に対向して位置するノズルから、液滴をY方向において予め設定された配置間隔で吐出させる。この液滴の滴下は、制御装置106によって制御される。つまり、制御装置106は、液体の液滴を、膜形成領域2に滴下する前に、凹溝10に滴下するように、塗布ヘッド105を制御する。   The groove 11 has a groove along the X direction and a groove along the Y direction. The groove along the X direction is different from the groove along the X direction located on the leading side of the substrate 1. For each of the grooves located on the side, the droplets are ejected from the nozzles located corresponding to the grooves along the X direction at the timing when the grooves pass under each nozzle of the coating head 105. Further, with respect to the groove along the Y direction, during the period from when the leading end of the groove reaches below the coating head 105 to when the rear end passes below the coating head 105, Droplets are ejected at preset intervals in the Y direction from nozzles located opposite the concave grooves. The dropping of the droplet is controlled by the control device 106. That is, the control device 106 controls the application head 105 so that the liquid droplet is dropped on the concave groove 10 before being dropped on the film formation region 2.

基板保持部材103が図2のY軸方向奥側の端部あるいは基板1が塗布ヘッド105を通過しきった位置に到達したら、今度は、搬入/搬出ポジションのある側へ向けて基板保持部材103が移動され、この移動中に、膜形成領域2内に対する液体の滴下塗布が行なわれる。この液体の滴下塗布は、塗布ヘッド105の下を基板1の膜形成領域2が通過するタイミングに合わせて、膜形成領域2に対向して位置する塗布ヘッド105における各ノズルから、膜形成領域2に対して予め設定された配置間隔で液滴が滴下されるように液滴を吐出させる。つまり、制御装置106は、液体の液滴を、凹溝10に滴下した後に、膜形成領域2に滴下するように塗布ヘッド105を制御する。   When the substrate holding member 103 reaches the end on the back side in the Y-axis direction in FIG. 2 or the position where the substrate 1 has completely passed through the coating head 105, the substrate holding member 103 is then moved toward the side where the carry-in / carry-out position is located. The film is moved, and during this movement, the liquid is dropped and applied to the inside of the film formation region 2. The liquid is applied by dropping from each nozzle of the coating head 105 located opposite to the film formation region 2 in accordance with the timing at which the film formation region 2 of the substrate 1 passes under the coating head 105. Droplets are discharged such that the droplets are dropped at a preset arrangement interval. That is, the control device 106 controls the application head 105 so that the liquid droplet is dropped on the groove 10 and then dropped on the film formation region 2.

基板1が塗布ヘッド105の下を通過し終わり、基板1に対する液体の滴下塗布が完了し、基板保持部材103が搬入/搬出ポジションに到達すると、液体が塗布された基板1が搬出される。続いて処理する基板1があるのなら、入れ替わりに次の基板1が基板保持部材103に供給され、続いて処理する基板1が無くなるまで、上述の動作が繰り返し行なわれる。   When the substrate 1 has passed under the coating head 105 and the drop application of the liquid to the substrate 1 is completed and the substrate holding member 103 reaches the carry-in / carry-out position, the substrate 1 on which the liquid has been applied is carried out. If there is a substrate 1 to be subsequently processed, the next substrate 1 is supplied instead to the substrate holding member 103, and the above operation is repeated until there is no more substrate 1 to be subsequently processed.

また、上述の凹溝10に滴下する液滴の量は、滴下された液滴が凹溝10における内側(表示領域DAに近い側)に位置する縁部に接する量で滴下するものとし、その量(大きさ)は、実験によって決定することができ、凹溝の深さが大きくなる程、必要な液滴の量は大きくなる。上述の凹溝10に滴下する液滴の量は、凹溝10の同じ位置に滴下する液滴の量のことで、1滴で滴下しても、同じ位置に複数回滴下するようにしてもよい。   In addition, the amount of the droplet dropped into the above-described groove 10 is such that the dropped droplet is dropped in such an amount that the droplet contacts the edge located inside (closer to the display area DA) of the groove 10. The amount (size) can be determined by experiment, and the larger the depth of the groove, the larger the required amount of droplet. The amount of the droplets dropped on the concave groove 10 is the amount of the liquid droplets dropped on the same position of the concave groove 10, and it can be dropped by one drop or a plurality of times by the same position. Good.

このとき、液滴は、図10の(A)又は(B)に示すように凹溝10の溝幅全体に行き渡っても良いし、図10の(C)又は(D)に示すように凹溝10の溝幅全体に行き渡らなくても良い。液滴は、少なくとも凹溝10における内側(表示領域DAに近い側)の縁に接するような位置となるように滴下すると良い。また、液滴は、凹溝10に対して、連続して連なって滴下されても良いし、間隔をおいて滴下されても良い。間隔をおいて滴下されていても、膜形成領域2から濡れ広がってくる液体は、凹溝10に滴下されて濡れている部分から液溜りを形成することなく凹溝10内に侵入する。いずれにしても、凹溝10内に、膜形成領域2から濡れ広がってきた液体を収容するスペースを確保できれば、膜形成領域2の内側から濡れ広がってきた液体の広がりを抑制できる。したがって、この点を考慮して凹溝10へ滴下する液滴の量や液滴の滴下間隔を決める。この液滴の量や滴下間隔についても、実験で求めることができる。また、凹溝10内における場所によって滴下量を変えても良い。   At this time, the droplet may spread over the entire groove width of the concave groove 10 as shown in FIG. 10A or FIG. 10B, or may be formed as shown in FIG. 10C or FIG. It is not necessary to cover the entire groove width of the groove 10. The droplet is preferably dropped so as to be at a position at least in contact with the inner edge (closer to the display area DA) of the concave groove 10. Further, the droplets may be continuously dropped into the concave groove 10 or may be dropped at intervals. Even if the liquid is dropped at intervals, the liquid that spreads and wets from the film formation region 2 enters the groove 10 from the part that is dropped and wet in the groove 10 without forming a liquid pool. In any case, if a space for accommodating the liquid that has spread from the film forming region 2 can be secured in the concave groove 10, the spread of the liquid that has spread from the inside of the film forming region 2 can be suppressed. Therefore, in consideration of this point, the amount of the droplet to be dropped into the concave groove 10 and the interval between the droplets are determined. The amount and interval of the droplets can also be determined by experiments. Further, the drop amount may be changed depending on the location in the concave groove 10.

更に、図10では凹溝10の最も内側の凹溝11だけに液滴を滴下する例を示したがこれに限られず、それよりも外側の凹溝12、13…1nにも液体を滴下しても良い。こうすることで、例え一番内側の凹溝11を乗り越えて液体が濡れ広がったとしても、その外側の凹溝12、13…1nのいずれかで濡れ広がりを留めることができる。もちろん、すべての凹溝10に液滴を滴下することも、任意の凹溝10のみに液滴を滴下することも同様である。膜形成領域2の液体の濡れ広がり状態によって適宜決定すれば良い。ただし、凹溝11の縁に生じる液溜りによって、濡れ広がってきた液体の一部が跳ね返って表示領域DAに及ぶことにより生じる膜形成材料の膜厚むらを効果的に抑制するためには、一番内側の凹溝11に液滴を滴下しておくことが有効である。   Further, FIG. 10 shows an example in which the droplet is dropped only on the innermost groove 11 of the groove 10. However, the present invention is not limited to this, and the liquid may be dropped on the outer grooves 12, 13,. May be. In this way, even if the liquid gets over the innermost groove 11 and spreads, it can be kept wet by any of the outer grooves 12, 13... 1n. Needless to say, the same applies to the case where the droplet is dropped into all the grooves 10 and the case where the droplet is dropped only to an arbitrary groove 10. What is necessary is just to determine suitably according to the state of the liquid spreading in the film formation area 2. However, in order to effectively suppress unevenness in the thickness of the film forming material caused by a part of the liquid that has spread and splashed by the liquid pool generated at the edge of the concave groove 11 and reaching the display area DA, it is necessary to perform one method. It is effective to drop droplets into the inner groove 11.

また、凹溝10に対する液体の滴下と、膜形成領域2に対する液体の滴下とを別々に行なう例で説明したが、一緒に行なうようにしても良い。すなわち、基板1が塗布ヘッド105直下を通過する際に、凹溝10への液滴の滴下を行うとともに、基板1の膜形成領域2にも液体の滴下を行う。これにより一回の基板保持部材103の移動で塗布が完了し、効率的な塗布ができる。また、Y軸方向移動ステージ102の移動両端を基板1の搬入/搬出ポジションとすることで、さらに効率的に繰り返し基板1への塗布が行うことができる。   In addition, although the example has been described in which the dropping of the liquid to the concave groove 10 and the dropping of the liquid to the film formation region 2 are performed separately, they may be performed together. That is, when the substrate 1 passes directly below the coating head 105, the droplet is dropped on the concave groove 10 and the liquid is also dropped on the film formation region 2 of the substrate 1. Thus, the application is completed by one movement of the substrate holding member 103, and efficient application can be performed. Further, by setting both ends of the movement of the Y-axis direction movement stage 102 to the carry-in / carry-out position of the substrate 1, the coating on the substrate 1 can be performed more efficiently and repeatedly.

塗布装置100による上述(a)の液体の塗布は、凹溝10に塗布(液滴を滴下)した後に、膜形成領域2に塗布する。つまり、膜形成領域2に塗布された液体が外側周辺に濡れ広がって凹溝10の縁に到達するときには、すでに先行して凹溝10に塗布済の液体が凹溝10の縁を確実に濡らしている。従って、凹溝10の縁に到達した液体による液溜りの形成を確実に生じにくくし、この液溜りによる液体の跳ね返りを確実に抑制し、膜厚むらの発生を確実に抑制できる。   In the application of the liquid (a) described above by the coating apparatus 100, the liquid is applied to the groove 10 (droplets are dropped) and then applied to the film formation region 2. In other words, when the liquid applied to the film forming region 2 spreads to the outer periphery and reaches the edge of the concave groove 10, the liquid that has already been applied to the concave groove 10 surely wets the edge of the concave groove 10. ing. Therefore, the formation of a liquid pool due to the liquid that has reached the edge of the concave groove 10 is less likely to occur, and the rebound of the liquid due to the liquid pool is reliably suppressed, and the occurrence of uneven film thickness can be reliably suppressed.

また、凹溝10は、膜形成領域2の内側から表示領域DAを超えて濡れ広がってきた液体がその中に浸入する分だけ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。   Further, the concave groove 10 reduces the amount of liquid that spreads to the outer periphery by the amount of the liquid that has spread from the inside of the film forming area 2 beyond the display area DA and penetrates into the groove, and the sealing agent is applied. The effect of suppressing the spread of wetness to the region is also large.

(b)基板1に形成された上述(a)の凹溝10は、前述したように膜形成領域2の外周に互いに離隔する複数重をなすように設けられる凹溝群10Nを形成し、更に、膜形成領域2の外周から離隔する外側の凹溝10ほど溝幅Li(i=1、2、3…)が小さいものとする。即ち、凹溝群10Nを形成する複数の第1凹溝11〜第n凹溝1nのうち、膜形成領域2の外周に最も近接する第1凹溝11の溝幅L1を最も大きくするものになり、濡れ広がってくる多量の液体を広幅の第1凹溝11に受容して跳ね返り及び濡れ広がりを抑制し、その後、各凹溝11、12、13…を通過してより少量となる液体をより狭幅L2、L3…の各凹溝12、13…内に順に受容して跳ね返り及び濡れ広がりを抑制する(L1>L2>L3…)。 (B) As described above, the concave grooves 10 formed on the substrate 1 form the plurality of concave groove groups 10N provided on the outer periphery of the film formation region 2 so as to be separated from each other. The groove width Li (i = 1, 2, 3,...) Is smaller as the outer concave groove 10 is farther away from the outer periphery of the film formation region 2. That is, among the plurality of first grooves 11 to n-th groove 1n forming the groove group 10N, the groove width L1 of the first groove 11 closest to the outer periphery of the film formation region 2 is the largest. A large amount of liquid that spreads and wets is received in the first groove 11 having a large width to suppress the rebound and spread of the liquid, and then a small amount of liquid that passes through each groove 11, 12, 13,. Are successively received in the grooves 12, 13... Having smaller widths L 2, L 3,..., And bounce and wet spreading are suppressed (L 1> L 2> L 3).

つまり、液体を各凹溝11、12、13…内に確実に受容し、塗布液のシール材塗布領域への濡れ広がりおよび、各凹溝11、12、13…による上述(a)の液体跳ね返りの抑制効果によって膜形成領域2内の膜厚むらの発生を抑制しつつ、凹溝群10Nが膜形成領域2の外周に直交する方向に沿ってなす全幅Wを、全ての凹溝10が広幅とされる場合に比して小寸法化でき、製品本体内における凹溝群10Nの占有スペースを小さくし、製品本体に対してより大きな表示領域DAを確保できる。   In other words, the liquid is reliably received in each of the grooves 11, 12, 13..., The application liquid spreads over the sealing material application area, and the liquid rebounds in the above-mentioned (a) due to each of the grooves 11, 12, 13,. While suppressing the occurrence of film thickness unevenness in the film formation region 2 by the suppression effect of the above, the total width W formed by the groove group 10N along the direction orthogonal to the outer periphery of the film formation region 2 and the width of all the grooves 10 are wide. , The space occupied by the groove group 10N in the product main body can be reduced, and a larger display area DA can be secured for the product main body.

(c)基板1に形成された上述(b)の相隣る凹溝10と凹溝10の間の間隔Si(i=1、2…)は、凹溝10の溝幅Liよりも小さい。これにより、上述(b)の凹溝群10Nにおいて、凹溝10と凹溝10の間の間隔Siを凹溝10の溝幅Li以上としたものに比し、各溝幅Liの合計値に相隣る凹溝10の間隔Siの合計値を加えた凹溝群10Nの全幅Wを一層小寸法化できる。従って、製品本体内における凹溝群10Nの占有スペースを一層小さくし、製品本体に対して一層大きな表示領域DAを確保できる。 (C) The distance Si (i = 1, 2,...) Between the adjacent grooves 10 formed in the above (b) formed on the substrate 1 is smaller than the groove width Li of the grooves 10. As a result, in the groove group 10N of (b) described above, the total value of the groove widths Li is smaller than that in which the distance Si between the grooves 10 is not less than the groove width Li of the grooves 10. The total width W of the groove group 10N obtained by adding the total value of the intervals Si between the adjacent grooves 10 can be further reduced. Therefore, the space occupied by the groove group 10N in the product main body can be further reduced, and a larger display area DA can be secured for the product main body.

本実施例の凹溝群10Nでは、第1凹溝11〜第3凹溝13の溝幅L1〜L3を、L1=0.18mm、L2=0.09mm、L3=0.06mmとしている。また、第1凹溝11と第2凹溝12の間隔S1、第2凹溝12と第3凹溝13の間隔S2を、S1=S2=0.01mmとしている。このような寸法の凹溝10を形成した基板1に対して、上述の塗布を行なったところ、表示領域DA内に形成された配向膜のむらを抑制することができた。   In the groove group 10N of this embodiment, the groove widths L1 to L3 of the first to third grooves 11 to 13 are L1 = 0.18 mm, L2 = 0.09 mm, and L3 = 0.06 mm. The distance S1 between the first groove 11 and the second groove 12 and the distance S2 between the second groove 12 and the third groove 13 are S1 = S2 = 0.01 mm. When the above-described coating was performed on the substrate 1 on which the concave grooves 10 having such dimensions were formed, it was possible to suppress the unevenness of the alignment film formed in the display area DA.

(実施例2)(図5)
実施例2の基板1を説明する。
(d)基板1に形成された凹溝10と表示領域DAとの間に、所定深さの複数の凹部20が並置された凹部群20Nを配置し、各凹部20の形状は、膜形成領域2に塗布された液体が膜形成領域2から凹溝10に向かう方向に比べて、その反対方向である凹溝10から膜形成領域2に向かう方向の方が流れ難くなる形状からなる。なお、本実施例において、各凹部20は、膜形成領域2の外周縁に沿って所定のピッチ間隔で配置される。
(Example 2) (FIG. 5)
Second Embodiment A substrate 1 according to a second embodiment will be described.
(D) A recess group 20N in which a plurality of recesses 20 having a predetermined depth are juxtaposed is arranged between the recess groove 10 formed in the substrate 1 and the display area DA. 2 has a shape that makes it more difficult for the liquid applied to the film forming region 2 to flow in the opposite direction from the groove 10 to the film forming region 2 than in the direction toward the groove 10 from the film forming region 2. In this embodiment, the concave portions 20 are arranged at a predetermined pitch along the outer peripheral edge of the film formation region 2.

凹部群20Nは、膜形成領域2の内側から外側への液体の流れに比べ、その反対方向への逆流を流れ難くする。具体的には、凹部群20Nの各凹部20によって形成される各凹部20の間が、膜形成領域2に塗布された液体が濡れ広がる時の主な道筋となる。そして、各凹部20の間は、膜形成領域2内側(表示領域DAに近い側)が広く、外側に向かって狭まるように構成する。また、表示領域DAに向かう側は、凹部20を形成する面が表示領域DAに対して平行とならないように構成する。すなわち、凹溝10側から表示領域DA側に向かっては各凹部20の間は狭くなっているので、液体が流れにくくなっていて、膜形成領域2の内側から濡れ広がって凹溝10の溝際に液溜まりができ、この液溜まりで液の流れの跳ね返りが生じたとしても、その跳ね返りのために生じた内側へ向かう流れ(逆流)を抑制する(減衰させる)ものになる。   The concave group 20 </ b> N makes it harder for the liquid to flow in the opposite direction than the liquid flowing from the inside to the outside of the film formation region 2. Specifically, the space between the concave portions 20 formed by the concave portions 20 of the concave portion group 20N is a main path when the liquid applied to the film formation region 2 spreads wet. The space between the recesses 20 is such that the inside of the film formation region 2 (the side near the display region DA) is wide and narrows outward. Further, on the side facing the display area DA, the surface forming the concave portion 20 is configured not to be parallel to the display area DA. That is, since the space between the concave portions 20 is narrower from the concave groove 10 side to the display area DA side, it is difficult for the liquid to flow, and the liquid spreads from the inside of the film forming region 2 and the groove of the concave groove 10 is formed. In this case, a liquid pool is formed, and even if the flow of the liquid rebounds in the liquid pool, an inward flow (backflow) generated due to the rebound is suppressed (attenuated).

凹部群20Nは、凹部群20Nが無い場合に比べて、外側(膜形成領域2から凹溝10に向かう方向)に向かって濡れ広がる流れに対して抵抗になるので、凹溝10の溝際に到達するときの流れの速さを、凹部群20Nが無い場合と比べて低減させることができる。液体が液溜まりにぶつかる速度が遅いほど液の流れの跳ね返りは小さくなるので、結果的に、凹部群20Nは跳ね返りの抑制に寄与する。更に、濡れ広がる液体は凹部群20Nを通過するときに各凹部20内に流れ込むので、このことによって、凹溝群10Nに向かって流れる液体の量が低減され、結果として、凹溝10の縁際での液体の跳ね返りが抑制され、膜形成領域2内に生ずる膜厚のむらを抑制できる。   The concave group 20N is more resistant to a flow that spreads outward (in a direction from the film formation region 2 toward the concave groove 10) than the case without the concave group 20N. The speed of the flow at the time of arrival can be reduced as compared with the case where there is no concave group 20N. The lower the speed at which the liquid hits the liquid pool, the lower the rebound of the liquid flow, and consequently, the concave group 20N contributes to the suppression of the rebound. Furthermore, since the liquid that spreads wet flows into each concave portion 20 when passing through the concave portion group 20N, this reduces the amount of liquid flowing toward the concave groove group 10N, and as a result, the edge of the concave groove 10 Of the liquid in the film formation region 2 can be suppressed, and the unevenness of the film thickness generated in the film formation region 2 can be suppressed.

また、凹部20に液体が流れ込んで、凹部20に液体が溜まった状態になったときでも、凹溝10側から膜形成領域2に向かう方向への流れを抑制する効果が得られることは実験によって確認されている。基板1の表面および凹部20を覆った液体の膜を観察したところ、凹部20の輪郭に沿って液体膜に土手状の盛り上がりが認められ、凹部20の輪郭に沿って形成された液体膜の盛り上がり部分が、凹溝10側から膜形成領域2に向かう方向への流れに対して抵抗となり、この流れが抑制されていると推測される。   It is also experimentally shown that even when the liquid flows into the concave portion 20 and the liquid accumulates in the concave portion 20, the effect of suppressing the flow from the concave groove 10 toward the film forming region 2 can be obtained. Has been confirmed. Observation of the surface of the substrate 1 and the liquid film covering the concave portion 20 revealed that a bank-like bulge was observed in the liquid film along the contour of the concave portion 20 and that the liquid film formed along the contour of the concave portion 20 was raised. It is presumed that the portion becomes a resistance to the flow in the direction from the concave groove 10 side toward the film formation region 2, and this flow is suppressed.

凹部20内に液体が侵入していてもしていなくても、凹部20の輪郭で液体が盛り上がるが、その輪郭を形成する線は、表示領域DAと平行とならず角度をなしている。このため、この凹部20の輪郭部での液体の盛り上がりによって生じる跳ね返りは、直接表示領域DA側に向かわず、また並置される各凹部20の輪郭からの跳ね返り同士が干渉し合い弱めるので、膜形成領域2内に生ずる膜厚のむらを抑制できる。   The liquid swells at the contour of the recess 20 whether or not the liquid has penetrated into the recess 20, but the line forming the contour is not parallel to the display area DA and forms an angle. For this reason, the rebound generated by the swelling of the liquid at the contour of the concave portion 20 does not directly go to the display area DA side, and the rebounds from the contours of the concave portions 20 arranged side by side interfere with each other and weaken. The unevenness of the film thickness generated in the region 2 can be suppressed.

(e)基板1に形成された上述の凹部群20Nを構成する各凹部20は、頂角が鋭角の二等辺三角形からなる凹部21であり、底辺が、凹溝10の延在方向に平行かつ凹溝10側に位置するように配置することにより、上述(d)の液体の流れを確実に形成できる。 (E) Each of the concave portions 20 constituting the above-described concave portion group 20 </ b> N formed on the substrate 1 is a concave portion 21 formed of an isosceles triangle having an apex angle of an acute angle, and a bottom side thereof is parallel to an extending direction of the concave groove 10 and By arranging it so as to be located on the concave groove 10 side, the flow of the liquid (d) can be reliably formed.

尚、膜形成領域2の外周縁において、相直交する2辺(縦辺と横辺)のコーナー部に直に臨む位置には二等辺三角形からなる凹部22が配置される。凹部22は、凹部21と同一形状の二等辺三角形をなし、底辺が凹溝10側に位置し、底辺に直交する中心軸が膜形成領域2の外周の縦辺と横辺に対して45度をなすように斜めに配置される。   In the outer peripheral edge of the film formation region 2, a concave portion 22 formed of an isosceles triangle is disposed at a position directly facing a corner portion of two sides (vertical side and horizontal side) orthogonal to each other. The concave portion 22 forms an isosceles triangle having the same shape as the concave portion 21, the bottom side is located on the side of the concave groove 10, and the central axis orthogonal to the bottom side is 45 degrees with respect to the vertical side and the horizontal side of the outer periphery of the film formation region 2. It is arranged diagonally so as to form.

また、膜形成領域2の外周において、相直交する二辺(縦辺と横辺)のコーナー部に直に臨む位置で、上述の二等辺三角形からなる凹部22の両側には、凹部21、22よりも例えば辺の長さを半分とした小形状の二等辺三角形からなる凹部23が配置される。凹部23は、底辺が凹溝10の延在方向に平行で、凹溝10側に位置するように配置される。各凹部23の底辺は各凹部21の底辺と同一直線上に配置される。   Further, on the outer periphery of the film forming region 2, at the position directly facing the corners of two sides (vertical side and horizontal side) orthogonal to each other, the recesses 21, 22 are formed on both sides of the recess 22 formed of the above-described isosceles triangle. For example, a concave portion 23 formed of a small isosceles triangle having half the length of the side is disposed. The concave portion 23 is arranged such that the bottom side is parallel to the extending direction of the concave groove 10 and is located on the concave groove 10 side. The bottom of each recess 23 is arranged on the same straight line as the bottom of each recess 21.

本実施例の凹部群20Nでは、凹部21、22の底辺の長さa、高さbを、a=0.06mm、b=0.10mmとし、凹部23の長さc、高さdを、c=0.03mm、d=0.05mmとしている。また、相隣る凹部21のピッチ間隔p1を、p1=0.1mmとし、相隣る凹部21と凹部23の配置間隔pcを、pc=0.085mmとしている。このような寸法の凹部群20Nを形成することで、表示領域DA内に形成された配向膜のむらがより一層抑制された。   In the recess group 20N of the present embodiment, the length a and height b of the bottom sides of the recesses 21 and 22 are set to 0.06 mm and b = 0.10 mm, and the length c and height d of the recess 23 are c = 0.03 mm and d = 0.05 mm. Further, the pitch interval p1 between the adjacent concave portions 21 is set to p1 = 0.1 mm, and the arrangement interval pc between the adjacent concave portions 21 and the concave portion 23 is set to pc = 0.085 mm. By forming the concave portion group 20N having such dimensions, the unevenness of the alignment film formed in the display area DA is further suppressed.

尚、凹部群20Nにあっては、例えば相隣る二等辺三角形からなる凹部21のピッチ間隔p1を、p1=0.08mmとし、凹部21の密度を大きくすることもできる。   In the concave group 20N, for example, the pitch interval p1 between the concave portions 21 formed of adjacent isosceles triangles may be set to p1 = 0.08 mm to increase the density of the concave portions 21.

(実施例3)(図6)
実施例3が実施例1と異なる点は、基板1に形成される凹部群20Nの構成である。実施例3の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に、凹部22の両側に配置した凹部23と同一形状である小形状の二等辺三角形からなる凹部24を配置したことにある。各凹部24の頂点は各凹部21、22の頂点と同一直線上に配置され、かつ相隣る凹部21、22の間の中央、及び相隣る凹部21と凹部22の間の中央に配置される。相隣る凹部24のピッチ間隔p2を、p2=0.1mmとしている。このような寸法で凹部24を配置したことによっても、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 3) (FIG. 6)
The third embodiment differs from the first embodiment in the configuration of the concave group 20 </ b> N formed in the substrate 1. The concave group 20N of the third embodiment has a small shape having the same shape as the concave portion 23 disposed on both sides of the concave portion 22 between the concave portions 21 adjacent to each other and between the concave portions 21 adjacent to each other. That is, the concave portion 24 formed of an isosceles triangle is arranged. The apex of each recess 24 is arranged on the same straight line as the apex of each recess 21, 22 and is located at the center between the adjacent recesses 21, 22 and at the center between the adjacent recesses 21 and 22. You. The pitch interval p2 between the adjacent concave portions 24 is set to p2 = 0.1 mm. By arranging the concave portions 24 with such dimensions, the unevenness of the alignment film formed in the display area DA was also suppressed.

(実施例4)(図7)
実施例4が実施例3と異なる点は、基板1に形成される凹部群20Nの構成である。実施例4の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に配置される各凹部24の頂点を、各凹部21、22の頂点を結ぶ直線よりも凹溝10の側に距離e=0.025mmだけ後退させたものである。このような寸法で凹部24を配置したことによっても、実施例3と同様に、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 4) (FIG. 7)
The fourth embodiment differs from the third embodiment in the configuration of the concave group 20N formed in the substrate 1. The concave group 20N according to the fourth embodiment is configured such that the vertexes of the concave portions 24 disposed between the adjacent concave portions 21 and the concave portions 21 and between the adjacent concave portions 21 and the concave portions 22 correspond to the vertexes of the concave portions 21 and 22. It is retracted by a distance e = 0.025 mm on the side of the concave groove 10 from the connecting straight line. By arranging the concave portions 24 with such dimensions, the unevenness of the alignment film formed in the display area DA was suppressed as in the third embodiment.

(実施例5)(図8)
実施例5が実施例1と異なる点は、基板1に形成される凹部群20Nの構成にある。実施例5の凹部群20Nは、相隣る凹部21と凹部21の間、及び相隣る凹部21と凹部22の間に、菱形からなる凹部25を配置したものである。凹部25の短い方の対角線の長さf、長い方の対角線の長さgを、f=0.03mm、g=0.10mmとしている。各凹部25の長い方の対角線上にある2つの頂点のそれぞれは各凹部21、22の頂点と底辺のそれぞれと同一直線上に配置され、かつ相隣る凹部21と凹部21の間の中央、及び相隣る凹部21と凹部22の間の中央に配置される。このような形状及び寸法で凹部25を配置した場合でも、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 5) (FIG. 8)
The fifth embodiment differs from the first embodiment in the configuration of the concave group 20 </ b> N formed in the substrate 1. The concave group 20N according to the fifth embodiment has a configuration in which rhombic concave portions 25 are arranged between adjacent concave portions 21 and between the adjacent concave portions 21 and between the adjacent concave portions 21 and 22. The length f of the shorter diagonal line and the length g of the longer diagonal line of the recess 25 are f = 0.03 mm and g = 0.10 mm. Each of the two vertices on the longer diagonal line of each of the concave portions 25 is arranged on the same straight line as each of the vertices and the base of each of the concave portions 21 and 22, and the center between the adjacent concave portions 21 and 21, And it is arranged at the center between the adjacent concave portions 21 and 22. Even when the concave portion 25 is arranged in such a shape and size, the unevenness of the alignment film formed in the display area DA is suppressed.

(実施例6)(図9)
実施例6が実施例4と異なる点は、基板1に形成される凹部群20Nの構成にある。実施例6の凹部群20Nは、実施例4の凹部群20Nにおける各凹部21を、実施例5で用いた凹部25と同一形状の菱形からなる凹部26に代えたものである。このような形状および寸法で凹部26を配置した場合でも、実施例3と同様に、表示領域DA内に形成された配向膜のむらが抑制された。
(Example 6) (FIG. 9)
The sixth embodiment differs from the fourth embodiment in the configuration of the concave group 20N formed in the substrate 1. The concave group 20N of the sixth embodiment is obtained by replacing each concave 21 in the concave group 20N of the fourth embodiment with a concave 26 having the same shape as the concave 25 used in the fifth embodiment. Even in the case where the recesses 26 were arranged in such a shape and size, the unevenness of the alignment film formed in the display area DA was suppressed as in the third embodiment.

以上、本発明の実施例を図面により詳述したが、本発明の具体的な構成はこの実施例に限られるものではなく、本発明の要旨を逸脱しない範囲の設計の変更等があっても本発明に含まれる。例えば、本発明の基板1は、複数の凹溝10からなる凹溝群10Nを配置するものに限らず、単一の凹溝10を配置してなるものでも良い。   As described above, the embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration of the present invention is not limited to this embodiment, and even if there is a design change or the like without departing from the gist of the present invention. Included in the present invention. For example, the substrate 1 of the present invention is not limited to the one in which the groove group 10N including the plurality of grooves 10 is arranged, but may be the one in which the single groove 10 is arranged.

また、上述の実施例2〜6では、膜形成領域2の外周縁に沿って、相直交する2辺(縦辺と横辺)のコーナー部に直に臨む位置に、二等辺三角形からなる凹部22が配置されている。但し、この凹部22は、配置されていなくても良い。また、上述の実施例2〜6では、相隣る凹部21と凹部22の間であって、凹部22の両側に、小形状の二等辺三角形の凹部23が配置されている。また、実施例3、4では、相隣る凹部21と凹部21の間及び相隣る凹部21と凹部22の間に、凹部23と同一形状である凹部24が配置されている。これらの凹部23、凹部24についても、必ずしも配置しなくても良い。さらに、上述の実施例におけるコーナー部に、三角形状の凹部22、凹部23、凹部24、菱形の凹部25又は凹部26を適宜置き換えて配置しても良く、あるいはこれらを適宜組み合わせて配置しても良い。   Further, in the above-described Examples 2 to 6, the concave portion formed of an isosceles triangle is located along the outer peripheral edge of the film forming region 2 at a position directly facing the corner portion of two mutually orthogonal sides (vertical side and horizontal side). 22 are arranged. However, the concave portion 22 may not be arranged. Further, in the above-described embodiments 2 to 6, the small isosceles triangular concave portions 23 are arranged between the adjacent concave portions 21 and 22 and on both sides of the concave portion 22. Further, in the third and fourth embodiments, the concave portion 24 having the same shape as the concave portion 23 is disposed between the concave portions 21 adjacent to each other and between the concave portions 21 adjacent to each other. The recesses 23 and 24 need not always be arranged. Further, the triangular concave portion 22, concave portion 23, concave portion 24, rhombic concave portion 25 or concave portion 26 may be appropriately replaced and arranged at the corner in the above-described embodiment, or may be appropriately combined and arranged. good.

また、実施例2では、膜形成領域2への液体の塗布に先立って、凹溝10への液滴の滴下を行うことは必ずしも必要ではない。但し、凹部20に、実施例1のように、塗布すべき液体の液滴を、膜形成領域2への塗布に先立って、凹部20に滴下しておいても良い。このようにすれば、膜形成領域2への液体の滴下によって濡れ広がる液体が、凹部群20Nを通過するときに、各凹部20内に流れ込むことを促進できる。もちろん、膜形成領域2への滴下の前に、実施例1と同様に、凹溝10に液滴を滴下しておいても良い。これにより、凹溝10の縁際での液体の跳ね返りがより一層抑制され、膜形成領域2内に生ずる膜厚のむらを抑制できる。   In the second embodiment, it is not always necessary to drop the liquid droplets into the concave grooves 10 before applying the liquid to the film formation region 2. However, as in the first embodiment, a droplet of the liquid to be applied may be dropped on the concave portion 20 prior to application on the film formation region 2 as in the first embodiment. In this way, it is possible to promote the flow of the liquid that is wetted and spread by dropping the liquid onto the film formation region 2 into each of the concave portions 20 when passing through the concave portion group 20N. Needless to say, like the first embodiment, the droplet may be dropped in the concave groove 10 before the droplet is dropped on the film formation region 2. Thereby, the rebound of the liquid near the edge of the concave groove 10 is further suppressed, and the unevenness of the film thickness generated in the film formation region 2 can be suppressed.

さらに、実施例1と同様に、凹部20を有する基板の凹溝10の幅を、膜形成領域2より遠ざかるに従って狭くなるようにしても良いし、相隣る凹溝10と凹溝10の間の間隔Siを、凹溝10の溝幅Liよりも小さくしても良い。これにより、実施例1と同様に、表示領域DA内に形成された配向膜のむらを抑制しつつ、製品本体内における凹溝群10Nの占有スペースを小さくし、製品本体に対してより大きな表示領域DAを確保できる。   Further, as in the first embodiment, the width of the concave groove 10 of the substrate having the concave portion 20 may be made narrower as the distance from the film forming region 2 increases, or between the adjacent concave grooves 10. May be smaller than the groove width Li of the concave groove 10. Thus, similarly to the first embodiment, the space occupied by the groove group 10N in the product main body is reduced while suppressing the unevenness of the alignment film formed in the display area DA, and the display area larger than the product main body. DA can be secured.

尚、凹溝は、膜形成領域2の外周を囲む環状であっても良いし、長尺な凹溝を複数配列したものであっても良い。また、凹溝10は、膜形成領域2の外周で閉じた環状とすることには限定されず、一部に隙間がある形状であってもよい。   Note that the concave groove may be an annular shape surrounding the outer periphery of the film forming region 2 or a plurality of long concave grooves arranged. Further, the concave groove 10 is not limited to an annular shape closed on the outer periphery of the film formation region 2 and may have a shape having a gap in a part.

また、前述の実施例では凹部群を二等辺三角形及び菱形の凹部で構成したが、他の形状、例えば、円形、楕円形、三角形や菱形以外の多角形、星型等であっても良い。各凹部20の形状は、膜形成領域2に塗布された液体が、膜形成領域2から凹溝10に向かう方向に比べて、凹溝10から膜形成領域2に向かう方向の方が流れ難くなる形状、配置であればよく、異なる形状、配置の組合せであっても良い。   Further, in the above-described embodiment, the concave portion group is constituted by the isosceles triangular and rhombic concave portions, but may have other shapes, for example, a circle, an ellipse, a polygon other than a triangle or a rhombus, a star shape, and the like. The shape of each recess 20 is such that the liquid applied to the film forming region 2 is less likely to flow in the direction from the groove 10 to the film forming region 2 than in the direction from the film forming region 2 to the concave groove 10. Any shape and arrangement may be used, and a combination of different shapes and arrangements may be used.

また、凹溝や凹部の縁は曲面あるいは斜面を有していてもよい。例えば、膜形成領域2の外周に沿う凹溝10が形成された基板1であって、凹溝10と膜形成領域2との間に、複数の凹部20が並置された凹部群20Nを備えるとともに、この凹部群20Nの各凹部20の形状は、基板1上に塗布された液体が、膜形成領域2から凹溝10に向かう方向に比べて凹溝10から膜形成領域2に向かう方向には流れ難い形状をなし、凹溝10及び凹部20の一方若しくは双方の縁に、曲面若しくは斜面を有する基板1であってもよい。図11に、基板1の凹溝10、凹部20の縁に垂直面を有する例(A)、斜面を有する例(B)、曲面を有する例(C)を示す。   Further, the edge of the concave groove or the concave portion may have a curved surface or a slope. For example, the substrate 1 in which the concave groove 10 is formed along the outer periphery of the film forming region 2, and a concave group 20 N in which a plurality of concave portions 20 are juxtaposed is provided between the concave groove 10 and the film forming region 2. The shape of each concave portion 20 of the concave portion group 20N is such that the liquid applied on the substrate 1 is in a direction from the groove 10 toward the film formation region 2 as compared with a direction from the film formation region 2 toward the groove 10. The substrate 1 may be a shape that is difficult to flow, and may have a curved or inclined surface at one or both edges of the concave groove 10 and the concave portion 20. FIG. 11 shows an example (A) having a vertical surface at the edge of the concave groove 10 and the concave portion 20 of the substrate 1, an example (B) having an inclined surface, and an example (C) having a curved surface.

このように曲面あるいは斜面とすることで、縁に生じる表面張力を弱めて、凹溝10や凹部20の輪郭部での液体の盛り上がりが抑制され、この盛り上がりによって生じる液体の跳ね返りも抑制される。また、液体の凹溝10や凹部20内への侵入が容易となり、液体の濡れ広がりを受容して濡れ広がりを抑制することがより確実にできる。このような曲面あるいは斜面は、凹溝10や凹部20の全周あるいはすべての縁に設けてもよいし、縁の一部、例えば、表示領域DA側の縁にのみ設けてもよい。表示領域DA側の縁に設けると、液体の表示領域DA側への跳ね返りを抑制しつつ、より外側の周辺に濡れ広がる液量を少なくし、シール剤塗布領域への濡れ広がりを抑制する効果も大きい。もちろん、凹溝10や凹部20の縁を曲面あるいは斜面としたうえで、実施例1同様に液滴を滴下してもよい。これにより、上記の効果をさらに高めることができる。   By making the surface curved or inclined as described above, the surface tension generated at the edge is weakened, the swelling of the liquid at the contour of the concave groove 10 or the concave portion 20 is suppressed, and the rebound of the liquid caused by the swelling is also suppressed. In addition, the liquid can easily enter the concave groove 10 or the concave portion 20, and it is possible to more reliably suppress the spread of the liquid by receiving the spread of the liquid. Such a curved surface or inclined surface may be provided on the entire circumference or all edges of the concave groove 10 or the concave portion 20, or may be provided only on a part of the edge, for example, only on the edge on the display area DA side. When provided on the edge on the display area DA side, while suppressing the liquid from splashing to the display area DA side, the amount of liquid that spreads to the outer periphery is reduced, and the effect of suppressing the liquid from spreading to the sealant application area is also reduced. large. Of course, the droplets may be dropped as in the first embodiment after the edges of the concave groove 10 and the concave portion 20 are curved or inclined. Thereby, the above effect can be further enhanced.

また、膜形成領域の外周に沿う第1の流動調整部が形成された基板1であって、第1の流動調整部と膜形成領域2との間に、複数の第2の流動調整部が並置された第2の流動調整部群を備えるとともに、各第2の流動調整部の形状は、基板1上に塗布された液体が、膜形成領域2から第1の流動調整部に向かう方向に比べて、第1の流動調整部から膜形成領域2に向かう方向には流れ難い形状をなす基板1であってもよい。   Further, the substrate 1 is provided with a first flow control unit along the outer periphery of the film formation region, and a plurality of second flow control units are provided between the first flow control unit and the film formation region 2. A second flow control unit group is provided side by side, and the shape of each second flow control unit is such that the liquid applied on the substrate 1 is moved in the direction from the film formation region 2 to the first flow control unit. In comparison, the substrate 1 may have a shape that is less likely to flow in the direction from the first flow controller to the film formation region 2.

第1の流動調整部、第2の流動調整部における「流動調整」は、液体の流動を抑制又は促進することをいう。ここで、第1の流動調整部、第2の流動調整部は、凹部20であっても、凸部であってもよい。つまり、基板1における表示領域DAと同一の高さの平坦面に対して、窪んでいるか、突出しているかは問わない。第1の流動調整部及び第2の流動調整部が双方とも凹部20であってもよいし、双方とも凸部であってもよい。第1の流動調整部及び第2の流動調整部のいずれか一方が凹部20で、他方が凸部であってもよい。   “Flow adjustment” in the first flow adjustment unit and the second flow adjustment unit refers to suppressing or promoting the flow of the liquid. Here, the first flow control unit and the second flow control unit may be concave portions 20 or convex portions. That is, it does not matter whether the substrate 1 is depressed or protrudes with respect to the flat surface having the same height as the display area DA. Both the first flow control unit and the second flow control unit may be recesses 20 or both may be protrusions. Either one of the first flow control unit and the second flow control unit may be the concave portion 20, and the other may be the convex portion.

また、第2の流動調整部は、頂角が鋭角の二等辺三角形で、この二等辺三角形の底辺が、第1の流動調整部の延在方向に平行で、かつ第1の流動調整部側に位置するように配置されていてもよい。   Further, the second flow adjustment unit is an isosceles triangle having a vertex at an acute angle, and the base of the isosceles triangle is parallel to the extending direction of the first flow adjustment unit and on the first flow adjustment unit side. May be arranged.

第1の流動調整部は、膜形成領域の外周に互いに離隔する複数重をなすように設けられる第1の流動調整部群を形成し、膜形成領域2の外周から離隔する外側の第1の流動調整部ほど幅が小さくてもよい。   The first flow control section forms a first flow control section group provided on the outer periphery of the film formation region so as to form a plurality of layers separated from each other, and the first outer flow control section separated from the outer periphery of the film formation region 2. The width may be smaller as the flow adjusting portion.

さらに、第1の流動調整部、第2の流動調整部における縁に、曲面あるいは斜面を有してもよい。例えば、第1の流動調整部又は第2の流動調整部が凸部の場合に、縁部の側面を曲面あるいは傾斜面を有する形状としてもよい。   Further, the edges of the first flow control unit and the second flow control unit may have a curved surface or a slope. For example, when the first flow control portion or the second flow control portion is a convex portion, the side surface of the edge may have a shape having a curved surface or an inclined surface.

また、前述の実施例では、インクジェット式の塗布ヘッドを用いる例で説明したが、液体を液滴状にして滴下するものであれば、他の方式の塗布ヘッドを用いるものにも適用可能である。   Further, in the above-described embodiment, an example in which an ink jet type coating head is used has been described. However, as long as the liquid is dropped and dropped, the present invention can be applied to a case where another type of coating head is used. .

1 基板
2 膜形成領域
10N 凹溝群
10、11、12、13 凹溝
20N 凹部群
20、21、22、23、24、25、26 凹部
100 塗布装置
DESCRIPTION OF SYMBOLS 1 Substrate 2 Film formation area 10N Groove group 10, 11, 12, 13 Groove 20N Concave group 20, 21, 22, 23, 24, 25, 26 Concave 100 Coating device

Claims (3)

基板の膜形成領域に、膜を塗布する塗布装置であって、
前記基板の前記膜形成領域に膜形成材料である液体の液滴を滴下する塗布ヘッドと、
前記塗布ヘッドを制御する制御装置と、を有し、
前記基板は、前記膜形成領域の外周に沿う凹溝が形成された基板であって、前記凹溝と前記膜形成領域との間に、複数の凹部が並置された凹部群を備えるとともに、前記凹部群の各凹部の形状は、前記基板上に塗布された液体が、前記膜形成領域から前記凹溝に向かう方向に比べて前記凹溝から前記膜形成領域に向かう方向には流れ難い形状をなし、
前記制御装置は、前記塗布ヘッドが、前記基板の前記凹溝または前記凹部に前記液滴を滴下した後に前記膜形成領域に滴下するように前記塗布ヘッドを制御することを特徴とする膜形成基板の塗布装置。
A coating apparatus for coating a film on a film forming region of a substrate,
A coating head for dropping liquid droplets of a film forming material on the film forming region of the substrate,
Having a control device for controlling the coating head,
The substrate is a substrate in which a concave groove along the outer periphery of the film forming region is formed, and between the concave groove and the film forming region, includes a concave group in which a plurality of concaves are juxtaposed, The shape of each recess of the recess group is such that the liquid applied on the substrate hardly flows in the direction from the groove to the film formation region as compared to the direction from the film formation region to the groove. None,
The film forming substrate, wherein the control device controls the coating head such that the coating head drops the droplet in the concave groove or the concave portion of the substrate and then drops the liquid in the film forming region. Coating equipment.
前記基板の前記凹部群は、頂角が鋭角で、底辺が、前記凹溝の延在方向に平行で、かつ前記凹溝側に位置するように配置される二等辺三角形の凹部であることを特徴とする請求項1記載の膜形成基板の塗布装置。   The concave group of the substrate may be an isosceles triangular concave portion having an acute angle at an apex angle, a bottom side being parallel to an extending direction of the concave groove, and being located on the concave groove side. The coating apparatus for a film-formed substrate according to claim 1, wherein: 前記基板の前記凹溝は、前記膜形成領域の外周に互いに離隔する複数重をなすように設けられる凹溝群を形成し、
前記制御装置は、最も内側の前記凹溝にのみ前記液滴を滴下するよう、前記塗布ヘッドを制御することを特徴とする請求項1または2記載の膜形成基板の塗布装置。
The concave grooves of the substrate form a group of concave grooves provided so as to form a plurality of layers separated from each other on the outer periphery of the film formation region,
The coating device for a film-formed substrate according to claim 1, wherein the control device controls the coating head such that the droplet is dropped only into the innermost groove.
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