JP6786588B2 - 光学要素を洗浄するための制御された流体流 - Google Patents
光学要素を洗浄するための制御された流体流 Download PDFInfo
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- ZSUXOVNWDZTCFN-UHFFFAOYSA-L tin(ii) bromide Chemical compound Br[Sn]Br ZSUXOVNWDZTCFN-UHFFFAOYSA-L 0.000 description 2
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- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910021623 Tin(IV) bromide Inorganic materials 0.000 description 1
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- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
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- KXCAEQNNTZANTK-UHFFFAOYSA-N stannane Chemical compound [SnH4] KXCAEQNNTZANTK-UHFFFAOYSA-N 0.000 description 1
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- 229910000083 tin tetrahydride Inorganic materials 0.000 description 1
- LTSUHJWLSNQKIP-UHFFFAOYSA-J tin(iv) bromide Chemical compound Br[Sn](Br)(Br)Br LTSUHJWLSNQKIP-UHFFFAOYSA-J 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Fluid Mechanics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
- Cleaning In General (AREA)
- Flow Control (AREA)
Description
本出願は、2015年8月6日に出願された「CONTROLLED FLUID FLOW FOR CLEANING AN OPTICAL ELEMENT」と題する米国仮出願第62/201,955号、及び、2015年11月11日に出願された「CONTROLLED FLUID FLOW FOR CLEANING AN OPTICAL ELEMENT」と題する米国実用新案出願(U.S. Utility Application)第14/937,973号の優先権を主張する。これらは双方とも参照により全体が本願にも含まれる。
Claims (12)
- 第1の流れパターンに基づいて光学要素の表面の方へ流体を誘導することであって、前記表面はデブリを含み、前記第1の流れパターンに基づいて誘導される前記流体は前記デブリの少なくとも一部を前記光学要素の表面上の第1の停滞領域へ移動させることと、
第2の流れパターンに基づいて前記光学要素の前記表面の方へ前記流体を誘導することであって、前記第2の流れパターンに基づいて誘導される前記流体は前記デブリの少なくとも一部を前記光学要素の前記表面上の第2の停滞領域へ移動させ、前記第2の停滞領域と前記第1の停滞領域は前記光学要素の前記表面における異なる位置を含むことと、
を含み、
前記第2の流れパターンに基づいて前記光学要素の方へ前記流体を誘導することは、前記デブリの少なくとも一部を前記第1の停滞領域から除去する、方法。 - 前記第1及び第2の流れパターンは、前記光学要素の前記表面に向かう前記流体の流れを示すのに充分な情報を含み、
前記情報は、前記光学要素の前記表面に対する前記流体の流量、空間分布、及び前記流体が前記光学要素の前記表面の方へ誘導される時間期間のうち1つ以上を含む、請求項1に記載の方法。 - 前記流体は、ガスを含む、請求項1に記載の方法。
- 前記流体は、フリーラジカルを含む、請求項3に記載の方法。
- 前記デブリは、材料を含み、
前記フリーラジカルは、前記材料と結合又は反応する、請求項4に記載の方法。 - 前記フリーラジカルは、前記材料の燃焼、前記材料のエッチング、又は前記材料との反応のうち1つを介して、前記材料と結合又は反応し、これによって前記材料を前記表面から除去する、請求項5に記載の方法。
- 前記第1の流れパターンに基づいて前記流体を誘導することは、前記流体を第1の流量で前記光学要素の前記表面の方へ誘導することを含み、
前記第2の流れパターンに基づいて前記流体を誘導することは、前記流体を第2の流量で前記光学要素の前記表面の方へ誘導することを含む、請求項1に記載の方法。 - 前記第1の流れパターンに基づいて前記流体を誘導することは、前記流体を第1の流量及び第1の方向のうち1つ以上で前記光学要素の前記表面の方へ誘導することを含み、
前記第2の流れパターンに基づいて前記流体を誘導することは、前記流体を第2の流量及び第2の方向のうち1つ以上で前記光学要素の前記表面の方へ誘導することを含む、請求項1に記載の方法。 - 前記第1の流れパターンに基づいて前記流体を前記表面の方へ誘導することは、前記光学要素の第1の側に対して位置決めされた第1の導管を通して第1の流量で、及び、前記光学要素の第2の側に対して位置決めされた第2の導管を通して第2の流量で、前記流体を前記光学要素の前記表面の方へ誘導することを含み、
前記第2の流れパターンに基づいて前記流体を前記表面の方へ誘導することは、前記第1の導管を通して第3の流量で及び前記第2の導管を通して第4の流量で前記流体を前記光学要素の前記表面の方へ誘導することを含む、請求項1に記載の方法。 - 前記第1の流量及び前記第2の流量は、相互に異なる、請求項9に記載の方法。
- 前記第1の停滞領域及び前記第2の停滞領域は、前記要素の表面における重複していない領域である、請求項1に記載の方法。
- 前記第1の停滞領域及び前記第2の停滞領域は、前記要素の表面における部分的に重複した領域である、請求項1に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562201955P | 2015-08-06 | 2015-08-06 | |
US62/201,955 | 2015-08-06 | ||
US14/937,973 US9776218B2 (en) | 2015-08-06 | 2015-11-11 | Controlled fluid flow for cleaning an optical element |
US14/937,973 | 2015-11-11 | ||
PCT/US2016/045200 WO2017023950A2 (en) | 2015-08-06 | 2016-08-02 | Controlled fluid flow for cleaning an optical element |
Related Child Applications (1)
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JP2020180496A Division JP7064550B2 (ja) | 2015-08-06 | 2020-10-28 | 光学要素を洗浄するための制御された流体流 |
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JP2018529991A JP2018529991A (ja) | 2018-10-11 |
JP6786588B2 true JP6786588B2 (ja) | 2020-11-18 |
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JP2018503751A Active JP6786588B2 (ja) | 2015-08-06 | 2016-08-02 | 光学要素を洗浄するための制御された流体流 |
JP2020180496A Active JP7064550B2 (ja) | 2015-08-06 | 2020-10-28 | 光学要素を洗浄するための制御された流体流 |
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Country Status (6)
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US (2) | US9776218B2 (ja) |
JP (2) | JP6786588B2 (ja) |
KR (1) | KR20180035898A (ja) |
CN (1) | CN108369380B (ja) |
TW (2) | TWI790486B (ja) |
WO (1) | WO2017023950A2 (ja) |
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US9776218B2 (en) | 2015-08-06 | 2017-10-03 | Asml Netherlands B.V. | Controlled fluid flow for cleaning an optical element |
US10656539B2 (en) | 2017-11-21 | 2020-05-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Radiation source for lithography process |
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US10990026B2 (en) * | 2018-08-14 | 2021-04-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography apparatus and cleaning method thereof |
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JP7389691B2 (ja) | 2020-03-18 | 2023-11-30 | ギガフォトン株式会社 | 極端紫外光生成装置、極端紫外光生成システム、及び電子デバイスの製造方法 |
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CN108369380A (zh) | 2018-08-03 |
TW202120205A (zh) | 2021-06-01 |
US9776218B2 (en) | 2017-10-03 |
WO2017023950A2 (en) | 2017-02-09 |
US20170361359A1 (en) | 2017-12-21 |
TWI790486B (zh) | 2023-01-21 |
CN108369380B (zh) | 2021-05-18 |
TWI708642B (zh) | 2020-11-01 |
JP2018529991A (ja) | 2018-10-11 |
TW201711763A (zh) | 2017-04-01 |
JP7064550B2 (ja) | 2022-05-10 |
US10232413B2 (en) | 2019-03-19 |
JP2021015289A (ja) | 2021-02-12 |
US20170036252A1 (en) | 2017-02-09 |
WO2017023950A3 (en) | 2017-03-09 |
KR20180035898A (ko) | 2018-04-06 |
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