JP6775369B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6775369B2 JP6775369B2 JP2016190175A JP2016190175A JP6775369B2 JP 6775369 B2 JP6775369 B2 JP 6775369B2 JP 2016190175 A JP2016190175 A JP 2016190175A JP 2016190175 A JP2016190175 A JP 2016190175A JP 6775369 B2 JP6775369 B2 JP 6775369B2
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- 239000004065 semiconductor Substances 0.000 title claims description 56
- 238000009792 diffusion process Methods 0.000 claims description 121
- 239000000758 substrate Substances 0.000 claims description 34
- 230000015556 catabolic process Effects 0.000 description 16
- 230000005684 electric field Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
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- Insulated Gate Type Field-Effect Transistor (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Description
P型半導体領域の表面に配置されたゲート絶縁膜と、
ゲート絶縁膜上に配置されたゲート電極と、
ゲート電極の両端のP型半導体領域の表面に配置されたLOCOS酸化膜と、
LOCOS酸化膜両端下部に配置された第1のN型低濃度拡散層と、
第1のN型低濃度拡散層に接して配置された第1のN型高濃度拡散層と、
片方の第1のN型低濃度拡散層および片方の第1のN型高濃度拡散層下部に配置された第2のN型低濃度拡散層と、
第2のN型低濃度拡散層下部に配置された第3のN型低濃度拡散層と、
を有する半導体装置とした。
12 N型ウェル拡散層
13a、13b、13c 第1のN型低濃度拡散層
14 P型低濃度拡散層
15a、15b N型高濃度拡散層
16 P型高濃度拡散層
17 第2のN型低濃度拡散層
18 第3のN型低濃度拡散層
21a、21b LOCOS酸化膜
22 ゲート絶縁膜
31 ドレイン電極
32 ソース電極
33 ゲート電極
Claims (2)
- 半導体基板と、
前記半導体基板に設けられたP型半導体領域と、
前記P型半導体領域の表面に配置されたゲート絶縁膜と、
前記ゲート絶縁膜の上に配置されたゲート電極と、
前記ゲート電極の両端の前記P型半導体領域の表面にそれぞれ配置されたLOCOS酸化膜と、
前記LOCOS酸化膜の下に配置されたソースの第1のN型低濃度拡散層およびドレインの第1のN型低濃度拡散層と、
前記ソースの第1のN型低濃度拡散層に接して、前記ゲート絶縁膜と反対側に配置されたソースのN型高濃度拡散層および前記ドレインの第1のN型低濃度拡散層に接して、前記ゲート絶縁膜と反対側に配置されたドレインのN型高濃度拡散層と、
前記ドレインの第1のN型低濃度拡散層および前記ドレインのN型高濃度拡散層の下部に配置された第2のN型低濃度拡散層と、
前記第2のN型低濃度拡散層の下部に配置された第3のN型低濃度拡散層と、
を有し、
前記第3のN型低濃度拡散層の濃度は、前記ドレインの第1のN型低濃度拡散層および前記第2のN型低濃度拡散層の濃度よりも濃く、前記第2のN型低濃度拡散層の濃度は前記ドレインの第1のN型低濃度拡散層の濃度よりも濃い、もしくは同等の濃度を有することを特徴とする半導体装置。 - 前記第3のN型低濃度拡散層の深さは、前記第1のN型低濃度拡散層の水平方向の長さの1/4であることを特徴とする請求項1に記載の半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016190175A JP6775369B2 (ja) | 2016-09-28 | 2016-09-28 | 半導体装置 |
CN201710873994.1A CN107871785B (zh) | 2016-09-28 | 2017-09-25 | 半导体装置 |
KR1020170123680A KR102291182B1 (ko) | 2016-09-28 | 2017-09-25 | 반도체 장치 |
TW106132920A TWI729216B (zh) | 2016-09-28 | 2017-09-26 | 半導體裝置 |
US15/715,905 US10355077B2 (en) | 2016-09-28 | 2017-09-26 | Semiconductor device |
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JP2016190175A JP6775369B2 (ja) | 2016-09-28 | 2016-09-28 | 半導体装置 |
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JP2018056307A JP2018056307A (ja) | 2018-04-05 |
JP6775369B2 true JP6775369B2 (ja) | 2020-10-28 |
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JP2016190175A Active JP6775369B2 (ja) | 2016-09-28 | 2016-09-28 | 半導体装置 |
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US (1) | US10355077B2 (ja) |
JP (1) | JP6775369B2 (ja) |
KR (1) | KR102291182B1 (ja) |
CN (1) | CN107871785B (ja) |
TW (1) | TWI729216B (ja) |
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JP3442009B2 (ja) * | 1999-09-24 | 2003-09-02 | 松下電器産業株式会社 | 高耐圧mosトランジスタの構造 |
JP4131647B2 (ja) | 2002-06-27 | 2008-08-13 | 三洋電機株式会社 | 半導体装置の製造方法 |
JP5296450B2 (ja) * | 2008-08-13 | 2013-09-25 | セイコーインスツル株式会社 | 半導体装置 |
JP5349885B2 (ja) * | 2008-09-30 | 2013-11-20 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
JP2014138091A (ja) * | 2013-01-17 | 2014-07-28 | Fuji Electric Co Ltd | 半導体装置およびその製造方法 |
JP6455023B2 (ja) * | 2014-08-27 | 2019-01-23 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
JP6595872B2 (ja) * | 2015-02-25 | 2019-10-23 | エイブリック株式会社 | 半導体集積回路装置およびその製造方法 |
US9698147B2 (en) * | 2015-02-25 | 2017-07-04 | Sii Semiconductor Corporation | Semiconductor integrated circuit device having low and high withstanding-voltage MOS transistors |
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2016
- 2016-09-28 JP JP2016190175A patent/JP6775369B2/ja active Active
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2017
- 2017-09-25 KR KR1020170123680A patent/KR102291182B1/ko active IP Right Grant
- 2017-09-25 CN CN201710873994.1A patent/CN107871785B/zh active Active
- 2017-09-26 TW TW106132920A patent/TWI729216B/zh not_active IP Right Cessation
- 2017-09-26 US US15/715,905 patent/US10355077B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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KR102291182B1 (ko) | 2021-08-18 |
TW201817013A (zh) | 2018-05-01 |
CN107871785B (zh) | 2022-03-22 |
CN107871785A (zh) | 2018-04-03 |
US10355077B2 (en) | 2019-07-16 |
JP2018056307A (ja) | 2018-04-05 |
KR20180035155A (ko) | 2018-04-05 |
US20180090563A1 (en) | 2018-03-29 |
TWI729216B (zh) | 2021-06-01 |
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