JP6740007B2 - 水素含有排ガスの処理装置 - Google Patents
水素含有排ガスの処理装置 Download PDFInfo
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- JP6740007B2 JP6740007B2 JP2016110389A JP2016110389A JP6740007B2 JP 6740007 B2 JP6740007 B2 JP 6740007B2 JP 2016110389 A JP2016110389 A JP 2016110389A JP 2016110389 A JP2016110389 A JP 2016110389A JP 6740007 B2 JP6740007 B2 JP 6740007B2
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- hydrogen
- exhaust gas
- containing exhaust
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims description 134
- 239000001257 hydrogen Substances 0.000 title claims description 125
- 229910052739 hydrogen Inorganic materials 0.000 title claims description 125
- 239000007789 gas Substances 0.000 title claims description 119
- 238000012545 processing Methods 0.000 claims description 76
- 239000003054 catalyst Substances 0.000 claims description 65
- 238000000034 method Methods 0.000 claims description 34
- 230000008569 process Effects 0.000 claims description 29
- 238000002156 mixing Methods 0.000 claims description 27
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 26
- 239000001301 oxygen Substances 0.000 claims description 26
- 229910052760 oxygen Inorganic materials 0.000 claims description 26
- 238000006555 catalytic reaction Methods 0.000 claims description 22
- 238000006243 chemical reaction Methods 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 238000010926 purge Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 6
- 230000003197 catalytic effect Effects 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 238000002407 reforming Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims 2
- 238000002485 combustion reaction Methods 0.000 description 6
- 238000009841 combustion method Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/869—Multiple step processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/38—Removing components of undefined structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/88—Handling or mounting catalysts
- B01D53/885—Devices in general for catalytic purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/10—Noble metals or compounds thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/10—Noble metals or compounds thereof
- B01D2255/102—Platinum group metals
- B01D2255/1021—Platinum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/10—Noble metals or compounds thereof
- B01D2255/102—Platinum group metals
- B01D2255/1025—Rhodium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/10—Noble metals or compounds thereof
- B01D2255/102—Platinum group metals
- B01D2255/1026—Ruthenium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/10—Noble metals or compounds thereof
- B01D2255/102—Platinum group metals
- B01D2255/1028—Iridium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/20—Metals or compounds thereof
- B01D2255/207—Transition metals
- B01D2255/20761—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/20—Metals or compounds thereof
- B01D2255/207—Transition metals
- B01D2255/20784—Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/20—Metals or compounds thereof
- B01D2255/209—Other metals
- B01D2255/2092—Aluminium
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Catalysts (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Exhaust Gas After Treatment (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Description
前記処理部は、
水平方向に沿って配される複数個の前記触媒担体部を含む第1処理部と、
前記第1処理部の上部に前記第1処理部と連通されるように配され、垂直方向に沿って配される少なくとも1つの前記触媒担体部を含む第2処理部と、
を含み、
前記第2処理部の上部と排出口との間にパージガスが供給されるパージガス流入管がさらに設けられたことを特徴とする。
110:水素含有排ガス流入管
20、200:水素含有排ガスの処理装置
210:第1処理部
211:ガス流入部
212:導入部
213:混合板
214:混合口
215:反応部
216、256:触媒担体部
217、257:触媒フィルター部
218、258:触媒反応部
230:CDA供給部
231:酸素を含む空気流入管
240:第1ウォータードレインポート
250:第2処理部
260:排出口
270:パージガス流入管
280:クーリングユニット
290:第2ウォータードレインポート
A:酸素を含む空気
HG、HG1、HG2、HG3:水素含有排ガス
P:パージガス
RA:空気
W:凝縮された水蒸気、水
Claims (11)
- 半導体の表面改質工程で発生する水素含有排ガスが流入される水素含有排ガス流入管、及び酸素を含む空気が流入される酸素を含む空気流入管が少なくとも一側に連結され、前記水素含有排ガスと触媒反応を起こす触媒を含む複数個の触媒担体部を含む処理部を含み、
前記処理部は、
水平方向に沿って配される複数個の前記触媒担体部を含む第1処理部と、
前記第1処理部の上部に前記第1処理部と連通されるように配され、垂直方向に沿って配される少なくとも1つの前記触媒担体部を含む第2処理部と、
を含み、
前記第2処理部の上部と排出口との間にパージガスが供給されるパージガス流入管がさらに設けられたことを特徴とする水素含有排ガスの処理装置。 - 前記第1処理部は、上部の反応部と下部のガス流入部とに区画され、
前記反応部に前記触媒担体部が配され、
前記ガス流入部の一側に前記水素含有排ガス流入管及び前記酸素を含む空気流入管が連結されることを特徴とする請求項1に記載の水素含有排ガスの処理装置。 - 前記触媒担体部の少なくとも一部に、白金(Pt)、アルミニウム(Al)、クロム(Cr)、銅(Cu)、ルテニウム(Ru)、ロジウム(Rh)、イリジウム(Ir)、オスミウム(Os)のうち少なくとも何れか1つの触媒金属がコーティングされたことを特徴とする請求項1に記載の水素含有排ガスの処理装置。
- 前記触媒担体部は、
多孔質金属またはセラミックに前記触媒金属がコーティングされた触媒フィルター部と、
前記触媒フィルター部上に配され、垂直方向に中空が形成されたハニカム構造の金属またはセラミックに前記触媒金属がコーティングされた触媒反応部と、
を含むことを特徴とする請求項3に記載の水素含有排ガスの処理装置。 - 前記ハニカム構造で単一ハニカムの直径は、4mmを超過しないことを特徴とする請求項4に記載の水素含有排ガスの処理装置。
- 前記ガス流入部は、
前記水素含有排ガス及び前記酸素を含む空気が流入される導入部と、
前記導入部上に互いに間隔をおいて水平方向に配された複数個の混合板と、を含み、
前記混合板は、横及び縦方向に沿って複数個の混合口が形成されたことを特徴とする請求項2に記載の水素含有排ガスの処理装置。 - 下部に位置した混合板の混合口は、上部に位置した混合板の混合口と交差するように形成されたことを特徴とする請求項6に記載の水素含有排ガスの処理装置。
- 前記第1処理部の少なくとも一側に、前記第1処理部の内部で凝縮された水蒸気を排出する第1ウォータードレインポートが連結されたことを特徴とする請求項1に記載の水素含有排ガスの処理装置。
- 前記第2処理部の上部と前記排出口との間に一部の前記水素含有排ガスを冷却するためのクーリングユニットがさらに設けられたことを特徴とする請求項1に記載の水素含有排ガスの処理装置。
- 前記第2処理部の上部と前記排出口との間に凝縮された水蒸気を排出する第2ウォータードレインポートが連結されたことを特徴とする請求項1に記載の水素含有排ガスの処理装置。
- 前記第2処理部の上部と前記排出口との間に空気が供給される空気流入管がさらに設けられたことを特徴とする請求項1に記載の水素含有排ガスの処理装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150082469A KR101670461B1 (ko) | 2015-06-11 | 2015-06-11 | 수소 포함 배기가스 처리장치 |
KR10-2015-0082469 | 2015-06-11 |
Publications (2)
Publication Number | Publication Date |
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JP2017001024A JP2017001024A (ja) | 2017-01-05 |
JP6740007B2 true JP6740007B2 (ja) | 2020-08-12 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016110389A Active JP6740007B2 (ja) | 2015-06-11 | 2016-06-01 | 水素含有排ガスの処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6740007B2 (ja) |
KR (1) | KR101670461B1 (ja) |
CN (1) | CN106237838B (ja) |
TW (1) | TWI737615B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102450632B1 (ko) * | 2022-03-17 | 2022-10-06 | (주)진솔루션 | 반도체 제조 수소 공정의 배기 수소 처리장치 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3563950B2 (ja) * | 1998-01-06 | 2004-09-08 | 株式会社ルネサステクノロジ | 水素含有排ガス処理装置 |
JP4775697B2 (ja) * | 2005-07-20 | 2011-09-21 | 宇部興産株式会社 | 排ガスの酸化的処理方法及びその装置 |
KR100777672B1 (ko) * | 2005-12-20 | 2007-11-28 | 코아텍주식회사 | 수소가스 처리용 스크러버 시스템 |
KR100654922B1 (ko) * | 2006-01-26 | 2006-12-06 | 주식회사 코캣 | 반도체 제조공정으로부터 발생하는 배가스 처리장치 및방법 |
CN101939079B (zh) * | 2008-02-05 | 2013-06-12 | 应用材料公司 | 用于处理来自制程的可燃性废气的系统及方法 |
JP2009202114A (ja) * | 2008-02-28 | 2009-09-10 | Hiroshi Matsuoka | メタルハニカム担体構造 |
JP2009241001A (ja) * | 2008-03-31 | 2009-10-22 | Okayama Prefecture Industrial Promotion Foundation | マイクロミキサ |
KR20090121943A (ko) * | 2008-05-23 | 2009-11-26 | 방재원 | 연소촉매와 광촉매를 이용한 폐 가스 처리방법 및 그처리장치 |
CN204329030U (zh) * | 2014-11-18 | 2015-05-13 | 程礼华 | 太阳能无烟囱固废发电联产碳油装置 |
-
2015
- 2015-06-11 KR KR1020150082469A patent/KR101670461B1/ko active IP Right Grant
-
2016
- 2016-06-01 JP JP2016110389A patent/JP6740007B2/ja active Active
- 2016-06-08 TW TW105118177A patent/TWI737615B/zh active
- 2016-06-08 CN CN201610402916.9A patent/CN106237838B/zh active Active
Also Published As
Publication number | Publication date |
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JP2017001024A (ja) | 2017-01-05 |
CN106237838A (zh) | 2016-12-21 |
TWI737615B (zh) | 2021-09-01 |
CN106237838B (zh) | 2020-10-30 |
KR101670461B1 (ko) | 2016-11-01 |
TW201707771A (zh) | 2017-03-01 |
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