JP6715975B2 - 基板処理装置及び半導体装置の製造方法 - Google Patents
基板処理装置及び半導体装置の製造方法 Download PDFInfo
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- JP6715975B2 JP6715975B2 JP2019034073A JP2019034073A JP6715975B2 JP 6715975 B2 JP6715975 B2 JP 6715975B2 JP 2019034073 A JP2019034073 A JP 2019034073A JP 2019034073 A JP2019034073 A JP 2019034073A JP 6715975 B2 JP6715975 B2 JP 6715975B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Automation & Control Theory (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/354,864 US10714362B2 (en) | 2018-03-15 | 2019-03-15 | Substrate processing apparatus and method of manufacturing semiconductor device |
US16/401,893 US10593572B2 (en) | 2018-03-15 | 2019-05-02 | Substrate processing apparatus and method of manufacturing semiconductor device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018047873 | 2018-03-15 | ||
JP2018047873 | 2018-03-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019165210A JP2019165210A (ja) | 2019-09-26 |
JP6715975B2 true JP6715975B2 (ja) | 2020-07-01 |
Family
ID=67958801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019034073A Active JP6715975B2 (ja) | 2018-03-15 | 2019-02-27 | 基板処理装置及び半導体装置の製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6715975B2 (zh) |
KR (2) | KR20190109216A (zh) |
CN (1) | CN110277305B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111033714B (zh) * | 2017-09-27 | 2023-12-29 | 株式会社国际电气 | 基板处理装置、半导体器件的制造方法及记录介质 |
KR20220088920A (ko) | 2020-01-28 | 2022-06-28 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 반응관, 반도체 장치의 제조 방법 및 프로그램 |
CN115136284A (zh) * | 2020-03-24 | 2022-09-30 | 株式会社国际电气 | 基板处理装置、半导体装置的制造方法、存储介质以及内管 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6440221B2 (en) * | 1996-05-13 | 2002-08-27 | Applied Materials, Inc. | Process chamber having improved temperature control |
JP3479020B2 (ja) * | 2000-01-28 | 2003-12-15 | 東京エレクトロン株式会社 | 熱処理装置 |
JP2002289603A (ja) * | 2001-03-28 | 2002-10-04 | Tokyo Electron Ltd | 熱処理装置及び熱処理方法 |
JP3863786B2 (ja) * | 2002-01-24 | 2006-12-27 | 株式会社日立国際電気 | 半導体製造装置および半導体装置の製造方法 |
US8282733B2 (en) * | 2007-04-02 | 2012-10-09 | Hitachi Kokusai Electric Inc. | Manufacturing method of semiconductor apparatus |
JP2008277777A (ja) * | 2007-04-02 | 2008-11-13 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法 |
JP5545055B2 (ja) * | 2010-06-15 | 2014-07-09 | 東京エレクトロン株式会社 | 支持体構造及び処理装置 |
JP5545061B2 (ja) * | 2010-06-18 | 2014-07-09 | 東京エレクトロン株式会社 | 処理装置及び成膜方法 |
JP5722450B2 (ja) * | 2011-08-25 | 2015-05-20 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理方法、基板処理装置および記録媒体 |
JP6016542B2 (ja) * | 2012-09-13 | 2016-10-26 | 株式会社日立国際電気 | 反応管、基板処理装置、及び半導体装置の製造方法 |
JP2015173154A (ja) | 2014-03-11 | 2015-10-01 | 東京エレクトロン株式会社 | 縦型熱処理装置、縦型熱処理装置の運転方法及び記憶媒体 |
JP6306411B2 (ja) * | 2014-04-17 | 2018-04-04 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理装置およびプログラム |
JP6579974B2 (ja) * | 2015-02-25 | 2019-09-25 | 株式会社Kokusai Electric | 基板処理装置、温度センサ及び半導体装置の製造方法 |
KR102048293B1 (ko) * | 2015-02-25 | 2019-11-25 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 히터 및 반도체 장치의 제조 방법 |
TWI611043B (zh) * | 2015-08-04 | 2018-01-11 | Hitachi Int Electric Inc | 基板處理裝置、半導體裝置之製造方法及記錄媒體 |
JP6529927B2 (ja) * | 2016-04-15 | 2019-06-12 | 株式会社Kokusai Electric | 半導体装置の製造方法、基板処理装置、およびプログラム |
-
2018
- 2018-11-20 KR KR1020180143336A patent/KR20190109216A/ko not_active IP Right Cessation
-
2019
- 2019-02-26 CN CN201910143036.8A patent/CN110277305B/zh active Active
- 2019-02-27 JP JP2019034073A patent/JP6715975B2/ja active Active
-
2020
- 2020-10-15 KR KR1020200133493A patent/KR102237780B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20190109216A (ko) | 2019-09-25 |
CN110277305A (zh) | 2019-09-24 |
KR20200121771A (ko) | 2020-10-26 |
JP2019165210A (ja) | 2019-09-26 |
CN110277305B (zh) | 2023-08-22 |
KR102237780B1 (ko) | 2021-04-07 |
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