JP6708358B2 - プラズマ処理装置及び試料の離脱方法 - Google Patents

プラズマ処理装置及び試料の離脱方法 Download PDF

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Publication number
JP6708358B2
JP6708358B2 JP2016152424A JP2016152424A JP6708358B2 JP 6708358 B2 JP6708358 B2 JP 6708358B2 JP 2016152424 A JP2016152424 A JP 2016152424A JP 2016152424 A JP2016152424 A JP 2016152424A JP 6708358 B2 JP6708358 B2 JP 6708358B2
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Japan
Prior art keywords
sample
plasma
frequency power
voltage
electrode
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JP2016152424A
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English (en)
Japanese (ja)
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JP2018022756A (ja
JP2018022756A5 (OSRAM
Inventor
正貴 石黒
正貴 石黒
角屋　誠浩
誠浩 角屋
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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Publication date
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Priority to JP2016152424A priority Critical patent/JP6708358B2/ja
Priority to KR1020170004058A priority patent/KR101883246B1/ko
Priority to TW106102962A priority patent/TWI660422B/zh
Priority to US15/425,155 priority patent/US10825700B2/en
Publication of JP2018022756A publication Critical patent/JP2018022756A/ja
Publication of JP2018022756A5 publication Critical patent/JP2018022756A5/ja
Application granted granted Critical
Publication of JP6708358B2 publication Critical patent/JP6708358B2/ja
Priority to US17/038,072 priority patent/US12148633B2/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2016152424A 2016-08-03 2016-08-03 プラズマ処理装置及び試料の離脱方法 Active JP6708358B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2016152424A JP6708358B2 (ja) 2016-08-03 2016-08-03 プラズマ処理装置及び試料の離脱方法
KR1020170004058A KR101883246B1 (ko) 2016-08-03 2017-01-11 플라스마 처리 장치 및 시료의 이탈 방법
TW106102962A TWI660422B (zh) 2016-08-03 2017-01-25 電漿處理裝置及樣品之脫離方法
US15/425,155 US10825700B2 (en) 2016-08-03 2017-02-06 Plasma processing apparatus and method for releasing sample
US17/038,072 US12148633B2 (en) 2016-08-03 2020-09-30 Plasma processing apparatus and method for releasing sample

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016152424A JP6708358B2 (ja) 2016-08-03 2016-08-03 プラズマ処理装置及び試料の離脱方法

Publications (3)

Publication Number Publication Date
JP2018022756A JP2018022756A (ja) 2018-02-08
JP2018022756A5 JP2018022756A5 (OSRAM) 2018-11-22
JP6708358B2 true JP6708358B2 (ja) 2020-06-10

Family

ID=61072045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016152424A Active JP6708358B2 (ja) 2016-08-03 2016-08-03 プラズマ処理装置及び試料の離脱方法

Country Status (4)

Country Link
US (2) US10825700B2 (OSRAM)
JP (1) JP6708358B2 (OSRAM)
KR (1) KR101883246B1 (OSRAM)
TW (1) TWI660422B (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7059064B2 (ja) * 2018-03-26 2022-04-25 株式会社日立ハイテク プラズマ処理装置
CN112885691B (zh) * 2019-11-29 2024-05-14 中微半导体设备(上海)股份有限公司 等离子体处理装置及其稳定性优化的方法
JP7526645B2 (ja) 2020-01-29 2024-08-01 東京エレクトロン株式会社 基板処理方法及び基板処理システム
CN115250648B (zh) * 2021-02-25 2025-11-11 株式会社日立高新技术 等离子处理装置
CN115020311B (zh) * 2022-05-27 2025-12-09 江苏鲁汶仪器股份有限公司 一种残余电荷释放方法
CN117836912A (zh) * 2022-08-03 2024-04-05 株式会社日立高新技术 晶片处理方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW334609B (en) 1996-09-19 1998-06-21 Hitachi Ltd Electrostatic chuck, method and device for processing sanyle use the same
KR19980024679U (ko) * 1996-10-30 1998-07-25 홍성기 광고용 녹화 카셋테이프
US5933314A (en) * 1997-06-27 1999-08-03 Lam Research Corp. Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks
JPH11111826A (ja) * 1997-10-02 1999-04-23 Sumitomo Metal Ind Ltd 静電チャックにおける試料の脱離方法
JPH11233605A (ja) * 1998-02-17 1999-08-27 Mitsubishi Electric Corp 静電チャックステージ
GB9812850D0 (en) * 1998-06-16 1998-08-12 Surface Tech Sys Ltd A method and apparatus for dechucking
US6057244A (en) * 1998-07-31 2000-05-02 Applied Materials, Inc. Method for improved sputter etch processing
US20030236004A1 (en) * 2002-06-24 2003-12-25 Applied Materials, Inc. Dechucking with N2/O2 plasma
JP2004047511A (ja) * 2002-07-08 2004-02-12 Tokyo Electron Ltd 離脱方法、処理方法、静電吸着装置および処理装置
US7292428B2 (en) * 2005-04-26 2007-11-06 Applied Materials, Inc. Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
JP2007073568A (ja) * 2005-09-05 2007-03-22 Hitachi High-Technologies Corp プラズマ処理装置
CN101535913B (zh) * 2006-10-31 2011-03-02 比亚迪股份有限公司 电动机控制方法
JP4847909B2 (ja) * 2007-03-29 2011-12-28 東京エレクトロン株式会社 プラズマ処理方法及び装置
US8780522B2 (en) * 2008-07-07 2014-07-15 Lam Research Corporation Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof
JP6013740B2 (ja) * 2012-02-03 2016-10-25 東京エレクトロン株式会社 離脱制御方法及びプラズマ処理装置の制御装置
JP6132497B2 (ja) * 2012-09-12 2017-05-24 東京エレクトロン株式会社 離脱制御方法及びプラズマ処理装置
JP2015072825A (ja) * 2013-10-03 2015-04-16 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
JP6357436B2 (ja) * 2014-07-25 2018-07-11 株式会社日立ハイテクノロジーズ プラズマ処理装置
US10535566B2 (en) * 2016-04-28 2020-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and method of manufacture

Also Published As

Publication number Publication date
KR101883246B1 (ko) 2018-08-30
JP2018022756A (ja) 2018-02-08
US10825700B2 (en) 2020-11-03
US20180040491A1 (en) 2018-02-08
US20210013060A1 (en) 2021-01-14
KR20180015558A (ko) 2018-02-13
US12148633B2 (en) 2024-11-19
TW201816883A (zh) 2018-05-01
TWI660422B (zh) 2019-05-21

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