JP6690949B2 - 走査型電子顕微鏡 - Google Patents
走査型電子顕微鏡 Download PDFInfo
- Publication number
- JP6690949B2 JP6690949B2 JP2016005865A JP2016005865A JP6690949B2 JP 6690949 B2 JP6690949 B2 JP 6690949B2 JP 2016005865 A JP2016005865 A JP 2016005865A JP 2016005865 A JP2016005865 A JP 2016005865A JP 6690949 B2 JP6690949 B2 JP 6690949B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- anode
- potential
- mcp
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010894 electron beam technology Methods 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000000523 sample Substances 0.000 description 52
- 239000000919 ceramic Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 9
- 101710121996 Hexon protein p72 Proteins 0.000 description 8
- 101710125418 Major capsid protein Proteins 0.000 description 8
- 238000005259 measurement Methods 0.000 description 6
- 238000005211 surface analysis Methods 0.000 description 6
- 101100042258 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) sem-1 gene Proteins 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 125000003821 2-(trimethylsilyl)ethoxymethyl group Chemical group [H]C([H])([H])[Si](C([H])([H])[H])(C([H])([H])[H])C([H])([H])C(OC([H])([H])[*])([H])[H] 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2801—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Tubes For Measurement (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/000,305 US9613781B2 (en) | 2015-01-23 | 2016-01-19 | Scanning electron microscope |
| CN201610041136.6A CN105826152B (zh) | 2015-01-23 | 2016-01-21 | 扫描型电子显微镜 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015011089 | 2015-01-23 | ||
| JP2015011089 | 2015-01-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016139607A JP2016139607A (ja) | 2016-08-04 |
| JP6690949B2 true JP6690949B2 (ja) | 2020-04-28 |
Family
ID=56560284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016005865A Active JP6690949B2 (ja) | 2015-01-23 | 2016-01-15 | 走査型電子顕微鏡 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6690949B2 (zh) |
| CN (1) | CN105826152B (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023201580A1 (zh) * | 2022-04-20 | 2023-10-26 | 华为技术有限公司 | 电源系统、电子光学镜组和扫描电子显微镜 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2506518A1 (fr) * | 1981-05-20 | 1982-11-26 | Labo Electronique Physique | Structure multiplicatrice d'electrons comportant un multiplicateur a galettes de microcanaux suivi d'un etage amplificateur a dynode, procede de fabrication et utilisation dans un tube photoelectrique |
| JPH0560601A (ja) * | 1991-09-04 | 1993-03-12 | Hamamatsu Photonics Kk | 高速光検出器及び高速光検出装置 |
| IL124333A0 (en) * | 1998-05-05 | 1998-12-06 | El Mul Technologies Ltd | Charges particle detector |
| JP2007042513A (ja) * | 2005-08-04 | 2007-02-15 | Horon:Kk | 検査装置および検査装置の照射ビームサイズ調整方法 |
| JP2008140723A (ja) * | 2006-12-05 | 2008-06-19 | Horiba Ltd | 分析装置 |
| US7564043B2 (en) * | 2007-05-24 | 2009-07-21 | Hamamatsu Photonics K.K. | MCP unit, MCP detector and time of flight mass spectrometer |
| JP2009289693A (ja) * | 2008-05-30 | 2009-12-10 | Hamamatsu Photonics Kk | 荷電粒子検出器 |
| US8759764B2 (en) * | 2012-06-29 | 2014-06-24 | Fei Company | On-axis detector for charged particle beam system |
| JP6121681B2 (ja) * | 2012-10-10 | 2017-04-26 | 浜松ホトニクス株式会社 | Ｍｃｐユニット、ｍｃｐ検出器および飛行時間型質量分析器 |
| JP6535250B2 (ja) * | 2015-08-10 | 2019-06-26 | 浜松ホトニクス株式会社 | 荷電粒子検出器およびその制御方法 |
-
2016
- 2016-01-15 JP JP2016005865A patent/JP6690949B2/ja active Active
- 2016-01-21 CN CN201610041136.6A patent/CN105826152B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105826152B (zh) | 2019-05-14 |
| CN105826152A (zh) | 2016-08-03 |
| JP2016139607A (ja) | 2016-08-04 |
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