JP6685914B2 - Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法 - Google Patents

Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法 Download PDF

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Publication number
JP6685914B2
JP6685914B2 JP2016551259A JP2016551259A JP6685914B2 JP 6685914 B2 JP6685914 B2 JP 6685914B2 JP 2016551259 A JP2016551259 A JP 2016551259A JP 2016551259 A JP2016551259 A JP 2016551259A JP 6685914 B2 JP6685914 B2 JP 6685914B2
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JP
Japan
Prior art keywords
conductive
conductive member
conductive surface
euv
electrically
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2016551259A
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English (en)
Japanese (ja)
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JP2017515136A5 (enExample
JP2017515136A (ja
Inventor
イーゴレヴィッチ エルショフ，アレクサンダー
イーゴレヴィッチ エルショフ，アレクサンダー
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ASML Netherlands BV
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ASML Netherlands BV
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Priority to JP2020066317A priority Critical patent/JP6944565B2/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Lenses (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
JP2016551259A 2014-03-18 2015-03-05 Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法 Expired - Fee Related JP6685914B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020066317A JP6944565B2 (ja) 2014-03-18 2020-04-01 Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/218,707 2014-03-18
US14/218,707 US9539622B2 (en) 2014-03-18 2014-03-18 Apparatus for and method of active cleaning of EUV optic with RF plasma field
PCT/EP2015/054588 WO2015139964A1 (en) 2014-03-18 2015-03-05 Apparatus for and method of active cleaning of euv optic with rf plasma field

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020066317A Division JP6944565B2 (ja) 2014-03-18 2020-04-01 Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法

Publications (3)

Publication Number Publication Date
JP2017515136A JP2017515136A (ja) 2017-06-08
JP2017515136A5 JP2017515136A5 (enExample) 2019-12-19
JP6685914B2 true JP6685914B2 (ja) 2020-04-22

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JP2016551259A Expired - Fee Related JP6685914B2 (ja) 2014-03-18 2015-03-05 Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法
JP2020066317A Active JP6944565B2 (ja) 2014-03-18 2020-04-01 Ｒｆプラズマ電界を使用したｅｕｖ光学部品のアクティブ洗浄装置および方法

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Country Status (5)

Country Link
US (2) US9539622B2 (enExample)
JP (2) JP6685914B2 (enExample)
KR (1) KR102397027B1 (enExample)
CN (2) CN106104383B (enExample)
WO (1) WO2015139964A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111266368B (zh) * 2020-01-20 2020-09-22 哈尔滨工业大学 一种聚焦离子束清理透射电子显微镜光阑的方法
KR102867854B1 (ko) 2021-03-23 2025-10-02 삼성전자주식회사 극자외선 광원 시스템의 컬렉터 세정 방법
KR20220132302A (ko) 2021-03-23 2022-09-30 삼성전자주식회사 Euv 컬렉터 검사 장치 및 검사 방법
CN114200778A (zh) * 2021-06-25 2022-03-18 四川大学 一种极紫外光刻机lpp光源收集镜的等离子体原位清洗结构

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US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
EP1939690A1 (en) * 2002-12-13 2008-07-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI251117B (en) * 2002-12-20 2006-03-11 Asml Netherlands Bv Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
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TWI305296B (en) * 2004-07-27 2009-01-11 Cymer Inc Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
US8317929B2 (en) * 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
US7989786B2 (en) * 2006-03-31 2011-08-02 Energetiq Technology, Inc. Laser-driven light source
WO2008107166A1 (de) 2007-03-07 2008-09-12 Carl Zeiss Smt Ag Verfahren zum reinigen einer euv-lithographievorrichtung, verfahren zur messung der restgasatmosphäre bzw. der kontamination sowie euv-lithographievorrichtung
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WO2014045889A1 (ja) * 2012-09-18 2014-03-27 ギガフォトン株式会社 スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置

Also Published As

Publication number Publication date
US20150266067A1 (en) 2015-09-24
CN106104383B (zh) 2019-03-19
CN110058494A (zh) 2019-07-26
US10493504B2 (en) 2019-12-03
US20170095843A1 (en) 2017-04-06
JP2020122973A (ja) 2020-08-13
US9539622B2 (en) 2017-01-10
CN106104383A (zh) 2016-11-09
KR20160134648A (ko) 2016-11-23
WO2015139964A1 (en) 2015-09-24
JP6944565B2 (ja) 2021-10-06
JP2017515136A (ja) 2017-06-08
CN110058494B (zh) 2021-09-03
KR102397027B1 (ko) 2022-05-11

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