JP6674648B2 - 被覆切削工具 - Google Patents
被覆切削工具 Download PDFInfo
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- JP6674648B2 JP6674648B2 JP2018508101A JP2018508101A JP6674648B2 JP 6674648 B2 JP6674648 B2 JP 6674648B2 JP 2018508101 A JP2018508101 A JP 2018508101A JP 2018508101 A JP2018508101 A JP 2018508101A JP 6674648 B2 JP6674648 B2 JP 6674648B2
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- 238000005520 cutting process Methods 0.000 title claims description 72
- 239000010410 layer Substances 0.000 claims description 154
- 239000002131 composite material Substances 0.000 claims description 80
- 150000004767 nitrides Chemical class 0.000 claims description 80
- 239000013078 crystal Substances 0.000 claims description 45
- 239000000463 material Substances 0.000 claims description 39
- 239000011247 coating layer Substances 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 22
- 229910052719 titanium Inorganic materials 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 13
- 229910052721 tungsten Inorganic materials 0.000 claims description 12
- 229910052804 chromium Inorganic materials 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 10
- 229910052758 niobium Inorganic materials 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 238000002441 X-ray diffraction Methods 0.000 claims description 9
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 8
- 239000002356 single layer Substances 0.000 claims description 7
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- 239000011195 cermet Substances 0.000 claims description 5
- 229910052582 BN Inorganic materials 0.000 claims description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 description 31
- 239000007789 gas Substances 0.000 description 25
- 238000001883 metal evaporation Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 238000010891 electric arc Methods 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 238000005299 abrasion Methods 0.000 description 6
- 238000003754 machining Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 101700004678 SLIT3 Proteins 0.000 description 2
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 2
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 2
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 238000002233 thin-film X-ray diffraction Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004098 selected area electron diffraction Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/141—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness
- B23B27/143—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness characterised by having chip-breakers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/02—Milling-cutters characterised by the shape of the cutter
- B23C5/10—Shank-type cutters, i.e. with an integral shaft
- B23C5/1009—Ball nose end mills
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
- B23C5/20—Milling-cutters characterised by physical features other than shape with removable cutter bits or teeth or cutting inserts
- B23C5/202—Plate-like cutting inserts with special form
- B23C5/205—Plate-like cutting inserts with special form characterised by chip-breakers of special form
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2222/00—Materials of tools or workpieces composed of metals, alloys or metal matrices
- B23B2222/28—Details of hard metal, i.e. cemented carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
- Drilling Tools (AREA)
Description
[1]基材と、前記基材の表面の少なくとも一部に形成された被覆層とを含む被覆切削工具であって、前記被覆層は、少なくとも1層の下記式(1):
(TixAly)N (1)
(式中、xはTi元素とAl元素との合計に対するTi元素の原子比を示し、yはTi元素とAl元素との合計に対するAl元素の原子比を示し、0.10≦x≦0.50、0.50≦y≦0.90、x+y=1を満足する。)
で表される組成を有する化合物を含有する複合窒化物層を有し、前記複合窒化物層は、格子定数が0.400nm以上0.430nm以下である相と、格子定数が0.755nm以上0.810nm以下である相とを含む、被覆切削工具。
[2]前記複合窒化物層は、結晶系が立方晶であり、格子定数が0.410nm以上0.430nm以下である相と、結晶系が立方晶であり、格子定数が0.760nm以上0.800nm以下である相とを含む、[1]に記載の被覆切削工具。
[3]前記複合窒化物層は、格子定数が0.410nm以上0.420nm以下である相と、格子定数が0.770nm以上0.795nm以下である相とを含む、[1]または[2]に記載の被覆切削工具。
[4]前記複合窒化物層は、立方晶の(Ti,Al)Nの結晶を含むか、または立方晶の(Ti,Al)Nの結晶と六方晶のAlNの結晶とを含み、X線回折による立方晶(200)面の回折ピーク強度I(200)に対する六方晶(100)面の回折ピーク強度I(100)の比[六方晶I(100)/立方晶I(200)]が0.5以下である、[1]〜[3]のいずれかに記載の被覆切削工具。
[5]前記複合窒化物層の残留応力は、−4.0GPa以上2.0GPa以下である、[1]〜[4]のいずれかに記載の被覆切削工具。
[6]前記複合窒化物層の平均厚さは、1.5μm以上12.0μm以下である、[1]〜[5]のいずれかに記載の被覆切削工具。
[7]前記被覆層は、前記基材と前記複合窒化物層との間に下部層を有し、前記下部層は、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Al、SiおよびYからなる群より選ばれる少なくとも1種の元素と、C、N、OおよびBからなる群より選ばれる少なくとも1種の元素とからなる化合物の単層または積層であり、前記下部層の平均厚さは、0.1μm以上3.5μm以下である、[1]〜[6]のいずれかに記載の被覆切削工具。
[8]前記被覆層は、前記複合窒化物層の前記基材とは反対側に上部層を有し、前記上部層は、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Al、SiおよびYからなる群より選ばれる少なくとも1種の元素と、C、N、OおよびBからなる群より選ばれる少なくとも1種の元素とからなる化合物の単層または積層であり、前記上部層の平均厚さは、0.1μm以上3.5μm以下である、[1]〜[7]のいずれかに記載の被覆切削工具。
[9]前記被覆層の全体の平均厚さは、1.5μm以上15.0μm以下である、[1]〜[8]のいずれかに記載の被覆切削工具。
[10]前記基材は、超硬合金、サーメット、セラミックスまたは立方晶窒化硼素焼結体のいずれかである[1]〜[9]のいずれかに記載の被覆切削工具。
(TixAly)N (1)
で表される組成を有する化合物を含有するため、耐酸化性に優れる。本実施形態の複合窒化物層において上記式(1)で表される組成を有する化合物は、立方晶、または立方晶と六方晶とを含むと好ましい。なお、上記式(1)において、xはTi元素とAl元素との合計に対するTi元素の原子比を示し、yはTi元素とAl元素との合計に対するAl元素の原子比を示し、0.10≦x≦0.50、0.50≦y≦0.90、x+y=1を満足する。Al元素の原子比yは、0.50以上であると、Alの含有量が多くなることにより、耐酸化性の低下をさらに抑制でき、0.90以下であると、六方晶の存在比率をより低く抑えることにより、耐摩耗性の低下をさらに抑制できる。その中でも、yが0.60以上0.85以下であると、耐酸化性と耐摩耗性とのバランスにより優れるため好ましく、0.65以上0.85以下であるとより好ましく、0.65以上0.80以下であると更に好ましい。
ブラッグの式:2d=λ/sinθ
立方晶の場合:a2=d2×(h2+k2+l2)
六方晶の場合:a2=d2×{4/3×(h2+k2+l2)+l2×(c/a)2}
ここで、dは格子面間隔、λは測定に用いた管球の波長、θは入射角、aは格子定数であり、h、k、lは面指数を示す。
無歪み角度(2θ)=T2θ+(Aa)・(A2θ−T2θ)
ここで、式中、T2θは立方晶TiNの(111)面の回折角度(36.81度)を示し、A2θは立方晶AlNの(111)面の回折角度(38.53度)を示し、AaはAl元素とTi元素との合計に対するAl元素の原子比(a)を示す。
よって、複合窒化物層の組成が(Al0.7Ti0.3)Nである場合、立方晶(111)面の無歪み角度(2θ)は、38.01度になる。
被削材:SCM440、
被削材形状:120mm×230mm×60mmの直方体、
切削速度:250m/min、
送り:0.15mm/tooth、
切り込み:2.0mm、
クーラント:無し、
切削幅:50mm、
評価項目:最大逃げ面摩耗幅が0.2mmに至ったときを工具寿命とし、工具寿命に至るまでの加工長を測定した。
被削材:SCM440、
被削材形状:120mm×230mm×60mmの直方体(但し、正面フライス加工を行う直方体の120mm×230mmの面に直径φ30mmの穴が4箇所明けられている。)、
切削速度:250m/min、
送り:0.40mm/tooth、
切り込み:2.0mm、
クーラント:無し、
切削幅:105mm、
評価項目:試料が欠損(試料の切れ刃部に欠けが生じる)したときを工具寿命とし、工具寿命に至るまでの加工長を測定した。
また、発明品の耐欠損性試験の評価はいずれもAまたはBの評価であり、比較品の評価は、すべてCであった。
Claims (8)
- 基材と、前記基材の表面に形成された被覆層とを含む被覆切削工具であって、
前記被覆層は、少なくとも1層の下記式(1):
(TixAly)N (1)
(式中、xはTi元素とAl元素との合計に対するTi元素の原子比を示し、yはTi元素とAl元素との合計に対するAl元素の原子比を示し、0.10≦x≦0.50、0.50≦y≦0.90、x+y=1を満足する。)
で表される組成を有する化合物からなる複合窒化物層を有し、
前記複合窒化物層は、結晶系が立方晶であり、格子定数が0.400nm以上0.430nm以下である相と、結晶系が立方晶であり、格子定数が0.755nm以上0.810nm以下である相とを含み、
前記被覆層の全体の平均厚さは、1.5μm以上15.0μm以下であり、
前記複合窒化物層の平均厚さは、1.5μm以上12.0μm以下である、被覆切削工具。 - 前記複合窒化物層は、結晶系が立方晶であり、格子定数が0.410nm以上0.430nm以下である相と、結晶系が立方晶であり、格子定数が0.760nm以上0.800nm以下である相とを含む、請求項1に記載の被覆切削工具。
- 前記複合窒化物層は、結晶系が立方晶であり、格子定数が0.410nm以上0.420nm以下である相と、結晶系が立方晶であり、格子定数が0.770nm以上0.795nm以下である相とを含む、請求項1または2に記載の被覆切削工具。
- 前記複合窒化物層は、立方晶の(Ti,Al)Nの結晶を含むか、または立方晶の(Ti,Al)Nの結晶と六方晶のAlNの結晶とを含み、X線回折による立方晶(200)面の回折ピーク強度I(200)に対する六方晶(100)面の回折ピーク強度I(100)の比[六方晶I(100)/立方晶I(200)]が0.5以下である、請求項1〜3のいずれか1項に記載の被覆切削工具。
- 前記複合窒化物層の残留応力は、−4.0GPa以上2.0GPa以下である、請求項1〜4のいずれか1項に記載の被覆切削工具。
- 前記被覆層は、前記基材と前記複合窒化物層との間に下部層を有し、
前記下部層は、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Al、SiおよびYからなる群より選ばれる少なくとも1種の元素と、C、N、OおよびBからなる群より選ばれる少なくとも1種の元素とからなる化合物の単層または積層であり、
前記下部層の平均厚さは、0.1μm以上3.5μm以下である、請求項1〜5のいずれか1項に記載の被覆切削工具。 - 前記被覆層は、前記複合窒化物層の前記基材とは反対側に上部層を有し、
前記上部層は、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Al、SiおよびYからなる群より選ばれる少なくとも1種の元素と、C、N、OおよびBからなる群より選ばれる少なくとも1種の元素とからなる化合物の単層または積層であり、
前記上部層の平均厚さは、0.1μm以上3.5μm以下である、請求項1〜6のいずれか1項に記載の被覆切削工具。 - 前記基材は、超硬合金、サーメット、セラミックスまたは立方晶窒化硼素焼結体のいずれかである請求項1〜7のいずれか1項に記載の被覆切削工具。
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