JP6666900B2 - 独立した分離されたヒータ区域を有するウエハキャリア - Google Patents
独立した分離されたヒータ区域を有するウエハキャリア Download PDFInfo
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- JP6666900B2 JP6666900B2 JP2017505467A JP2017505467A JP6666900B2 JP 6666900 B2 JP6666900 B2 JP 6666900B2 JP 2017505467 A JP2017505467 A JP 2017505467A JP 2017505467 A JP2017505467 A JP 2017505467A JP 6666900 B2 JP6666900 B2 JP 6666900B2
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- 238000001816 cooling Methods 0.000 claims description 118
- 238000010438 heat treatment Methods 0.000 claims description 25
- 238000012546 transfer Methods 0.000 claims description 23
- 239000000919 ceramic Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- 238000012545 processing Methods 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000013529 heat transfer fluid Substances 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 16
- 239000002826 coolant Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000012809 cooling fluid Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 238000001020 plasma etching Methods 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
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- 239000012530 fluid Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000000110 cooling liquid Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000001364 causal effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000006261 foam material Substances 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
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- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Description
本出願は、全ての目的のために参照により組み込まれる2014年8月1日に出願された「Wafer Carrier with Independent Isolated Heater Zones」という名称の米国仮特許出願第62/032,313号からの優先権を主張する、全ての目的のために参照により全体が本明細書に組み込まれる2015年2月4日に出願された「Wafer Carrier with Independent Isolated Heater Zones」という名称の米国特許出願第14/614,199号からの優先権を主張するものである。
Claims (15)
- 製造プロセスのために加工対象物を支持するパック、
各々が前記パックと熱的に連結された複数の熱的に分離されたブロックを有するヒータプレートであって、各ブロックが前記ヒータプレートのそれぞれのブロックを加熱するためのヒータを有する、ヒータプレート、及び
前記ヒータプレートと固定され且つ熱的に連結された冷却プレートであって、前記冷却プレートから熱を伝達する熱伝達流体を搬送するための冷却チャネルを有する、冷却プレート、
を備え、
前記冷却チャネルは、前記熱的に分離されたブロックのそれぞれの拡張部の両側の各々に配され、前記冷却プレートは、熱伝達面を介して、前記熱的に分離されたブロックのそれぞれの前記拡張部から熱を除去し、前記熱伝達面は、それぞれのブロックの前記ヒータに隣接し且つ前記ヒータを取り囲む、装置。 - 前記ヒータが、長手方向軸が前記パックの上端面と垂直になるように方向付けられた縦長の抵抗ヒータロッドの形態にある、請求項1に記載の装置。
- 前記パックとは反対側の前記冷却プレートに固定されたベースプレートを更に備え、前記冷却チャネルがベースプレートに対してオープンであり、前記装置が前記ベースプレートに対して前記冷却チャネルを密封するための複数のシールを更に備える、請求項1に記載の装置。
- 前記ベースプレートが、前記冷却プレートよりも低い熱伝導率を有する材料から形成されている、請求項3に記載の装置。
- 前記材料が、チタニウム、ステンレススチール、アルミナ、セラミック、及びニッケルから選択されている、請求項4に記載の装置。
- 前記ヒータプレートの前記ブロックが、各ブロックの間の間隙によって互いのブロックから熱的に分離されている、請求項1に記載の装置。
- 前記間隙が、断熱材料によって満たされている、請求項6に記載の装置。
- 前記ブロックが、前記ヒータプレートの表面全体にわたり同心リング状に配置され、前記ブロックが、直線的若しくは曲線的な側面を有する矩形状、三角形状、又は六角形状の何れかである、請求項1に記載の装置。
- 前記パックが誘電体であり、前記パックが、製造プロセスの間に前記加工対象物を静電的に保持する電極を更に備える、請求項1に記載の装置。
- 前記それぞれのブロックの温度を測定するための、各ヒータに関連付けられた温度センサを更に備える、請求項1に記載の装置。
- 前記温度センサが、前記ヒータと統合されている、請求項10に記載の装置。
- 各ブロックが、冷却チャネルと熱的に連結され、前記連結されている冷却チャネルが、前記それぞれのブロックの下方を通っている、請求項1に記載の装置。
- プラズマ処理システムであって、
プラズマチャンバ、
前記プラズマチャンバ内で気体イオンを含有するプラズマを生成するためのプラズマ源、
製造プロセスのために加工対象物を支持するパックと、各々が前記パックと熱的に連結された複数の熱的に分離されたブロックを有するヒータプレートであって、各ブロックが前記ヒータプレートのそれぞれのブロックを加熱するためのヒータを有するヒータプレートと、前記ヒータプレートと固定され且つ熱的に連結された冷却プレートであって、前記冷却プレートから熱を伝達する熱伝達流体を搬送するための冷却チャネルを有する冷却プレートとを有する、前記プラズマチャンバ内の加工対象物ホルダ、及び
各ヒータを独立して制御するための温度コントローラ、
を備え、
前記冷却チャネルは、前記熱的に分離されたブロックのそれぞれの拡張部の両側の各々に配され、前記冷却プレートは、熱伝達面を介して、前記熱的に分離されたブロックのそれぞれの前記拡張部から熱を除去し、前記熱伝達面は、それぞれのブロックの前記ヒータに隣接し且つ前記ヒータを取り囲む、
プラズマ処理システム。 - 前記ヒータプレートの前記ブロックが、各ブロックの間の間隙によって互いのブロックから熱的に分離されている、請求項13に記載のプラズマ処理システム。
- 前記ヒータプレートの前記ブロックが、各それぞれのブロックから前記冷却プレートへ熱を伝達するために、前記冷却プレートと物理的に接触した前記熱伝達面を有する、請求項13に記載のプラズマ処理システム。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462032313P | 2014-08-01 | 2014-08-01 | |
US62/032,313 | 2014-08-01 | ||
US14/614,199 | 2015-02-04 | ||
US14/614,199 US10431435B2 (en) | 2014-08-01 | 2015-02-04 | Wafer carrier with independent isolated heater zones |
PCT/US2015/041852 WO2016018727A1 (en) | 2014-08-01 | 2015-07-23 | Wafer carrier with independent isolated heater zones |
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JP2020028030A Division JP7090115B2 (ja) | 2014-08-01 | 2020-02-21 | 独立した分離されたヒータ区域を有するウエハキャリア |
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Publication Number | Publication Date |
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JP2017522737A JP2017522737A (ja) | 2017-08-10 |
JP6666900B2 true JP6666900B2 (ja) | 2020-03-18 |
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JP2017505467A Active JP6666900B2 (ja) | 2014-08-01 | 2015-07-23 | 独立した分離されたヒータ区域を有するウエハキャリア |
JP2020028030A Active JP7090115B2 (ja) | 2014-08-01 | 2020-02-21 | 独立した分離されたヒータ区域を有するウエハキャリア |
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JP2020028030A Active JP7090115B2 (ja) | 2014-08-01 | 2020-02-21 | 独立した分離されたヒータ区域を有するウエハキャリア |
Country Status (6)
Country | Link |
---|---|
US (2) | US10431435B2 (ja) |
JP (2) | JP6666900B2 (ja) |
KR (2) | KR102392006B1 (ja) |
CN (2) | CN106716608B (ja) |
TW (2) | TWI780597B (ja) |
WO (1) | WO2016018727A1 (ja) |
Cited By (1)
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US20210050234A1 (en) * | 2019-08-16 | 2021-02-18 | Applied Materials, Inc. | Heated substrate support with thermal baffles |
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KR101681190B1 (ko) * | 2015-05-15 | 2016-12-02 | 세메스 주식회사 | 기판 건조 장치 및 방법 |
US20180053666A1 (en) * | 2016-08-19 | 2018-02-22 | Applied Materials, Inc. | Substrate carrier with array of independently controllable heater elements |
JP6807217B2 (ja) * | 2016-11-16 | 2021-01-06 | 東京エレクトロン株式会社 | ステージ及び基板処理装置 |
US10903066B2 (en) * | 2017-05-08 | 2021-01-26 | Applied Materials, Inc. | Heater support kit for bevel etch chamber |
US11276590B2 (en) * | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Multi-zone semiconductor substrate supports |
CN108962780A (zh) * | 2017-05-19 | 2018-12-07 | 北京北方华创微电子装备有限公司 | 加热装置和工艺腔室 |
CN108987323B (zh) * | 2017-06-05 | 2020-03-31 | 北京北方华创微电子装备有限公司 | 一种承载装置及半导体加工设备 |
US11062886B2 (en) * | 2017-11-28 | 2021-07-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for controlling wafer uniformity |
US10306776B1 (en) * | 2017-11-29 | 2019-05-28 | Lam Research Corporation | Substrate processing system printed-circuit control board assembly with one or more heater layers |
US11014853B2 (en) * | 2018-03-07 | 2021-05-25 | Applied Materials, Inc. | Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments |
US10903097B2 (en) * | 2018-03-30 | 2021-01-26 | Axcelis Technologies, Inc. | In-situ wafer temperature measurement and control |
CN108682635B (zh) * | 2018-05-03 | 2021-08-06 | 拓荆科技股份有限公司 | 具有加热机制的晶圆座及包含该晶圆座的反应腔体 |
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US10431435B2 (en) | 2019-10-01 |
KR20220053703A (ko) | 2022-04-29 |
KR20170038886A (ko) | 2017-04-07 |
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JP2020109848A (ja) | 2020-07-16 |
US20170250060A1 (en) | 2017-08-31 |
TW201606919A (zh) | 2016-02-16 |
CN106716608B (zh) | 2020-10-02 |
TW202127575A (zh) | 2021-07-16 |
US20160035544A1 (en) | 2016-02-04 |
JP7090115B2 (ja) | 2022-06-23 |
KR102517790B1 (ko) | 2023-04-03 |
JP2017522737A (ja) | 2017-08-10 |
CN112053988A (zh) | 2020-12-08 |
WO2016018727A1 (en) | 2016-02-04 |
CN106716608A (zh) | 2017-05-24 |
KR102392006B1 (ko) | 2022-04-27 |
US11322337B2 (en) | 2022-05-03 |
TWI721952B (zh) | 2021-03-21 |
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