TWI560801B - Electrostatic chuck with temperature control - Google Patents

Electrostatic chuck with temperature control

Info

Publication number
TWI560801B
TWI560801B TW101135982A TW101135982A TWI560801B TW I560801 B TWI560801 B TW I560801B TW 101135982 A TW101135982 A TW 101135982A TW 101135982 A TW101135982 A TW 101135982A TW I560801 B TWI560801 B TW I560801B
Authority
TW
Taiwan
Prior art keywords
temperature control
electrostatic chuck
chuck
electrostatic
temperature
Prior art date
Application number
TW101135982A
Other languages
Chinese (zh)
Other versions
TW201330164A (en
Inventor
Vijay D Parkhe
Steven V Sansoni
Cheng-Hsiung Matthew Tsai
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW201330164A publication Critical patent/TW201330164A/en
Application granted granted Critical
Publication of TWI560801B publication Critical patent/TWI560801B/en

Links

TW101135982A 2011-09-30 2012-09-28 Electrostatic chuck with temperature control TWI560801B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161542068P 2011-09-30 2011-09-30
US201161542746P 2011-10-03 2011-10-03

Publications (2)

Publication Number Publication Date
TW201330164A TW201330164A (en) 2013-07-16
TWI560801B true TWI560801B (en) 2016-12-01

Family

ID=49225831

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101135982A TWI560801B (en) 2011-09-30 2012-09-28 Electrostatic chuck with temperature control

Country Status (1)

Country Link
TW (1) TWI560801B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10431435B2 (en) * 2014-08-01 2019-10-01 Applied Materials, Inc. Wafer carrier with independent isolated heater zones
TWI748304B (en) * 2018-12-21 2021-12-01 日商Ｔｏｔｏ股份有限公司 Electrostatic chuck
US11894255B2 (en) * 2019-07-30 2024-02-06 Applied Materials, Inc. Sheath and temperature control of process kit

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6740853B1 (en) * 1999-09-29 2004-05-25 Tokyo Electron Limited Multi-zone resistance heater
US20070247779A1 (en) * 2003-01-29 2007-10-25 Kyocera Corporation Electrostatic Chuck
US20080230518A1 (en) * 2007-03-21 2008-09-25 Applied Materials, Inc. Gas flow diffuser
US20090201622A1 (en) * 2004-03-31 2009-08-13 Applied Materials, Inc. Detachable electrostatic chuck for supporting a substrate in a process chamber
JP2011035186A (en) * 2009-08-03 2011-02-17 Tokyo Electron Ltd Coating processing device, coating processing method, program, and computer storage medium

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6740853B1 (en) * 1999-09-29 2004-05-25 Tokyo Electron Limited Multi-zone resistance heater
US20070247779A1 (en) * 2003-01-29 2007-10-25 Kyocera Corporation Electrostatic Chuck
US20090201622A1 (en) * 2004-03-31 2009-08-13 Applied Materials, Inc. Detachable electrostatic chuck for supporting a substrate in a process chamber
US20080230518A1 (en) * 2007-03-21 2008-09-25 Applied Materials, Inc. Gas flow diffuser
JP2011035186A (en) * 2009-08-03 2011-02-17 Tokyo Electron Ltd Coating processing device, coating processing method, program, and computer storage medium

Also Published As

Publication number Publication date
TW201330164A (en) 2013-07-16

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