JP6653814B2 - 試料回収装置、試料回収方法、及びこれらを用いた蛍光x線分析装置 - Google Patents
試料回収装置、試料回収方法、及びこれらを用いた蛍光x線分析装置 Download PDFInfo
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Description
[変形例]
レーザ、1002 移動機構、1102 基板を移動させる方向。
Claims (11)
- 表面に被測定物が存在する基板に液滴を滴下するとともに、前記滴下された液滴を前記基板表面上で移動させて、前記被測定物を前記液滴中に取り込む回収部と、
前記液滴を乾燥させ、前記被測定物を前記基板の表面上に保持させる乾燥部と、
前記被測定物にX線を照射し、前記被測定物から出射された蛍光X線に基づいて前記被測定物に含まれる元素を定量分析する分析部と、
前記被測定物を回収後前記液滴を乾燥させる前に、前記回収部から離れた前記液滴の量を検出するレーザを出射するビームセンサと、
前記ビームセンサの検出結果から前記液滴の量または前記被測定物の定量分析値を補正する補正係数を算出する演算部と、
を有することを特徴とする蛍光X線分析装置。 - 前記演算部は、前記検出結果が表す波形の形状に基づいて、前記液滴の量または前記被測定物の定量分析値を補正する補正係数を算出することを特徴とする請求項1に記載の蛍光X線分析装置。
- 前記ビームセンサは、帯状の形状であって、前記レーザの進行方向が前記基板の表面に対して平行に出射されるように、かつ、前記レーザの帯が前記基板の表面に対して垂直な方向となるように配置されることを特徴とする請求項2に記載の蛍光X線分析装置。
- 前記ビームセンサは、レーザを出射する発振器およびレーザを受光する受光器を有するビームセンサ本体と、前記ビームセンサ本体に対向する反射板と、からなる回帰反射型のビームセンサであることを特徴とする請求項3に記載の蛍光X線分析装置。
- 前記ビームセンサは、レーザを出射する発振器と、前記発振器に対向して配置され、レーザを受光する受光器と、からなる透過型のビームセンサであることを特徴とする請求項3に記載の蛍光X線分析装置。
- さらに、前記液滴が前記レーザを横切るように前記基板を移動させる移動機構を有することを特徴とする請求項1乃至5のいずれかに記載の蛍光X線分析装置。
- さらに、前記液滴にレーザを出射する際に、前記基板を水平面内で回転させる回転台を有することを特徴とする請求項1乃至6のいずれかに記載の蛍光X線分析装置。
- 前記演算部は、前記基板を前記回転台で回転させる中心から前記滴下された液滴までの距離に応じた相関関係に基づいて、前記ビームセンサの検出結果から前記液滴の量または前記被測定物の定量分析値を補正する補正係数を算出することを特徴とする請求項7に記載の蛍光X線分析装置。
- さらに、前記ビームセンサによる検出結果と、前記滴下された液滴の量に応じて設定された値と、の差分が予め設定された値より大きい場合に警告を通知する警告通知部を有することを特徴とする請求項1乃至8のいずれかに記載の蛍光X線分析装置。
- 表面に被測定物が存在する基板に液滴を滴下するとともに、前記滴下された液滴を前記基板表面上で移動させて前記被測定物を前記液滴中に取り込んだ後、前記液滴にレーザを出射するビームセンサと、
前記ビームセンサの検出結果から前記液滴の量または前記被測定物の定量分析値を補正する補正係数を算出する演算部と、
を有することを特徴とする試料回収装置。 - 表面に被測定物が存在する基板に液滴を滴下するとともに、前記滴下された液滴を前記基板表面上で移動させて前記被測定物を前記液滴中に取り込んだ後、ビームセンサが前記液滴にレーザを出射する工程と、
前記ビームセンサの検出結果から前記液滴の量または前記被測定物の定量分析値を補正する補正係数を算出する工程と、
を含むことを特徴とする試料回収方法。
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JPH10300684A (ja) * | 1997-04-28 | 1998-11-13 | Sony Corp | 基板表面の不純物を採取する装置およびその方法 |
JP3116871B2 (ja) * | 1997-09-03 | 2000-12-11 | 日本電気株式会社 | 半導体基板表面分析の前処理方法及びその装置 |
JPH11174006A (ja) * | 1997-10-08 | 1999-07-02 | Sony Corp | 不純物濃縮点の探索方法およびそれに用いる濃縮装置 |
JP3811718B2 (ja) | 2001-09-06 | 2006-08-23 | 理学電機工業株式会社 | 蛍光x線分析用試料回収装置 |
JP2004333364A (ja) * | 2003-05-09 | 2004-11-25 | Matsushita Electric Ind Co Ltd | 全反射蛍光x線分析方法および分析装置 |
RU2308024C2 (ru) * | 2003-08-01 | 2007-10-10 | Ригаку Индастриал Корпорейшн | Держатель образца для рентгеновского флуоресцентного анализа, способ рентгеновского флуоресцентного анализа и рентгеновский флуоресцентный спектрометр с использованием такого держателя |
US7732225B2 (en) * | 2006-06-29 | 2010-06-08 | Texas Instruments Incorporated | Method for measuring contamination in liquids at PPQ levels |
JP5307504B2 (ja) * | 2008-08-22 | 2013-10-02 | 株式会社日立ハイテクサイエンス | X線分析装置及びx線分析方法 |
CN114464546A (zh) * | 2015-03-12 | 2022-05-10 | 非视觉污染分析科学技术有限公司 | 基板污染物分析装置及基板污染物分析方法 |
JP6481168B2 (ja) * | 2015-04-13 | 2019-03-13 | 株式会社リガク | 蛍光x線分析システム |
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KR101921726B1 (ko) | 2019-02-13 |
US10989677B2 (en) | 2021-04-27 |
EP3418728B1 (en) | 2020-08-19 |
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