JP6652908B2 - 導電性粒子 - Google Patents
導電性粒子 Download PDFInfo
- Publication number
- JP6652908B2 JP6652908B2 JP2016227594A JP2016227594A JP6652908B2 JP 6652908 B2 JP6652908 B2 JP 6652908B2 JP 2016227594 A JP2016227594 A JP 2016227594A JP 2016227594 A JP2016227594 A JP 2016227594A JP 6652908 B2 JP6652908 B2 JP 6652908B2
- Authority
- JP
- Japan
- Prior art keywords
- conductive particles
- mass
- tin oxide
- core material
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 title claims description 143
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 62
- 229910001887 tin oxide Inorganic materials 0.000 claims description 62
- 229910000077 silane Inorganic materials 0.000 claims description 54
- -1 silane compound Chemical class 0.000 claims description 48
- 239000011162 core material Substances 0.000 claims description 46
- 229910052782 aluminium Inorganic materials 0.000 claims description 38
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 36
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 29
- 229920005989 resin Polymers 0.000 claims description 25
- 239000011347 resin Substances 0.000 claims description 25
- 239000010410 layer Substances 0.000 claims description 22
- 239000002335 surface treatment layer Substances 0.000 claims description 22
- 125000001165 hydrophobic group Chemical group 0.000 claims description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 2
- 239000000113 methacrylic resin Substances 0.000 claims description 2
- 239000002002 slurry Substances 0.000 description 21
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 20
- 238000000034 method Methods 0.000 description 20
- 239000000843 powder Substances 0.000 description 20
- 239000002243 precursor Substances 0.000 description 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 18
- 229910052731 fluorine Inorganic materials 0.000 description 18
- 239000011737 fluorine Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000002019 doping agent Substances 0.000 description 12
- 238000006386 neutralization reaction Methods 0.000 description 12
- 239000002244 precipitate Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 238000002156 mixing Methods 0.000 description 10
- 150000001282 organosilanes Chemical class 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 9
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000011268 mixed slurry Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000001186 cumulative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 125000005641 methacryl group Chemical group 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 229920002545 silicone oil Polymers 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- JGDITNMASUZKPW-UHFFFAOYSA-K aluminium trichloride hexahydrate Chemical compound O.O.O.O.O.O.Cl[Al](Cl)Cl JGDITNMASUZKPW-UHFFFAOYSA-K 0.000 description 3
- 229940009861 aluminum chloride hexahydrate Drugs 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229940079864 sodium stannate Drugs 0.000 description 3
- 150000003606 tin compounds Chemical class 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229940063656 aluminum chloride Drugs 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
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- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
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- 239000004408 titanium dioxide Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- PRKPGWQEKNEVEU-UHFFFAOYSA-N 4-methyl-n-(3-triethoxysilylpropyl)pentan-2-imine Chemical compound CCO[Si](OCC)(OCC)CCCN=C(C)CC(C)C PRKPGWQEKNEVEU-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
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- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
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- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
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- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
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- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
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- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Description
酸化スズ中にアルミニウムが含まれており、
前記表面域の表面に有機シラン化合物を含む有機表面処理層を有する、導電性粒子を提供することにより前記の課題を解決したものである。
芯材である硫酸バリウム粒子(BET比表面積26m2/g、粒径D500.12μm)150gを、水1500mlに分散させた。得られた分散スラリーを75℃まで加熱した後、25%水酸化ナトリウム水溶液を滴下して、分散スラリーのpHを12程度に調整した。次いで、スズ酸ナトリウム(Na2SnO3、純度96%)270gを水500mlに溶解してなるスズ酸ナトリウム水溶液を全量、分散スラリーに添加した。その後、分散スラリーを30分間撹拌した後、20%硫酸水溶液を90分間かけて添加してpH2.5まで中和した。中和の後、5.0gの塩化アルミニウム六水和物(塩化アルミニウム品位97%)を混合スラリーに添加し、該混合スラリーを撹拌した。拡販後のスラリーをpH2.5、75℃に保持しながら3時間熟成した。熟成後のスラリーをろ過し、固形分を水で洗浄した後、乾燥した。得られた乾燥物を、横型チューブ炉中で、2体積%H2/N2雰囲気下で500℃、2時間還元焼成して、アルミニウムがドープされた導電性酸化スズからなる表面域を芯材の表面に有する前駆体粒子を得た。
実施例1において、塩化アルミニウム六水和物の添加量を変更して、スズに対するアルミニウムの割合を表1に示すとおりとした。それ以外は実施例1と同様にして導電性粒子の粉末を得た。
実施例1において用いた芯材である硫酸バリウム粒子に代えて、二酸化ケイ素粒子(BET比表面積35m2/g、粒径D500.05μm)を用いた。それ以外は実施例1と同様にして導電性粒子の粉末を得た。
実施例2で作製した導電性粒子の粉末150gを、ハイスピードミキサ(深江パウテックLFS−2型)に投入して2500rpmにて撹拌しながら、フッ素化メタクリル酸ポリマーを含むフッ素含有エーテルの液(スリーエム社のNovec2702)225gを5分間にわたって滴下した。滴下後、引き続き5分間撹拌した。その後、150℃まで加温して、その温度で1時間にわたり熱処理を行い、目的とする導電性粒子の粉末を得た。
実施例1において、塩化アルミニウム六水和物の添加を行わず、酸化スズ中にアルミニウムを含有させなかった。それ以外は実施例1と同様にして導電性粒子の粉末を得た。
実施例1において、アルコキシシランを用いた表面処理を行わなかった。それ以外は実施例1と同様にして導電性粒子の粉末を得た。
実施例及び比較例で得られた導電性粒子について、粒子全体に対するSnO2の割合を上述の方法で測定した。また、トルエン中での分散性及び分散状態での粒径、水吸着量、初期圧粉抵抗R1、高温高湿環境下での圧粉抵抗R2、圧粉抵抗の変化率を以下の方法で測定した。それらの結果を以下の表1に示す。
1.0gの導電性粒子を10gのトルエンに添加し、100W、周波数20kHzの超音波で10分間分散させた。分散液を25℃、55%RHの環境下に静置して、導電性粒子の分散状態を以下の規準で評価した。
○:1週間以上分散状態が保たれた。
△:導電性粒子が1日以内に沈降した。
×:導電性粒子が1時間以内に沈降した。
前項の分散性の評価で用いた、調製直後の分散液中での導電性粒子について、レーザー回折散乱式粒度分布測定法による累積体積50容量%における体積累積粒径D50を測定した。
5.0gの導電性粒子を30℃、35%RHの恒温恒湿機で4時間静置させた。その後35℃、90%RHの恒温恒湿機で4時間静置させた。この前後での質量変化を測定し、以下の式から水吸着量(%)を求めた。
水吸着量(%)=(35℃、90%RHの質量Wb−30℃、35%RHの質量Wa)/30℃、35%RHの質量Wa×100
25℃、55%RHの環境下に24時間保管した後の導電性粒子の圧粉抵抗を測定した。導電性粒子を圧力49MPa(500kgf/cm2)で圧縮し、得られたサンプルについて、三菱化学社製ロレスタPAPD−41を用い、四端子法に従い圧粉抵抗を測定した。
前項で初期圧粉抵抗R1を測定した後、導電性粒子を85℃、85%RHの環境下に1日間保管した。1日経過後に前項と同様の方法で圧粉抵抗を測定した。
(R2−R1)/R1×100の算出式に従い圧粉抵抗の変化率を算出した。
フッ素樹脂層を有する導電性粒子15mgをアルミナ製のパンに入れ、セイコーインスツルメンツ社製TGDTA/Exstar6000を用いて、大気中で常温から600℃まで昇温速度10℃/minで加熱させ、600℃で10分間保持したときの質量減少を測定した。フッ素樹脂層を形成していない導電性粒子についても同様の方法で測定を行った。両者の質量差をフッ素含有樹脂の量とした。
Claims (6)
- 芯材と、該芯材の表面に位置する酸化スズ含有の表面域とを有する導電性粒子において、
酸化スズ中にアルミニウムが含まれており、
前記表面域の表面に有機シラン化合物を含む有機表面処理層を有しており、
最表面に、フッ素化メタクリル酸樹脂を含む層を有している、導電性粒子。 - スズの質量に対するアルミニウムの質量の割合が0.01質量%以上1質量%以下である請求項1に記載の導電性粒子。
- 前記有機シラン化合物が、Siに直接結合した疎水性基を有するものである請求項1又は2に記載の導電性粒子。
- 酸化スズ中に5価又はそれよりも高い価数の元素が含まれていない請求項1ないし3のいずれか一項に記載の導電性粒子。
- 前記芯材が酸化物又は硫酸塩である請求項1ないし4のいずれか一項に記載の導電性粒子。
- フッ素化メタクリル酸樹脂を含む前記層が、前記有機表面処理層の少なくとも一部を被覆しているか、前記表面域の少なくとも一部を被覆しているか、又は前記有機表面処理層及び前記表面域の双方の少なくとも一部を被覆している請求項1ないし5のいずれか一項に記載の導電性粒子。
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