JP6622616B2 - 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置 - Google Patents

着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置 Download PDF

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JP6622616B2
JP6622616B2 JP2016028135A JP2016028135A JP6622616B2 JP 6622616 B2 JP6622616 B2 JP 6622616B2 JP 2016028135 A JP2016028135 A JP 2016028135A JP 2016028135 A JP2016028135 A JP 2016028135A JP 6622616 B2 JP6622616 B2 JP 6622616B2
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group
acid
meth
compound
acrylate
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JP2017145321A (ja
Inventor
喜之 太田
喜之 太田
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Priority to JP2016028135A priority Critical patent/JP6622616B2/ja
Priority to KR1020170019483A priority patent/KR102652508B1/ko
Priority to TW106104734A priority patent/TWI774657B/zh
Priority to CN201710081040.7A priority patent/CN107092165B/zh
Publication of JP2017145321A publication Critical patent/JP2017145321A/ja
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Publication of JP6622616B2 publication Critical patent/JP6622616B2/ja
Priority to KR1020240039492A priority patent/KR20240045175A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Graft Or Block Polymers (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
JP2016028135A 2016-02-17 2016-02-17 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置 Active JP6622616B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2016028135A JP6622616B2 (ja) 2016-02-17 2016-02-17 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置
KR1020170019483A KR102652508B1 (ko) 2016-02-17 2017-02-13 착색 경화성 수지 조성물, 컬러 필터 및 그것을 포함하는 표시 장치
TW106104734A TWI774657B (zh) 2016-02-17 2017-02-14 著色硬化性樹脂組成物、彩色濾光片及含有該濾光片之顯示裝置
CN201710081040.7A CN107092165B (zh) 2016-02-17 2017-02-15 着色固化性树脂组合物、滤色器和包含该滤色器的显示装置
KR1020240039492A KR20240045175A (ko) 2016-02-17 2024-03-22 착색 경화성 수지 조성물, 컬러 필터 및 그것을 포함하는 표시 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016028135A JP6622616B2 (ja) 2016-02-17 2016-02-17 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置

Related Child Applications (1)

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JP2019210319A Division JP2020041154A (ja) 2019-11-21 2019-11-21 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む表示装置

Publications (2)

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JP2017145321A JP2017145321A (ja) 2017-08-24
JP6622616B2 true JP6622616B2 (ja) 2019-12-18

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JP (1) JP6622616B2 (zh)
KR (2) KR102652508B1 (zh)
CN (1) CN107092165B (zh)
TW (1) TWI774657B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102371945B1 (ko) * 2017-11-03 2022-03-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR102356582B1 (ko) * 2018-01-10 2022-01-27 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
JP2019137710A (ja) * 2018-02-06 2019-08-22 日立化成株式会社 硬化性樹脂組成物、画像表示装置及び画像表示装置の製造方法
JP7227738B2 (ja) * 2018-11-07 2023-02-22 サカタインクス株式会社 皮膜形成用組成物、該皮膜形成用組成物を塗工してなるガラス基材、及び、該ガラス基材を用いてなるタッチパネル
JP2021039336A (ja) * 2019-08-30 2021-03-11 住友化学株式会社 着色樹脂組成物
KR20210104956A (ko) * 2020-02-17 2021-08-26 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스를 포함하는 컬러필터 및 상기 컬러필터를 포함하는 표시장치
TWI778376B (zh) * 2020-06-20 2022-09-21 住華科技股份有限公司 著色樹脂組成物、及應用其之彩色濾光片和顯示裝置

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
JP5623818B2 (ja) * 2009-09-18 2014-11-12 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP6350335B2 (ja) * 2014-02-27 2018-07-04 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6327173B2 (ja) * 2014-02-27 2018-05-23 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6428393B2 (ja) * 2014-03-18 2018-11-28 Jsr株式会社 感放射線性組成物、硬化膜、表示素子及び着色剤分散液
JP2015232694A (ja) 2014-05-13 2015-12-24 Jsr株式会社 カラーフィルタ、表示素子、赤色画素及び緑色画素
JP6733280B2 (ja) * 2015-04-28 2020-07-29 Jsr株式会社 着色剤分散液及びその製造方法、着色組成物及びその製造方法、着色硬化膜、表示素子並びに固体撮像素子
KR101981373B1 (ko) * 2015-09-24 2019-05-22 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
JP6329599B2 (ja) * 2015-09-24 2018-05-23 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 緑色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
JP6704337B2 (ja) * 2015-12-28 2020-06-03 住友化学株式会社 着色感光性樹脂組成物、カラーフィルタ及びそれを含む表示装置
JP6969086B2 (ja) * 2015-12-28 2021-11-24 Jsr株式会社 カラーフィルタ、カラーフィルタの製造方法、表示素子および保護膜形成用樹脂組成物

Also Published As

Publication number Publication date
TW201741767A (zh) 2017-12-01
KR102652508B1 (ko) 2024-03-28
JP2017145321A (ja) 2017-08-24
CN107092165A (zh) 2017-08-25
CN107092165B (zh) 2021-06-18
TWI774657B (zh) 2022-08-21
KR20170096955A (ko) 2017-08-25
KR20240045175A (ko) 2024-04-05

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