JP6614942B2 - 溶射部材の溶射膜の再形成方法 - Google Patents
溶射部材の溶射膜の再形成方法 Download PDFInfo
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- JP6614942B2 JP6614942B2 JP2015234278A JP2015234278A JP6614942B2 JP 6614942 B2 JP6614942 B2 JP 6614942B2 JP 2015234278 A JP2015234278 A JP 2015234278A JP 2015234278 A JP2015234278 A JP 2015234278A JP 6614942 B2 JP6614942 B2 JP 6614942B2
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- 238000000034 method Methods 0.000 title description 10
- 238000002407 reforming Methods 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims description 65
- 239000000919 ceramic Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- 229910000838 Al alloy Inorganic materials 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000007598 dipping method Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 79
- 239000000243 solution Substances 0.000 description 52
- 239000007921 spray Substances 0.000 description 35
- 238000007654 immersion Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 238000003754 machining Methods 0.000 description 4
- 230000000873 masking effect Effects 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Coating By Spraying Or Casting (AREA)
Description
基体11として、アルミニウム合金(6061)からなり、直径300mm、厚さ60mmの円板状のものを用意した。そして、この基体11の上面と側周面にアルミナ(Al2O3)粉末を溶射し、厚さ250μmの溶射膜12を形成して、溶射部材10を作製した。
基体11として、アルミニウム合金(6061)からなり、直径300mm、厚さ20mmの円板状のものを用意した。そして、この基体11の上面と側周面にアルミナ(Al2O3)粉末を溶射し、厚さ350μmの溶射膜12を形成して、溶射部材10を作製した。
基体11として、実施例2と同じものを用意した。そして、この基体11の上面と側周面にアルミナ−チタニア(Al2O3−TiO2)粉末を溶射し、厚さ350μmの溶射膜12を形成して、溶射部材10を作製した。
基体11として、アルミニウム合金(SUS304)からなり、直径300mm、厚さ25mmの円板状のものを用意した。そして、この基体11の上面と側周面にアルミナ(Al2O3)粉末を溶射し、厚さ250μmの溶射膜12を形成して、溶射部材10を作製した。
溶射部材10として、実施例4と同じものを作製した。
溶射部材10として、実施例1と同じものを作製した。
溶射部材10及び剥離液21として、実施例1と同じものを作製した。ただし、剥離液21の温度は20℃とした。
溶射部材10として、実施例4と同じものを作製した。
Claims (1)
- 表面がアルミナ又はアルミナ-チタニアからなるセラミックス溶射膜で被膜されたアルミニウム合金からなる金属基体を、硝酸を含む強酸を10%以上20%以下含有する水溶液に、30℃以上50℃以下の雰囲気で、48時間以上120時間以下浸漬し、前記セラミックス溶射膜を剥離させる工程と、
前記金属基体の表面を研磨する工程と、
前記表面にセラミックス粉末を溶射して新たなセラミックス溶射膜を形成する工程とを備えることを特徴とする溶射部材の溶射膜の再形成方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2015234278A JP6614942B2 (ja) | 2015-11-30 | 2015-11-30 | 溶射部材の溶射膜の再形成方法 |
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JP2015234278A JP6614942B2 (ja) | 2015-11-30 | 2015-11-30 | 溶射部材の溶射膜の再形成方法 |
Publications (2)
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JP2017101274A JP2017101274A (ja) | 2017-06-08 |
JP6614942B2 true JP6614942B2 (ja) | 2019-12-04 |
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JP2015234278A Active JP6614942B2 (ja) | 2015-11-30 | 2015-11-30 | 溶射部材の溶射膜の再形成方法 |
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Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2971369B2 (ja) * | 1995-08-31 | 1999-11-02 | トーカロ株式会社 | 静電チャック部材およびその製造方法 |
US6379749B2 (en) * | 2000-01-20 | 2002-04-30 | General Electric Company | Method of removing ceramic coatings |
JP2003253482A (ja) * | 2002-03-01 | 2003-09-10 | Ngk Insulators Ltd | チタン系膜及びチタン酸化物の除去方法 |
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