JP6607973B2 - 有機発光表示装置 - Google Patents
有機発光表示装置 Download PDFInfo
- Publication number
- JP6607973B2 JP6607973B2 JP2018000279A JP2018000279A JP6607973B2 JP 6607973 B2 JP6607973 B2 JP 6607973B2 JP 2018000279 A JP2018000279 A JP 2018000279A JP 2018000279 A JP2018000279 A JP 2018000279A JP 6607973 B2 JP6607973 B2 JP 6607973B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- light emitting
- organic light
- organic
- inorganic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000007613 environmental effect Effects 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 42
- 239000000126 substance Substances 0.000 claims description 25
- 229910008449 SnF 2 Inorganic materials 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 16
- 238000004925 denaturation Methods 0.000 claims description 12
- 230000036425 denaturation Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 230000001681 protective effect Effects 0.000 claims description 5
- 230000009477 glass transition Effects 0.000 claims description 4
- 229920000058 polyacrylate Polymers 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000010408 film Substances 0.000 description 276
- 229910010272 inorganic material Inorganic materials 0.000 description 30
- 239000011147 inorganic material Substances 0.000 description 30
- 230000035876 healing Effects 0.000 description 23
- 238000000034 method Methods 0.000 description 19
- 239000002243 precursor Substances 0.000 description 19
- 238000005452 bending Methods 0.000 description 11
- 238000007789 sealing Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 238000002411 thermogravimetry Methods 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- -1 aluminum series nitride Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- YZYDPPZYDIRSJT-UHFFFAOYSA-K boron phosphate Chemical compound [B+3].[O-]P([O-])([O-])=O YZYDPPZYDIRSJT-UHFFFAOYSA-K 0.000 description 1
- 229910000149 boron phosphate Inorganic materials 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000011416 infrared curing Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000000869 ion-assisted deposition Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- IMKMFBIYHXBKRX-UHFFFAOYSA-M lithium;quinoline-2-carboxylate Chemical compound [Li+].C1=CC=CC2=NC(C(=O)[O-])=CC=C21 IMKMFBIYHXBKRX-UHFFFAOYSA-M 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- YUOWTJMRMWQJDA-UHFFFAOYSA-J tin(iv) fluoride Chemical compound [F-].[F-].[F-].[F-].[Sn+4] YUOWTJMRMWQJDA-UHFFFAOYSA-J 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/361—Temperature
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
4無機膜
22第2電極
24画素定義膜
51、51'環境性要素
52成膜性要素
301有機膜の上面
302有機膜の下部面
401無機膜の上面
402無機膜の下部面
t31、t32、t41、t42厚さ
Claims (14)
- 基板と、
前記基板上に位置し、第1電極、有機発光膜、および第2電極の順に積層された積層体を含む有機発光部と、
前記基板、および前記有機発光部の上側に位置し、前記有機発光部全体を覆い、硬化されたポリマーを含む有機膜と、
前記有機膜の上側に位置し、前記有機膜の上面及び側面全体を覆い、前記基板の表面上の一部に延在された無機膜を備え、
前記無機膜の上面は平坦であり、
前記無機膜が、前記有機発光部に含まれる物質のガラス転移温度よりも低い軟化温度を有する有機発光表示装置。 - 前記無機膜は、
SnO(20〜50wt%)、SnF2(30〜60wt%)、およびP2O5(10〜30wt%)からなる混合物;
SnO(20〜50wt%)、SnF2(30〜60wt%)、P2O5(10〜30wt%)、およびNbO(1〜5wt%)からなる混合物;ならびに
SnO(20〜50wt%)、SnF2(30〜60wt%)、P2O5(10−30wt%)、およびWO3(1〜5wt%)からなる混合物のいずれか一つである、請求項1に記載の有機発光表示装置。 - 前記無機膜は、少なくとも一つの環境性要素のエッジを取り囲み、かつ前記環境性要素と接する、請求項1に記載の有機発光表示装置。
- 前記無機膜と前記環境性要素との間に間隙が存在しない、請求項3に記載の有機発光表示装置。
- 前記有機膜は、前記環境性要素のエッジを取り囲み、かつ前記環境性要素と接する、請求項3に記載の有機発光表示装置。
- 前記無機膜の軟化温度は、前記有機発光膜に含まれる物質の変性温度の最小値より低い、請求項1に記載の有機発光表示装置。
- 前記無機膜は、柔軟性が与えられた後、凝固して形成された、請求項1に記載の有機発光表示装置。
- 前記有機膜の上面は平坦である、請求項1に記載の有機発光表示装置。
- 前記有機膜と前記有機発光部との間に保護膜をさらに含む、請求項1に記載の有機発光表示装置。
- 前記無機膜の下部面は、非平坦面と平坦面とを有する、請求項1に記載の有機発光表示装置。
- 前記無機膜は、SnO(42.5wt%)、SnF2(40wt%)、P2O5(15wt%)、およびWO3(2.5wt%)を含む、請求項1に記載の有機発光表示装置。
- 前記有機発光部と前記有機膜の間に第2の無機膜をさらに有する、請求項1に記載の有機発光表示装置。
- 前記変性温度の前記最小値が130〜140℃の範囲に存在する、請求項6に記載の有機発光表示装置。
- 前記有機膜が、硬化されたアクリレート系ポリマーを含む、請求項1に記載の有機発光表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120022042A KR101931177B1 (ko) | 2012-03-02 | 2012-03-02 | 유기 발광 표시 장치 |
KR10-2012-0022042 | 2012-03-02 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013036324A Division JP2013182886A (ja) | 2012-03-02 | 2013-02-26 | 有機発光表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018060813A JP2018060813A (ja) | 2018-04-12 |
JP6607973B2 true JP6607973B2 (ja) | 2019-11-20 |
Family
ID=47216156
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013036324A Pending JP2013182886A (ja) | 2012-03-02 | 2013-02-26 | 有機発光表示装置 |
JP2018000279A Active JP6607973B2 (ja) | 2012-03-02 | 2018-01-04 | 有機発光表示装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013036324A Pending JP2013182886A (ja) | 2012-03-02 | 2013-02-26 | 有機発光表示装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9054336B2 (ja) |
EP (1) | EP2634829A3 (ja) |
JP (2) | JP2013182886A (ja) |
KR (1) | KR101931177B1 (ja) |
CN (2) | CN203351601U (ja) |
TW (1) | TW201338235A (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101931177B1 (ko) * | 2012-03-02 | 2018-12-21 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
KR101473310B1 (ko) * | 2012-12-06 | 2014-12-16 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조방법 |
JP6054763B2 (ja) | 2013-02-12 | 2016-12-27 | 株式会社ジャパンディスプレイ | 有機el表示装置 |
KR20140120541A (ko) * | 2013-04-03 | 2014-10-14 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
KR102072805B1 (ko) * | 2013-04-15 | 2020-02-04 | 삼성디스플레이 주식회사 | 유기발광표시장치 및 그의 제조방법 |
KR102072806B1 (ko) * | 2013-04-18 | 2020-03-03 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치 및 이의 제조 방법 |
KR102105061B1 (ko) | 2014-01-06 | 2020-04-28 | 삼성디스플레이 주식회사 | 유기발광 표시패널 및 이의 제조방법 |
US10333103B2 (en) | 2014-11-12 | 2019-06-25 | Sharp Kabushiki Kaisha | Electroluminescent device and method for producing same |
KR102526609B1 (ko) * | 2015-07-30 | 2023-04-28 | 엘지디스플레이 주식회사 | 두루마리형 연성표시장치 |
JP2019171629A (ja) | 2018-03-27 | 2019-10-10 | 住友重機械工業株式会社 | 金型システム |
KR102645419B1 (ko) * | 2018-08-20 | 2024-03-07 | 엘지디스플레이 주식회사 | 발광 표시 장치 |
CN110350005B (zh) | 2019-06-26 | 2020-10-16 | 武汉华星光电半导体显示技术有限公司 | Oled显示面板及其制备方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3290375B2 (ja) * | 1997-05-12 | 2002-06-10 | 松下電器産業株式会社 | 有機電界発光素子 |
JP4556282B2 (ja) * | 2000-03-31 | 2010-10-06 | 株式会社デンソー | 有機el素子およびその製造方法 |
DE10222958B4 (de) | 2002-04-15 | 2007-08-16 | Schott Ag | Verfahren zur Herstellung eines organischen elektro-optischen Elements und organisches elektro-optisches Element |
US8900366B2 (en) | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
KR100942038B1 (ko) | 2002-04-15 | 2010-02-11 | 쇼오트 아게 | 유기 광전 소자 및 유기 광전 소자 제조 방법 |
US7648925B2 (en) | 2003-04-11 | 2010-01-19 | Vitex Systems, Inc. | Multilayer barrier stacks and methods of making multilayer barrier stacks |
US7510913B2 (en) * | 2003-04-11 | 2009-03-31 | Vitex Systems, Inc. | Method of making an encapsulated plasma sensitive device |
JP2004362912A (ja) * | 2003-06-04 | 2004-12-24 | Toyota Industries Corp | 有機エレクトロルミネッセンス素子及びその製造方法 |
US20080206589A1 (en) * | 2007-02-28 | 2008-08-28 | Bruce Gardiner Aitken | Low tempertature sintering using Sn2+ containing inorganic materials to hermetically seal a device |
US7722929B2 (en) * | 2005-08-18 | 2010-05-25 | Corning Incorporated | Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device |
US7829147B2 (en) | 2005-08-18 | 2010-11-09 | Corning Incorporated | Hermetically sealing a device without a heat treating step and the resulting hermetically sealed device |
US20070040501A1 (en) * | 2005-08-18 | 2007-02-22 | Aitken Bruce G | Method for inhibiting oxygen and moisture degradation of a device and the resulting device |
KR100707210B1 (ko) * | 2006-02-03 | 2007-04-13 | 삼성전자주식회사 | 유기발광 디스플레이 및 그 제조방법 |
US7615506B2 (en) * | 2006-10-06 | 2009-11-10 | Corning Incorporated | Durable tungsten-doped tin-fluorophosphate glasses |
JP4809186B2 (ja) * | 2006-10-26 | 2011-11-09 | 京セラ株式会社 | 有機elディスプレイおよびその製造方法 |
US8062085B2 (en) * | 2007-03-23 | 2011-11-22 | Canon Kabushiki Kaisha | Method of producing organic light emitting device |
JP2009037812A (ja) * | 2007-07-31 | 2009-02-19 | Sumitomo Chemical Co Ltd | 有機el装置およびその製造方法 |
JP2009076232A (ja) * | 2007-09-19 | 2009-04-09 | Fujifilm Corp | 環境感受性デバイス、環境感受性素子の封止方法 |
JP4577415B2 (ja) * | 2008-06-26 | 2010-11-10 | 富士ゼロックス株式会社 | 潤滑剤塗布装置及びこれを用いた画像形成組立体、画像形成装置 |
KR100976457B1 (ko) * | 2008-10-22 | 2010-08-17 | 삼성모바일디스플레이주식회사 | 유기전계발광표시장치 및 그 제조방법 |
KR20100107217A (ko) * | 2009-03-25 | 2010-10-05 | 주식회사 테라세미콘 | 유기전계 발광소자 및 그 제조방법 |
JP5424738B2 (ja) * | 2009-06-23 | 2014-02-26 | キヤノン株式会社 | 表示装置 |
TWI407535B (zh) * | 2009-09-15 | 2013-09-01 | Ind Tech Res Inst | 環境敏感電子元件之封裝體 |
JP5197666B2 (ja) * | 2010-03-23 | 2013-05-15 | 株式会社東芝 | 有機発光装置、照明装置、表示装置及び有機発光装置の製造方法 |
US20120028011A1 (en) * | 2010-07-27 | 2012-02-02 | Chong Pyung An | Self-passivating mechanically stable hermetic thin film |
KR101931177B1 (ko) * | 2012-03-02 | 2018-12-21 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
-
2012
- 2012-03-02 KR KR1020120022042A patent/KR101931177B1/ko active IP Right Grant
- 2012-09-06 US US13/605,974 patent/US9054336B2/en active Active
- 2012-10-23 TW TW101138985A patent/TW201338235A/zh unknown
- 2012-11-26 EP EP12194302.1A patent/EP2634829A3/en not_active Withdrawn
-
2013
- 2013-02-18 CN CN2013200753666U patent/CN203351601U/zh not_active Expired - Lifetime
- 2013-02-18 CN CN201310052148.5A patent/CN103296057B/zh active Active
- 2013-02-26 JP JP2013036324A patent/JP2013182886A/ja active Pending
-
2018
- 2018-01-04 JP JP2018000279A patent/JP6607973B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TW201338235A (zh) | 2013-09-16 |
KR20130100637A (ko) | 2013-09-11 |
CN203351601U (zh) | 2013-12-18 |
CN103296057A (zh) | 2013-09-11 |
CN103296057B (zh) | 2019-04-30 |
EP2634829A3 (en) | 2015-01-21 |
KR101931177B1 (ko) | 2018-12-21 |
US20130229107A1 (en) | 2013-09-05 |
JP2018060813A (ja) | 2018-04-12 |
US9054336B2 (en) | 2015-06-09 |
EP2634829A2 (en) | 2013-09-04 |
JP2013182886A (ja) | 2013-09-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6607973B2 (ja) | 有機発光表示装置 | |
JP6559166B2 (ja) | 有機発光装置の製造方法、無機膜転写用基板及び有機発光装置 | |
CN104347671B (zh) | 有机发光显示设备及其制造方法 | |
US9159950B2 (en) | Organic light emitting display device and method for manufacturing the same | |
KR101503401B1 (ko) | 유기 발광 장치의 제조 방법 | |
JP6216517B2 (ja) | 有機発光装置の製造方法 | |
US9054057B2 (en) | Organic light-emitting display device and method of preparing the same | |
TW201507147A (zh) | 有機發光顯示設備及其製造方法 | |
CN104112759B (zh) | 有机发光显示设备及其制造方法 | |
KR101444065B1 (ko) | 유기 발광 표시 장치 및 그 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180104 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20180810 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20181102 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20181112 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190408 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190924 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191021 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6607973 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |