JP6582349B2 - 化合物、これを含む色材組成物、およびこれを含む樹脂組成物 - Google Patents

化合物、これを含む色材組成物、およびこれを含む樹脂組成物 Download PDF

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JP6582349B2
JP6582349B2 JP2017001220A JP2017001220A JP6582349B2 JP 6582349 B2 JP6582349 B2 JP 6582349B2 JP 2017001220 A JP2017001220 A JP 2017001220A JP 2017001220 A JP2017001220 A JP 2017001220A JP 6582349 B2 JP6582349 B2 JP 6582349B2
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JP2017001220A
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JP2017122221A (ja
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パーク、ジョンホー
リー、ダミ
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エルジー・ケム・リミテッド
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Priority claimed from KR1020160002608A external-priority patent/KR102016619B1/ko
Priority claimed from KR1020160015696A external-priority patent/KR102059235B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/38—Nitrogen atoms
    • C07D215/40—Nitrogen atoms attached in position 8
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D217/00—Heterocyclic compounds containing isoquinoline or hydrogenated isoquinoline ring systems
    • C07D217/02—Heterocyclic compounds containing isoquinoline or hydrogenated isoquinoline ring systems with only hydrogen atoms or radicals containing only carbon and hydrogen atoms, directly attached to carbon atoms of the nitrogen-containing ring; Alkylene-bis-isoquinolines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Quinoline Compounds (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
  • Materials For Photolithography (AREA)
JP2017001220A 2016-01-08 2017-01-06 化合物、これを含む色材組成物、およびこれを含む樹脂組成物 Active JP6582349B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2016-0002608 2016-01-08
KR1020160002608A KR102016619B1 (ko) 2016-01-08 2016-01-08 신규한 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR1020160015696A KR102059235B1 (ko) 2016-02-11 2016-02-11 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR10-2016-0015696 2016-02-11

Publications (2)

Publication Number Publication Date
JP2017122221A JP2017122221A (ja) 2017-07-13
JP6582349B2 true JP6582349B2 (ja) 2019-10-02

Family

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JP2017001220A Active JP6582349B2 (ja) 2016-01-08 2017-01-06 化合物、これを含む色材組成物、およびこれを含む樹脂組成物

Country Status (3)

Country Link
JP (1) JP6582349B2 (zh)
CN (1) CN107033077B (zh)
TW (1) TWI647283B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI624499B (zh) * 2013-07-16 2018-05-21 東友精細化工有限公司 著色硬化性樹脂組成物
KR102410887B1 (ko) * 2018-03-15 2022-06-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상표시장치
CN111936532B (zh) * 2018-05-08 2024-03-12 株式会社艾迪科 化合物、潜伏性添加剂、组合物、固化物、固化物的制造方法及组合物的制造方法
KR102314483B1 (ko) * 2018-06-22 2021-10-19 주식회사 엘지화학 화합물, 중합체, 색재 조성물, 수지 조성물, 컬러필터 및 디스플레이 장치
KR102349707B1 (ko) * 2018-09-06 2022-01-10 주식회사 엘지화학 화합물, 착색제 조성물, 감광재, 컬러필터 및 디스플레이 장치
CN109232281B (zh) * 2018-09-25 2021-10-26 杭州盛弗泰新材料科技有限公司 一种4，4′-二[(2-羟基乙基)甲基氨基]二苯甲酮的制备方法
CN115368340B (zh) * 2021-05-20 2024-01-26 常州强力先端电子材料有限公司 肟磺酸酯光产酸剂、含其的抗蚀剂组合物、电子器件及应用
CN115368341B (zh) * 2021-05-20 2024-01-26 常州强力先端电子材料有限公司 肟磺酸酯化合物、含其的抗蚀剂组合物、电子器件及应用
CN114369112B (zh) * 2021-11-26 2024-04-09 广州大学 一种基于双给体结构的有机光学非线性发色团及其合成方法和应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010009058A (ko) * 1999-07-07 2001-02-05 성재갑 감광성 수지 조성물
EP2237785B1 (en) * 2007-12-31 2015-12-23 Emory University Triarylmethane analogs and their use in treating cancers
JP5442004B2 (ja) * 2009-04-24 2014-03-12 日本化薬株式会社 新規なトリアリールメタン化合物
JP6299329B2 (ja) * 2013-04-09 2018-03-28 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
TW201536873A (zh) * 2014-03-31 2015-10-01 Fujifilm Corp 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝影元件及圖像顯示裝置
EP3360930A1 (en) * 2014-07-04 2018-08-15 FUJIFILM Corporation Novel compound, coloring composition for dyeing or textile, ink jet ink, method of printing on fabric, and dyed or printed fabric
KR102064631B1 (ko) * 2015-06-30 2020-01-09 주식회사 엘지화학 아민계 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR101953174B1 (ko) * 2015-07-15 2019-02-28 주식회사 엘지화학 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물

Also Published As

Publication number Publication date
TW201736521A (zh) 2017-10-16
JP2017122221A (ja) 2017-07-13
TWI647283B (zh) 2019-01-11
CN107033077A (zh) 2017-08-11
CN107033077B (zh) 2022-05-24

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