JP6487937B2 - マルチカソードを有する堆積システム及びその製造方法 - Google Patents
マルチカソードを有する堆積システム及びその製造方法 Download PDFInfo
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- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 26
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- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
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- FQMNUIZEFUVPNU-UHFFFAOYSA-N cobalt iron Chemical compound [Fe].[Co].[Co] FQMNUIZEFUVPNU-UHFFFAOYSA-N 0.000 description 1
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- SHMWNGFNWYELHA-UHFFFAOYSA-N iridium manganese Chemical compound [Mn].[Ir] SHMWNGFNWYELHA-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- IGOJMROYPFZEOR-UHFFFAOYSA-N manganese platinum Chemical compound [Mn].[Pt] IGOJMROYPFZEOR-UHFFFAOYSA-N 0.000 description 1
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- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Description
本出願は、2014年3月31日出願の米国仮特許出願番号第61/973,210号の利益を主張し、その主題は参照により本明細書に組み込まれている。
Claims (12)
- チャンバの操作の方法であって、
カソードを調節することと、
前記カソードの下方のシュラウドを通して、且つ回転式シールドのシールド孔を通して、前記カソードを露出させるために前記カソードの下方の前記回転式シールドを回転させることと、
回転式ペデスタルの上側にキャリアを形成する材料を生成するため、回転式ペデスタルを回転させることであって、前記材料が前記材料の厚みの1%未満の不均一性制約を有し、且つ前記カソードが前記カソードと前記キャリアとの間で角度を有する、回転式ペデスタルを回転させることと、
前記カソードの下方且つ前記回転式シールドの上側のシュラウドを通して前記カソードを露出させることであって、前記シュラウドが、前記キャリア上に堆積されないターゲットからの前記材料の主要部分を格納するように構成されている、前記カソードを露出させることと、
を含む方法。 - 前記材料の均一性を改善するため、前記カソードの磁石と前記カソードの下方のターゲットとの間の磁石対ターゲット間隔を調節することをさらに含む、請求項1に記載の方法。
- 前記カソードを調節することが、前記カソード間の相互汚染なく、マルチカソードチャンバ内のカソードのうちの1つを調節することを含む、請求項1に記載の方法。
- 前記カソードを調節することが、前記角度を形成するために前記カソードのスィングアームを回転させることによって、前記カソードを調節することを含む、請求項1に記載の方法。
- 前記回転式シールドを回転させることが、前記カソードのカソード長よりも大きなシュラウド長を有する前記シュラウドを通して前記カソードを露出させるため、前記回転式シールドを回転させることを含む、請求項1に記載の方法。
- 前記カソード長は、前記ターゲットの表面に垂直な方向の前記カソードの長さであり、前記シュラウド長は、前記ターゲットの表面に垂直な方向の前記シュラウドの長さである、請求項5に記載の方法。
- チャンバであって、
カソードと、
前記カソードの下方のシュラウドと、
前記シュラウドを通して、且つ回転式シールドのシールド孔を通して、前記カソードを露出させるための、前記カソードの下方の回転式シールドと、
回転式ペデスタルの上側にキャリアを形成する材料を生成するための回転式ペデスタルであって、前記材料が、前記材料の厚みの1%未満の不均一性制約を有し、且つ前記カソードが、前記カソードと前記キャリアとの間で角度を有する、回転式ペデスタルと
を備え、
前記シュラウドは、前記カソードの下方且つ前記回転式シールドの上側に配置されており、前記キャリア上に堆積されない前記カソードの下方のターゲットからの前記材料の主要部分を格納するように構成されている、チャンバ。 - 前記カソードの下方のターゲットを更に備え、
前記カソードが、前記材料の均一性を改善するため、前記カソードの磁石と前記ターゲットとの間の磁石対ターゲット間隔を含む、請求項7に記載のチャンバ。 - 前記カソードが、前記カソード間の相互汚染なく、マルチカソードチャンバ内のカソードのうちの1つを含む、請求項7に記載のチャンバ。
- 前記カソードが、前記角度を形成するためのスィングアームを含む、請求項7に記載のチャンバ。
- 前記シュラウドが、前記カソードのカソード長よりも大きなシュラウド長を含む、請求項7に記載のチャンバ。
- 前記カソード長は、前記ターゲットの表面に垂直な方向の前記カソードの長さであり、前記シュラウド長は、前記ターゲットの表面に垂直な方向の前記シュラウドの長さである、請求項11に記載のチャンバ。
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US14/606,367 US11183375B2 (en) | 2014-03-31 | 2015-01-27 | Deposition system with multi-cathode and method of manufacture thereof |
PCT/US2015/023427 WO2015153509A1 (en) | 2014-03-31 | 2015-03-30 | Deposition system with multi-cathode and method of manufacture thereof |
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