JP6478261B2 - 多孔性高分子フィルムの製造方法および多孔性高分子フィルム - Google Patents

多孔性高分子フィルムの製造方法および多孔性高分子フィルム Download PDF

Info

Publication number
JP6478261B2
JP6478261B2 JP2014194358A JP2014194358A JP6478261B2 JP 6478261 B2 JP6478261 B2 JP 6478261B2 JP 2014194358 A JP2014194358 A JP 2014194358A JP 2014194358 A JP2014194358 A JP 2014194358A JP 6478261 B2 JP6478261 B2 JP 6478261B2
Authority
JP
Japan
Prior art keywords
polymer film
etching
main surface
masking layer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014194358A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016065140A (ja
Inventor
勇三 村木
勇三 村木
博 越川
博 越川
八巻 徹也
徹也 八巻
前川 康成
康成 前川
庸介 百合
庸介 百合
貴裕 湯山
貴裕 湯山
知久 石坂
知久 石坂
郁夫 石堀
郁夫 石堀
吉田 健一
健一 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY
Nitto Denko Corp
Original Assignee
NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY, Nitto Denko Corp filed Critical NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY
Priority to JP2014194358A priority Critical patent/JP6478261B2/ja
Priority to PCT/JP2015/004858 priority patent/WO2016047142A1/fr
Publication of JP2016065140A publication Critical patent/JP2016065140A/ja
Application granted granted Critical
Publication of JP6478261B2 publication Critical patent/JP6478261B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2014194358A 2014-09-24 2014-09-24 多孔性高分子フィルムの製造方法および多孔性高分子フィルム Active JP6478261B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014194358A JP6478261B2 (ja) 2014-09-24 2014-09-24 多孔性高分子フィルムの製造方法および多孔性高分子フィルム
PCT/JP2015/004858 WO2016047142A1 (fr) 2014-09-24 2015-09-24 Procédé de fabrication de film polymère poreux et film polymère poreux

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014194358A JP6478261B2 (ja) 2014-09-24 2014-09-24 多孔性高分子フィルムの製造方法および多孔性高分子フィルム

Publications (2)

Publication Number Publication Date
JP2016065140A JP2016065140A (ja) 2016-04-28
JP6478261B2 true JP6478261B2 (ja) 2019-03-06

Family

ID=55580688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014194358A Active JP6478261B2 (ja) 2014-09-24 2014-09-24 多孔性高分子フィルムの製造方法および多孔性高分子フィルム

Country Status (2)

Country Link
JP (1) JP6478261B2 (fr)
WO (1) WO2016047142A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312084A (ja) * 1988-06-09 1989-12-15 Hitachi Ltd 絶縁膜の形成方法およびそれを用いた素子構造
US5564959A (en) * 1993-09-08 1996-10-15 Silicon Video Corporation Use of charged-particle tracks in fabricating gated electron-emitting devices
WO2008063125A1 (fr) * 2006-11-20 2008-05-29 Senseair Ab Processus de traitement d'un substrat flexible à pellicule mince, sous forme d'une feuille de plastique diélectrique, et substrat à pellicule mince ainsi obtenu
JP2010283231A (ja) * 2009-06-05 2010-12-16 Sharp Corp 太陽電池モジュール及びその製造方法
JP2013001804A (ja) * 2011-06-16 2013-01-07 Mitsubishi Gas Chemical Co Inc 複数の多孔性フィルム及びその製造方法

Also Published As

Publication number Publication date
JP2016065140A (ja) 2016-04-28
WO2016047142A1 (fr) 2016-03-31

Similar Documents

Publication Publication Date Title
JP6898998B2 (ja) 電磁放射及び続くエッチングプロセスにより材料内に少なくとも1つの空隙を施すための方法
JP6044895B2 (ja) 多孔性高分子フィルムの製造方法および多孔性高分子フィルム
JP6885161B2 (ja) 貫通孔を有するガラス基板の製造方法およびガラス基板に貫通孔を形成する方法
US7419612B2 (en) Method of creating pores in a thin sheet of polyimide
JP2005175369A (ja) ドライエッチング方法及びその方法を用いて作製されたフォトニック結晶素子
KR102456079B1 (ko) 산화물 제거용 세정 조성물 및 이를 이용한 세정 방법
US20110008578A1 (en) Method for producing polymer molded body
TW201417929A (zh) 一種用以美化或標記使用之部分金屬化精密合成線織方形網織物的製造方法
US6861006B2 (en) Method for creating pores in a polymer material
JP6478261B2 (ja) 多孔性高分子フィルムの製造方法および多孔性高分子フィルム
JP5872213B2 (ja) 拡面処理された箔の製造方法
CN110244514B (zh) 一种表面具有纳米孔结构的光刻胶及其制备方法
WO2014156155A1 (fr) Procédé de fabrication d'un film polymère poreux et film polymère poreux
JP2014222689A (ja) 両面金属積層フィルムの製造方法とその製造装置、および、フレキシブル両面プリント配線基板の製造方法
TW201602732A (zh) 奈米模板遮罩及形成奈米模板遮罩的方法
JP6396737B2 (ja) 吸着用シート及び吸着ユニットへの作業対象物の吸着方法並びにセラミックコンデンサの製造方法
US10464025B2 (en) Method for producing molded filter body
JP2012048030A (ja) 基板の製造方法
JP6446218B2 (ja) 表裏で反射率が異なる光学フィルム
JPH0338228A (ja) 多孔性高分子膜及びその製造方法
Spohr Report M2. 1 Etch hints for polymers with high track-etch-rate
JP6325824B2 (ja) レジスト剥離液及びレジスト剥離方法
JP2014189654A (ja) 多孔性高分子フィルムの製造方法
JP2023080489A (ja) 表面改質方法
JP2008001965A (ja) 多孔質体の製造方法および多孔質樹脂体の製造方法

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20161130

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20161130

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170522

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20170522

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20170522

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180703

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20180829

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181031

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20190108

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20190131

R150 Certificate of patent or registration of utility model

Ref document number: 6478261

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250