JP6472447B2 - フォトマスク欠陥性における変化の監視 - Google Patents

フォトマスク欠陥性における変化の監視 Download PDF

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Publication number
JP6472447B2
JP6472447B2 JP2016531834A JP2016531834A JP6472447B2 JP 6472447 B2 JP6472447 B2 JP 6472447B2 JP 2016531834 A JP2016531834 A JP 2016531834A JP 2016531834 A JP2016531834 A JP 2016531834A JP 6472447 B2 JP6472447 B2 JP 6472447B2
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reticle
inspection
baseline
candidate
location
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Japanese (ja)
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JP2016528497A5 (enExample
JP2016528497A (ja
Inventor
チュン グアン
チュン グアン
ヤーリン シオン
ヤーリン シオン
ジョセフ ブレッカー
ジョセフ ブレッカー
ロバート エー コムストック
ロバート エー コムストック
マーク ジェイ ウィル
マーク ジェイ ウィル
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2016531834A 2013-07-29 2014-07-29 フォトマスク欠陥性における変化の監視 Active JP6472447B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361859670P 2013-07-29 2013-07-29
US61/859,670 2013-07-29
US14/278,277 2014-05-15
US14/278,277 US9518935B2 (en) 2013-07-29 2014-05-15 Monitoring changes in photomask defectivity
PCT/US2014/048720 WO2015017453A1 (en) 2013-07-29 2014-07-29 Monitoring changes in photomask defectivity

Publications (3)

Publication Number Publication Date
JP2016528497A JP2016528497A (ja) 2016-09-15
JP2016528497A5 JP2016528497A5 (enExample) 2017-09-14
JP6472447B2 true JP6472447B2 (ja) 2019-02-20

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ID=52390256

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JP2016531834A Active JP6472447B2 (ja) 2013-07-29 2014-07-29 フォトマスク欠陥性における変化の監視

Country Status (6)

Country Link
US (2) US9518935B2 (enExample)
JP (1) JP6472447B2 (enExample)
KR (1) KR102102019B1 (enExample)
CN (2) CN109659245B (enExample)
TW (1) TWI623812B (enExample)
WO (1) WO2015017453A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity
JP6668199B2 (ja) * 2016-08-19 2020-03-18 株式会社ニューフレアテクノロジー マスク検査方法
US10395358B2 (en) * 2016-11-10 2019-08-27 Kla-Tencor Corp. High sensitivity repeater defect detection
US10451563B2 (en) * 2017-02-21 2019-10-22 Kla-Tencor Corporation Inspection of photomasks by comparing two photomasks
DE102018105322A1 (de) 2018-03-08 2019-09-12 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer industriellen Maschine
US10866197B2 (en) * 2018-09-20 2020-12-15 KLA Corp. Dispositioning defects detected on extreme ultraviolet photomasks
CN112955926B (zh) * 2018-10-23 2025-07-01 Asml荷兰有限公司 用于自适应对准的方法和装置
US11499924B2 (en) 2019-06-03 2022-11-15 KLA Corp. Determining one or more characteristics of light in an optical system
US11953448B2 (en) * 2019-09-27 2024-04-09 Taiwan Semiconductor Manufacturing Company Ltd. Method for defect inspection
US11379972B2 (en) * 2020-06-03 2022-07-05 Applied Materials Israel Ltd. Detecting defects in semiconductor specimens using weak labeling
EP3945458B1 (en) * 2020-07-29 2024-04-10 Tata Consultancy Services Limited Identification of defect types in liquid pipelines for classification and computing severity thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6614520B1 (en) 1997-12-18 2003-09-02 Kla-Tencor Corporation Method for inspecting a reticle
US6516085B1 (en) * 1999-05-03 2003-02-04 Kla-Tencor Apparatus and methods for collecting global data during a reticle inspection
JP2006080437A (ja) 2004-09-13 2006-03-23 Intel Corp マスク・ブランクス検査方法及びマスク・ブランク検査ツール
JP2008020374A (ja) 2006-07-14 2008-01-31 Hitachi High-Technologies Corp 欠陥検査方法およびその装置
US7873204B2 (en) 2007-01-11 2011-01-18 Kla-Tencor Corporation Method for detecting lithographically significant defects on reticles
US7738093B2 (en) 2007-05-07 2010-06-15 Kla-Tencor Corp. Methods for detecting and classifying defects on a reticle
JP2009236697A (ja) * 2008-03-27 2009-10-15 Fujitsu Microelectronics Ltd フォトマスクの検査方法及び検査装置
JP5229575B2 (ja) 2009-05-08 2013-07-03 ソニー株式会社 画像処理装置および方法、並びにプログラム
KR20110027979A (ko) * 2009-09-11 2011-03-17 삼성모바일디스플레이주식회사 마스크 불량 검사 장치
CN102792297A (zh) * 2010-03-01 2012-11-21 日本电气株式会社 模式匹配装置、模式匹配方法和模式匹配系统
JP2011247957A (ja) 2010-05-24 2011-12-08 Toshiba Corp パターン検査方法および半導体装置の製造方法
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity

Also Published As

Publication number Publication date
TW201514616A (zh) 2015-04-16
US9518935B2 (en) 2016-12-13
CN109659245A (zh) 2019-04-19
KR102102019B1 (ko) 2020-04-17
US20170053395A1 (en) 2017-02-23
TWI623812B (zh) 2018-05-11
US9892503B2 (en) 2018-02-13
CN105531807A (zh) 2016-04-27
CN105531807B (zh) 2018-10-19
WO2015017453A1 (en) 2015-02-05
US20150029498A1 (en) 2015-01-29
JP2016528497A (ja) 2016-09-15
CN109659245B (zh) 2020-08-04
KR20160039642A (ko) 2016-04-11

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