TWI623812B - 用於檢驗一光微倍縮光罩之方法及檢驗系統 - Google Patents

用於檢驗一光微倍縮光罩之方法及檢驗系統 Download PDF

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Publication number
TWI623812B
TWI623812B TW103125901A TW103125901A TWI623812B TW I623812 B TWI623812 B TW I623812B TW 103125901 A TW103125901 A TW 103125901A TW 103125901 A TW103125901 A TW 103125901A TW I623812 B TWI623812 B TW I623812B
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TW
Taiwan
Prior art keywords
reticle
baseline
inspection
defects
candidate
Prior art date
Application number
TW103125901A
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English (en)
Chinese (zh)
Other versions
TW201514616A (zh
Inventor
官淳
熊亞霖
喬瑟夫Ｍ 布麗雀
羅伯特Ａ 康史塔克
馬克Ｊ 輝爾
Original Assignee
克萊譚克公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 克萊譚克公司 filed Critical 克萊譚克公司
Publication of TW201514616A publication Critical patent/TW201514616A/zh
Application granted granted Critical
Publication of TWI623812B publication Critical patent/TWI623812B/zh

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW103125901A 2013-07-29 2014-07-29 用於檢驗一光微倍縮光罩之方法及檢驗系統 TWI623812B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201361859670P 2013-07-29 2013-07-29
US61/859,670 2013-07-29
US14/278,277 2014-05-15
US14/278,277 US9518935B2 (en) 2013-07-29 2014-05-15 Monitoring changes in photomask defectivity

Publications (2)

Publication Number Publication Date
TW201514616A TW201514616A (zh) 2015-04-16
TWI623812B true TWI623812B (zh) 2018-05-11

Family

ID=52390256

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103125901A TWI623812B (zh) 2013-07-29 2014-07-29 用於檢驗一光微倍縮光罩之方法及檢驗系統

Country Status (6)

Country Link
US (2) US9518935B2 (enExample)
JP (1) JP6472447B2 (enExample)
KR (1) KR102102019B1 (enExample)
CN (2) CN109659245B (enExample)
TW (1) TWI623812B (enExample)
WO (1) WO2015017453A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity
JP6668199B2 (ja) * 2016-08-19 2020-03-18 株式会社ニューフレアテクノロジー マスク検査方法
US10395358B2 (en) * 2016-11-10 2019-08-27 Kla-Tencor Corp. High sensitivity repeater defect detection
US10451563B2 (en) * 2017-02-21 2019-10-22 Kla-Tencor Corporation Inspection of photomasks by comparing two photomasks
DE102018105322A1 (de) 2018-03-08 2019-09-12 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer industriellen Maschine
US10866197B2 (en) * 2018-09-20 2020-12-15 KLA Corp. Dispositioning defects detected on extreme ultraviolet photomasks
CN112955926B (zh) * 2018-10-23 2025-07-01 Asml荷兰有限公司 用于自适应对准的方法和装置
US11499924B2 (en) 2019-06-03 2022-11-15 KLA Corp. Determining one or more characteristics of light in an optical system
US11953448B2 (en) * 2019-09-27 2024-04-09 Taiwan Semiconductor Manufacturing Company Ltd. Method for defect inspection
US11379972B2 (en) * 2020-06-03 2022-07-05 Applied Materials Israel Ltd. Detecting defects in semiconductor specimens using weak labeling
EP3945458B1 (en) * 2020-07-29 2024-04-10 Tata Consultancy Services Limited Identification of defect types in liquid pipelines for classification and computing severity thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080304056A1 (en) * 2007-05-07 2008-12-11 David Alles Methods for detecting and classifying defects on a reticle
TW201044324A (en) * 2009-05-08 2010-12-16 Sony Corp Image processing device, method, and program
US20110286658A1 (en) * 2010-05-24 2011-11-24 Tadashi Mitsui Pattern inspection method and semiconductor device manufacturing method
US20120331487A1 (en) * 2010-03-01 2012-12-27 Nec Corporation Pattern matching device, pattern matching method, and pattern matching system

Family Cites Families (8)

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Publication number Priority date Publication date Assignee Title
US6614520B1 (en) 1997-12-18 2003-09-02 Kla-Tencor Corporation Method for inspecting a reticle
US6516085B1 (en) * 1999-05-03 2003-02-04 Kla-Tencor Apparatus and methods for collecting global data during a reticle inspection
JP2006080437A (ja) 2004-09-13 2006-03-23 Intel Corp マスク・ブランクス検査方法及びマスク・ブランク検査ツール
JP2008020374A (ja) 2006-07-14 2008-01-31 Hitachi High-Technologies Corp 欠陥検査方法およびその装置
US7873204B2 (en) 2007-01-11 2011-01-18 Kla-Tencor Corporation Method for detecting lithographically significant defects on reticles
JP2009236697A (ja) * 2008-03-27 2009-10-15 Fujitsu Microelectronics Ltd フォトマスクの検査方法及び検査装置
KR20110027979A (ko) * 2009-09-11 2011-03-17 삼성모바일디스플레이주식회사 마스크 불량 검사 장치
US9518935B2 (en) 2013-07-29 2016-12-13 Kla-Tencor Corporation Monitoring changes in photomask defectivity

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080304056A1 (en) * 2007-05-07 2008-12-11 David Alles Methods for detecting and classifying defects on a reticle
TW201044324A (en) * 2009-05-08 2010-12-16 Sony Corp Image processing device, method, and program
US20120331487A1 (en) * 2010-03-01 2012-12-27 Nec Corporation Pattern matching device, pattern matching method, and pattern matching system
US20110286658A1 (en) * 2010-05-24 2011-11-24 Tadashi Mitsui Pattern inspection method and semiconductor device manufacturing method

Also Published As

Publication number Publication date
TW201514616A (zh) 2015-04-16
US9518935B2 (en) 2016-12-13
CN109659245A (zh) 2019-04-19
KR102102019B1 (ko) 2020-04-17
US20170053395A1 (en) 2017-02-23
JP6472447B2 (ja) 2019-02-20
US9892503B2 (en) 2018-02-13
CN105531807A (zh) 2016-04-27
CN105531807B (zh) 2018-10-19
WO2015017453A1 (en) 2015-02-05
US20150029498A1 (en) 2015-01-29
JP2016528497A (ja) 2016-09-15
CN109659245B (zh) 2020-08-04
KR20160039642A (ko) 2016-04-11

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