JP6459170B2 - Multi-surface color filter, organic electroluminescence display device, and method for manufacturing multi-surface color filter - Google Patents

Description

  The present invention relates to a multifaceted color filter and a method for manufacturing the same, and more particularly to an organic electroluminescence display device using the multifaceted color filter.

  The organic electroluminescence display device has high visibility due to self-coloring, it is an all-solid-state display unlike a liquid crystal display device, so it has excellent impact resistance, has a fast response speed, is less affected by temperature changes, In addition, it has attracted attention because of its advantages such as a large viewing angle, and research and development and commercialization are being promoted as flat panel displays following liquid crystal display devices and plasma displays. Hereinafter, electroluminescence may be abbreviated as EL.

  There are roughly two types of organic EL display devices in full color: a separate coating method, a color conversion method, and a color filter method. The painting method is a method of arranging light emitting layers of three colors of red, green, and blue in a plane, the color conversion method is a method of combining the color conversion layers using a blue light emitting layer, and the color filter method is a white light emitting method. This is a method of combining color filters using layers. Also, in the separate coating method, a color filter may be used in combination to increase color purity.

In an organic EL display device using a color filter, a colored layer is disposed for each pixel in the color filter, a light emitting layer is disposed for each pixel in the organic EL element, and the pixel element is controlled and driven by a TFT element. In such an organic EL display device, light from a light emitting layer in a certain pixel region directly enters a colored layer in an adjacent pixel region, or passes through the colored layer in the adjacent pixel region and passes through the adjacent pixel region. Light leaks to adjacent pixels, such as entering a colored layer, and this causes a color shift of the display image depending on the viewing direction. This is because the light emitted from the organic EL element has no directivity and has a problem of poor viewing angle characteristics.
Here, in general, in a color filter, a light shielding layer is formed between colored layers in order to define pixels. Therefore, when light from the light emitting layer of a certain pixel region passes through the colored layer of that pixel region and enters the colored layer of the adjacent pixel region, it is absorbed or reflected by the light shielding layer located between the colored layers. Or, since it is absorbed when passing through the two colored layers, most of the light is absorbed without being emitted. Therefore, in particular, the fact that light from the light emitting layer in a certain pixel region directly enters the colored layer in the adjacent pixel region greatly affects the color shift of the display image.

  Further, a liquid crystal display device including a color filter has a problem that light leaks to the adjacent pixels as described above, similarly to the organic EL display device including the color filter.

  Furthermore, in recent years, along with the demand for higher definition and higher quality of displays, reduction of pixel size and reduction of line width of light shielding layers have been promoted. As a result, light leakage to the adjacent pixels as described above is likely to occur, and cannot be ignored in terms of quality.

  In Patent Document 1, in a color filter used in a liquid crystal display device, a black matrix is interposed between adjacent color filters in order to prevent color mixture due to oblique light, and the height is higher than that of the color filter. It has been proposed to form such that. Here, the black matrix generally has a sufficient light shielding property and is formed by a photolithography method. However, in the case of a black matrix whose height is higher than that of a color filter, it has a light shielding property and the film thickness is thick, so that exposure light cannot reach the deep part of the film, and patterning is very difficult. It is difficult to.

JP 2010-72513 A

  As a result of intensive studies to solve the above problems, the present inventors formed two light-shielding layers in a color filter used in an organic EL display device as described in Japanese Patent Application No. 2012-284636. It has been found that light leakage to adjacent pixels can be suppressed by providing the first light-shielding layer on the material and the second light-shielding layer on the colored layer.

  Here, in the color filter, the light shielding layer is generally formed in a pattern by a photolithography method as described above, and an alignment mark for alignment is provided on the substrate in the process of manufacturing the color filter. When the two light shielding layers are formed as described above, when the second light shielding layer is formed into a pattern by a photolithography method, an alignment mark is used to align the first light shielding layer and the second light shielding layer. Need to recognize. However, since the light-shielding layer usually has sufficient light-shielding properties, in the above case, the alignment mark located below the second light-shielding layer cannot be recognized, and the first light-shielding layer is not recognized. Alignment cannot be performed.

  In order to make the alignment mark easy to recognize, it is conceivable to increase the transmittance of the second light-shielding layer, but in this case, the light-shielding property of the second light-shielding layer is deteriorated and light leakage to adjacent pixels is suppressed. Will be less effective.

  The present invention has been made in view of the above problems, and can provide a multifaceted color filter that can suppress light leakage to adjacent pixels and can appropriately perform alignment of two light shielding layers. The main object is to provide a method for manufacturing an organic EL display device and a multi-faceted color filter.

  In order to solve the above problems, the present invention provides a transparent substrate, a first light shielding layer and an alignment mark formed in a pattern on the transparent substrate, and the transparent substrate on which the first light shielding layer is formed. A plurality of colored layers formed, a high transmittance layer formed at least around the alignment mark and having a higher transmittance than the alignment mark, a pattern formed on the colored layer, and the first light shielding layer A multi-sided color filter comprising a second light-shielding layer disposed on the layer.

  According to the present invention, since the first light-shielding layer and the second light-shielding layer are formed, when used in an organic EL display device or a liquid crystal display device, a color shift of a display image due to light leakage to adjacent pixels is prevented. It is possible to suppress. According to the present invention, since the high transmittance layer is formed at least around the alignment mark, when the second light shielding layer composition is applied to the entire surface of the transparent substrate, it is located on the colored layer. While securing the film thickness of the coating film for the second light-shielding layer, the film thickness of the coating film for the second light-shielding layer positioned on the high transmittance layer can be reduced to increase the transmittance. it can. Therefore, it becomes possible to detect the alignment mark located under the coating film of the composition for 2nd light shielding layers. Therefore, it is possible to ensure the light shielding property of the second light shielding layer and to accurately align the first light shielding layer and the second light shielding layer.

  In the said invention, it is preferable that the said high transmittance layer is comprised from the same material as the arbitrary layers currently formed between the said 1st light shielding layer and the said 2nd light shielding layer. This is because a high transmittance layer and an arbitrary layer can be formed at a time, and a high transmittance layer can be formed without increasing the number of steps.

  According to another aspect of the present invention, there is provided an organic EL display device comprising: a color filter obtained by cutting the multi-faced color filter described above; and an organic EL element substrate having an organic EL element formed on a support substrate. provide.

  According to the present invention, it is possible to suppress a color shift of a display image due to light leakage to an adjacent pixel by having a color filter in which the above-described multi-surface color filter is cut.

  The present invention also provides a first light-shielding layer forming step of forming a patterned first light-shielding layer and an alignment mark on the transparent substrate, and a plurality of colors on the transparent substrate on which the first light-shielding layer and the alignment mark are formed. A colored layer forming step for forming the colored layer, a high transmittance layer forming step for forming a high transmittance layer having a higher transmittance than the alignment mark at least around the alignment mark, the colored layer and the high The second light-shielding layer composition is applied to the entire surface of the transparent substrate on which the transmittance layer is formed to form a coating film of the second light-shielding layer composition, and the alignment mark is used for the second light-shielding layer. There is provided a method for producing a multifaceted color filter, comprising: patterning a coating film of the composition; and a second light shielding layer forming step of disposing a second light shielding layer on the first light shielding layer.

  According to the present invention, by forming the high transmittance layer at least around the alignment mark before the second light shielding layer forming step, in the second light shielding layer forming step, for the second light shielding layer located on the colored layer. The film thickness of the coating film of the composition for 2nd light shielding layers located on a high transmittance layer can be made thin, and the transmittance | permeability can be made high, ensuring the film thickness of the coating film of a composition. Therefore, the alignment mark located under the coating film of the 2nd light shielding layer composition is detectable. Therefore, it is possible to ensure the light shielding property of the second light shielding layer and to accurately align the first light shielding layer and the second light shielding layer. Further, according to the present invention, by forming the first light shielding layer and the second light shielding layer, when used in an organic EL display device or a liquid crystal display device, color shift of a display image due to light leakage to adjacent pixels is suppressed. Is possible.

  In the said invention, it is preferable to form the said high transmittance layer simultaneously with the arbitrary layers formed between the said 1st light shielding layer formation process and the said 2nd light shielding layer formation process. This is because a high transmittance layer and an arbitrary layer can be formed at a time, and a high transmittance layer can be formed without increasing the number of steps.

  In the present invention, it is possible to suppress a color shift of a display image due to light leakage to an adjacent pixel, and to achieve an effect that the first light shielding layer and the second light shielding layer can be accurately aligned.

It is a schematic sectional drawing which shows an example of the multi-faced color filter of this invention. It is a schematic sectional drawing which shows an example of the organic electroluminescent display apparatus of this invention. It is process drawing which shows an example of the manufacturing method of the multi-faced color filter of this invention. It is a schematic plan view which shows an example of arrangement | positioning of the pixel in the multi-faced color filter of this invention. It is the schematic plan view and sectional drawing which show an example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is the schematic plan view and sectional drawing which show the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is the schematic plan view and sectional drawing which show the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is a schematic plan view which shows the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is a schematic plan view which shows the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is a schematic plan view which shows the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is the schematic plan view and sectional drawing which show the other example of the alignment mark and high transmittance layer in the multi-faced color filter of this invention. It is a schematic sectional drawing which shows the other example of the multi-faced color filter of this invention. It is a schematic sectional drawing which shows the other example of the multi-faced color filter of this invention. It is a schematic sectional drawing which shows the other example of the multi-faced color filter of this invention. It is a graph which shows the relationship between the transmittance | permeability of the light absorption layer in the multi-faced color filter of this invention, and the transmittance | permeability of the external light which passed the light absorption layer twice. It is a graph which shows an example of the transmittance | permeability characteristic of the light absorption layer in the multi-faced color filter of this invention. It is a schematic sectional drawing which shows an example of the conventional organic EL display apparatus.

  Hereinafter, the multi-sided color filter, organic EL display device, and multi-sided color filter manufacturing method of the present invention will be described in detail.

A. Multi-sided color filter The multi-sided color filter of the present invention includes a transparent substrate, a first light-shielding layer and an alignment mark formed in a pattern on the transparent substrate, and the transparent substrate on which the first light-shielding layer is formed. A plurality of colored layers formed at least around the alignment mark, a high transmittance layer having a higher transmittance than the alignment mark, and a pattern formed on the colored layer; And a second light shielding layer disposed on the light shielding layer.

Here, “around the alignment mark” differs depending on the shape of the alignment mark and is appropriately set. Details will be described later.
In addition, the “second light shielding layer disposed on the first light shielding layer” means that the first light shielding layer and the second light shielding layer are disposed so as to overlap in plan view.

The multi-sided color filter of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic cross-sectional view showing an example of the multi-faced color filter of the present invention. As illustrated in FIG. 1, the multifaceted color filter 1 </ b> A is formed in a pattern on the transparent substrate 2, on the transparent substrate 2, in a pattern on the transparent substrate 2. The formed alignment mark 4 and the first light shielding layer 3 are formed so as to cover the colored layer 5 in which the red colored layer 5R, the green colored layer 5G and the blue colored layer 5B are arranged, and the alignment mark 4 are covered. The formed high transmittance layer 6 and the second light shielding layer 7 formed on the colored layer 5 in a pattern and disposed on the first light shielding layer 3 are provided.

  FIG. 2 is a schematic cross-sectional view showing an example of an organic EL display device having a color filter obtained by cutting the multi-sided color filter of the present invention. As illustrated in FIG. 2, in the organic EL display device 20, a resin 19 is filled between the organic EL element substrate 11 and the color filter 1 </ b> B. The color filter 1B is obtained by cutting the multi-surface color filter 1A shown in FIG. In the organic EL element substrate 11, an organic EL element 13 is formed on a support substrate 12. In the organic EL element 13, an organic EL layer 16 including a back electrode layer 14 and a light emitting layer and a transparent electrode layer are formed on the support substrate 12. 17 are sequentially stacked, and an insulating layer 15 is formed between the back electrode layer 14 and the organic EL layer 16.

Here, the “pixel” is a minimum unit constituting an image. For example, when one pixel is composed of three subpixels of red, green, and blue, in the present invention, one subpixel is referred to as a pixel. Specifically, as shown in FIG. 2, the organic EL display device 20 includes a colored layer 5 including a red colored layer 5R, a green colored layer 5G, and a blue colored layer 5B. It has a plurality of defined pixels P.
“Pixel area” refers to an area in which one pixel is arranged. For example, when one pixel is composed of three subpixels of red, green, and blue, a region where one subpixel is arranged is referred to as a pixel region. Specifically, as shown in FIG. 1, the multifaceted color filter 1 </ b> A has a colored layer 5 composed of a red colored layer 5 </ b> R, a green colored layer 5 </ b> G, and a blue colored layer 5 </ b> B. A plurality of pixel regions 10 in which defined pixels are arranged are provided.

  In the multi-sided color filter of the present invention, since the first light shielding layer and the second light shielding layer are formed, it is possible to suppress the color shift of the display image due to light leakage to the adjacent pixels. The reason for this will be briefly described.

First, as illustrated in FIG. 17, in the case of the organic EL display device 100 using the conventional color filter 101, most of the light from the organic EL element 13 in the pixel region 10a is in the pixel region 10a like the light ray L11. The light is emitted through the red colored layer 5R. On the other hand, a part of the light passes through the red colored layer 5R in the pixel region 10a like the light ray L14, further passes through the green colored layer 5G in the adjacent pixel region 10b, and enters the light shielding layer 103. A part of the light passes through the red colored layer 5R of the pixel region 10a like the light ray L13, and enters and exits the green colored layer 5G of the adjacent pixel region 10b. Further, a part of the light is directly incident on the green colored layer 5G in the adjacent pixel region 10b as the light beam L12 and is emitted.
The light beam L14 is absorbed because it enters the light shielding layer 103. Since the light ray L13 is transmitted through the red colored layer 5R and the green colored layer 5G, most of the light L13 is absorbed from the transmittance characteristics of the red colored layer 5R and the green colored layer 5G. On the other hand, since the light ray L12 passes through only the green colored layer 5G, light that should not be emitted is emitted with the transmittance characteristics of the green colored layer 5G. For this reason, the color shift of the display image has occurred particularly when viewed from an oblique direction due to such a light ray L12.

  On the other hand, as illustrated in FIG. 2, in the organic EL display device 20 having the color filter from which the multifaceted color filter 1 </ b> A of the present invention is cut, the light beam L <b> 2 corresponding to the light beam L <b> 12 shown in FIG. The light shielding layer 7 absorbs the light beam L3 corresponding to the light beam L13 shown in FIG. For this reason, the color shift of the display image when viewed from an oblique direction can be suppressed, and the viewing angle characteristics can be improved. In FIG. 2, light rays L1 and L4 correspond to the light rays L11 and L14 shown in FIG.

  Although FIG. 2 shows an example in which the multifaceted color filter of the present invention is used in an organic EL display device, the same effect can be obtained even when it is used in a liquid crystal display device.

  In addition, the multi-faced color filter of the present invention has an alignment mark when patterning the second light-shielding layer in the manufacturing process of the multi-faced color filter of the present invention because the high transmittance layer is formed at least around the arament mark. Can be detected. The reason for this will be briefly described.

3A to 3E are process diagrams showing an example of a method for producing a multi-faced color filter of the present invention. 3, the red colored layer 5R, the green colored layer 5G, the blue colored layer 5B, and the white layer 5W are arranged as illustrated in FIG. 4, and red, green, blue, FIG. 3 shows an example of a method for manufacturing a multi-faced color filter in which one pixel is composed of four white sub-pixels, and FIG. 3 corresponds to a cross section taken along line AA of FIG. Since details are described in the section “C. Manufacturing method of multi-faceted color filter”, description thereof is omitted here.
In the present invention, before the second light shielding layer 7 is formed, the high transmittance layer 6 is formed at least around the alignment mark 4 as illustrated in FIG. In this example, the white layer 5W and the high transmittance layer 6 are collectively formed. Next, as illustrated in FIG. 3D, the second light shielding layer composition is applied to the entire surface of the transparent substrate 2 to form a coating film 7 a of the second light shielding composition.
At this time, since the high transmittance layer 6 is formed, the second light shielding layer composition flows down from the high transmittance layer 6, so that the second light shielding layer composition positioned on the high transmittance layer 6 The film thickness d1 of the coating film 7a can be made thinner than the film thickness d2 of the coating film 7a of the second light-shielding layer composition in the region where the high transmittance layer 6 is not formed. Therefore, the transmittance of the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6 is such that the transmittance of the coating film 7a of the second light shielding layer composition in the region where the high transmittance layer 6 is not formed. Since it becomes higher than the transmittance, the alignment mark 4 can be detected. Therefore, when the coating film 7a of the second light shielding layer composition is patterned, the alignment mark is arranged in order to dispose the second light shielding layer 7 on the first light shielding layer 3 as illustrated in FIG. 4 can be used for alignment.
On the other hand, as shown in FIG. 3D, the film thickness d3 of the coating layer 7a of the composition for the second light shielding layer located on the colored layer such as the red colored layer 5R and the white layer 5W has sufficient light shielding properties. It can be ensured to the extent that it is obtained. Therefore, since the high transmittance layer is formed around the alignment mark, the alignment mark can be easily detected without sacrificing the light shielding property of the second light shielding layer.
Therefore, in the present invention, the light shielding property of the second light shielding layer can be ensured, and the first light shielding layer and the second light shielding layer can be accurately aligned, the positional deviation can be suppressed, and the aperture ratio due to the positional deviation can be reduced. The decrease can be suppressed.

  Hereinafter, each configuration in the multi-surface color filter of the present invention will be described.

1. High transmittance layer The high transmittance layer in the present invention is formed at least around the alignment mark and has a higher transmittance than the alignment mark.

  Here, “around the alignment mark” differs depending on the shape of the alignment mark and is appropriately set.

For example, when the alignment mark 4 has a cross shape as shown in FIGS. 5 to 7, “around the alignment mark” means “around the intersection of the crosses”. In this case, it is sufficient that the high transmittance layer 6 is formed at least around the intersection of the cross, and the high transmittance layer 6 is formed so as to cover the cross-shaped alignment mark 4 as illustrated in FIGS. As illustrated in FIG. 7, the high transmittance layer 6 may not be formed on the alignment mark 4 but may be formed only around the alignment mark 4.
Specifically, in the case where the high transmittance layer is formed so as to cover the cross-shaped alignment mark, the high transmittance layer may be formed at least around the intersection of the cross, as shown in FIG. The high transmittance layer 6 may be formed so as to cover the entire alignment mark 4 as illustrated in FIG. 5, and the high transmittance layer 6 covers the upper surface of the alignment mark 4 as illustrated in FIG. A part of the side surface of the alignment mark 4 may be exposed, and the high transmittance layer 6 covers a part of the upper surface of the alignment mark 4 as illustrated in FIG. It may be formed so that a part of the side surface and the upper surface is exposed.
When the high transmittance layer is formed only around the cross-shaped alignment mark, the high transmittance layer may be formed at least around the intersection of the cross, as illustrated in FIG. Thus, the high transmittance layer 6 may be formed in a range larger than the alignment mark 4, and the high transmittance layer 6 is formed in the same range as the alignment mark 4 as illustrated in FIG. The high transmittance layer 6 may be formed in a range smaller than the alignment mark 4 as illustrated in FIG.
5B, 5E, and 5H are cross-sectional views taken along line BB in FIGS. 5A, 5D, and 5G, respectively, and FIGS. 6B, 6E, and 6H. ) Is a cross-sectional view taken along line BB in FIGS. 6A, 6D, and 6G, and FIGS. 7B, 7E, and 7H are FIGS. 7A, 7D, and 7H, respectively. It is a BB line sectional view of g).

  Further, for example, although not shown, when the alignment mark has a cross (X) mark shape, “around the alignment mark” means “around the intersection of x”. In this case, the high transmittance layer only needs to be formed around the intersection of at least x. Although not shown, the high transmittance layer may be formed so as to cover the x-shaped alignment mark. The layer may not be formed on the alignment mark but may be formed only around the alignment mark. Specifically, it can be the same as in the case of the cross shape.

  Further, for example, as shown in FIG. 8, when the alignment mark 4 has a dot shape such as a circular shape, a square shape, or a triangular shape, “around the alignment mark” means “around the dots such as a circle, square, triangle”. Point to. In this case, it is sufficient that the high transmittance layer 6 is formed at least around a circle, square, triangle, or the like dot, and the high transmittance layer 6 is formed as an alignment mark as illustrated in FIGS. 4, and the high transmittance layer 6 is not formed on the alignment mark 4 as illustrated in FIGS. 8D to 8F, and is formed around the alignment mark 4. It may be formed only.

  For example, as shown in FIG. 9, when the alignment mark 4 is a double circle shape, a double square shape, or a hollow square shape, “around the alignment mark” means “around each circle of the double circle”. "" Surrounding each square of double squares "" Surrounding squares ". In this case, the high transmittance layer 6 may be formed at least around each circle of a double circle, around each square of a double square, or around a square, as illustrated in FIGS. 9A to 9C. Thus, the high transmittance layer 6 may be formed so as to cover the alignment mark 4, and the high transmittance layer 6 is formed on the alignment mark 4 as illustrated in FIGS. 9D to 9F. However, it may be formed only around the alignment mark 4.

Further, for example, as shown in FIG. 10, when the alignment mark 4 is shaped like a well, “around the alignment mark” means “around the four intersections of the well”. In this case, it is sufficient that the high transmittance layer 6 is formed around at least four intersections of the well shape. As illustrated in FIGS. 10A to 10C, the high transmittance layer 6 is formed in the well shape. The alignment mark 4 may be formed so as to cover the alignment mark 4, and the high transmittance layer 6 is not formed on the alignment mark 4 as illustrated in FIGS. It may be formed only around 4.
Specifically, when the high-transmittance layer is formed so as to cover the well-shaped alignment mark, it is sufficient that the high-transmittance layer is formed at least around four intersections of the well-shaped. The high transmittance layer 6 may be formed so as to cover the entire alignment mark 4 as illustrated in FIG. 10A, and the high transmittance layer 6 is formed as the alignment mark as illustrated in FIG. 4 may be formed so that a part of the side surface of the alignment mark 4 is exposed, and the high transmittance layer 6 is a part of the upper surface of the alignment mark 4 as illustrated in FIG. , And a part of the side surface and the upper surface of the alignment mark 4 may be exposed.
Further, when the high transmittance layer is formed only around the well-shaped alignment mark, the high transmittance layer may be formed at least around the four intersections of the well shape. The high transmittance layer 6 may be formed in a larger range than the alignment mark 4 as illustrated in FIG. 10D, and the high transmittance layer 6 and the alignment mark 4 are illustrated as illustrated in FIG. It may be formed in a similar range, or the high transmittance layer 6 may be formed in a range smaller than the alignment mark 4 as illustrated in FIG.

As for the arrangement of the high transmittance layer, it is sufficient that the high transmittance layer is formed at least around the alignment mark, and is appropriately selected according to the shape of the alignment mark, and covers the alignment mark as described above. It may be formed like this, and may be formed only around the alignment mark.
When the high transmittance layer is formed only around the alignment mark, the high transmittance layer 6 is preferably formed in contact with the alignment mark 4 as illustrated in FIG. As illustrated in FIGS. 7C, 7 </ b> F, and 7 </ b> I, the film thickness d <b> 1 of the coating film 7 a of the second light-shielding layer composition located on the high-transmittance layer 6 becomes thin, and the transmittance By increasing the height, a difference in the amount of transmitted light occurs at the boundary portion between the alignment mark 4 and the high transmittance layer 6, so that the alignment mark 4 can be easily detected. In the case where the high transmittance layer is formed only around the alignment mark, in order to arrange the high transmittance layer so as to contact the alignment mark, the high transmittance layer is overlapped with a part of the alignment mark. It may be formed.

For example, when the high transmittance layer 6 is formed so as to cover the alignment mark 4 as shown in FIGS. 5, 6, 8 (a) to 8 (c) and FIGS. 9 (a) to 9 (c). 5 (c), (f), (i), FIG. 6 (c), (f), (i), the application of the second light shielding layer composition positioned on the high transmittance layer 6 The film thickness d1 of the film 7a is thinner than the film thickness d2 of the coating film 7a of the second light-shielding layer composition in the region where the high transmittance layer 6 is not formed, and the film 7a is located on the high transmittance layer 6. 2 The transmittance of the coating film 7a of the light shielding layer composition is higher than the transmittance of the coating film 7a of the second light shielding layer composition in the region where the high transmittance layer 6 is not formed. Therefore, it becomes easy to detect the alignment mark 4.
For example, in FIG. 5 (i), the high transmittance layer 6 is formed so that a part of the alignment mark 4 is exposed, and even on the alignment mark 4, the second light shielding layer composition is applied. There is a portion where the film 7a is not thin. However, when the alignment mark 4 has a cross shape, alignment is possible if the cross point of the cross can be detected. Therefore, even in such a case, the alignment of the first light shielding layer and the second light shielding layer can be performed using the alignment mark.

For example, as shown in FIGS. 7, 8 (d) to (f), and FIGS. 9 (d) to (f), when the high transmittance layer 6 is formed only around the alignment mark 4, As shown in FIGS. 7 (c), (f), and (i), the film thickness d1 of the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6 is such that the high transmittance layer 6 and the alignment are aligned. The thickness of the coating film 7a of the second light-shielding layer composition in the region where the mark 4 is not formed is thinner than the thickness d2 of the coating film 7a of the second light-shielding layer composition and is located on the high transmittance layer 6. The transmittance is higher than the transmittance of the coating film 7a of the second light shielding layer composition in the region where the high transmittance layer 6 and the alignment mark 4 are not formed. In this case, the film thickness of the coating film 7a of the second light shielding layer composition located on the alignment mark 4 is the film thickness d1 of the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6. It is thicker than. However, the film thickness d1 of the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6 is thin, and the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6 is thin. If the transmittance is high, the amount of transmitted light is different at the boundary portion between the alignment mark 4 and the high transmittance layer 6. Therefore, it becomes easy to detect the alignment mark 4.
For example, in FIG. 7 (i), the high transmittance layer 6 is formed in a range smaller than the alignment mark 4, and although not shown, the second light-shielding layer composition is applied even on the alignment mark 4. There is a portion where the film 7a is not thin. However, when the alignment mark 4 has a cross shape, alignment is possible if the cross point of the cross can be detected. Therefore, even in such a case, the alignment of the first light shielding layer and the second light shielding layer can be performed using the alignment mark.

  5 (c), (f), and (i) are cross-sectional views taken along line BB in FIGS. 5 (a), (d), and (g), and FIGS. 6 (c), (f), and (i), respectively. ) Is a cross-sectional view taken along the line BB in FIGS. 6A, 6D, and 6G, and FIGS. 7C, 7F, and 7I are respectively FIGS. 7A, 7D, and 7G. It corresponds to a cross-sectional view taken along line B-B in g), and shows a case where a coating film of the second light shielding layer composition is formed by applying the second light shielding layer composition on the entire surface of the transparent substrate.

  The transmittance of the high transmittance layer is not particularly limited as long as it is higher than the transmittance of the alignment mark and can detect the alignment mark during patterning of the colored layer or the second light shielding layer. It adjusts suitably according to the film thickness and material of a layer. Specifically, when the film thickness of the high transmittance layer is 2.0 μm or more, the average transmittance in the visible light region of the high transmittance layer is preferably 70% or more, and in particular, 80% to 99%. It is preferable to be within the range. In addition, when the film thickness of the high transmittance layer is 2.0 μm or less, the average transmittance in the visible light region of the high transmittance layer is preferably 80% or more, and particularly within the range of 80% to 99%. It is preferable that If the average transmittance of the high transmittance layer is too low, it is difficult to detect alignment marks when patterning the second light shielding layer, and it is difficult to perform alignment.

Here, the “visible light region” refers to a wavelength range of 400 nm to 700 nm.
As a method for measuring the transmittance, a method of measuring the transmittance of the high transmittance layer using the transmittance of the sample substrate (transparent substrate) as a reference (100%) can be employed. As the device, an ultraviolet / visible spectrophotometer (for example, Hitachi U-4000) or a device having a photodiode array as a detector (for example, Otsuka Electronics MCPD) can be used. The average transmittance in the visible light region is a value obtained by averaging the transmittance in a wavelength range of 400 nm to 700 nm.

  The high-transmittance layer is not particularly limited as long as it satisfies the above-described transmittance. Among them, the same layer as the arbitrary layer formed between the first light-shielding layer and the second light-shielding layer is used. It is preferable that it is made of a material. Specifically, the high transmittance layer is preferably made of the same material as the colored layer, the white layer, the protective layer, or the like. This is because these layers and the high transmittance layer can be formed at a time, and the high transmittance layer can be formed without increasing the number of steps. In particular, as illustrated in FIG. 4, a red coloring layer 5R, a green coloring layer 5G, a blue coloring layer 5B, and a white layer 5W are arranged, and one sub-pixel of four sub-pixels of red, green, blue, and white. When the pixel is configured, the high transmittance layer is preferably made of the same material as the white layer. This is because the white layer has a higher transmittance than the colored layer.

As the shape of the high transmittance layer, as illustrated in FIG. 3D, the second light-shielding layer composition was applied to the entire surface of the transparent substrate 2 to form the second light-shielding layer composition coating 7a. At this time, the shape is not particularly limited as long as the film thickness d1 of the coating film 7a of the second light-shielding layer composition located on the high transmittance layer 6 can be reduced. Are appropriately selected. The shape of the high transmittance layer can be any shape such as a square shape, a circular shape, or a cross shape. Moreover, the shape of the high transmittance layer may be the same as or different from the shape of the alignment mark.
For example, in FIGS. 5 (c), (f), (i), FIGS. 6 (c), (f), (i), and FIGS. 7 (c), (f), (i), a high transmittance layer is used. Whatever shape 6 is, the film thickness d1 of the coating film 7a of the composition for the second light-shielding layer located on the high transmittance layer 6 is thin.

As the size of the high transmittance layer, as illustrated in FIG. 3D, the second light shielding layer composition is applied to the entire surface of the transparent substrate 2 to form the second light shielding layer composition coating 7a. The thickness of the coating film 7a of the second light shielding layer composition positioned on the high transmittance layer 6 is not particularly limited as long as the film thickness d1 can be reduced. It is appropriately selected depending on. The high transmittance layer may be formed in a range larger than the alignment mark, may be formed in the same range as the alignment mark, or may be formed in a range smaller than the alignment mark.
For example, in FIGS. 5 (c), (f), (i), FIGS. 6 (c), (f), (i), and FIGS. 7 (c), (f), (i), a high transmittance layer is used. Regardless of the size of 6, the film thickness d 1 of the coating film 7 a of the second light shielding layer composition located on the high transmittance layer 6 is thin.
Among these, it is preferable that the size of the high transmittance layer is small. The smaller the size of the high transmittance layer, the easier it is for the second light shielding layer composition to flow down from the high transmittance layer when the second light shielding layer composition is applied to the entire surface of the transparent substrate. It is because the coating film of the composition for 2nd light shielding layers located in can be made thin.

  The high transmittance layer may be a single layer or a laminate of a plurality of layers. For example, as shown in FIG. 11, when the high transmittance layer 6 is formed by laminating the first high transmittance layer 6a and the second high transmittance layer 6b, the entire thickness of the high transmittance layer 6 is increased. can do. Thereby, when the composition for 2nd light shielding layers is apply | coated to the whole surface of a transparent substrate, the composition for 2nd light shielding layers can be made easy to flow down from on a high transmittance layer, and the 2nd light shielding layer composition located on a high transmittance layer can be made. 2 The coating film of the composition for light shielding layers can be made thin.

  As the film thickness of the high transmittance layer, a high transmittance layer satisfying the above-described transmittance can be obtained. As illustrated in FIG. 3D, the second light-shielding layer composition is applied to the entire surface of the transparent substrate 2. When the coating film 7a of the second light shielding layer composition is formed by coating, the film thickness d1 of the coating film 7a of the second light shielding layer composition positioned on the high transmittance layer 6 can be reduced. There is no particular limitation as long as the film thickness is large. When the high transmittance layer is made of the same material as the colored layer, the white layer or the protective layer as described above, the thickness of the high transmittance layer is the same as the thickness of these layers.

  The method for forming the high transmittance layer is not particularly limited as long as the method can form the high transmittance layer in a pattern on the transparent substrate. When the high transmittance layer is composed of the same material as the colored layer, the white layer, or the protective layer as described above, the method for forming the high transmittance layer is the same as the method for forming these layers.

2. Alignment Mark The alignment mark in the present invention is formed in a pattern on a transparent substrate.

  As the shape of the alignment mark, a general alignment mark shape can be employed. For example, a cross shape, a cross (X) shape, a square shape, a well shape, a circular shape, a square shape, a triangular shape, etc. The shape may be any shape such as a dot shape such as a shape, a double round shape, a double square shape, or a hollow square shape.

The transmittance of the alignment mark is not particularly limited as long as it is lower than the transmittance of the high transmittance layer and can detect the alignment mark when patterning the colored layer or the second light shielding layer. The average transmittance in the visible light region is preferably 5% or less, and more preferably 1% or less. If the average transmittance of the alignment mark is too high, it is difficult to detect the alignment mark when patterning the colored layer or the second light shielding layer, and it is difficult to perform alignment.
The method for measuring the average transmittance in the visible light region is the same as the method described above.

The optical density of the alignment mark is not limited as long as the alignment mark can be detected at the time of patterning the colored layer and the second light shielding layer, but is preferably 2.0 or more, more preferably 4.0 or more.
Here, for example, the optical density can be measured by a spectrocolorimeter, and the optical density can be calculated from the Y value of the spectrum. As the spectrocolorimeter, a spectrocolorimeter manufactured by OLYMPUS Co., Ltd. can be used.

As the alignment mark, for example, a black resin dispersed in a binder resin is used.
Examples of the black color material include carbon black and titanium black.
The binder resin is appropriately selected according to the method for forming the arament mark. In the case of the photolithography method, as the binder resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used. In the case of a printing method or an inkjet method, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, Examples include melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.

  In addition, the alignment mark may contain a photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like as necessary.

  The material of the alignment mark may be the same as or different from the material of the first light shielding layer. In the case where the alignment mark is made of the same material as that of the first light shielding layer, the first light shielding layer and the alignment mark can be collectively formed, and the number of processes can be reduced.

  The film thickness of the alignment mark can be the same as the film thickness of a general alignment mark in a color filter, and can be set within a range of 0.5 μm to 2.0 μm, for example.

  The method for forming the alignment mark is not particularly limited as long as the alignment mark can be formed in a pattern on the transparent substrate. Examples thereof include a photolithography method, a printing method, and an ink jet method.

3. 1st light shielding layer The 1st light shielding layer in this invention is formed in pattern shape on a transparent substrate.

As the first light shielding layer, for example, a material in which a black color material is dispersed in a binder resin is used. The black color material and the binder resin are the same as those of the alignment mark, and the description thereof is omitted here.
The first light-shielding layer may contain a photopolymerization initiator, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like as necessary. Good.

The optical density of the first light shielding layer is not limited as long as light leakage from adjacent pixels can be prevented, but is preferably 2.0 or more, more preferably 4.0 or more.
The optical density measurement method is the same as that described above.

  The film thickness of the first light shielding layer can be the same as the film thickness of a general light shielding layer in the color filter, and can be set, for example, within a range of 0.5 μm to 2.0 μm.

  The shape of the opening of the first light shielding layer is not particularly limited, and examples thereof include those in which the arrangement of the colored layers is changed, such as a stripe shape, a dogleg shape, and a delta arrangement.

  The method for forming the first light shielding layer is not particularly limited as long as the first light shielding layer can be formed in a pattern on the transparent substrate. Examples thereof include a photolithography method, a printing method, and an ink jet method. Can do.

4). 2nd light shielding layer The 2nd light shielding layer in this invention is formed in pattern shape on the transparent substrate in which the colored layer was formed, and is arrange | positioned on a 1st light shielding layer.

As the second light shielding layer, for example, a material in which a black color material is dispersed in a binder resin is used. The black color material and the binder resin are the same as those of the alignment mark, and the description thereof is omitted here.
The second light-shielding layer may contain a photopolymerization initiator, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc., if necessary. Good.

  The material of the second light shielding layer may be the same as or different from the material of the first light shielding layer. When the second light-shielding layer is made of the same material as the first light-shielding layer, it is only necessary to prepare one type of composition for the light-shielding layer, so that the manufacturing cost can be reduced.

The optical density of the second light-shielding layer only needs to be such that light leakage from adjacent pixels can be prevented, may be the same as the optical density of the first light-shielding layer, and is lower than the optical density of the first light-shielding layer. May be.
When the optical density of the second light shielding layer is lower than the optical density of the first light shielding layer, it becomes easy to detect the alignment mark during patterning of the second light shielding layer.
The optical density measurement method is the same as that described above.

  Here, in the second light shielding layer, at least light from the organic EL element in a certain pixel region is directly incident on the colored layer in the adjacent pixel region that greatly affects the color shift of the display image. The optical density of the second light shielding layer may be low as long as it can be shielded.

Examples of the method for adjusting the optical density of the second light shielding layer include a method for adjusting the content of the black color material in the second light shielding layer, and a method for adjusting the film thickness of the second light shielding layer. Among these, a method of adjusting the content of the black color material in the second light shielding layer is preferably used. This is because the optical density of the second light shielding layer can be easily adjusted.
Specifically, when the second light-shielding layer is made of the same material as the first light-shielding layer, for example, the second light-shielding layer is made thinner than the first light-shielding layer so as to reduce the second light-shielding layer. The optical density of the layer can be made lower than the optical density of the first light shielding layer. Further, when the second light shielding layer is made of a material different from that of the first light shielding layer, for example, the content of the black color material in the second light shielding layer is made smaller than the content of the black color material in the first light shielding layer. Thus, the optical density of the second light shielding layer can be made lower than the optical density of the first light shielding layer.

  The film thickness of the second light shielding layer is not particularly limited as long as the above optical density is satisfied, and can be set, for example, within a range of 0.1 μm to 1.5 μm.

The width of the second light shielding layer is not particularly limited as long as the second light shielding layer is disposed on the first light shielding layer, and may be the same as the width of the first light shielding layer. It may be smaller than the width of the layer, and may be larger than the width of the first light shielding layer.
As illustrated in FIG. 12, when the width of the second light shielding layer 7 is larger than the width of the first light shielding layer 3, the color filter from which the multi-sided color filter of the present invention is cut is used for the organic EL display device. In some cases, the second light-shielding layer causes the light from the organic EL element in a certain pixel region to pass through the colored layer in the pixel region, as well as the light that directly enters the colored layer in the adjacent pixel region. Light incident on the colored layer in the pixel region can also be absorbed, and the occurrence of color shift of the display image when viewed from an oblique direction can be effectively suppressed. In addition, alignment can be easily performed when the second light shielding layer is disposed on the first light shielding layer. When the second light-shielding layer has an optical density lower than that of the first light-shielding layer, the aperture ratio is not greatly reduced even if the width is large. The first light shielding layer can absorb most of the light from the organic EL element in a certain pixel region that passes through the colored layer in the pixel region and enters the colored layer in the adjacent pixel region. Therefore, the width of the first light shielding layer may be smaller than the width of the second light shielding layer.

  The shape of the opening of the second light-shielding layer may be the same as the shape of the opening of the first light-shielding layer. For example, the colored layer arrangement may be changed such as a stripe shape, a dogleg shape, or a delta arrangement. Can be mentioned.

  Further, the second light shielding layer 7 may not be formed on the high transmittance layer 6 as illustrated in FIG. 1, and the second light shielding layer 7 is disposed on the high transmittance layer 6 as illustrated in FIG. 13. May be formed. That is, when patterning the second light shielding layer, the second light shielding layer located on the high transmittance layer may be removed or left.

As illustrated in FIG. 13, when the second light shielding layer 7 is formed on the high transmittance layer 6, the film thickness D <b> 1 of the second light shielding layer 7 located on the high transmittance layer 6 is high transmittance. The thickness D2 of the second light shielding layer 7 in the region where the rate layer 6 is not formed and the thickness D3 of the second light shielding layer 7 disposed on the first light shielding layer 3 are smaller.
In this case, the transmittance of the second light shielding layer located on the high transmittance layer is not particularly limited as long as the alignment mark located under the second light shielding layer can be detected during patterning of the second light shielding layer. It is not something.

  As a method for forming the second light shielding layer, any method can be used as long as the second light shielding layer can be disposed on the first light shielding layer, but a photolithography method is preferable. The method for forming the second light-shielding layer is described in detail in the section “C. Method for producing a multifaceted color filter”, and the description thereof is omitted here.

5. Colored layer The colored layer in the present invention is formed on the transparent substrate on which the first light shielding layer is formed, and has a plurality of colored layers.

  The colored layer has, for example, three colored layers of red, green, and blue. The color of the colored layer may be any color as long as it contains at least three colors of red, green, and blue. For example, three colors of red, green, and blue, four colors of red, green, blue, and yellow, or red, Five colors such as green, blue, yellow, and cyan may be used.

The colored layer is, for example, a color material dispersed in a binder resin.
Examples of the color material include pigments and dyes of each color. Examples of the color material used for the red colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Examples of the color material used in the green coloring layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. And pigments. Examples of the color material used in the blue colored layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. These pigments and dyes may be used alone or in combination of two or more.
As the binder resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
The colored layer may contain a photopolymerization initiator and, if necessary, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like.

  The arrangement of the colored layers is not particularly limited, and may be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type.

  There may or may not be a gap between adjacent colored layers, but it is preferable that there is no gap among them.

  Further, on the same plane on which the colored layer is formed, a white layer that does not contain the color material but contains the binder resin and transmits light may be formed. For example, when a red colored layer, a green colored layer, a blue colored layer, and a white layer are formed, at least one pixel of three colors of red, green, and blue is not lit at the time of display. The light leaks easily. On the other hand, in the present invention, since light leakage to adjacent pixels can be suppressed, it is particularly useful when a white layer is formed.

The film thickness of the colored layer can be the same as the film thickness of a general colored layer in a color filter, and can be set, for example, within a range of 1 μm to 5 μm.
As a method for forming the colored layer, any method can be used as long as a plurality of colored layers can be arranged on the same plane, and examples thereof include a photolithography method, an inkjet method, and a printing method.
The thickness and formation method of the white layer are the same as those of the colored layer.

6). Transparent substrate The transparent substrate in the present invention supports the first light shielding layer, the alignment mark, the high transmittance layer, the colored layer, the second light shielding layer, and the like.
As the transparent substrate, those generally used for color filters can be used. For example, non-flexible inorganic substrates such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, and transparent Examples thereof include a resin substrate having flexibility such as a resin film and an optical resin plate. Among them, it is preferable to use an inorganic substrate, and it is preferable to use a glass substrate among inorganic substrates. Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates. This is because the alkali-free glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and since it does not contain an alkali component in the glass, it can be suitably used for a color filter for a display device. .

7). Other Configurations The multi-sided color filter of the present invention has other configurations as necessary in addition to the transparent substrate, the first light shielding layer, the alignment mark, the high transmittance layer, the colored layer, and the second light shielding layer. It may be.

(1) Protective layer In this invention, as illustrated in FIG. 12, the protective layer 8 may be formed on the colored layer 5.

The formation position of the protective layer is appropriately selected according to the use of the multi-faced color filter of the present invention.
In the case of an organic EL display device, the second light shielding layer is preferably disposed on the outermost surface of the multi-faced color filter, and the second light shielding layer is formed on the protective layer. By the protective layer, planarization and stabilization of the base can be achieved, and the second light shielding layer can be easily formed.
In the case of a liquid crystal display device, the protective layer is preferably disposed on the outermost surface of the multifaceted color filter, and the protective layer is formed so as to cover the second light shielding layer.

The material of the protective layer is not particularly limited as long as it can flatten the surface on which the colored layer and the second light shielding layer are formed, and is generally the same as the protective layer used for the color filter. Both organic and inorganic materials can be used. When the protective layer is made of an inorganic material, barrier performance can be ensured and can be stabilized as a base when the second light shielding layer is formed.
The thickness and forming method of the protective layer can be the same as the protective layer generally used for color filters.

(2) Light Absorbing Layer In the present invention, the light absorbing layer 9 may be formed in the pixel region 10 as illustrated in FIG. In addition to the effect of preventing color mixing, the light absorption layer can achieve a reduction in display luminance in addition to a reduction in external light reflection.

Examples of the light absorbing layer include those in which a color material is dispersed in a binder resin.
Examples of the color material include a black color material. The light absorbing layer may contain a main color material and a color material for color adjustment. The main color material includes a black color material, and the color adjustment color material includes a blue color material.
The binder resin is the same as the first light shielding layer, the second light shielding layer, and the colored layer.

In the light absorption layer, the intensity of light transmitted through the light absorption layer can be adjusted by adjusting the concentration of the main color material, and the visible light region (400 nm to A flat transmittance characteristic with less variation in transmittance of the light absorption layer over the entire wavelength range of 700 nm can be easily obtained. Specifically, by adjusting the concentration of carbon black as the main coloring material, various transmittances can be easily obtained as illustrated in FIG.
In FIG. 15, the transmissivity value of the light absorption layer is represented by the horizontal axis, and the transmissivity when the light absorption layer corresponding to the transmissivity value of the light absorption layer passes twice is represented by the vertical axis. The triangle marks indicate the transmittance (horizontal axis) of the light absorption layer obtained by adjusting and measuring the carbon black concentration, and the transmittance (vertical axis) when passing through the corresponding absorption layer twice. .
Further, by adjusting the content of the pigment for color adjustment, it is possible to easily obtain a transmittance characteristic close to flat over the visible light region (wavelength range of 400 nm to 700 nm). In the visible light region (wavelength range from 400 nm to 700 nm), the light absorption layer has a smaller transmittance due to the provision of the light absorption layer in the transmittance characteristics close to flat, and the transmitted light color shift during display and external light The color shift of reflection can be reduced.
For example, in the case of using a light absorption layer having transmittance characteristics close to a flat as shown in FIG.

For example, in the visible light region (wavelength range of 400 nm to 700 nm), when the transmittance characteristic of the light absorption layer is flat and 60%, the light passing through the light absorption layer twice is 60% of 60%, which is 36%. %. Further, since the light at the time of display passes through the light absorption layer and is emitted once, the light transmitted by the light absorption layer can be reduced only once. For example, if the transmittance of the light absorption layer is 60% The decrease in transmitted light due to the single pass of the light absorption layer is substantially 60%.
Therefore, when the color filter from which the multi-sided color filter of the present invention is cut is used in an organic EL display device or a liquid crystal display device, reflection of external light can be suppressed. In addition, when a circularly polarizing plate is disposed on the front surface of an organic EL display device or a liquid crystal display device in order to suppress external light reflection, not only external light reflection but also light during display is reduced. The light absorption layer can suppress a decrease in light at the time of display, and can be brightened at the time of display as compared with the case where a circularly polarizing plate is provided.

As the transmittance of the light absorption layer, in the case of the C light source, the average transmittance is 45% to 95% in that external light reflection can be reduced and light during display can be increased. It is preferable to be within the range.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorbing layer over the entire visible light region, and averaging the transmittance over the entire visible light region. Specifically, a transmission spectrum is measured using a microspectroscope OSP-SP2000 manufactured by OLYMPUS Co., Ltd., and the Y value of the XYZ color system is obtained from the following transmission formula from the obtained transmission spectrum. However, the average transmittance substantially corresponds to this Y value.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. Rate.

  In particular, when the light absorption layer has a flat transmittance characteristic with little variation in transmittance over the entire visible light region (wavelength range of 400 nm to 700 nm), the color shift at the time of display due to the provision of the light absorption layer is small And can.

  As a formation position of the light absorption layer, the light absorption layer may be formed between the colored layer and the second light shielding layer so as to cover the colored layer, and the light absorption layer is formed of the transparent substrate and the first light shielding layer. And may be formed on the entire surface of the transparent substrate.

Examples of the method for forming the light absorption layer include a photolithography method (die coating method, spin coating method), an ink jet method, and the like, but a photolithography method is usually used.
The film thickness of the light absorption layer is preferably 0.3 μm or more from the viewpoint of coatability and external light reflection reduction.

(3) Scattering layer In the present invention, a scattering layer may be formed on the colored layer. The scattering layer can improve the parallax depending on the viewing direction of the observer. In this case, the second light shielding layer is formed on the scattering layer. Moreover, when the light absorption layer is formed, a scattering layer is formed on the light absorption layer.

8). Applications The multi-faced color filter of the present invention can be used in organic EL display devices and liquid crystal display devices. Among these, the multi-sided color filter of the present invention is suitable for an organic EL display device having a white light emitting layer.

B. Organic EL Display Device The organic EL display device according to the present invention is formed by laminating a color filter obtained by cutting the above-described multi-faced color filter and an organic EL element substrate in which an organic EL element is formed on a support substrate. It is a feature.

  FIG. 2 is a schematic sectional view showing an example of the organic EL display device of the present invention. The organic EL display device shown in FIG. 2 has been described in the section “A. Multi-faceted color filter”, and a description thereof will be omitted here.

  In the present invention, it is possible to suppress a color shift of a display image due to light leakage to an adjacent pixel by having a color filter in which the above-described multi-surface color filter is cut.

  Hereinafter, another configuration of the organic EL display device of the present invention will be described.

1. Color filter The color filter in the present invention is obtained by cutting the above-described multi-surface color filter. Usually, when using a multi-sided color filter in an organic EL display device, a region where an alignment mark or the like is formed is cut and cut into individual color filters.
The multi-faceted color filter has been described in the above section “A. Multi-faceted color filter”, and the description thereof is omitted here.

2. Organic EL Element Substrate The organic EL element substrate in the present invention is obtained by forming an organic EL element on a support substrate.
Hereinafter, each component in the organic EL element substrate will be described.

(1) Support substrate The support substrate in this invention supports an organic EL element.
In the present invention, the support substrate may be transparent or opaque in order to extract light from the color filter. The support substrate can be the same as the transparent substrate of the color filter.

(2) Organic EL element The organic EL element in the present invention is one in which an organic EL layer including a light emitting layer is formed between an anode and a cathode. For example, a back electrode layer formed in a pattern on a support substrate And an insulating layer formed in the opening of the back electrode layer, an organic EL layer formed on the back electrode layer and including a light emitting layer, and a transparent electrode layer formed on the organic EL layer. .
The organic EL element may emit white light, or may have a plurality of light emitting layers such as red, green, and blue arranged in a plane, but emits white light. It is preferable. Since the white light emitting type organic EL display device is liable to cause a color shift of a display image due to light leakage to adjacent pixels, the configuration of the present invention is useful.
Hereinafter, each structure in an organic EL element is demonstrated.

(A) Organic EL layer The organic EL layer has one or more organic layers including at least a light emitting layer. Examples of the organic layer constituting the organic EL layer other than the light emitting layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer. The hole transport layer is often integrated with the hole injection layer by adding a hole transport function to the hole injection layer. In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited. The organic EL layer may have a general configuration, and only the light emitting layer, hole injection layer / light emitting layer, hole injection layer / light emitting layer / electron injection layer, hole injection layer / hole blocking layer. / Light emitting layer / electron injection layer, hole injection layer / light emitting layer / electron transport layer and the like can be exemplified.

  The light-emitting layer may be a white light-emitting layer or a plurality of light-emitting layers arranged in a plane, but is preferably a white light-emitting layer. As described above, the white light emission type organic EL display device is likely to cause a color shift of a display image due to light leakage to adjacent pixels, and thus the configuration of the present invention is useful. The light emitting material used for the white light emitting layer is hardly composed of a single compound, and generally light emitting materials having two to three colors are used. In this case, the emission spectrum of the white light-emitting layer is a combination of the spectra of the light-emitting materials of the respective colors.

  About the material of each layer which comprises an organic EL layer, a formation method, etc., it can be made to be the same as that of a general organic EL element.

(B) Transparent electrode layer and back electrode layer The transparent electrode layer and the back electrode layer are provided to apply a voltage to the light emitting layer and cause light emission in the light emitting layer, one being an anode and the other being a cathode. is there. The back electrode layer is formed between the support substrate and the organic EL layer, and the transparent electrode layer is formed on the organic EL layer.
About a material, a formation method, etc. of a transparent electrode layer and a back electrode layer, it can be made to be the same as that of a general organic EL element.

3. Other Configurations The organic EL display device of the present invention may have other configurations as necessary in addition to the color filter and the organic EL element substrate.

(1) Sealing structure The sealing structure of the organic EL display device of the present invention is not particularly limited, but is a solid sealing in which a resin is filled between the organic EL element substrate and the color filter. It is preferable.

As resin, what is generally used for an organic EL element can be used, For example, a thermosetting resin and a photocurable resin are mentioned.
The photocurable resin is the same as the binder resin used for the colored layer in the color filter, for example, a photosensitive vinyl group having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber. Resin is used. A photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added to the photosensitive resin as necessary.
Examples of the thermosetting resin include those using an epoxy compound and those using a thermal radical generator. Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid, an amine compound, and the like. Examples of such epoxy compounds include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used. The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides. Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

(2) Insulating layer In this invention, the insulating layer may be formed in the opening part of the back electrode layer formed in pattern shape on the support substrate. The insulating layer is formed in order to prevent conduction between adjacent back electrode layers or conduction between the transparent electrode layer and the back electrode layer.
The material of the insulating layer, the formation method, and the like can be the same as those of a general organic EL element.

(3) Sealant The organic EL display device of the present invention may be sealed with a sealant. A sealing agent is formed in the peripheral part of a color filter and an organic EL element substrate, and seals an organic EL element. Any sealing agent can be used as long as it can prevent the organic EL element from coming into contact with moisture or the like in the atmosphere, and those generally used in organic EL display devices can be used.

4). Applications The organic EL display device of the present invention is suitable for high-definition displays. For example, it can be used for mobile electronic devices such as mobile notebook computers and multifunction terminal devices (also referred to as high-function terminal devices). It is done.

C. Manufacturing method of multi-faceted color filter The manufacturing method of the multi-faceted color filter of the present invention includes a first light-shielding layer forming step of forming a patterned first light-shielding layer and an alignment mark on a transparent substrate, the first light-shielding layer, A colored layer forming step of forming a plurality of colored layers on the transparent substrate on which the alignment mark is formed, and a high transmittance layer having a higher transmittance than the alignment mark is formed at least around the alignment mark. High transmittance layer forming step and coating the second light shielding layer composition on the entire surface of the transparent substrate on which the colored layer and the high transmittance layer are formed to form a coating film of the second light shielding layer composition And a second light-shielding layer forming step of patterning the coating film of the second light-shielding layer composition using the alignment mark and disposing the second light-shielding layer on the first light-shielding layer. It is characterized by that.

3A to 3E are steps showing an example of a method for producing a multi-faced color filter of the present invention. 3, the red colored layer 5R, the green colored layer 5G, the blue colored layer 5B, and the white layer 5W are arranged as illustrated in FIG. 4, and red, green, blue, FIG. 3 shows an example of a method for manufacturing a multi-faced color filter in which one pixel is composed of four white sub-pixels, and FIG. 3 corresponds to a cross section taken along line AA of FIG.
First, although not shown, a light-shielding film is formed on the entire surface of the transparent substrate 2 and patterned by photolithography to form a first light-shielding layer 3 and an alignment mark 4 as shown in FIG. A light shielding layer forming step is performed. Next, as shown in FIGS. 3B to 3C, a red colored layer 5R, a green colored layer (not shown), a blue colored layer (not shown), and a white layer 5W are formed in a pattern and colored. A colored layer forming step for obtaining the layer 5 and the white layer 5W is performed. As shown in FIG. 3C, when forming the white layer 5 </ b> W, a high transmittance layer forming step of simultaneously forming the high transmittance layer 6 so as to cover the alignment mark 4 is also performed. In this case, the white layer 5W and the high transmittance layer 6 are collectively formed.

Next, as shown in FIG. 3D, the second light-shielding layer composition is applied to the entire surface of the transparent substrate 2 on which the colored layer such as the red colored layer 5R and the white layer 5W are formed. A coating film 7a of the composition is formed, and the coating film 7a of the second light shielding layer composition is patterned by a photolithography method, and the second light shielding layer is formed on the first light shielding layer 3 as shown in FIG. The 2nd light shielding layer formation process which arranges 7 is performed.
At this time, as shown in FIG. 3 (d), since the high transmittance layer 6 is formed, the second light shielding layer composition flows down from the high transmittance layer 6. The film thickness d1 of the coating film 7a of the second light-shielding layer composition positioned is made thinner than the film thickness d2 of the coating film 7a of the second light-shielding layer composition in the region where the high transmittance layer 6 is not formed. be able to. Therefore, the transmittance of the coating film 7a of the second light shielding layer composition located on the high transmittance layer 6 is such that the transmittance of the coating film 7a of the second light shielding layer composition in the region where the high transmittance layer 6 is not formed. Since it becomes higher than the transmittance, the alignment mark 4 can be detected. Therefore, when patterning the coating film 7 a of the second light shielding layer composition, alignment is performed using the alignment mark 4 in order to dispose the second light shielding layer 7 on the first light shielding layer 3. Can do.
On the other hand, the film thickness d3 of the coating film 7a of the composition for the second light-shielding layer located on the colored layer such as the red colored layer 5R and the white layer 5W can be ensured to the extent that sufficient light-shielding properties can be obtained. Therefore, it is possible to easily detect the alignment mark without sacrificing the light shielding property of the second light shielding layer.
Therefore, in the present invention, it is possible to accurately align the first light shielding layer and the second light shielding layer while ensuring the light shielding property of the second light shielding layer.

  In the present invention, since the first light shielding layer and the second light shielding layer are formed, it is possible to suppress the color shift of the display image due to the light leakage to the adjacent pixels.

  Hereafter, each process in the manufacturing method of the multi-faced color filter of this invention is demonstrated.

1. First light shielding layer forming step In the present invention, a first light shielding layer forming step of forming a patterned first light shielding layer and an alignment mark on a transparent substrate is performed.
The method for forming the first light-shielding layer and the alignment mark is described in the above section “A. Multi-face color filter”, and the description thereof is omitted here. When the first light-shielding layer and the alignment mark are made of the same material, the first light-shielding layer and the alignment mark can be formed at a time, and the number of processes can be reduced.

2. Colored layer forming step In the present invention, a colored layer forming step of forming a plurality of colored layers on the transparent substrate on which the first light shielding layer and the alignment mark are formed is performed.
In addition, since the formation method of the colored layer was described in the above-mentioned section of “A. Multi-faceted color filter”, description thereof is omitted here.

3. High Transmittance Layer Forming Step In the present invention, a high transmittance layer forming step of forming a high transmittance layer having a transmittance higher than that of the alignment mark is performed at least around the alignment mark.
The method for forming the high transmittance layer is described in the section “A. Multi-faceted color filter”, and the description thereof is omitted here.
Especially, it is preferable to form a high transmittance layer simultaneously with the arbitrary layer formed between the said 1st light shielding layer formation process and the said 2nd light shielding layer formation process. This is because an arbitrary layer and a high transmittance layer can be formed at once, and a high transmittance layer can be formed without increasing the number of steps. Examples of such an arbitrary layer include a colored layer, a white layer, a protective layer, and the like. In particular, as illustrated in FIG. 4, a red coloring layer 5R, a green coloring layer 5G, a blue coloring layer 5B, and a white layer 5W are arranged, and one sub-pixel of four sub-pixels of red, green, blue, and white. When pixels are configured, it is preferable to form the high transmittance layer simultaneously with the white layer.

4). Second light-shielding layer forming step In the present invention, the second light-shielding layer composition is applied to the entire surface of the transparent substrate on which the colored layer and the high-transmittance layer are formed. A film is formed, the coating film of the second light-shielding layer composition is patterned using the alignment mark, and a second light-shielding layer forming step of placing the second light-shielding layer on the first light-shielding layer is performed.
The method for applying the second light-shielding layer composition is not particularly limited as long as it is a method capable of applying the second light-shielding layer composition to the entire surface of the transparent substrate. Etc.
As a method for patterning the coating film of the second light shielding layer composition, any method using an alignment mark may be used, and a photolithography method is used. The intensity of the light irradiated when detecting the alignment mark is appropriately adjusted according to the transmittance of the coating film of the second light shielding layer composition located on the high transmittance layer.

5. Other Steps In the present invention, in addition to the first light shielding layer forming step, the colored layer forming step, the high transmittance layer forming step, and the second light shielding layer forming step, a step of forming other configurations as necessary. You may go. Other configurations are described in the above section “A. Multi-faceted color filter”, and thus description thereof is omitted here.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.

[Reference example]
A photomask capable of forming a high transmittance layer on an alignment mark made of the same material as the first light shielding layer as shown in FIG. That is, when aligning the alignment mark formed on the glass substrate with the alignment mark of the photomask, the camera view area is shown in FIGS. 5A, 5D, 5G, and 6A. , (D), (g), FIG. 7 (a), (d), (g), FIG. 8 (a), (b), (c), FIG. 9 (a), (b), FIG. The light shielding layer pattern was additionally processed in the photomask so that the pattern of the high transmittance layer shown in a) can be formed on the alignment mark.
In a photomask, when a photomask is arranged with an arbitrary distance from a coating film formed on a glass substrate by a spin coater, and a pattern of a high transmittance layer is formed on the glass substrate by a proximity aligner. The pattern of the high transmittance layer may or may not be formed on the alignment mark after pattern development by arranging or not arranging the light shielding plate for shielding the exposure light on the alignment position camera field of the photomask. It becomes possible.

[Example 1]
A multi-sided color filter illustrated in FIG. 1 was produced.

(1) Formation of first light-shielding layer and alignment mark As shown below, the film thickness of the first light-shielding layer and the alignment mark is 1.5 μm on a glass substrate (Asahi Glass Co., Ltd., AN material) by photolithography. Formed. That is, a curable resin composition for forming a light shielding layer is applied to one surface of a glass substrate with a spin coater, dried to a contact point near 102 Pa under reduced pressure, and then dried at 100 ° C. for 3 minutes to form a light shielding resin layer. did. A photomask was placed on the light-shielding resin layer at a distance of 100 μm from the layer, and was exposed in a pattern with a 2.0 kW ultrahigh pressure mercury lamp using a proximity aligner, and then developed with a 0.05 wt% aqueous potassium hydroxide solution. . Thereafter, the substrate was allowed to stand in an atmosphere at 230 ° C. for 30 minutes to perform a water treatment, thereby forming the first light shielding layer and the alignment mark in a predetermined shape.

(2) Formation of colored layer Next, the colored layer of each color was formed as follows.
(Formation of red colored layer)
A red curable resin composition is applied on a glass substrate on which a first light-shielding layer and alignment marks are formed in a pattern with a spin coater, and then dried under reduced pressure to a contact point near 102 Pa. Dried for minutes. Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and an ultraviolet ray is applied only to the region corresponding to the red colored layer forming region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Was irradiated for 10 seconds. Subsequently, it developed with 0.05 wt% potassium hydroxide aqueous solution (liquid temperature of 23 degreeC), and removed only the uncured part of the coating film of a red curable resin composition. Thereafter, the substrate was allowed to stand in an atmosphere at 230 ° C. for 25 minutes, so that heat treatment was performed to form a patterned red colored layer in the display region. The formed film thickness was 2.5 μm.

(Formation of green colored layer)
In the same process as the formation of the red colored layer using the green curable resin composition, the coating film thickness is changed so that the formed film thickness becomes 2.5 μm and the patterned green colored layer is formed in the display region. Formed.

(Formation of blue colored layer)
Using the blue curable resin composition, in the same process as the formation of the red colored layer, the coating film thickness is changed, and the patterned blue colored layer is formed in the display region so that the formed film thickness becomes 2.5 μm. Formed.

(Formation of white layer and high transmittance layer)
Using a white curable resin composition, in the same process as the formation of the red colored layer, changing the coating film thickness to form a patterned white layer in the display area so that the film thickness is 2.5 μm did. At this time, by not arranging a light-shielding plate at the time of exposure in the camera field of alignment position alignment, the pattern of the high transmittance layer as shown in FIG. 3C is formed on the alignment mark formed on the glass substrate as a white layer. Could be formed.

(3) Formation of second light-shielding layer On the substrate on which the colored layer has been formed as described above, the above-described curable resin composition for light-shielding layer formation is applied by a spin coating method and dried. A 4 μm light-shielding resin layer was formed. At this time, the dry film thickness of the light-shielding resin layer located on the high transmittance layer was 0.2 μm. A photomask was placed at a distance of 100 μm from the light-shielding resin layer, and ultraviolet rays were irradiated for 10 seconds only to the region corresponding to the formation region of the second light-shielding layer using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. The mask alignment operation at the time of exposure could be performed without any problem. Next, development was performed with a 0.05 wt% aqueous potassium hydroxide solution (liquid temperature: 23 ° C.) to remove only the uncured portion of the light-shielding resin layer. Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 25 minutes to perform a heat treatment to form a second light shielding layer.
In this way, a color filter having the second light shielding layer and the high transmittance layer on the alignment mark was produced.

[Comparative Example 1]
Example 1 except that a high transmittance layer was not formed on the alignment mark formed on the glass substrate by disposing a light-shielding plate at the time of exposure in the camera field of alignment alignment when forming the white layer. The colored layer was formed in the same manner as described above. Next, an attempt was made to form the second light-shielding layer in the same manner as in Example 1, but the alignment mark could not be read during exposure, and the mask alignment operation could not be performed.

DESCRIPTION OF SYMBOLS 1A ... Multi-sided color filter 1B ... Color filter 2 ... Transparent substrate 3 ... 1st light shielding layer 4 ... Alignment mark 5 ... Colored layer 5R ... Red colored layer 5G ... Green colored layer 5B ... Blue colored layer 5W ... White layer 6 ... High Transmittance layer 7 ... 2nd light shielding layer 7a ... Coating film of composition for second light shielding layer 10, 10a, 10b ... Pixel region 11 ... Organic EL element substrate 13 ... Organic EL element 20 ... Organic EL display device

Claims (5)

A transparent substrate;
A first light-shielding layer and an alignment mark formed in a pattern on the transparent substrate;
A plurality of colored layers formed on the transparent substrate on which the first light-shielding layer is formed;
A high transmittance layer formed at least around the alignment mark and having a higher transmittance than the alignment mark;
A second light-shielding layer formed on the colored layer in a pattern and disposed on the first light-shielding layer;
Wherein between the colored layer and the alignment marks, possess the high transmittance layer is not formed region,
The high transmittance layer, multi with a color filter, characterized that you have been made of the same material and one colored layer among the plurality of colors of colored layers. A transparent substrate;
A first light-shielding layer and an alignment mark formed in a pattern on the transparent substrate;
A plurality of colored layers formed on the transparent substrate on which the first light-shielding layer is formed;
A high-transmittance layer formed at least in a pattern around the alignment mark and having a higher transmittance than the alignment mark;
A second light-shielding layer formed on the colored layer in a pattern and disposed on the first light-shielding layer;
Thickness of the second light-shielding layer is rather smaller than the thickness of said first light-shielding layer was combined with the high permeability layer,
The multi-sided color filter, wherein the high transmittance layer is made of the same material as one of the colored layers of the plurality of colors . A transparent substrate;
A first light-shielding layer and an alignment mark formed in a pattern on the transparent substrate;
A plurality of colored layers formed on the transparent substrate on which the first light-shielding layer is formed;
A high transmittance layer formed at least around the alignment mark and having a higher transmittance than the alignment mark;
A second light-shielding layer formed on the colored layer in a pattern and disposed on the first light-shielding layer;
The size of the high permeability layer, when forming the second light-shielding layer, Ri magnitude der to reduce the film thickness of the second light-shielding layer positioned on the high transmittance layer,
The high transmittance layer, multi with a color filter, characterized that you have been made of the same material and one colored layer among the plurality of colors of colored layers. A color filter obtained by cutting the multi-sided color filter according to any one of claims 1 to 3 ,
An organic electroluminescence display device comprising: an organic electroluminescence element substrate having an organic electroluminescence element formed on a support substrate; A first light shielding layer forming step of forming a patterned first light shielding layer and an alignment mark on the transparent substrate;
A colored layer forming step of forming a plurality of colored layers on the transparent substrate on which the first light shielding layer and the alignment mark are formed;
A high transmittance layer forming step of forming a high transmittance layer having a higher transmittance than the alignment mark in a pattern around at least the alignment mark;
Using the alignment mark, the second light-shielding layer composition is coated on the entire surface of the transparent substrate on which the colored layer and the high-transmittance layer are formed, and the alignment mark is used. the second patterning the coating film of the light shielding layer composition have a, a second light-shielding layer forming step of disposing the second light-shielding layer on the first light-shielding layer,
The method for producing a multi-faced color filter, wherein the high transmittance layer forming step is performed simultaneously with the step of forming one colored layer in the colored layer forming step of forming the colored layers of the plurality of colors .

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