JP6431190B2 - ヒーター用熱動的応答感知システム - Google Patents

ヒーター用熱動的応答感知システム Download PDF

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Publication number
JP6431190B2
JP6431190B2 JP2017522916A JP2017522916A JP6431190B2 JP 6431190 B2 JP6431190 B2 JP 6431190B2 JP 2017522916 A JP2017522916 A JP 2017522916A JP 2017522916 A JP2017522916 A JP 2017522916A JP 6431190 B2 JP6431190 B2 JP 6431190B2
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Prior art keywords
heater
heating
heater assembly
layer
temperature
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Japanese (ja)
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JP2018502443A5 (https=
JP2018502443A (ja
Inventor
シュタインハウザー、ルイス・ピー
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ワットロー・エレクトリック・マニュファクチャリング・カンパニー
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Priority claimed from US14/530,670 external-priority patent/US10163668B2/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/20—Investigating or analyzing materials by the use of thermal means by investigating the development of heat, i.e. calorimetry, e.g. by measuring specific heat, by measuring thermal conductivity
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/20—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from infrared radiation only
    • H04N23/23—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from infrared radiation only from thermal infrared radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/72—Investigating presence of flaws

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Resistance Heating (AREA)
  • Drying Of Semiconductors (AREA)
  • Resistance Heating (AREA)
JP2017522916A 2014-10-31 2015-10-28 ヒーター用熱動的応答感知システム Active JP6431190B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/530,670 2014-10-31
US14/530,670 US10163668B2 (en) 2011-08-30 2014-10-31 Thermal dynamic response sensing systems for heaters
PCT/US2015/057905 WO2016069808A1 (en) 2014-10-31 2015-10-28 Thermal dynamic response sensing systems for heaters

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018206740A Division JP6692875B2 (ja) 2014-10-31 2018-11-01 ヒーターシステムに対する熱動的応答感知の方法

Publications (3)

Publication Number Publication Date
JP2018502443A JP2018502443A (ja) 2018-01-25
JP2018502443A5 JP2018502443A5 (https=) 2018-07-12
JP6431190B2 true JP6431190B2 (ja) 2018-11-28

Family

ID=54548258

Family Applications (2)

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JP2017522916A Active JP6431190B2 (ja) 2014-10-31 2015-10-28 ヒーター用熱動的応答感知システム
JP2018206740A Active JP6692875B2 (ja) 2014-10-31 2018-11-01 ヒーターシステムに対する熱動的応答感知の方法

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JP2018206740A Active JP6692875B2 (ja) 2014-10-31 2018-11-01 ヒーターシステムに対する熱動的応答感知の方法

Country Status (6)

Country Link
EP (1) EP3213598B1 (https=)
JP (2) JP6431190B2 (https=)
KR (2) KR102110267B1 (https=)
CN (1) CN107078082B (https=)
TW (1) TWI681483B (https=)
WO (1) WO2016069808A1 (https=)

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CN114175208B (zh) * 2019-07-25 2024-05-24 朗姆研究公司 衬底处理系统
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JP7731373B2 (ja) * 2020-05-19 2025-08-29 ワトロー エレクトリック マニュファクチュアリング カンパニー 抵抗ヒーターのための受動的及び能動的な較正方法
KR102602807B1 (ko) * 2020-08-14 2023-11-15 세메스 주식회사 히터 제어 장치 및 이를 구비하는 기판 처리 시스템
KR102520584B1 (ko) * 2020-10-14 2023-04-10 세메스 주식회사 공정 계측 장치 및 방법
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KR102579663B1 (ko) * 2023-06-27 2023-09-18 시스트로닉스 주식회사 공기 가열을 통해 측정 정확도를 향상시키는 공기성분측정 장치
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Also Published As

Publication number Publication date
TW201624588A (zh) 2016-07-01
TWI681483B (zh) 2020-01-01
KR101999705B1 (ko) 2019-07-12
EP3213598B1 (en) 2023-07-05
KR102110267B1 (ko) 2020-05-14
JP2019061960A (ja) 2019-04-18
KR20190069624A (ko) 2019-06-19
WO2016069808A1 (en) 2016-05-06
JP6692875B2 (ja) 2020-05-13
JP2018502443A (ja) 2018-01-25
CN107078082B (zh) 2021-04-09
KR20170078645A (ko) 2017-07-07
CN107078082A (zh) 2017-08-18
EP3213598A1 (en) 2017-09-06

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