JP6413784B2 - 基板処理装置及びデバイス製造方法 - Google Patents

基板処理装置及びデバイス製造方法 Download PDF

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JP6413784B2
JP6413784B2 JP2015008107A JP2015008107A JP6413784B2 JP 6413784 B2 JP6413784 B2 JP 6413784B2 JP 2015008107 A JP2015008107 A JP 2015008107A JP 2015008107 A JP2015008107 A JP 2015008107A JP 6413784 B2 JP6413784 B2 JP 6413784B2
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substrate
pattern
substrate processing
cylindrical member
detection unit
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JP2016133623A (ja
JP2016133623A5 (enExample
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洋祐 林田
洋祐 林田
加藤　正紀
正紀 加藤
義昭 鬼頭
義昭 鬼頭
正和 堀
堀　　正和
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Nikon Corp
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Nikon Corp
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JP2015008107A 2015-01-19 2015-01-19 基板処理装置及びデバイス製造方法 Active JP6413784B2 (ja)

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JP2018172644A Division JP6680330B2 (ja) 2018-09-14 2018-09-14 パターン形成装置

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JP2016133623A JP2016133623A (ja) 2016-07-25
JP2016133623A5 JP2016133623A5 (enExample) 2017-12-07
JP6413784B2 true JP6413784B2 (ja) 2018-10-31

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
KR102630749B1 (ko) * 2021-08-03 2024-01-30 주식회사 디에이테크놀로지 이차전지 제조 시스템의 전극 측정 장치 및 방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005197483A (ja) * 2004-01-08 2005-07-21 Nikon Corp 撮像手段の回転誤差計測方法、及びこの回転誤差計測方法を用いた調整方法又は計測方法、及びこの回転誤差計測方法で計測された回転誤差を使用する位置計測装置、及びこの位置計測装置を備えた露光装置
JP2006268032A (ja) * 2005-02-24 2006-10-05 Fuji Photo Film Co Ltd 描画装置および描画装置の校正方法
JP5210199B2 (ja) * 2009-02-23 2013-06-12 大日本スクリーン製造株式会社 画像記録方法
JP6123252B2 (ja) * 2012-11-21 2017-05-10 株式会社ニコン 処理装置及びデバイス製造方法
KR101812857B1 (ko) * 2012-08-28 2017-12-27 가부시키가이샤 니콘 기판 지지 장치, 및 노광 장치
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法

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