JP6409063B2 - 歪み修正面活性領域を有するｉｉｉ族窒化物ナノワイヤｌｅｄ及びその製造方法 - Google Patents

歪み修正面活性領域を有するｉｉｉ族窒化物ナノワイヤｌｅｄ及びその製造方法 Download PDF

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JP6409063B2
JP6409063B2 JP2016526939A JP2016526939A JP6409063B2 JP 6409063 B2 JP6409063 B2 JP 6409063B2 JP 2016526939 A JP2016526939 A JP 2016526939A JP 2016526939 A JP2016526939 A JP 2016526939A JP 6409063 B2 JP6409063 B2 JP 6409063B2
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shell
active region
peaks
nanowire
semiconductor
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JP2017503333A (ja
JP2017503333A5 (OSRAM
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リンダ ロマーノ，
リンダ ロマーノ，
サンスー イ，
サンスー イ，
パトリック スヴェンソン，
パトリック スヴェンソン，
ネイサン ガードナー，
ネイサン ガードナー，
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0137—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/821—Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/032—Manufacture or treatment of electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/832—Electrodes characterised by their material
    • H10H20/833—Transparent materials

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JP2016526939A 2013-12-17 2014-12-15 歪み修正面活性領域を有するｉｉｉ族窒化物ナノワイヤｌｅｄ及びその製造方法 Active JP6409063B2 (ja)

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US201361917046P 2013-12-17 2013-12-17
US61/917,046 2013-12-17
PCT/US2014/070347 WO2015095049A1 (en) 2013-12-17 2014-12-15 Iii-nitride nanowire led with strain modified surface active region and method of making thereof

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JP2017503333A JP2017503333A (ja) 2017-01-26
JP2017503333A5 JP2017503333A5 (OSRAM) 2017-12-28
JP6409063B2 true JP6409063B2 (ja) 2018-10-17

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US (3) US9281442B2 (OSRAM)
EP (1) EP3084847B1 (OSRAM)
JP (1) JP6409063B2 (OSRAM)
TW (1) TWI621278B (OSRAM)
WO (1) WO2015095049A1 (OSRAM)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2297794B1 (en) 2008-07-07 2017-09-06 Glo Ab Nanostructured light emitting diode
TWI621278B (zh) 2013-12-17 2018-04-11 瑞典商Ｇｌｏ公司 具有應變改質表面活性區域之第三族氮化物奈米線ｌｅｄ及其製造方法
WO2016022824A1 (en) 2014-08-08 2016-02-11 Glo Ab Pixilated display device based upon nanowire leds and method for making the same
WO2016025325A1 (en) 2014-08-12 2016-02-18 Glo Ab Iii-nitride nanowire led with strain modified surface active region and method of making thereof
WO2016049507A1 (en) 2014-09-26 2016-03-31 Glo Ab Monolithic image chip for near-to-eye display
US10290767B2 (en) * 2015-06-09 2019-05-14 The Royal Institution For The Advancement Of Learning/Mcgill University High efficiency visible and ultraviolet nanowire emitters
US11322652B2 (en) * 2015-12-14 2022-05-03 Ostendo Technologies, Inc. Methods for producing composite GaN nanocolumns and light emitting structures made from the methods
WO2017184941A1 (en) 2016-04-22 2017-10-26 Neil Deeman Small pitch direct view display and method of making thereof
KR20180133436A (ko) 2016-05-04 2018-12-14 글로 에이비 상이한 색상의 led를 포함하는 일체형 다색 직시형 디스플레이와 이의 제조 방법
US10096469B2 (en) * 2016-08-24 2018-10-09 COMSATS Institute of Information Technology (CIIT) Sn doped ZnS nanowires for white light source material
CN109791963B (zh) 2016-09-29 2021-09-17 日亚化学工业株式会社 发光元件
JP6853882B2 (ja) 2016-10-24 2021-03-31 グロ アーベーＧｌｏ Ａｂ 発光ダイオード、ディスプレイデバイス、および、直視型ディスプレイデバイス
TWI742222B (zh) 2017-01-09 2021-10-11 美商納諾西斯有限公司 用於直接視野顯示之具有集成反射器的發光二極體及其製造方式
US10998465B2 (en) 2017-01-09 2021-05-04 Glo Ab Light emitting diodes with integrated reflector for a direct view display and method of making thereof
US20180277713A1 (en) * 2017-03-21 2018-09-27 Glo Ab Red light emitting diodes having an indium gallium nitride template layer and method of making thereof
JP7147132B2 (ja) * 2017-05-31 2022-10-05 セイコーエプソン株式会社 発光装置、プロジェクター、および発光装置の製造方法
US10418499B2 (en) 2017-06-01 2019-09-17 Glo Ab Self-aligned nanowire-based light emitting diode subpixels for a direct view display and method of making thereof
WO2019036439A1 (en) 2017-08-15 2019-02-21 Glo Ab METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE EMPLOYING NANO-PRINT LITHOGRAPHY FOR FORMING SELECTIVE GROWTH MASK
US10439101B2 (en) * 2017-08-18 2019-10-08 Intel Corporation Micro light-emitting diode (LED) elements and display
US10707374B2 (en) 2017-09-15 2020-07-07 Glo Ab Etendue enhancement for light emitting diode subpixels
US11362238B2 (en) 2017-10-06 2022-06-14 Nanosys, Inc. Light emitting diode containing oxidized metal contacts
US10804436B2 (en) 2017-10-06 2020-10-13 Glo Ab Light emitting diode containing oxidized metal contacts
FR3076399B1 (fr) * 2017-12-28 2020-01-24 Aledia Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles
US10627673B2 (en) 2018-04-06 2020-04-21 Glo Ab Light emitting diode array containing a multilayer bus electrode and method of making the same
WO2019199946A1 (en) 2018-04-11 2019-10-17 Glo Ab Light emitting diodes formed on nanodisk substrates and methods of making the same
TWI828679B (zh) 2018-04-20 2024-01-11 美商納諾西斯有限公司 用於直視型顯示器之子像素發光二極體及其製造方法
JP7312772B2 (ja) 2018-06-14 2023-07-21 ナノシス， インコーポレイテッド エピタキシャル窒化ガリウムベース発光ダイオード、および、その製造方法
US11239212B2 (en) 2018-08-24 2022-02-01 Nanosys, Inc. Light emitting diode array containing a black matrix and an optical bonding layer and method of making the same
KR102724659B1 (ko) 2018-12-03 2024-10-31 삼성전자주식회사 비활성화된 영역을 포함하는 발광 다이오드 및 이의 제조방법
US11637219B2 (en) 2019-04-12 2023-04-25 Google Llc Monolithic integration of different light emitting structures on a same substrate
WO2020243147A1 (en) 2019-05-30 2020-12-03 Glo Ab Light emitting diode device containing a positive photoresist insulating spacer and a conductive sidewall contact and method of making the same
FR3098012B1 (fr) * 2019-06-25 2023-01-13 Aledia Procédé d'homogénéisation de la section de nanofils pour diodes électroluminescentes
FR3098992B1 (fr) * 2019-07-18 2023-01-13 Aledia Diode électroluminescente et procédé de fabrication
GB2586862B (en) 2019-09-06 2021-12-15 Plessey Semiconductors Ltd LED precursor incorporating strain relaxing structure
US11462659B2 (en) * 2019-09-10 2022-10-04 Koito Manufacturing Co., Ltd. Semiconductor light emitting device and manufacturing method of semiconductor light emitting device
US11594663B2 (en) 2019-12-20 2023-02-28 Nanosys, Inc. Light emitting diode device containing a micro lens array and method of making the same
US11798988B2 (en) 2020-01-08 2023-10-24 Microsoft Technology Licensing, Llc Graded planar buffer for nanowires
US12074251B2 (en) 2020-04-30 2024-08-27 Samsung Electronics Co., Ltd. Semiconductor device containing stress relaxation layer and method of making thereof
TWI893113B (zh) 2020-05-18 2025-08-11 南韓商三星電子股份有限公司 用於直視型顯示器之次像素發光二極體及其製造方法
US11488822B2 (en) 2020-05-29 2022-11-01 Microsoft Technology Licensing, Llc SAG nanowire growth with ion implantation
US11929253B2 (en) * 2020-05-29 2024-03-12 Microsoft Technology Licensing, Llc SAG nanowire growth with a planarization process
JP7176700B2 (ja) * 2020-07-31 2022-11-22 セイコーエプソン株式会社 発光装置およびプロジェクター
JP7520305B2 (ja) * 2020-08-31 2024-07-23 株式会社小糸製作所 半導体発光素子および半導体発光素子の製造方法
US12159964B2 (en) 2021-01-08 2024-12-03 Samsung Electronics Co., Ltd. Light-emitting diode device containing microlenses and method of making the same
CN114122204B (zh) * 2021-11-26 2024-03-12 江苏第三代半导体研究院有限公司 一种半导体外延片及其制备方法与应用
US20230369535A1 (en) * 2022-05-10 2023-11-16 Meta Platforms Technologies, Llc Nanowire architecture for micro-displays

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3282174B2 (ja) 1997-01-29 2002-05-13 日亜化学工業株式会社 窒化物半導体発光素子
JP4158519B2 (ja) * 2002-12-26 2008-10-01 住友電気工業株式会社 白色発光素子およびその製造方法
US7968359B2 (en) 2006-03-10 2011-06-28 Stc.Unm Thin-walled structures
US20140012224A1 (en) * 2006-04-07 2014-01-09 The Regents Of The University Of California Targeted hollow gold nanostructures and methods of use
JP5453105B2 (ja) * 2006-12-22 2014-03-26 クナノ アーベー ナノ構造のｌｅｄ及びデバイス
WO2008085129A1 (en) 2007-01-12 2008-07-17 Qunano Ab Nitride nanowires and method of producing such
US8188513B2 (en) 2007-10-04 2012-05-29 Stc.Unm Nanowire and larger GaN based HEMTS
JP2009105088A (ja) 2007-10-19 2009-05-14 Panasonic Electric Works Co Ltd 半導体発光素子およびそれを用いる照明装置ならびに半導体発光素子の製造方法
US8138493B2 (en) * 2008-07-09 2012-03-20 Qunano Ab Optoelectronic semiconductor device
SE533090C2 (sv) * 2008-07-09 2010-06-22 Qunano Ab Nanostrukturerad ljusdiod
WO2010062644A2 (en) * 2008-10-28 2010-06-03 The Regents Of The University Of California Vertical group iii-v nanowires on si, heterostructures, flexible arrays and fabrication
KR101549620B1 (ko) * 2009-01-30 2015-09-02 삼성전자주식회사 ｐｎ 구조를 지닌 Ｚｎ 산화물 나노 와이어 및 그 제조 방법
KR20110064702A (ko) * 2009-12-08 2011-06-15 삼성전자주식회사 요철 구조를 지닌 코어-쉘 나노 와이어 및 이를 이용한 열전 소자
US9112240B2 (en) * 2010-01-04 2015-08-18 Nanotek Instruments, Inc. Lithium metal-sulfur and lithium ion-sulfur secondary batteries containing a nano-structured cathode and processes for producing same
EP2553696A4 (en) * 2010-04-02 2016-07-06 Intel Corp LOAD MEMORY DEVICE, METHOD OF MANUFACTURING THEREFOR, METHOD FOR PRODUCING AN ELECTRICALLY CONDUCTIVE STRUCTURE THEREFOR, MOBILE ELECTRONIC DEVICE THEREWITH AND MICROELECTRONIC DEVICE THEREWITH
SG186261A1 (en) * 2010-06-18 2013-01-30 Glo Ab Nanowire led structure and method for manufacturing the same
EP2586062A4 (en) * 2010-06-24 2015-06-03 Glo Ab SUBSTRATE WITH BUFFER LAYER FOR ALIGNED NANODRAHT GROWTH
KR20120052651A (ko) 2010-11-16 2012-05-24 삼성엘이디 주식회사 나노로드 발광소자
KR20120059064A (ko) * 2010-11-30 2012-06-08 삼성엘이디 주식회사 발광소자 및 그 제조방법
JP5409707B2 (ja) * 2011-06-15 2014-02-05 シャープ株式会社 半導体素子、半導体素子の製造方法、発光ダイオード、光電変換素子、太陽電池、照明装置、バックライトおよび表示装置
US8937297B2 (en) * 2011-12-02 2015-01-20 Commissariat A L'energie Atomique Et Aux Energies Alternatives Optoelectronic device including nanowires with a core/shell structure
EP3005429B1 (en) 2013-06-07 2020-05-27 Glo Ab Multicolor led and method of fabricating thereof
TWI621278B (zh) 2013-12-17 2018-04-11 瑞典商Ｇｌｏ公司 具有應變改質表面活性區域之第三族氮化物奈米線ｌｅｄ及其製造方法

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TWI621278B (zh) 2018-04-11
EP3084847B1 (en) 2018-02-14
EP3084847A4 (en) 2017-05-31
JP2017503333A (ja) 2017-01-26
WO2015095049A1 (en) 2015-06-25
TW201530807A (zh) 2015-08-01
US20160260866A1 (en) 2016-09-08
EP3084847A1 (en) 2016-10-26
US10026866B2 (en) 2018-07-17
US20150207028A1 (en) 2015-07-23
US9281442B2 (en) 2016-03-08
US9761757B2 (en) 2017-09-12
US20170345969A1 (en) 2017-11-30

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