FR3076399B1 - Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles - Google Patents
Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles Download PDFInfo
- Publication number
- FR3076399B1 FR3076399B1 FR1763316A FR1763316A FR3076399B1 FR 3076399 B1 FR3076399 B1 FR 3076399B1 FR 1763316 A FR1763316 A FR 1763316A FR 1763316 A FR1763316 A FR 1763316A FR 3076399 B1 FR3076399 B1 FR 3076399B1
- Authority
- FR
- France
- Prior art keywords
- layer
- chemical
- optoelectronic device
- light emitting
- emitting diodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005693 optoelectronics Effects 0.000 title abstract 2
- 229910052729 chemical element Inorganic materials 0.000 abstract 9
- 239000004065 semiconductor Substances 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
- H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/002—Devices characterised by their operation having heterojunctions or graded gap
- H01L33/0025—Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
L'invention concerne un dispositif optoélectronique (10) comprenant : un élément semiconducteur tridimensionnel (20), composé majoritairement d'un premier élément chimique et d'un deuxième élément chimique ; une zone active (24) recouvrant au moins partiellement les parois latérales de l'élément semiconducteur tridimensionnel (20) et comprenant un empilement d'au moins une première couche composée majoritairement des premier et deuxième éléments chimiques, et d'au moins une deuxième couche composée majoritairement des premier et deuxième éléments chimiques et d'un troisième élément chimique ; une troisième couche (26) recouvrant la zone active, la troisième couche étant composée majoritairement des premier, deuxième et troisième éléments chimiques et d'un quatrième élément chimique, la proportion massique des troisième et quatrième éléments chimiques de la troisième couche augmentant ou diminuant lorsque la distance au substrat (12) augmente ; et une quatrième couche (28), composée majoritairement des premier et deuxième éléments chimiques, recouvrant la troisième couche (26).
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1763316A FR3076399B1 (fr) | 2017-12-28 | 2017-12-28 | Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles |
JP2020536272A JP2021508951A (ja) | 2017-12-28 | 2018-12-06 | 三次元発光ダイオードを備えた光電子デバイス |
CN201880090490.5A CN111788701A (zh) | 2017-12-28 | 2018-12-06 | 包含三维发光二极管的光电设备 |
EP18811318.7A EP3732735A1 (fr) | 2017-12-28 | 2018-12-06 | Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles |
PCT/EP2018/083890 WO2019129473A1 (fr) | 2017-12-28 | 2018-12-06 | Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles |
US16/958,130 US11563147B2 (en) | 2017-12-28 | 2018-12-06 | Optoelectronic device comprising three-dimensional light-emitting diodes |
KR1020207020756A KR102572289B1 (ko) | 2017-12-28 | 2018-12-06 | 3차원 발광 다이오드를 갖는 광전자 장치 |
TW107144095A TWI805657B (zh) | 2017-12-28 | 2018-12-07 | 包含三維發光二極體之光電裝置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1763316A FR3076399B1 (fr) | 2017-12-28 | 2017-12-28 | Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles |
FR1763316 | 2017-12-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3076399A1 FR3076399A1 (fr) | 2019-07-05 |
FR3076399B1 true FR3076399B1 (fr) | 2020-01-24 |
Family
ID=62017441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1763316A Active FR3076399B1 (fr) | 2017-12-28 | 2017-12-28 | Dispositif optoelectronique comprenant des diodes electroluminescentes tridimensionnelles |
Country Status (8)
Country | Link |
---|---|
US (1) | US11563147B2 (fr) |
EP (1) | EP3732735A1 (fr) |
JP (1) | JP2021508951A (fr) |
KR (1) | KR102572289B1 (fr) |
CN (1) | CN111788701A (fr) |
FR (1) | FR3076399B1 (fr) |
TW (1) | TWI805657B (fr) |
WO (1) | WO2019129473A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3096509B1 (fr) * | 2019-05-20 | 2021-05-28 | Aledia | Dispositif optoelectronique avec diodes electroluminescentes dont une zone dopee integre une portion externe a base d’aluminium et de nitrure de galium |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4572963B2 (ja) * | 2008-07-09 | 2010-11-04 | 住友電気工業株式会社 | Iii族窒化物系半導体発光素子、及びエピタキシャルウエハ |
KR101650720B1 (ko) * | 2010-08-04 | 2016-09-06 | 삼성전자주식회사 | 나노로드 기반의 반도체 발광 소자 및 그 제조 방법 |
US8350249B1 (en) * | 2011-09-26 | 2013-01-08 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
KR20130108935A (ko) * | 2012-03-26 | 2013-10-07 | 서울바이오시스 주식회사 | 질화갈륨계 발광 다이오드 |
KR101997020B1 (ko) * | 2012-03-29 | 2019-07-08 | 서울바이오시스 주식회사 | 근자외선 발광 소자 |
KR101976455B1 (ko) * | 2012-10-19 | 2019-05-09 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
US20140264260A1 (en) * | 2013-03-15 | 2014-09-18 | Design Express Limited | Light emitting structure |
DE102013104273A1 (de) * | 2013-04-26 | 2014-10-30 | Osram Opto Semiconductors Gmbh | Anordnung mit säulenartiger Struktur und einer aktiven Zone |
US9196787B2 (en) * | 2013-06-07 | 2015-11-24 | Glo Ab | Nanowire LED structure with decreased leakage and method of making same |
JP6409063B2 (ja) * | 2013-12-17 | 2018-10-17 | グロ アーベーGlo Ab | 歪み修正面活性領域を有するiii族窒化物ナノワイヤled及びその製造方法 |
FR3026564B1 (fr) * | 2014-09-30 | 2018-02-16 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a elements semiconducteurs tridimensionnels |
FR3029015B1 (fr) * | 2014-11-24 | 2018-03-02 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a elements semiconducteurs tridimensionnels et son procede de fabrication |
FR3032064B1 (fr) * | 2015-01-22 | 2018-03-09 | Aledia | Dispositif optoelectronique et son procede de fabrication |
KR102523696B1 (ko) * | 2015-11-30 | 2023-04-20 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 발광소자 및 그 제조방법 |
WO2016208993A1 (fr) * | 2015-06-23 | 2016-12-29 | 엘지이노텍 주식회사 | Elément d'émission de lumière et dispositif d'affichage comportant un tel elément |
FR3041476B1 (fr) * | 2015-09-21 | 2017-12-01 | Commissariat Energie Atomique | Dispositif electroluminescent a puits quantiques multiples |
-
2017
- 2017-12-28 FR FR1763316A patent/FR3076399B1/fr active Active
-
2018
- 2018-12-06 WO PCT/EP2018/083890 patent/WO2019129473A1/fr unknown
- 2018-12-06 CN CN201880090490.5A patent/CN111788701A/zh active Pending
- 2018-12-06 EP EP18811318.7A patent/EP3732735A1/fr active Pending
- 2018-12-06 JP JP2020536272A patent/JP2021508951A/ja active Pending
- 2018-12-06 US US16/958,130 patent/US11563147B2/en active Active
- 2018-12-06 KR KR1020207020756A patent/KR102572289B1/ko active IP Right Grant
- 2018-12-07 TW TW107144095A patent/TWI805657B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR20200094790A (ko) | 2020-08-07 |
EP3732735A1 (fr) | 2020-11-04 |
CN111788701A (zh) | 2020-10-16 |
FR3076399A1 (fr) | 2019-07-05 |
JP2021508951A (ja) | 2021-03-11 |
US11563147B2 (en) | 2023-01-24 |
US20200365762A1 (en) | 2020-11-19 |
KR102572289B1 (ko) | 2023-08-28 |
WO2019129473A1 (fr) | 2019-07-04 |
TW201931622A (zh) | 2019-08-01 |
TWI805657B (zh) | 2023-06-21 |
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