JP6401885B1 - Display manufacturing apparatus and device manufacturing method using the same - Google Patents

Display manufacturing apparatus and device manufacturing method using the same Download PDF

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JP6401885B1
JP6401885B1 JP2018115773A JP2018115773A JP6401885B1 JP 6401885 B1 JP6401885 B1 JP 6401885B1 JP 2018115773 A JP2018115773 A JP 2018115773A JP 2018115773 A JP2018115773 A JP 2018115773A JP 6401885 B1 JP6401885 B1 JP 6401885B1
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JP2019026931A (en
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雄樹 相澤
雄樹 相澤
孝雄 星野
孝雄 星野
功康 佐藤
功康 佐藤
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Canon Tokki Corp
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

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  • Manufacturing & Machinery (AREA)
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Abstract

【課題】摩擦熱などによって飛散したグリースが被蒸着体やマスクに付着することを低減する。
【解決手段】本発明のディスプレイ製造装置は、処理対象体に対する処理が行われるチャンバーと;前記チャンバー内で移動する移動体と;前記移動体を移動させるための移動機構であって、潤滑部材が加えられる潤滑部位を含む移動機構と;少なくとも前記移動機構の前記潤滑部位を覆うように前記移動機構に隣接して設けられるカバー部材とを含む。これにより、チャンバー内の移動機構から処理対象体を向かって飛散する潤滑部材をカバー部材によって遮断することができる。
【選択図】図3
The present invention reduces the adhesion of grease scattered by frictional heat or the like to a deposition target or a mask.
A display manufacturing apparatus according to the present invention includes a chamber in which processing is performed on an object to be processed; a moving body that moves in the chamber; a moving mechanism for moving the moving body, and a lubrication member A movement mechanism including a lubrication site to be added; and a cover member provided adjacent to the movement mechanism so as to cover at least the lubrication site of the movement mechanism. Thereby, the lubricating member which scatters toward a process target body from the moving mechanism in a chamber can be interrupted | blocked by a cover member.
[Selection] Figure 3

Description

本発明はディスプレイ製造装置及びこれを用いたデバイス製造方法に関するもので、具体的には、有機電界発光ディスプレイ(OLED)の製造装置内で被移動体を移動させるための移動機構から潤滑部材が飛散して被蒸着体やマスクに付着することを低減するための構造を持つディスプレイ製造装置に関するものである。   The present invention relates to a display manufacturing apparatus and a device manufacturing method using the display manufacturing apparatus. Specifically, a lubricating member is scattered from a moving mechanism for moving a moving object in an organic electroluminescent display (OLED) manufacturing apparatus. The present invention relates to a display manufacturing apparatus having a structure for reducing adhesion to a deposition target or a mask.

最近、フラットパネルディスプレイとして有機電界発光ディスプレイ(OLED)が脚光を浴びている。有機電界発光ディスプレイは自発光ディスプレイで、応答速度、視野角、薄型化などの特性が液晶パネルディスプレイより優れており、モニタ、テレビ、スマートフォンに代表される各種の携帯端末などで、既存の液晶パネルディスプレイを急速に代替している。また、自動車用のディスプレイ等にも、その応用分野が広がっている。   Recently, organic electroluminescent displays (OLEDs) have attracted attention as flat panel displays. Organic electroluminescent displays are self-luminous displays that have better response speed, viewing angle, thinning, and other characteristics than liquid crystal panel displays. We are rapidly replacing displays. In addition, the application fields are expanding to displays for automobiles and the like.

有機電界発光ディスプレイの素子は、2つの向かい合う電極(カソード電極、アノード電極)の間に発光を起こす有機物層が形成された基本構造を有し、有機電界発光ディスプレイの素子の有機物層は、真空チャンバー内で蒸発源に収容されている蒸着物質を蒸発させて真空チャンバー内の被蒸着体に蒸着させることで形成される。   The element of the organic electroluminescent display has a basic structure in which an organic layer that emits light is formed between two opposing electrodes (cathode electrode, anode electrode). The organic layer of the element of the organic electroluminescent display is a vacuum chamber. It is formed by evaporating the vapor deposition material accommodated in the evaporation source and depositing it on the deposition target in the vacuum chamber.

大型化された被蒸着体上に均一な膜厚を持つ有機物層を形成するために、真空チャンバー内に停止されている被蒸着体に対して蒸発源が移動しながら、蒸着工程が行われる。このように蒸発源が移動するムービングソースからなる場合、蒸発源の移動のためにガイドレールが設置され、そのガイドレールの上を蒸発源が移動することになる。   In order to form an organic material layer having a uniform film thickness on the enlarged deposition target, a deposition process is performed while the evaporation source moves relative to the deposition target stopped in the vacuum chamber. When the evaporation source is made of a moving source that moves in this way, a guide rail is installed to move the evaporation source, and the evaporation source moves on the guide rail.

この際、ガイドレール上にはガイドレールに沿って移動するガイドブロックが設けられ、ガイドブロック上には蒸発源の胴体が乗せられる。蒸発源が乗せられたガイドブロックはガイドレールに沿って移動するので、ガイドブロックとガイドレールと間の摩擦を低減するために、ガイドレールとガイドのブロックとの間にはグリース(grease)のような潤滑剤が加えられる。   At this time, a guide block that moves along the guide rail is provided on the guide rail, and the body of the evaporation source is placed on the guide block. Since the guide block on which the evaporation source is placed moves along the guide rail, a grease is used between the guide rail and the guide block to reduce friction between the guide block and the guide rail. The appropriate lubricant is added.

ところで、真空蒸着工程が行われる間、ガイドレールとこれと相対的に移動するガイドブロック間の摩擦熱が持続的に発生し、また、蒸着物質を蒸発させるための蒸発源ユニットの加熱によって真空チャンバー内部の温度そのものが上がる。これによってグリースが加熱されて蒸発してしまう。特に、蒸着工程は、真空状態で行われるため、グリース成分が蒸発しやすいだけでなく空気抵抗がないため、蒸発されたグリースが真空チャンバーの上部に配置される被蒸着体やマスクに向かって飛散しやすく、被蒸着体の蒸着面やマスクに付着してしまうことがある。このように被蒸着体の蒸着面に付着したグリースは、有機電界発光表示素子の寿命を短縮させる原因になる。   By the way, during the vacuum deposition process, frictional heat between the guide rail and the guide block that moves relative to the guide rail is continuously generated, and the vacuum chamber is heated by heating the evaporation source unit for evaporating the deposition material. The internal temperature rises. As a result, the grease is heated and evaporated. In particular, since the vapor deposition process is performed in a vacuum state, the grease component is not only easily evaporated, but also has no air resistance, and thus the evaporated grease is scattered toward the deposition target or the mask placed at the top of the vacuum chamber. It is easy to do and may adhere to the vapor deposition surface and mask of a to-be-deposited body. Thus, the grease adhering to the vapor deposition surface of the vapor-deposited body causes the life of the organic light emitting display device to be shortened.

このようなグリース飛散による問題は真空蒸着装置だけでなく、真空蒸着装置とともに、有機電界発光ディスプレイ製造ラインを構成する他の装置(マスクストックチャンバー、被蒸着体ストックチャンバー、パスチャンバーなど)のように、移動機構や昇降機構を用いて被蒸着体やマスクの移送/昇降を行う装置においても同様の問題がある。   The problem due to the scattering of grease is not only the vacuum deposition apparatus, but also other apparatuses (mask stock chamber, deposition target stock chamber, pass chamber, etc.) constituting the organic electroluminescence display production line together with the vacuum deposition apparatus. The same problem occurs in an apparatus for transferring / elevating a deposition target or a mask using a moving mechanism or an elevating mechanism.

本発明が解決しようとする課題乃至目的は、摩擦熱などによって飛散したグリースが被蒸着体やマスクに付着することを低減することができるディスプレイ製造装置を提供する
ことである。
SUMMARY OF THE INVENTION An object or object of the present invention is to provide a display manufacturing apparatus capable of reducing the adhesion of grease scattered by frictional heat or the like to a deposition target or a mask.

本発明の課題乃至目的は、前述した技術的課題ないし目的に制限されず、言及されていない、他の技術的課題乃至目的は以下の記載から、当業者が明確に理解することができる。   Problems or objects of the present invention are not limited to the above-described technical problems or objects, and other technical problems or objects not mentioned can be clearly understood by those skilled in the art from the following description.

本発明のディスプレイ製造装置は、処理対象体に対する処理が行われるチャンバーと;前記チャンバー内で移動する移動体と;前記移動体を移動させるための移動機構であって、潤滑部材が加えられる潤滑部位を含む移動機構と;少なくとも前記移動機構の前記潤滑部位を覆うように前記移動機構の移動可能部材固定して設けられるカバー部材とを含む。
A display manufacturing apparatus according to the present invention includes a chamber in which processing is performed on a processing object; a moving body that moves in the chamber; a moving mechanism for moving the moving body, and a lubrication site to which a lubricating member is added. A moving mechanism including: a cover member fixed to a movable member of the moving mechanism so as to cover at least the lubrication part of the moving mechanism.

本発明の一態様によるディスプレイ製造装置は、被蒸着体に対する蒸着が行われる真空チャンバーと;蒸着物質が充填される蒸発源を含む蒸発源ユニットと;前記蒸発源ユニットを第1方向に移動させるための第1移動機構であって、潤滑部材が加えられる潤滑部位を含む第1移動機構と;少なくとも前記第1移動機構の前記潤滑部位を覆うように前記第1移動機構の移動可能部材固定して設けられる第1移動機構カバー部材とを含む。
A display manufacturing apparatus according to an aspect of the present invention includes: a vacuum chamber in which vapor deposition is performed on a deposition target; an evaporation source unit including an evaporation source filled with an evaporation material; and moving the evaporation source unit in a first direction. A first moving mechanism including a lubricating portion to which a lubricating member is applied; and fixed to a movable member of the first moving mechanism so as to cover at least the lubricating portion of the first moving mechanism. And a first moving mechanism cover member provided.

本発明の他の一態様によるディスプレイ製造装置は、被移動体が収納されるチャンバーと;前記チャンバー内の被移動体を移動させるための移動機構であって、潤滑部材が加えられる潤滑部位を含む移動機構と;少なくとも前記移動機構の前記潤滑部位を覆うように、前記移動機構の移動可能部材固定して設けられる移動機構カバー部材とを含む。
A display manufacturing apparatus according to another aspect of the present invention includes a chamber in which a moving object is accommodated; a moving mechanism for moving the moving object in the chamber, and a lubricating part to which a lubricating member is added. A moving mechanism; and a moving mechanism cover member fixed to a movable member of the moving mechanism so as to cover at least the lubrication part of the moving mechanism.

本発明の他の一態様によるディスプレイ製造装置は、マスクが収納されるチャンバーと;使用前後のマスクを区分して収納する複数のカセットと;前記カセットを昇降させるための昇降機構であって、潤滑部材が加えられる潤滑部位を含む昇降機構と;少なくとも前記昇降機構の前記潤滑部位を覆うように、前記昇降機構の移動可能部材から延長して設けられる昇降機構カバー部材とを含む。
A display manufacturing apparatus according to another aspect of the present invention includes: a chamber in which a mask is stored; a plurality of cassettes that store a mask before and after use; a lifting mechanism for lifting and lowering the cassette; An elevating mechanism including a lubrication part to which a member is added; and an elevating mechanism cover member provided extending from a movable member of the elevating mechanism so as to cover at least the lubrication part of the elevating mechanism.

本発明によると、真空蒸着装置において蒸発源ユニットを真空チャンバー内で移動させるための蒸発源移動機構から飛散するフッ化物グリースのような潤滑部材が被蒸着体やマスクに付着することを低減することができ、これによって、本発明の真空蒸着装置によって製造される有機電界発光ディスプレイの不良を効果的に防止することができる。また、マスクストックチャンバー、被蒸着体ストックチャンバー、パスチャンバーのように有機電界発光ディスプレイの製造ラインを構成する各チャンバー内で被蒸着体やマスクの移送/昇降機構からグリースなどが飛散し、被蒸着体やマスクに付着することを効果的に防止することができる。   According to the present invention, it is possible to reduce adhesion of a lubricating member such as fluoride grease scattered from an evaporation source moving mechanism for moving an evaporation source unit in a vacuum chamber in a vacuum evaporation apparatus to an evaporation target or a mask. Accordingly, it is possible to effectively prevent defects in the organic electroluminescent display manufactured by the vacuum vapor deposition apparatus of the present invention. In addition, grease, etc. scatters from the deposition target and mask transfer / lifting mechanism in each chamber constituting the organic electroluminescence display production line such as the mask stock chamber, deposition target stock chamber, and pass chamber. It can prevent effectively adhering to a body and a mask.

図1は、有機電界発光ディスプレイ製造ラインの概略図である。FIG. 1 is a schematic view of an organic electroluminescent display production line. 図2は、有機電界発光ディスプレイ製造ラインに使用される真空蒸着装置の概略図である。FIG. 2 is a schematic view of a vacuum deposition apparatus used in an organic electroluminescence display production line. 図3は、真空蒸着装置の蒸発源ユニットを移動させるための第1移動機構及び潤滑部材の飛散を防止するためのカバー部材の概略図である。FIG. 3 is a schematic view of a first moving mechanism for moving the evaporation source unit of the vacuum vapor deposition apparatus and a cover member for preventing scattering of the lubricating member. 図4は、真空蒸着装置の蒸発源ユニットを真空蒸着装置のステージ間に移動させるための第2移動機構及び潤滑部材の飛散を防止するためのカバー部材の概略図である。FIG. 4 is a schematic view of a second moving mechanism for moving the evaporation source unit of the vacuum vapor deposition apparatus between the stages of the vacuum vapor deposition apparatus and a cover member for preventing scattering of the lubricating member. 図5は、マスクストックチャンバー内のマスクカセットを昇降させるための昇降機構及び潤滑部材の飛散を防止するためのカバー部材の概略図である。FIG. 5 is a schematic view of an elevating mechanism for elevating and lowering the mask cassette in the mask stock chamber and a cover member for preventing scattering of the lubricating member. 図6は、被蒸着体ストックチャンバー内で被蒸着体カセットを昇降させるための昇降機構及び潤滑部材の飛散を防止するためのカバー部材の概略図である。FIG. 6 is a schematic view of an elevating mechanism for elevating and lowering a deposition target cassette in a deposition target stock chamber and a cover member for preventing scattering of a lubricating member. 図7は、パスチャンバー内で被蒸着体を移送するための移送機構及び潤滑部材の飛散を防止するためのカバー部材の概略図である。FIG. 7 is a schematic view of a transport mechanism for transporting the deposition target in the pass chamber and a cover member for preventing the lubrication member from scattering. 図8は、本発明のディスプレイ製造装置を用いて、有機電界発光ディスプレイを製造する方法に関するフローチャートである。FIG. 8 is a flowchart relating to a method of manufacturing an organic electroluminescent display using the display manufacturing apparatus of the present invention.

以下、図面を参照し、本発明の実施例を詳しく説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

本発明は多様な変更ができ、多様な実施例を有することができる。特定の実施例を図面に基づき例示して説明するが、本発明はこの特定の実施例に限定されず、本発明の思想および技術範囲に含まれるすべての変更、均等物乃至代替物を含むものと理解されるべきである。   The present invention can be variously modified and have various embodiments. Specific embodiments will be described with reference to the drawings. However, the present invention is not limited to the specific embodiments, and includes all modifications, equivalents or alternatives included in the spirit and technical scope of the present invention. Should be understood.

図1は有機電界発光ディスプレイの製造ラインの構成を簡略に示した図面である。有機電界発光ディスプレイ製造ラインは複数の蒸着ステーションから成り、各蒸着ステーションは、トランスファーチャンバー1(transfer chamber)、トランスファーチャンバー1に連結された複数の真空蒸着装置2、トランスファーチャンバー1に連結され、使用前後のマスクが収納されるマスクストックチャンバー3を含む。各蒸着ステーションの間には、被蒸着体の流れ方向において、上流側の蒸着ステーションから被蒸着体を受けとり、下流側の蒸着ステーションに被蒸着体を流す前に一時的に被蒸着体を収納する被蒸着体ストックチャンバー4、被蒸着体ストックチャンバー4の下流側に設置され、被蒸着体ストックチャンバー4からの被蒸着体を水平旋回させるためのターンチャンバー5(turn chamber)、ターンチャンバー5から被蒸着体を受け取って次の蒸着ステーションに被蒸着体をパスするためのパスチャンバー6(pass chamber)などが設置される。   FIG. 1 is a schematic view illustrating a configuration of a production line of an organic light emitting display. The organic electroluminescence display production line is composed of a plurality of deposition stations. Each deposition station is connected to a transfer chamber 1, a plurality of vacuum deposition apparatuses 2 connected to the transfer chamber 1, and a transfer chamber 1 before and after use. The mask stock chamber 3 in which the mask is stored is included. Between each deposition station, in the flow direction of the deposition target, the deposition target is received from the upstream deposition station, and the deposition target is temporarily stored before flowing the deposition target to the downstream deposition station. A deposition chamber 4 is provided on the downstream side of the deposition target stock chamber 4, and a turn chamber 5 for turning the deposition target from the deposition target stock chamber 4 horizontally. A pass chamber 6 (pass chamber) for receiving the vapor deposition body and passing the vapor deposition body to the next vapor deposition station is installed.

有機電界発光ディスプレイ製造ラインにはターンチャンバー5がないものもあり、このような製造ラインではパスチャンバー6内に被蒸着体を180度回転させる回転装置及び
回転された被蒸着体を水平移送するための移送機構を設けることが一般的である。
Some organic electroluminescence display production lines do not have a turn chamber 5. In such a production line, a rotating device that rotates the deposition target 180 degrees in the pass chamber 6 and a horizontal transport of the rotated deposition target. It is common to provide a transfer mechanism.

本発明は、このような有機電界発光ディスプレイ製造ラインを構成する様々な装置乃至チャンバー内の移動/昇降機構から飛散した潤滑部材が各装置乃至チャンバー内の被蒸着体やマスクに付着して被蒸着体やマスクを汚染させる問題を低減させるためのものである。   In the present invention, various members constituting such an organic electroluminescence display production line or a lubricating member scattered from a moving / elevating mechanism in the chamber adheres to a deposition object or a mask in each device or the chamber. This is to reduce the problem of contaminating the body and the mask.

このため、本発明では、潤滑部材の飛散源である移動機構または昇降機構と被蒸着体乃至マスクとの間の潤滑部材の飛散経路をブロッキングするカバー部材を移動機構/昇降機構の周りに隣接して設置することを特徴としている。すなわち、本発明のディスプレイ製造装置は、潤滑部材の飛散源である移動機構/昇降機構の潤滑部位(すなわち、移動機構/昇降機構で潤滑部材が加えられる部位)を少なくとも覆うように、移動機構/昇降機構に隣接して設置されるカバー部材を含むことを特徴とする。   For this reason, in the present invention, a cover member that blocks the scattering path of the lubricating member between the moving mechanism or elevating mechanism that is the source of the lubricating member and the deposition target or mask is adjacent to the moving mechanism / elevating mechanism. It is characterized by being installed. In other words, the display manufacturing apparatus according to the present invention covers the moving mechanism / elevating mechanism lubrication part (that is, the moving mechanism / elevating mechanism to which the lubricating member is added) at least so as to cover the lubricating member scattering source. It includes a cover member installed adjacent to the lifting mechanism.

以下、各装置乃至チャンバー別に本発明の構成について具体的に説明している。   Hereinafter, the configuration of the present invention will be specifically described for each apparatus or chamber.

(第1実施例)   (First embodiment)

図2は、本発明の一実施例による真空蒸着装置2の全体的な構成を概略的に示す図面である。   FIG. 2 is a drawing schematically showing an overall configuration of a vacuum deposition apparatus 2 according to an embodiment of the present invention.

図2(a)に示されたとおり、本発明の一実施例による真空蒸着装置2は、減圧雰囲気の下で被蒸着体7(処理対象体、例えば、基板)に対して蒸着が行われる空間を定義する真空チャンバー10及び蒸着物質を蒸発させて放出する蒸発源ユニット11を含む。   As shown in FIG. 2A, the vacuum deposition apparatus 2 according to an embodiment of the present invention is a space in which deposition is performed on an object to be deposited 7 (processing object, for example, a substrate) under a reduced pressure atmosphere. And an evaporation source unit 11 for evaporating and releasing the vapor deposition material.

蒸発源ユニット11は蒸着物質を収容し、蒸着物質を加熱して蒸発させるための蒸発源12を含む。蒸発源12は、被蒸着体7の蒸着面に向いて蒸着物質を放出する放出孔或いはノズルを複数備えた構造を持つが、これに限らず、被蒸着体7、マスク8のパターン、蒸着物質の種類などに合わせて、適宜選択できる。例えば、点(point)蒸発源や線形(linear)蒸発源、小型の蒸着物質収容部に、蒸着物質を放出する複数の放出孔を持つ拡散室に接続した構造の蒸発源などを用いてもよい。   The evaporation source unit 11 contains an evaporation material and includes an evaporation source 12 for heating and evaporating the evaporation material. The evaporation source 12 has a structure including a plurality of discharge holes or nozzles that discharge the deposition material toward the deposition surface of the deposition target 7, but is not limited to this, and the pattern of the deposition target 7, the mask 8, and the deposition material. It can be selected as appropriate according to the type of the. For example, a point evaporation source, a linear evaporation source, an evaporation source having a structure connected to a diffusion chamber having a plurality of emission holes for discharging a deposition material, or the like may be used in a small deposition material container. .

また、本発明の真空蒸着装置2は、図2(b)に示されたように、蒸発源12から蒸発し被蒸着体に向けて噴射される蒸着物質を遮断乃至通過させる開閉シャッター(不図示)と、蒸発源12から放出された蒸着物質の蒸発レートをモニタする膜厚モニタ13と、膜厚モニタ13からの入力信号を受け膜厚を計測する膜厚計14と、蒸発源12に設けられた加熱装置を制御する電源15と、被蒸着体7を保持し、被蒸着体7をマスク8や蒸発源12に対して相対的に移動させることができる被蒸着体ホルダー16と、マスク8を保持し、マスク8を被蒸着体7や蒸発源12に対して相対的に移動させることができるマスクホルダー17等の他の構成部品をさらに含むことができる。   In addition, as shown in FIG. 2B, the vacuum vapor deposition apparatus 2 of the present invention has an open / close shutter (not shown) that blocks or allows the vapor deposition material evaporated from the evaporation source 12 and sprayed toward the vapor deposition target. ), A film thickness monitor 13 for monitoring the evaporation rate of the vapor deposition material released from the evaporation source 12, a film thickness meter 14 for measuring the film thickness in response to an input signal from the film thickness monitor 13, and the evaporation source 12 A power source 15 for controlling the heating device, a deposition target 7, a deposition target holder 16 that holds the deposition target 7 and can move the deposition target 7 relative to the mask 8 and the evaporation source 12, and the mask 8. , And other components such as a mask holder 17 that can move the mask 8 relative to the deposition target 7 and the evaporation source 12 can be further included.

このような構成を持つ真空蒸着装置2は真空チャンバー10内を減圧雰囲気(例えば、真空)にした状態で蒸発源ユニット11の蒸発源12内に収容されている蒸着物質を加熱・蒸発させ、蒸発された蒸着物質を所定のパターンが形成されているマスク8又はパターンシートを通じて、被蒸着体7上に蒸着させ、被蒸着体7上に求められるパターンを持つ蒸着物質の薄膜を形成する。本発明の真空蒸着装置2を用いて有機電界発光ディスプレイデバイスを製造する具体的な方法については、後述する。   The vacuum vapor deposition apparatus 2 having such a configuration heats and evaporates the vapor deposition material accommodated in the evaporation source 12 of the evaporation source unit 11 in a state where the vacuum chamber 10 is in a reduced pressure atmosphere (for example, vacuum), and evaporates. The deposited deposition material is deposited on the deposition target 7 through the mask 8 or pattern sheet on which a predetermined pattern is formed, and a thin film of deposition material having the required pattern is formed on the deposition target 7. A specific method for manufacturing an organic electroluminescent display device using the vacuum deposition apparatus 2 of the present invention will be described later.

蒸発源12を含む蒸発源ユニット11は、通常、真空チャンバー10の下方に一つが配置され、一つの蒸発源ユニット11で被蒸着体7全体に均一な厚さの薄膜を蒸着するため
に、蒸発源ユニット11を被蒸着体7の長手方向に沿って真空チャンバー10のドア側から真空チャンバー10の奥側(図2(a)に示された矢印の方向に)移動させながら蒸着を行う。
One evaporation source unit 11 including the evaporation source 12 is usually disposed below the vacuum chamber 10. In order to deposit a thin film having a uniform thickness on the entire deposition target 7 with one evaporation source unit 11, evaporation is performed. Vapor deposition is performed while moving the source unit 11 along the longitudinal direction of the deposition target 7 from the door side of the vacuum chamber 10 to the back side of the vacuum chamber 10 (in the direction of the arrow shown in FIG. 2A).

図2(a)の真空蒸着装置2は、一つの真空チャンバー10内に2つの被蒸着体7が搬入され、その中の一つの被蒸着体7に蒸着が行われている間(例えば、A側ステージ)、他の被蒸着体7に対して(例えば、B側ステージ)は、マスク8と被蒸着体7間の整列(アライメント)が行われる、いわゆる、「デュアルステージ」で蒸着可能な真空蒸着装置2を図示している。   In the vacuum vapor deposition apparatus 2 of FIG. 2A, two vapor deposition bodies 7 are carried into one vacuum chamber 10, and vapor deposition is performed on one of the vapor deposition bodies 7 (for example, A Side stage), the other deposition target 7 (for example, the B side stage) is a vacuum that can be deposited by a so-called “dual stage” in which alignment between the mask 8 and the deposition target 7 is performed. A vapor deposition apparatus 2 is shown.

このようなデュアルステージの真空蒸着装置2においては、それぞれのステージ内で蒸着工程が行われる際に被蒸着体7の長手方向に沿って蒸発源ユニット11を移動させることに加え、蒸発源ユニット11を各ステージ間に移動させる。以下では、デュアルステージの真空蒸着装置2の例を挙げて本発明の構成を説明するが、この限りではなく、本発明は真空チャンバー10内での蒸発源ユニット11の移動が伴う場合には適用可能である。   In such a dual-stage vacuum vapor deposition apparatus 2, in addition to moving the evaporation source unit 11 along the longitudinal direction of the vapor-deposited body 7 when the vapor deposition process is performed in each stage, the evaporation source unit 11 Is moved between each stage. Hereinafter, the configuration of the present invention will be described with reference to an example of the dual stage vacuum vapor deposition apparatus 2, but the present invention is not limited to this, and the present invention is applicable when the evaporation source unit 11 moves in the vacuum chamber 10. Is possible.

蒸発源ユニット11を被蒸着体7に対向する面内で被蒸着体7の長手方向に移動させたり、各ステージ間に移動させるため、真空チャンバー10の下方には蒸発源移動機構18が配置される。すなわち、蒸発源移動機構18は蒸発源ユニット11を被蒸着体の長手方向である第1方向に移動させるための第1移動機構及び蒸発源ユニット11を第1方向と交差する第2方向に移動させるための第2移動機構を含む。   In order to move the evaporation source unit 11 in the longitudinal direction of the evaporation target body 7 in the plane facing the evaporation target body 7 or between the stages, an evaporation source moving mechanism 18 is disposed below the vacuum chamber 10. The That is, the evaporation source moving mechanism 18 moves the evaporation source unit 11 in the first direction, which is the longitudinal direction of the deposition target, and the evaporation source unit 11 in the second direction intersecting the first direction. Including a second moving mechanism.

蒸発源移動機構18の第1移動機構及び第2移動機構はそれぞれ、蒸発源ユニット11を移動させるために、その移動をガイドするための機構であり、駆動力を提供するサーボモーターと、サーボモーターの回転駆動力を直線駆動力に転換する駆動力転換機構としてのラック/ピニオンと、蒸発源ユニット11の移動をガイドするガイドレール及びガイドレール上でガイドレールに沿って移動可能なガイドブロックなどを含む。   Each of the first moving mechanism and the second moving mechanism of the evaporation source moving mechanism 18 is a mechanism for guiding the movement of the evaporation source unit 11, and includes a servo motor that provides a driving force, and a servo motor. A rack / pinion as a driving force conversion mechanism that converts the rotational driving force of the motor to a linear driving force, a guide rail that guides the movement of the evaporation source unit 11, and a guide block that can move along the guide rail on the guide rail Including.

具体的に、図3に図示されたとおり、蒸発源ユニット11を被蒸着体の長手方向に移動させるための移動機構である第1移動機構は、被蒸着体の長手方向である第1方向に延びる2つの第1ガイドレール19(第1レール部材)、それぞれの第1ガイドレール19上に設置され、第1方向に移動可能な第1ガイドブロック20(第1移動可能部材)を含む。第1ガイドブロック20は蒸発源ユニット11を支持し、蒸発源ユニット11の大気ボックス内の第1サーボモーター21の回転軸端に連結された第1ピニオン22とベースプレート29に固定された第1ラック23との連結によって、第1サーボモーター21から駆動力を受け、第1ガイドレール19上で、第1方向に移動する。第1ピニオン22と第1ラック23とが、本実施例の第1駆動力転換機構に当たるが、本発明は、このような駆動力転換機構に限定されず、駆動源であるモーターの回転駆動力を直線駆動力に転換できる他の駆動力転換機構を含むことができる。例えば、ボールねじのような他の駆動力転換機構を含むこともできる。   Specifically, as illustrated in FIG. 3, the first moving mechanism that is a moving mechanism for moving the evaporation source unit 11 in the longitudinal direction of the deposition target is in the first direction that is the longitudinal direction of the deposition target. Two extended first guide rails 19 (first rail members) are provided on the respective first guide rails 19 and include a first guide block 20 (first movable member) movable in the first direction. The first guide block 20 supports the evaporation source unit 11, and a first rack fixed to the base plate 29 and a first pinion 22 connected to the rotary shaft end of the first servo motor 21 in the atmospheric box of the evaporation source unit 11. By being connected to the first servomotor 21, the driving force is received from the first servomotor 21 and moves in the first direction on the first guide rail 19. The first pinion 22 and the first rack 23 correspond to the first driving force conversion mechanism of the present embodiment, but the present invention is not limited to such a driving force conversion mechanism, and the rotational driving force of the motor that is the driving source. Other driving force conversion mechanisms that can convert the motor to a linear driving force can be included. For example, other driving force conversion mechanisms such as a ball screw can be included.

第1ガイドレール19と第1ガイドブロック20との間、そして、第1サーボモーター21の回転軸端に連結された第1ピニオン22とベースプレート29に固定された第1ラック23との間には摩擦抵抗を低減させるために、フッ素成分のグリース(grease)のような潤滑部材が加えられる。   Between the first guide rail 19 and the first guide block 20 and between the first pinion 22 connected to the rotating shaft end of the first servo motor 21 and the first rack 23 fixed to the base plate 29. In order to reduce the frictional resistance, a lubricating member such as a grease of fluorine component is added.

本実施例による真空蒸着装置2は、蒸発源ユニット11を第1方向に移動させる第1移動機構の潤滑部位(潤滑部材が加えられた部位)から被蒸着体7やマスク8に向かう潤滑部材の飛散経路を遮断するため、少なくとも第1移動機構の潤滑部位を覆うように、第1移動機構に隣接して設置された第1移動機構カバー部材を含む。   The vacuum vapor deposition apparatus 2 according to the present embodiment has a lubrication member that is directed from the lubrication part (the part to which the lubrication member is added) of the first moving mechanism that moves the evaporation source unit 11 in the first direction toward the deposition target 7 and the mask 8. In order to block the scattering path, a first moving mechanism cover member installed adjacent to the first moving mechanism is included so as to cover at least the lubrication site of the first moving mechanism.

具体的に、図3に図示されたとおり、本実施例による真空蒸着装置2は、第1移動機構カバー部材として、第1ガイドブロック20に固定され、第1ガイドレール19の上面の少なくとも一部を覆うように第1ガイドブロック20の第1方向の前端及び後端から第1方向に所定の長さで延びる第1カバー部材25を含む。第1カバー部材25は第1ガイドレール19と第1ガイドブロック20との間の潤滑部材が真空チャンバー10内の上部に位置する被蒸着体7やマスク8に到達する経路を遮断する機能を果たす。   Specifically, as illustrated in FIG. 3, the vacuum evaporation apparatus 2 according to the present embodiment is fixed to the first guide block 20 as a first moving mechanism cover member, and at least a part of the upper surface of the first guide rail 19. A first cover member 25 extending from the front end and the rear end in the first direction of the first guide block 20 by a predetermined length in the first direction is included. The first cover member 25 functions to block a route through which the lubricating member between the first guide rail 19 and the first guide block 20 reaches the deposition target 7 and the mask 8 positioned in the upper part of the vacuum chamber 10. .

第1カバー部材25は、第1ガイドレール19と第1ガイドブロック20との間から被蒸着体に向かう潤滑部材の飛散経路をより確実に遮断するために、図3(b)に示したように、第1ガイドレール19を3つの面(つまり、上面及び第1方向から見た際の両側面)で囲むように形成することがより望ましい。つまり、潤滑部材の飛散源である移動機構から被蒸着体7やマスク8が見えないように飛散源の移動機構を覆う位置だけでなく、直接的な視線(line of sight)経路上ではない位置(移動機構から被蒸着体で直接的に向かう方向ではない位置)にもカバー部材を設置することで、潤滑部材の飛散をさらに確実に遮断することができる。これは、潤滑部材が被蒸着体7やマスク8に直接的に向かう方向ではない他の方向に飛散し始めたとしても、再び被蒸着体7やマスク8に向くように飛散経路が変わりうるからである。   As shown in FIG. 3B, the first cover member 25 more reliably blocks the scattering path of the lubricating member from the space between the first guide rail 19 and the first guide block 20 toward the deposition target. In addition, it is more desirable to form the first guide rail 19 so as to be surrounded by three surfaces (that is, the upper surface and both side surfaces when viewed from the first direction). That is, not only the position that covers the moving mechanism of the scattering source so that the deposition target 7 and the mask 8 cannot be seen from the moving mechanism that is the scattering source of the lubricating member, but also a position that is not on the direct line of sight path. By installing the cover member also at a position (a position not directly directed from the moving mechanism to the vapor deposition target), scattering of the lubricating member can be more reliably blocked. This is because even if the lubricating member starts to scatter in another direction that is not directly directed to the deposition target 7 or the mask 8, the scattering path can be changed so as to face the deposition target 7 or the mask 8 again. It is.

図3(a)に示されたように、第1カバー部材25の第1方向の長さは被蒸着体7に向かう飛散経路の遮断程度及び真空蒸着装置2の他の構成部品との干渉の如何を考慮して決めることが望ましい。すなわち、第1カバー部材25の第1方向の長さを長くするほど被蒸着体7に向かう飛散経路をより確実に遮断することができるが、第1方向の移動の両端で第1カバー部材25が例えば、真空チャンバー10の壁面にぶつかる可能性があるので、このような要素のバランスを考慮して第1方向の長さを定めることが望ましい。例えば、第1カバー部材25の中、真空チャンバー10の奥側壁面に向かうカバー部材はその反対側のものより短く形成し、真空チャンバー10の奥側壁面とのぶつかりを防止することができる。   As shown in FIG. 3A, the length of the first cover member 25 in the first direction is the degree of blocking of the scattering path toward the deposition target 7 and the interference with other components of the vacuum deposition apparatus 2. It is desirable to decide in consideration of how. That is, as the length of the first cover member 25 in the first direction is increased, the scattering path toward the deposition target 7 can be more reliably blocked, but the first cover member 25 is at both ends of the movement in the first direction. For example, since there is a possibility of hitting the wall surface of the vacuum chamber 10, it is desirable to determine the length in the first direction in consideration of such a balance of elements. For example, in the first cover member 25, the cover member facing the back wall surface of the vacuum chamber 10 can be formed shorter than the one on the opposite side, and collision with the back wall surface of the vacuum chamber 10 can be prevented.

本実施例の真空蒸着装置2は第1移動機構カバー部材として、図3に図示されたとおり、第1カバー部材25以外に、第1ピニオン22と第1ラック23との間(第1駆動力転換機構の潤滑部位)に加えられた潤滑部材の飛散経路を遮断するための第2カバー部材26を含むことができる。   As shown in FIG. 3, the vacuum vapor deposition apparatus 2 of the present embodiment includes a first moving mechanism cover member between the first pinion 22 and the first rack 23 in addition to the first cover member 25 (first driving force). A second cover member 26 may be included for blocking the scattering path of the lubricating member added to the lubricating portion of the conversion mechanism.

第2カバー部材26は、図3(b)に図示されたとおり、少なくとも第1ピニオン22と第1ラック23と間の潤滑部位を覆うように形成されるが、具体的に、第1ピニオン22の上面の少なくとも一部を覆うように形成される。第2カバー部材26は、潤滑部材の飛散経路をより確実に遮断するために、第1ピニオン22の上面の少なくとも一部だけでなく、第1ピニオン22と第1ラック23との間の結合部位の外側の側面(第1方向から見て、第1ラック23に対して蒸発源ユニット11と反対側)の少なくとも一部も覆うように形成されることがより望ましい。このため、第2カバー部材26は、第1ラック23の外側から垂直方向(第3方向)に延び、その上端部が、第1ピニオン22の上部側に(第1方向と交差する第2方向に)曲がった形状を持つ。第2カバー部材26は、図3(a)に示されたとおり、第1ガイドレール19の第1方向に延びるように形成されるが、第1ガイドレール19の第1方向の長さ全体にわたって設置するほうがより望ましい。こうした第2カバー部材26は、蒸発源ユニット11がAステージの被蒸着体7に蒸着を行う間飛散する潤滑部材がBステージ側の被蒸着体7及びマスク8に向かって飛散したり、その逆でBステージ側の蒸発源ユニット11からAステージ側の被蒸着体7やマスク8に向かって飛散するのも低減できる。   As shown in FIG. 3B, the second cover member 26 is formed so as to cover at least a lubrication site between the first pinion 22 and the first rack 23, but specifically, the first pinion 22. It is formed so as to cover at least a part of the upper surface. The second cover member 26 is not only at least a part of the upper surface of the first pinion 22 but also a coupling site between the first pinion 22 and the first rack 23 in order to more reliably block the scattering path of the lubricating member. It is more desirable to form so as to cover at least a part of the outer side surface (as viewed from the first direction, opposite to the evaporation source unit 11 with respect to the first rack 23). For this reason, the second cover member 26 extends in the vertical direction (third direction) from the outside of the first rack 23, and its upper end portion is on the upper side of the first pinion 22 (second direction intersecting the first direction). B) It has a bent shape. As shown in FIG. 3A, the second cover member 26 is formed so as to extend in the first direction of the first guide rail 19, but over the entire length of the first guide rail 19 in the first direction. It is more desirable to install. In such a second cover member 26, the lubricating member that scatters while the evaporation source unit 11 performs deposition on the A stage deposition target 7 is scattered toward the B stage deposition target 7 and the mask 8, and vice versa. Thus, scattering from the evaporation source unit 11 on the B stage side toward the deposition target 7 or the mask 8 on the A stage side can be reduced.

以上では、蒸発源ユニット11の第1移動機構からの潤滑部材が真空チャンバー10内の被蒸着体7やマスク8に向かう経路を遮断するためのカバー部材として第1カバー部材25及び第2カバー部材26を説明したが、本実施例の真空蒸着装置2は、それ以外にも蒸発源ユニット11の第1移動機構から被蒸着体7やマスク8に向かう経路を遮断できる他のカバー部材を追加で持つことができる。また、第1カバー部材25及び第2カバー部材26は、真空蒸着装置2の全体的な構造によって、その具体的な形状、長さや設置位置が変更され得る。特に、潤滑部材の飛散源である移動機構に可能な限り隣接するように設置することで、カバー部材の大きさを小さくすることができるだけでなく、潤滑部材の飛散をより効果的に遮断することができる。   In the above, the first cover member 25 and the second cover member are used as cover members for blocking the path from the first moving mechanism of the evaporation source unit 11 toward the deposition target 7 and the mask 8 in the vacuum chamber 10. However, the vacuum deposition apparatus 2 of the present embodiment additionally includes another cover member that can block the path from the first moving mechanism of the evaporation source unit 11 toward the deposition target 7 and the mask 8. Can have. Moreover, the specific shape, length, and installation position of the first cover member 25 and the second cover member 26 can be changed depending on the overall structure of the vacuum deposition apparatus 2. In particular, it is possible to not only reduce the size of the cover member but also more effectively block the scattering of the lubricating member by installing it as close as possible to the moving mechanism that is the scattering source of the lubricating member. Can do.

以下では、図4を参照して、本実施例の真空蒸着装置2において、蒸発源ユニット11のステージ間の移動に使用される第2移動機構及び第2移動機構の潤滑部位から被蒸着体7やマスク8に向かう潤滑部材の飛散経路を遮断するための第2移動機構カバー部材について説明する。第2移動機構カバー部材はすくなくとも第2移動機構の潤滑部位を覆うように、第2移動機構に隣接して設ける。   In the following, referring to FIG. 4, in the vacuum vapor deposition apparatus 2 of the present embodiment, the vapor deposition body 7 from the second movement mechanism used for movement between the stages of the evaporation source unit 11 and the lubrication site of the second movement mechanism. A second moving mechanism cover member for blocking the scattering path of the lubricating member toward the mask 8 will be described. The second moving mechanism cover member is provided adjacent to the second moving mechanism so as to cover at least the lubrication part of the second moving mechanism.

本実施例の真空蒸着装置2の第2移動機構は、蒸発源ユニット11をAステージからBステージに(又はその反対に)移動させるために、第1方向と交差する第2方向に延びる第2ガイドレール27(第2レール部材)及び第2ガイドレール27上で第2方向に移動可能な第2ガイドブロック28(第2移動可能部材)を含む。第2ガイドブロック28上のベースプレート29には第1移動機構(第1ガイドレール19と第1ガイドブロック20など)が乗せられる。第2ガイドブロック28は、第2方向への移動の駆動源である第2サーボモーター30と、第2サーボモーター30の回転駆動力を直線駆動力に転換するための第2駆動力転換機構としての第2ラック32と第2ピニオン31によって、第2ガイドレール27上を第2方向に移動する。これにより、第2ガイドブロック28によって支持された第1移動機構及び第1移動機構の第1ガイドブロック上に乗せられた蒸発源ユニット11は第2方向にステージ間を移動することができるようになる。本実施例では、第2駆動力転換機構として、第2ラック32と第2ピニオン31を例示しているが、本発明はこれに限定されず、駆動源であるモーターの回転駆動力を直線駆動力に転換できる他の駆動力転換機構を使用することができる。例えば、ボールねじのような他の駆動力転換機構を含むことができる。   The second moving mechanism of the vacuum vapor deposition apparatus 2 of the present embodiment has a second extending in the second direction intersecting the first direction in order to move the evaporation source unit 11 from the A stage to the B stage (or vice versa). A guide rail 27 (second rail member) and a second guide block 28 (second movable member) movable on the second guide rail 27 in the second direction are included. A first moving mechanism (such as the first guide rail 19 and the first guide block 20) is placed on the base plate 29 on the second guide block 28. The second guide block 28 is a second servo motor 30 that is a driving source for movement in the second direction, and a second driving force conversion mechanism for converting the rotational driving force of the second servo motor 30 into a linear driving force. The second rack 32 and the second pinion 31 move the second guide rail 27 in the second direction. Thus, the first movement mechanism supported by the second guide block 28 and the evaporation source unit 11 placed on the first guide block of the first movement mechanism can move between the stages in the second direction. Become. In the present embodiment, the second rack 32 and the second pinion 31 are illustrated as the second driving force conversion mechanism, but the present invention is not limited to this, and the rotational driving force of the motor that is the driving source is linearly driven. Other driving force conversion mechanisms that can convert to force can be used. For example, other driving force conversion mechanisms such as ball screws can be included.

第2方向への移動の駆動源である第2サーボモーター30は、図4(c)に示されたとおり、真空チャンバー10の底面に固定され、第2サーボモーター30の回転軸に第2ピニオン31を設置し、これをベースプレート29の側面に形成された第2ラック32とかみ合わせることで、第2ガイドブロック28を第2方向へ移動させる。   As shown in FIG. 4C, the second servo motor 30 that is a driving source for movement in the second direction is fixed to the bottom surface of the vacuum chamber 10, and the second pinion is attached to the rotating shaft of the second servo motor 30. 31 is installed, and this is engaged with the second rack 32 formed on the side surface of the base plate 29, whereby the second guide block 28 is moved in the second direction.

第2ガイドレール27と第2ガイドブロック28との間及び第2ピニオン31と第2ラック32との間にも摩擦抵抗の低減のために、フッ素成分が含まれたグリースのような潤滑部材が加えられるので、真空蒸着装置2内の他のグリース飛散源となる。したがって、本実施例の真空蒸着装置2は第2移動機構カバー部材として、第2ガイドレール27と第2ガイドブロック28との間の潤滑部材が被蒸着体に向かって飛散する経路を遮断するための第3カバー部材33及び第4カバー部材34と、第2ピニオン31と第2ラック32の間(第2駆動力転換機構の潤滑部位)の潤滑部材の飛散経路を遮断するための第5カバー部材35及び第6カバー部材36を含む。   A lubricating member such as grease containing a fluorine component is also provided between the second guide rail 27 and the second guide block 28 and between the second pinion 31 and the second rack 32 in order to reduce frictional resistance. Since it is added, it becomes another grease scattering source in the vacuum deposition apparatus 2. Therefore, the vacuum vapor deposition apparatus 2 of the present embodiment serves as the second moving mechanism cover member in order to block the path where the lubricating member between the second guide rail 27 and the second guide block 28 scatters toward the deposition target. A third cover member 33, a fourth cover member 34, and a fifth cover for blocking the scattering path of the lubricating member between the second pinion 31 and the second rack 32 (lubricated part of the second driving force changing mechanism). A member 35 and a sixth cover member 36 are included.

第3カバー部材33は、第2ガイドレール27と第2ガイドブロック28との間から被蒸着体に向かう潤滑部材の飛散経路を遮断するために、図4(b)に図示されたとおり、第2ガイドブロック28の上面の少なくとも一部を覆い、また、図4(a)に示されたとおり、第2方向に延びる構造を持つ。潤滑部材の飛散をさらに確実に低減させるため、第
3カバー部材33は第2ガイドレール27の内側(第2方向から見た時、第2サーボモーター30の反対側)で第2ガイドレール27及び第2ガイドブロックの側面の少なくとも一部をさらに覆うように形成されることができる。すなわち、第3カバー部材33は、2つの第2ガイドレール27の内側で第2ガイドレール27に隣接して垂直方向(第3方向)に延びることによって、第2ガイドレール27と第2ガイドブロック28の内側の側面の少なくとも一部を覆い、その上端部が、第2ガイドブロック28側に向かって(すなわち、第1方向に)曲がって、第2ガイドブロック28の上面の少なくとも一部を覆う構造を持つことがより望ましい。また、第3カバー部材33は第2方向には、第2ガイドレール27のほぼ全長にわたって第2ガイドレール27に平行に形成されることがより望ましい。
As illustrated in FIG. 4B, the third cover member 33 is used to block the scattering path of the lubricating member from the space between the second guide rail 27 and the second guide block 28 toward the deposition target. 2 Covers at least a part of the upper surface of the guide block 28 and has a structure extending in the second direction as shown in FIG. In order to reduce the scattering of the lubricating member more reliably, the third cover member 33 is disposed on the inner side of the second guide rail 27 (on the opposite side of the second servo motor 30 when viewed from the second direction) and the second guide rail 27 and It may be formed so as to further cover at least a part of the side surface of the second guide block. That is, the third cover member 33 extends in the vertical direction (third direction) adjacent to the second guide rail 27 inside the two second guide rails 27, so that the second guide rail 27 and the second guide block are extended. 28, covering at least a part of the inner side surface thereof, and its upper end portion being bent toward the second guide block 28 (ie, in the first direction) to cover at least a part of the upper surface of the second guide block 28. It is more desirable to have a structure. Further, it is more desirable that the third cover member 33 is formed in parallel with the second guide rail 27 over the substantially entire length of the second guide rail 27 in the second direction.

本実施例の真空蒸着装置2は、第2ガイドレール27と第2ガイドブロック28からの潤滑部材の飛散を遮断する別のカバー部材である第4カバー部材34を有することができる。第4カバー部材34は、2つの第2ガイドレール27の中、真空チャンバー10の奥側に設けられた第2ガイドレール27の外側(真空チャンバー10の奥側の第2ガイドレール27と真空チャンバー10の奥側壁面との間)で第2ガイドレール27及び第2ガイドブロック28の側面(真空チャンバー10の奥側壁面を向かう面)の少なくとも一部を覆うように、第2ガイドレール27の外側の側面に隣接して設けられる。第4カバー部材34は、第2方向には第2ガイドレール27に沿って延びるように形成される。   The vacuum vapor deposition apparatus 2 of the present embodiment can include a fourth cover member 34 that is another cover member that blocks scattering of the lubricating member from the second guide rail 27 and the second guide block 28. The fourth cover member 34 is located outside the second guide rail 27 provided on the back side of the vacuum chamber 10 among the two second guide rails 27 (the second guide rail 27 and the vacuum chamber on the back side of the vacuum chamber 10). Of the second guide rail 27 so as to cover at least a part of the side surfaces of the second guide rail 27 and the second guide block 28 (surfaces facing the rear wall surface of the vacuum chamber 10) between the second guide rail 27 and the second guide rail 27. Adjacent to the outer side. The fourth cover member 34 is formed to extend along the second guide rail 27 in the second direction.

本実施例の第5カバー部材35は、第2駆動力転換機構である第2ピニオン31及び第2ラック32の潤滑部位を覆うためのカバー部材であり、図4(c)に図示されたように、第2ピニオン31上面及び第2ラック32の上面の少なくとも一部を覆うように形成される。第2駆動力転換機構からのグリースの飛散をさらに確実に防止するために、第5カバー部材35は、第2方向から見て第2ピニオン31の外側(第2方向から見た際、真空チャンバー10のドア側、及び奥側壁面側)側面の少なくとも一部をさらに覆うように形成されることが望ましい。即ち、第5カバー部材35は、第2サーボモーター30の回転軸の上端に連結された第2ピニオン31の外側の側面(第2方向から見て、外側の面)の少なくとも一部を覆うように垂直方向(第3方向)に延び、その上部が少なくとも第2ピニオン31の上面及び第2ラック32の上面の一部を覆うように第2レール部材側に(つまり、第1方向に)曲がっている。第2ピニオン31と第2ラック32との間の飛散源からの潤滑部材の飛散経路をさらに確実に遮断するため、図4(a)に示されたとおり、第5カバー部材35は第2ピニオン31の第1方向から見た際の両側面を追加で覆うように(したがって、全体的に上面及び3側面を覆うように)形成されることもでき、第2ピニオン31とかみ合う第2ラック32の少なくとも一部を覆うように第2方向に延長することもできる。   The fifth cover member 35 of the present embodiment is a cover member for covering the lubrication sites of the second pinion 31 and the second rack 32 that are the second driving force conversion mechanism, as illustrated in FIG. Further, it is formed so as to cover at least a part of the upper surface of the second pinion 31 and the upper surface of the second rack 32. In order to more reliably prevent the grease from scattering from the second driving force conversion mechanism, the fifth cover member 35 is disposed outside the second pinion 31 when viewed from the second direction (when viewed from the second direction, the vacuum chamber (10 door side and back side wall surface side) It is desirable to form at least a part of the side surface. That is, the fifth cover member 35 covers at least a part of the outer side surface (the outer surface when viewed from the second direction) of the second pinion 31 connected to the upper end of the rotation shaft of the second servomotor 30. The upper portion of the second pinion 31 is bent toward the second rail member side (that is, in the first direction) so as to cover at least a part of the upper surface of the second pinion 31 and the upper surface of the second rack 32. ing. As shown in FIG. 4 (a), the fifth cover member 35 is provided with the second pinion in order to further reliably block the scattering path of the lubricating member from the scattering source between the second pinion 31 and the second rack 32. The second rack 32 may be formed so as to additionally cover both side surfaces when viewed from the first direction of the 31 (thus covering the upper surface and the three side surfaces as a whole) and meshing with the second pinion 31. It is also possible to extend in the second direction so as to cover at least a part of the.

第2ピニオン31/第2ラック32から被蒸着体に向かう飛散経路をさらに確実に遮断するため、図4(c)に図示されたように、第1ガイドレール19を乗せていて第2ガイドブロック28上に設置されるベースプレート29(base plate)に垂直な方向(第3方向)に延びる第6カバー部材36を追加で設置することができる。第6カバー部材36は第1方向では第2ピニオン31より内側に設置され、第2方向では、第2ガイドレール27に沿って第2ガイドレール27の長さ全体にわたって設置することができる。   In order to more reliably block the scattering path from the second pinion 31 / second rack 32 to the deposition target, the first guide rail 19 is placed as shown in FIG. A sixth cover member 36 extending in a direction (third direction) perpendicular to a base plate 29 (base plate) installed on the base plate 28 can be additionally installed. The sixth cover member 36 can be installed on the inner side of the second pinion 31 in the first direction, and can be installed along the second guide rail 27 over the entire length of the second guide rail 27 in the second direction.

図4には、第2移動機構から被蒸着体への潤滑部材飛散経路を遮断するため、第3乃至第6カバー部材を図示したが、第2移動機構の構造に従って、これらのカバー部材以外の他のカバー部材が第2移動機構と被蒸着体の間の空間で(第2移動機構に隣接して)少なくとも第2移動機構の潤滑部位を覆うように形成されることもでき、第3乃至第6カバー部材の具体的な形状や設置位置も本発明の技術思想の範囲内で変更することができる。   FIG. 4 illustrates the third to sixth cover members in order to block the lubrication member scattering path from the second moving mechanism to the vapor deposition target, but according to the structure of the second moving mechanism, other than these cover members. Another cover member may be formed so as to cover at least the lubrication part of the second moving mechanism (adjacent to the second moving mechanism) in the space between the second moving mechanism and the deposition target. The specific shape and installation position of the sixth cover member can also be changed within the scope of the technical idea of the present invention.

本実施例では、真空蒸着装置2内の蒸発源ユニット11の移動機構から飛散する潤滑部材を遮断するためのカバー部材を中心に説明したが、本発明はこれに限定されず、真空蒸着装置2の他の被移動体の移動機構から被蒸着体やマスクへと向かう経路を遮断するためのカバー部材を含むことができる。例えば、被蒸着体ホルダー16やマスクホルダー17等の移動機構にも、必要に応じて、潤滑部材の飛散経路を遮断するためのカバー部材を設置することができる。   In the present embodiment, the description has focused on the cover member for blocking the lubricating member scattered from the moving mechanism of the evaporation source unit 11 in the vacuum vapor deposition apparatus 2, but the present invention is not limited to this and the vacuum vapor deposition apparatus 2 is not limited thereto. A cover member for blocking a path from another moving body moving mechanism to the vapor deposition body or the mask can be included. For example, a cover member for blocking the scattering path of the lubricating member can be installed in the moving mechanism such as the deposition target holder 16 and the mask holder 17 as necessary.

(第2実施例)   (Second embodiment)

以下、図5を参照して、本発明による第2実施例の構成を説明する。   The configuration of the second embodiment according to the present invention will be described below with reference to FIG.

第2実施例は、有機電界発光ディスプレイ製造ラインのマスクストックチャンバー3内でグリース飛散源からマスクに向かう経路を遮断するために、カバー部材を設置するという点で真空蒸着装置2内のグリース飛散源のカバー部材に関する第1実施例の構成と異なる。   In the second embodiment, the grease scattering source in the vacuum vapor deposition apparatus 2 is provided in that a cover member is installed to block the path from the grease scattering source to the mask in the mask stock chamber 3 of the organic electroluminescence display production line. This is different from the configuration of the first embodiment relating to the cover member.

マスクストックチャンバー3は真空蒸着装置2内で被蒸着体に蒸着工程を行う際に用いられるマスク8を収納するチャンバーであり、真空蒸着工程に使用される前の新たなマスク及び使用済みのマスクを別途のマスクカセット39に収納する構造を持つ。マスクストックチャンバー3ではマスクが収納された複数のマスクカセット39を第1ステージ40上に乗せ、第1ステージ40をマスク出入り口に向かって昇降機構によって昇降させてマスクストックチャンバー3からマスクを搬出入させる。   The mask stock chamber 3 is a chamber for storing a mask 8 used when a deposition process is performed on an object to be deposited in the vacuum deposition apparatus 2, and a new mask and a used mask before being used in the vacuum deposition process are stored therein. It has a structure to be stored in a separate mask cassette 39. In the mask stock chamber 3, a plurality of mask cassettes 39 storing masks are placed on the first stage 40, and the first stage 40 is moved up and down by a lifting mechanism toward the mask entrance / exit to carry the mask in and out of the mask stock chamber 3. .

マスクストックチャンバー3に使用される昇降機構は、第1ボールねじ41と第1ボールねじ41の両側に設けられる第3ガイドレール42(第3レール部材)と第3ガイドブロック43(第3移動可能部材)とを含む。駆動源である第3モーター(不図示)は第1ボールねじ41の下端に連結されており、第3モーターからの駆動力は第1ボールねじ41と第3ガイドレール42上に移動可能に設置された第3ガイドブロック43を通じて、第3ガイドブロック43に連結された第1ステージ40に伝達される。   The lifting mechanism used in the mask stock chamber 3 includes a first guide screw 42 and a third guide rail 42 (third rail member) provided on both sides of the first ball screw 41 and a third guide block 43 (third movable). Member). A third motor (not shown) as a driving source is connected to the lower end of the first ball screw 41, and the driving force from the third motor is movably installed on the first ball screw 41 and the third guide rail 42. The light is transmitted to the first stage 40 connected to the third guide block 43 through the third guide block 43.

マスクストックチャンバー3内の昇降装置である第1ボールねじ41及び第3ガイドレール42/第3ガイドブロック43にも摩擦抵抗を低減させるために潤滑部材が加えられるので、本実施例では、彼らからマスクストックチャンバー3内に収納されたマスク8に向かって潤滑部材が飛散する経路を遮断するために、昇降機構カバー部材を少なくとも昇降機構の潤滑部位を覆うように昇降機構に隣接して設置する。   Lubricating members are also added to the first ball screw 41 and the third guide rail 42 / third guide block 43, which are lifting devices in the mask stock chamber 3, in order to reduce the frictional resistance. In order to block the path where the lubricating member scatters toward the mask 8 accommodated in the mask stock chamber 3, an elevating mechanism cover member is installed adjacent to the elevating mechanism so as to cover at least the lubrication part of the elevating mechanism.

具体的に、本実施例のマスクストックチャンバーは、第1ボールねじ41の潤滑部位から飛散するグリースを遮断するための、マスクストックチャンバー内の昇降機構カバー部材として、第7カバー部材44を含む。第7カバー部材44は、マスクストックチャンバー3内で垂直方向(昇降機構の昇降方向)に延びる第1ボールねじ41からマスク収納空間に向かう面の少なくとも一部を覆うように、第1ボールねじ41とマスクカセット39との間の空間で第1ボールねじ41に沿って延びる。本実施例による第7カバー部材44は第1ボールねじ41の昇降方向の全長にわたって延びるプレート部材の形状を持つことがより望ましい。   Specifically, the mask stock chamber of the present embodiment includes a seventh cover member 44 as an elevating mechanism cover member in the mask stock chamber for blocking the grease scattered from the lubrication site of the first ball screw 41. The seventh cover member 44 covers the first ball screw 41 so as to cover at least a part of the surface from the first ball screw 41 extending in the vertical direction (the elevating direction of the elevating mechanism) in the mask stock chamber 3 toward the mask storage space. And a space between the mask cassette 39 and the first ball screw 41. It is more desirable that the seventh cover member 44 according to the present embodiment has the shape of a plate member that extends over the entire length of the first ball screw 41 in the ascending / descending direction.

第1ボールねじ41からマスクに向かう潤滑部材の飛散経路をさらに確実に遮断するため、図5に図示されたとおり、第1ボールねじ41を3つの面(マスク収納空間に向かう面及び両側面)で包む構造に第7カバー部材44を形成することがより望ましい。図5に図示したように、第7カバー部材44は第1ボールねじ41からマスク収納空間に向かう
面を覆う部分とその両側面を覆う部分を別途の部材にしても、一体に形成してもいい。
In order to more reliably block the scattering path of the lubricating member from the first ball screw 41 to the mask, the first ball screw 41 has three surfaces (a surface toward the mask storage space and both side surfaces) as shown in FIG. It is more desirable to form the seventh cover member 44 in a structure wrapped in As shown in FIG. 5, the seventh cover member 44 may be formed as a separate member or an integral part of a portion covering the surface from the first ball screw 41 toward the mask storage space and a portion covering both side surfaces thereof. Good.

図5(b)には第7カバー部材44が第1ボールねじ41周囲の長方形の形で3つの面を包む構造に図示されたが、本実施例の第7カバー部材44はこれに限定されず、第1ボールねじ41の設置状態及びマスク収納空間との空間的な配置によって様々な形状を持つことができる。   In FIG. 5B, the seventh cover member 44 is illustrated in a structure that wraps three surfaces in a rectangular shape around the first ball screw 41. However, the seventh cover member 44 of the present embodiment is not limited thereto. The first ball screw 41 can have various shapes depending on the installation state and the spatial arrangement with the mask storage space.

また、本実施例のマスクストックチャンバーはマスクストックチャンバー3内の第3ガイドレール42と第3ガイドブロック43との間の潤滑部材の飛散を遮断するための昇降機構カバー部材として、第8カバー部材45を含むことができる。本実施例による第8カバー部材45は、図5(c)に示されたとおり、潤滑部材第3ガイドブロック43の上下の両端部から垂直方向(昇降方向)に所定の長さで延長し、第3ガイドレール42の周りを包む構造を持つ。   Further, the mask stock chamber of this embodiment is an eighth cover member as an elevating mechanism cover member for blocking the scattering of the lubricating member between the third guide rail 42 and the third guide block 43 in the mask stock chamber 3. 45 can be included. As shown in FIG. 5C, the eighth cover member 45 according to this embodiment extends from the upper and lower ends of the lubricating member third guide block 43 in a vertical direction (lifting direction) with a predetermined length, It has a structure that wraps around the third guide rail 42.

本実施例では、マスクストックチャンバー3内のカセット昇降機構からの潤滑部材の飛散を遮断するための昇降機構カバー部材を中心に説明したが、マスクストックチャンバー3内の他の移動機構からの潤滑部材の飛散を遮断するためのカバー部材も本発明の範囲に含まれる。   In the present embodiment, the description has focused on the lifting mechanism cover member for blocking the scattering of the lubricating member from the cassette lifting mechanism in the mask stock chamber 3, but the lubricating member from the other moving mechanism in the mask stock chamber 3. A cover member for blocking the scattering of the above is also included in the scope of the present invention.

(第3実施例)   (Third embodiment)

以下、図6を参照して、本発明による第3実施例の構成を説明する。   The configuration of the third embodiment according to the present invention will be described below with reference to FIG.

第3実施例は、有機電界発光ディスプレイ製造ラインの被蒸着体ストックチャンバー4内で潤滑部材の飛散源から被蒸着体に向かう経路を遮断するために、カバー部材を設置するという点で他の実施例の構成と異なる。   The third embodiment is another implementation in that a cover member is installed in order to block the path from the scattering source of the lubricating member to the deposition target in the deposition target stock chamber 4 of the organic light emitting display production line. Different from the example configuration.

被蒸着体ストックチャンバー4は、被蒸着体の流れ方向の上流側蒸着ステーションで蒸着が完了した被蒸着体を下流側蒸着ステーションに移送する前に一時的に収納するチャンバーであり、被蒸着体7が収納された被蒸着体カセット46を被蒸着体ストックチャンバー4の第2ステージ47上に乗せて、必要に応じて、望む被蒸着体7を搬出入させるため、第2ステージ47を搬出入口に向かって昇降させる。このための昇降機構として、第2ボールねじ48及び第2ボールねじ48の両側に設けられる第4ガイドレール49(第4レール部材)及び第4ガイドブロック50(第4移動可能部材)を使用する。被蒸着体ストックチャンバー4でも、第2ボールねじ48及び第4ガイドレール49と第4ガイドブロック50との間の摩擦抵抗を低減させるため、フッ素成分のグリースのような潤滑部材を使用する。   The deposition target stock chamber 4 is a chamber for temporarily storing the deposition target that has been deposited at the upstream deposition station in the flow direction of the deposition target before being transferred to the downstream deposition station. Is placed on the second stage 47 of the deposition object stock chamber 4 and, if necessary, the desired deposition object 7 is carried in and out, so that the second stage 47 is placed at the carry-in / out entrance. Raise and lower. As a lifting mechanism for this purpose, the second guide screw 49 (fourth rail member) and the fourth guide block 50 (fourth movable member) provided on both sides of the second ball screw 48 and the second ball screw 48 are used. . Also in the deposition object stock chamber 4, in order to reduce the frictional resistance between the second ball screw 48 and the fourth guide rail 49 and the fourth guide block 50, a lubricating member such as a fluorine component grease is used.

本実施例の被蒸着体ストックチャンバーは、少なくとも被蒸着体ストックチャンバー4の昇降機構の潤滑部位を覆う昇降機構カバー部材として、第9カバー部材51を含む。すなわち、本実施例では、潤滑部材が被蒸着体ストックチャンバー4内に設置された第2ボールねじ48及び第4ガイドレール49と第4ガイドブロック50との間から被蒸着体の収納空間に向かって飛散する経路を遮断するために、第9カバー部材51を少なくとも昇降機構の潤滑部位を覆うように昇降機構に隣接して設置する。   The deposition object stock chamber of the present embodiment includes a ninth cover member 51 as an elevating mechanism cover member that covers at least the lubrication part of the elevating mechanism of the deposition object stock chamber 4. In other words, in this embodiment, the lubricating member extends from the second ball screw 48 and the fourth guide rail 49 installed in the deposition target stock chamber 4 to the storage space for the deposition target. In order to block the path of scattering, the ninth cover member 51 is installed adjacent to the lifting mechanism so as to cover at least the lubrication part of the lifting mechanism.

具体的に、図6(a)に示されたとおり、本実施例の第9カバー部材51は垂直方向(昇降方向)に延びる第2ボールねじ48及び第4ガイドレール49と第4ガイドブロック50から被蒸着体(被蒸着体収納空間)に向かう面の少なくとも一部を覆うようにその垂直方向(昇降方向)に延びる。第9カバー部材51は、第2ボールねじ48の昇降方向の長さ全体にわたって形成されるのがより望ましい。潤滑部材の飛散経路をより確実に遮断
するため、図6(b)に図示されたとおり、第2ボールねじ48及び第4ガイドレール49/第4ガイドブロック50を3面(被蒸着体収納空間を向かう面とその両側面)で囲む構造で第9カバー部材51を形成してもよい。この際、被蒸着体収納空間に向かう面(正面)を覆うための部材と両側面を覆うための部材はお互いに別途の部材にしてもよい。第9カバー部材51の具体的な構造は被蒸着体ストックチャンバー4内の昇降装置の構造及び被蒸着体収納空間の構造によってこれと異なる構造を持つことができる。
Specifically, as shown in FIG. 6A, the ninth cover member 51 of the present embodiment includes a second ball screw 48, a fourth guide rail 49, and a fourth guide block 50 that extend in the vertical direction (lifting direction). Extends in the vertical direction (lifting direction) so as to cover at least a part of the surface from the surface toward the deposition target (deposition target storage space). The ninth cover member 51 is more preferably formed over the entire length of the second ball screw 48 in the up-and-down direction. In order to more reliably block the scattering path of the lubricating member, the second ball screw 48 and the fourth guide rail 49 / fourth guide block 50 are arranged on three surfaces (deposited object storage space as shown in FIG. 6B). The ninth cover member 51 may be formed in a structure that is surrounded by a surface facing each other and both side surfaces thereof. At this time, the member for covering the surface (front surface) facing the deposition object storage space and the member for covering both side surfaces may be separate members. The specific structure of the ninth cover member 51 may have a different structure depending on the structure of the lifting device in the deposition object stock chamber 4 and the structure of the deposition object storage space.

本実施例では、被蒸着体ストックチャンバー4内の被蒸着体昇降機構からの潤滑部材の飛散を遮断するための昇降機構カバー部材を中心に説明したが、被蒸着体ストックチャンバー4内の他の移動機構からの潤滑部材の飛散を遮断するためのカバー部材も本発明の範囲に含まれる。   In the present embodiment, the description has focused on the lifting mechanism cover member for blocking the scattering of the lubricating member from the deposition target lifting mechanism in the deposition target stock chamber 4. A cover member for blocking scattering of the lubricating member from the moving mechanism is also included in the scope of the present invention.

(第4実施例)   (Fourth embodiment)

以下、図7を参照して、本発明による第4実施例の構成を説明する。   The configuration of the fourth embodiment according to the present invention will be described below with reference to FIG.

第4実施例は、有機電界発光ディスプレイ製造ラインのパスチャンバー6内でグリース飛散源からマスクに向かう経路を遮断するために、カバー部材を設置するという点で他の実施例の構成と異なる。   The fourth embodiment is different from the configuration of the other embodiments in that a cover member is provided in order to block the path from the grease scattering source to the mask in the pass chamber 6 of the organic electroluminescence display production line.

パスチャンバー6は、有機電界発光ディスプレイ製造ラインのタイプによって、ターンチャンバー5がない場合には、被蒸着体ストックチャンバー4から移送された被蒸着体を次の蒸着ステーションのトランスファーチャンバー1のロボットアームに渡す前に、被蒸着体7を平面上で180度回転させて、被蒸着体7を事前整列のステージに水平方向に移送して被蒸着体の事前整列を行う機能を持つチャンバーである。ターンチャンバー5がある場合には、ターンチャンバー5から渡された基板を次の蒸着ステーションに送る前に事前整列させる機能をもつ。   If the turn chamber 5 is not provided depending on the type of the organic light emitting display production line, the pass chamber 6 can transfer the deposition target transferred from the deposition target stock chamber 4 to the robot arm of the transfer chamber 1 of the next deposition station. Before delivery, the chamber 7 has a function of rotating the deposition target 7 180 degrees on a plane and transferring the deposition target 7 horizontally to a pre-aligned stage to perform pre-alignment of the deposition target. When the turn chamber 5 is present, it has a function of pre-aligning the substrate delivered from the turn chamber 5 before sending it to the next deposition station.

パスチャンバー6の水平移送機構は、図7に図示されたとおり、被蒸着体7が置かれる第3ステージ55の下部にパスチャンバー6の長手方向に延びる第3ボールねじ52及び第3ボールねじ52の両側に設けられる第5ガイドレール53/第5ガイドブロック54を含む。これら第3ボールねじ52及び第5ガイドレール53と第5ガイドブロック54との間には摩擦抵抗を低減させるため、フッ素成分が含まれたグリースのような潤滑部材が加えられる。   As shown in FIG. 7, the horizontal transfer mechanism of the pass chamber 6 includes a third ball screw 52 and a third ball screw 52 that extend in the longitudinal direction of the pass chamber 6 below the third stage 55 on which the deposition target 7 is placed. The fifth guide rail 53 / the fifth guide block 54 are provided on both sides of the first guide rail. A lubricating member such as grease containing a fluorine component is added between the third ball screw 52 and the fifth guide rail 53 and the fifth guide block 54 in order to reduce the frictional resistance.

本実施例のパスチャンバーは少なくとも移送機構の潤滑部位を覆う移送機構カバー部材として、第10カバー部材56を含む。第10カバー部材56は、パスチャンバー6の長手方向に延びる第3ボールねじ52と第5ガイドレール53から第3ステージ55に向かう、第3ボールねじ52と第5ガイドレール53の上面の少なくとも一部を覆うように設置される。第10カバー部材56は、第3ボールねじ52と第5ガイドレール53のほぼ全長にわたって設けられるのがより望ましい。より確実に潤滑部材の飛散経路を遮断するため、図7に図示されたとおり、第3ボールねじ52及び第5ガイドレール53/第5ガイドブロック54を3面(上面及び両側)で包む構造に第10カバー部材56を形成してもよい。この時、被蒸着体(または第3ステージ55)に向かう面(上面)を覆うためのカバー部材と両側面を覆うためのカバー部材はお互いに別途の部材にしてもよい。その他、第10カバー部材56の具体的な構造はパスチャンバー6内の移送装置の構造及び第3ステージ55の構造によってこれと異なる構造を持つことができる。   The pass chamber of the present embodiment includes a tenth cover member 56 as a transfer mechanism cover member that covers at least the lubrication portion of the transfer mechanism. The tenth cover member 56 is at least one of the upper surfaces of the third ball screw 52 and the fifth guide rail 53 from the third ball screw 52 and the fifth guide rail 53 extending in the longitudinal direction of the pass chamber 6 toward the third stage 55. It is installed so as to cover the part. More preferably, the tenth cover member 56 is provided over substantially the entire length of the third ball screw 52 and the fifth guide rail 53. As shown in FIG. 7, the third ball screw 52 and the fifth guide rail 53 / the fifth guide block 54 are wrapped in three surfaces (upper surface and both sides) as shown in FIG. A tenth cover member 56 may be formed. At this time, the cover member for covering the surface (upper surface) facing the deposition target (or the third stage 55) and the cover member for covering both side surfaces may be separate members. In addition, the specific structure of the tenth cover member 56 may have a different structure depending on the structure of the transfer device in the pass chamber 6 and the structure of the third stage 55.

以上では、有機電界発光ディスプレイ製造ラインでグリース飛散源から被蒸着体やマスクに向かう潤滑部材の飛散経路を遮断するためのカバー部材を、真空蒸着装置2、マスク
ストックチャンバー3、被蒸着体ストックチャンバー4、パスチャンバー6を例にとって説明したが、本発明の技術的思想はこれらの装置やチャンバーに限定されず、被蒸着体やマスクの移動/昇降機構を含む他の装置やチャンバーなどにも利用できる。
In the above, the cover member for blocking the scattering path of the lubricating member from the grease scattering source to the deposition target or the mask in the organic electroluminescence display production line is the vacuum deposition apparatus 2, the mask stock chamber 3, and the deposition target stock chamber. 4. Although the pass chamber 6 has been described as an example, the technical idea of the present invention is not limited to these apparatuses and chambers, but can be used for other apparatuses and chambers including a deposition / mask moving / elevating mechanism. it can.

(本発明のディスプレイ製造装置を使用したディスプレイデバイスの製造方法)   (Method of manufacturing a display device using the display manufacturing apparatus of the present invention)

以下では、図2及び8を参照して、本発明のディスプレイ製造装置を使用してデバイスを製造する方法について具体的に説明する。   Below, with reference to FIG. 2 and 8, the method of manufacturing a device using the display manufacturing apparatus of this invention is demonstrated concretely.

まず、制御部(不図示)は、蒸着物質を気化させるため、蒸発源12に設けられた加熱装置を電源15によって制御する。この時、蒸発源12に設けられたシャッター(不図示)が閉じられており、気化された蒸着物質は真空チャンバー10内に放出しないようになっている。シャッターが閉られた状態で蒸発源12に設けられた加熱装置の電源15を入れる(S1)。   First, a control unit (not shown) controls the heating device provided in the evaporation source 12 by the power source 15 in order to vaporize the vapor deposition material. At this time, a shutter (not shown) provided in the evaporation source 12 is closed so that the vaporized vapor deposition material is not released into the vacuum chamber 10. The power supply 15 of the heating device provided in the evaporation source 12 is turned on with the shutter closed (S1).

被蒸着体7に蒸着しようとするパターンが形成されたマスク8が、搬送手段(不図示)によって、真空チャンバー10内に搬入され、マスク8を保持するマスクホルダー17に載置される。マスクホルダー17は、移動機構を有しており、マスク8の位置を所定の位置に移動させる(S2)。この時、マスク8を管理する制御部(不図示)は、マスク使用回数(M)を1とする。   A mask 8 on which a pattern to be deposited on the deposition object 7 is formed is carried into the vacuum chamber 10 by a transport means (not shown) and placed on a mask holder 17 that holds the mask 8. The mask holder 17 has a moving mechanism, and moves the position of the mask 8 to a predetermined position (S2). At this time, a control unit (not shown) that manages the mask 8 sets the number of mask use (M) to 1.

この状態で、蒸着物質が蒸着される対象である被蒸着体7は、搬送手段によって、真空チャンバー10内に搬入され、被蒸着体ホルダー16に載置される。マスク8に設けられたアライメントマークと被蒸着体7に設けられたアライメントマークに基づいて、被蒸着体ホルダー16の移動機構を制御することにより、マスク8と被蒸着体7間のアライメントを行う(S3)。被蒸着体ホルダー16を移動制御して被蒸着体7とマスク8間のアライメントを行う代わりに、被蒸着体7が真空チャンバー10内に搬入され、被蒸着体ホルダー16によって所定の位置に配置された後に、マスク8をマスクホルダー17によって移動し、マスク8と被蒸着体7とのアライメントを行ってもよい。   In this state, the vapor deposition target 7 on which the vapor deposition material is vapor-deposited is carried into the vacuum chamber 10 by the conveying means and placed on the vapor deposition target holder 16. Based on the alignment mark provided on the mask 8 and the alignment mark provided on the deposition target 7, the movement mechanism of the deposition target holder 16 is controlled to perform alignment between the mask 8 and the deposition target 7 ( S3). Instead of moving and controlling the deposition target holder 16 to perform alignment between the deposition target 7 and the mask 8, the deposition target 7 is carried into the vacuum chamber 10 and placed at a predetermined position by the deposition target holder 16. After that, the mask 8 may be moved by the mask holder 17 to align the mask 8 and the deposition target 7.

アライメント終了後、蒸発源12のシャッターを開き、気化された蒸着物質を放出して、マスクパターンに沿って被蒸着体7に蒸着物質を蒸着する(S4)。   After the alignment is completed, the shutter of the evaporation source 12 is opened, the vaporized vapor deposition material is released, and the vapor deposition material is deposited on the vapor deposition target body 7 along the mask pattern (S4).

この時、被蒸着体7全体にわたって均一な厚さで蒸着を行うために、蒸発源12は蒸発源移動機構18によっても図2(b)の紙面に垂直な方向に移動(例えば,被蒸着体の長手方向に移動)する。このような蒸着工程において、蒸発源移動機構18と被蒸着体7またはマスク8との間に蒸発源移動機構18に隣接するように設けられたカバー部材(25、26、33、34、35、36)を含む本発明のディスプレイ製造装置(真空蒸着装置2)を使用することにより、蒸発源移動機構18の潤滑部位に加えられる潤滑部材が蒸発源移動機構18の潤滑部位から被蒸着体7やマスク8に飛散する経路を効果的に遮断できるようになり、これにより、ディスプレイデバイスの不良を低減できるようになる。   At this time, in order to perform vapor deposition with a uniform thickness over the entire body 7 to be deposited, the evaporation source 12 is also moved in a direction perpendicular to the paper surface of FIG. Move in the longitudinal direction). In such a vapor deposition step, a cover member (25, 26, 33, 34, 35, provided so as to be adjacent to the evaporation source moving mechanism 18 between the evaporation source moving mechanism 18 and the deposition target 7 or the mask 8. 36), the lubricating member to be added to the lubricating part of the evaporation source moving mechanism 18 is transferred from the lubricating part of the evaporation source moving mechanism 18 to the deposition target 7 or the like. It is possible to effectively cut off the path that scatters to the mask 8, thereby reducing defects in the display device.

蒸着工程中に水晶振動子などの膜厚のモニタ13は、蒸発レートを計測し、膜厚計14で膜厚に換算する。膜厚計14で換算された膜厚が目標とする膜厚になるまで蒸着を続ける(S5)。   During the vapor deposition process, a film thickness monitor 13 such as a crystal oscillator measures the evaporation rate, and the film thickness meter 14 converts it to a film thickness. Deposition is continued until the film thickness converted by the film thickness meter 14 reaches the target film thickness (S5).

膜厚計14で換算した膜厚が目標値に到達した後、蒸発源12のシャッターを閉じ蒸着を終了する。その後、搬送手段によって被蒸着体7を真空チャンバー10外に搬出する(S6)。マスク8は前述のマスク使用回数(M)が所定回数(n)以上(n≧2)になった場合に交換を行う。使用回数(M)が所定回数(n)より小さい場合には使用回数(M
)を1だけ上げて、次の被蒸着体7を搬入し、同様の工程で蒸着を行う(S7)。マスク8の交換頻度はマスク8への蒸着材料の堆積具合などによって適切に定めることができる。
After the film thickness converted by the film thickness meter 14 reaches the target value, the shutter of the evaporation source 12 is closed to complete the vapor deposition. Then, the to-be-deposited body 7 is carried out of the vacuum chamber 10 by a conveyance means (S6). The mask 8 is replaced when the above-described mask use count (M) is equal to or greater than the predetermined count (n) (n ≧ 2). When the number of uses (M) is smaller than the predetermined number (n), the number of uses (M
) Is increased by 1, and the next vapor-deposited body 7 is carried in, and vapor deposition is performed in the same process (S7). The replacement frequency of the mask 8 can be appropriately determined depending on the degree of deposition of the vapor deposition material on the mask 8.

このような工程を経て、有機電界発光ディスプレイデバイスのようなデバイスを製造することができるが、本発明のデバイス製造方法はこれに限らず、各工程の具体的な構成は適切に変更可能である。   A device such as an organic electroluminescence display device can be manufactured through such steps, but the device manufacturing method of the present invention is not limited to this, and the specific configuration of each step can be appropriately changed. .

以上説明した本発明によると、有機電界発光ディスプレイ製造ラインで蒸発源ユニット11、被蒸着体7やマスク8などを移動乃至昇降させるための機構の潤滑部位から被蒸着体7やマスク8に向かう潤滑部材の飛散経路をカバー部材によって遮断することにより、これら移動機構に使われる潤滑部材が被蒸着体7やマスク8に付着することで有機電界発光ディスプレイデバイスに不具合が発生する問題を低減させることができる。   According to the present invention described above, lubrication from the lubrication part of the mechanism for moving or raising / lowering the evaporation source unit 11, the deposition target 7, the mask 8, etc., to the deposition target 7 or the mask 8 in the organic electroluminescence display production line. By blocking the scattering path of the member by the cover member, it is possible to reduce the problem that the organic electroluminescence display device has a problem due to the lubricating member used in the moving mechanism adhering to the deposition target 7 or the mask 8. it can.

1:トランスファーチャンバー
2:真空蒸着装置
3:マスクストックチャンバー
4:被蒸着体ストックチャンバー
5:ターンチャンバー
6;パスチャンバー
7:被蒸着体
8:マスク
10:真空チャンバー
11:蒸発源ユニット
12:蒸発源
13:膜厚モニタ
14:膜厚計
15:電源
16:被蒸着体ホルダー
17:マスクホルダー
18:蒸発源移動機構
19:第1ガイドレール(第1レール部材)
20:第1ガイドブロック(第1移動可能部材)
21:第1サーボモーター
22:第1ピニオン
23:第1ラック
25:第1カバー部材
26:第2カバー部材
27:第2ガイドレール(第2レール部材)
28:第2ガイドブロック(第2移動可能部材)
29:ベースプレート
30:第2サーボモーター
31:第2ピニオン
32:第2ラック
33:第3カバー部材
34:第4カバー部材
35:第5カバー部材
36:第6カバー部材
39:マスクカセット
40:第1ステージ
41:第1ボールねじ
42:第3ガイドレール(第3レール部材)
43:第3ガイドブロック(第3移動可能部材)
44:第7カバー部材
45:第8カバー部材
46:被蒸着体カセット
47:第2ステージ
48:第2ボールねじ
49:第4ガイドレール(第4レール部材)
50:第4ガイドブロック(第4移動可能部材)
51:第9カバー部材
52:第3ボールねじ
53:第5ガイドレール(第5レール部材)
54:第5ガイドブロック(第5移動可能部材)
55:第3ステージ
56:第10カバー部材
1: transfer chamber 2: vacuum deposition apparatus 3: mask stock chamber 4: deposition target stock chamber 5: turn chamber 6; pass chamber 7: deposition target 8: mask 10: vacuum chamber 11: evaporation source unit 12: evaporation source 13: Film thickness monitor 14: Film thickness meter 15: Power supply 16: Deposited body holder 17: Mask holder 18: Evaporation source moving mechanism 19: First guide rail (first rail member)
20: 1st guide block (1st movable member)
21: first servo motor 22: first pinion 23: first rack 25: first cover member 26: second cover member 27: second guide rail (second rail member)
28: Second guide block (second movable member)
29: base plate 30: second servo motor 31: second pinion 32: second rack 33: third cover member 34: fourth cover member 35: fifth cover member 36: sixth cover member 39: mask cassette 40: first 1 stage 41: 1st ball screw 42: 3rd guide rail (3rd rail member)
43: Third guide block (third movable member)
44: seventh cover member 45: eighth cover member 46: deposition target cassette 47: second stage 48: second ball screw 49: fourth guide rail (fourth rail member)
50: Fourth guide block (fourth movable member)
51: Ninth cover member 52: Third ball screw 53: Fifth guide rail (fifth rail member)
54: Fifth guide block (fifth movable member)
55: Third stage 56: Tenth cover member

Claims (22)

ディスプレイ製造装置において、
処理対象体に対する処理が行われるチャンバーと、
前記チャンバー内で移動する移動体と、
前記移動体を移動させるための移動機構であって、潤滑部材が加えられる潤滑部位を含む移動機構と、
少なくとも前記移動機構の前記潤滑部位を覆うように前記移動機構の移動可能部材固定して設けられるカバー部材とを含むディスプレイ製造装置。
In display manufacturing equipment,
A chamber in which processing is performed on the target object;
A moving body that moves in the chamber;
A moving mechanism for moving the moving body, the moving mechanism including a lubricating part to which a lubricating member is added;
And a cover member fixed to a movable member of the moving mechanism so as to cover at least the lubrication part of the moving mechanism.
ディスプレイ製造装置において、
被蒸着体に対する蒸着が行われる真空チャンバーと、
蒸着物質が充填される蒸発源を含む蒸発源ユニットと、
前記蒸発源ユニットを第1方向に移動させるための第1移動機構であって、潤滑部材が加えられる潤滑部位を含む第1移動機構と、
少なくとも前記第1移動機構の前記潤滑部位を覆うように前記第1移動機構の移動可能部材固定して設けられる第1移動機構カバー部材とを含むディスプレイ製造装置。
In display manufacturing equipment,
A vacuum chamber in which deposition is performed on the deposition target;
An evaporation source unit including an evaporation source filled with a deposition material;
A first moving mechanism for moving the evaporation source unit in a first direction, the first moving mechanism including a lubricating part to which a lubricating member is added;
A display manufacturing apparatus comprising: a first moving mechanism cover member fixed to a movable member of the first moving mechanism so as to cover at least the lubricating part of the first moving mechanism.
前記第1移動機構は、前記第1方向に延びるように設けられる第1レール部材と、前記蒸発源ユニットを支持し、前記第1レール部材上で前記第1方向に移動可能に設けられる第1移動可能部材とを含み、
前記第1移動機構カバー部材は、少なくとも前記第1レール部材と前記第1移動可能部材の潤滑部位を覆うように前記第1移動可能部材に固定して設けられる第1カバー部材を含む請求項2に記載のディスプレイ製造装置。
The first moving mechanism supports a first rail member provided to extend in the first direction and the evaporation source unit, and is provided to be movable in the first direction on the first rail member. A movable member,
The first moving mechanism cover member claims, including a first cover member provided and fixed to the first movable member before SL to cover the lubricating portions of at least the first rail member and the first movable member 2. The display manufacturing apparatus according to 2.
前記第1移動機構は、前記真空チャンバーの下部に配置され、
前記第1カバー部材は、前記第1レール部材の上面の少なくとも一部を覆うように前記第1移動可能部材の前記第1方向の前端及び後端から前記第1方向に所定の長さで延びる請求項3に記載のディスプレイ製造装置。
The first moving mechanism is disposed at a lower portion of the vacuum chamber,
The first cover member extends from the front end and the rear end of the first movable member by a predetermined length in the first direction so as to cover at least a part of the upper surface of the first rail member. The display manufacturing apparatus according to claim 3.
前記第1カバー部材は、前記第1方向から見て前記第1レール部材の両側面の少なくとも一部を覆うように形成される請求項3又は請求項4に記載のディスプレイ製造装置。   The display manufacturing apparatus according to claim 3, wherein the first cover member is formed so as to cover at least a part of both side surfaces of the first rail member when viewed from the first direction. 前記第1移動機構は、前記第1方向に延びるように設けられる第1レール部材と、前記蒸発源ユニットを支持し、前記第1レール部材上で前記第1方向に移動可能に設けられる第1移動可能部材と、前記第1移動可能部材を前記第1方向に移動させるための回転駆動力を発生させる第1モーターと、前記第1モーターの回転駆動力を直線駆動力に転換するための第1駆動力転換機構とを含み、
前記第1移動機構カバー部材は、少なくとも前記第1駆動力転換機構の潤滑部位を覆うように前記第1駆動力転換機構に隣接して設けられる第2カバー部材を含む請求項2乃至請求項5のいずれか1項に記載のディスプレイ製造装置。
The first moving mechanism supports a first rail member provided to extend in the first direction and the evaporation source unit, and is provided to be movable in the first direction on the first rail member. A movable member; a first motor for generating a rotational driving force for moving the first movable member in the first direction; and a first motor for converting the rotational driving force of the first motor into a linear driving force. 1 driving force conversion mechanism,
The said 1st moving mechanism cover member contains the 2nd cover member provided adjacent to the said 1st driving force conversion mechanism so that the lubrication site | part of the said 1st driving force conversion mechanism may be covered at least. The display manufacturing apparatus according to any one of the above.
前記第1移動機構は、前記真空チャンバーの下部に配置され、
前記第1駆動力転換機構は、前記第1モーターの回転軸に連結された第1ピニオンと、前記第1ピニオンとかみ合う第1ラックとを含み、
前記第2カバー部材は、前記第1ピニオンの上面の少なくとも一部を覆うように形成され、前記第1方向に延びる請求項6に記載のディスプレイ製造装置。
The first moving mechanism is disposed at a lower portion of the vacuum chamber,
The first driving force conversion mechanism includes a first pinion connected to a rotation shaft of the first motor, and a first rack meshing with the first pinion.
The display manufacturing apparatus according to claim 6, wherein the second cover member is formed to cover at least a part of an upper surface of the first pinion and extends in the first direction.
前記第2カバー部材は、前記第1方向から見て、前記第1ラックの外側で前記第1ピニオン及び前記第1ラックの側面の少なくとも一部をさらに覆うように形成される請求項7に記載のディスプレイ製造装置。   The said 2nd cover member is formed so that at least one part of the side surface of the said 1st pinion and the said 1st rack may further be covered on the outer side of the said 1st rack seeing from the said 1st direction. Display manufacturing equipment. 記第1移動機構を前記第1方向と交差する第2方向に移動させるための第2移動機構であって、潤滑部材が加えられる潤滑部位を含む第2移動機構と、
少なくとも前記第2移動機構の前記潤滑部位を覆うように、前記第2移動機構に隣接して設けられる第2移動機構カバー部材とをさらに含む請求項2乃至請求項8のいずれか1項に記載のディスプレイ製造装置。
A second moving mechanism for moving the pre-Symbol first moving mechanism in a second direction crossing the first direction, and a second moving mechanism comprising a lubricating sites lubricating member is applied,
To cover the lubricating portion of at least the second moving mechanism, according to any one of claims 2 to 8 further comprising a second moving mechanism cover member provided adjacent to the second moving mechanism of display manufacturing equipment.
前記第2移動機構は、前記第2方向に延びるように設けられる第2レール部材と、前記第1移動機構を支持し、前記第2レール部材上で前記第2方向に移動可能に設けられる第2移動可能部材とを含み、
前記第2移動機構カバー部材は、少なくとも前記第2レール部材と前記第2移動可能部材の潤滑部位を覆うように前記第2レール部材と前記第2移動可能部材に隣接して設けられる第3カバー部材を含む請求項9に記載のディスプレイ製造装置。
The second moving mechanism includes a second rail member provided so as to extend in the second direction, and a second rail member that supports the first moving mechanism and is movable on the second rail member in the second direction. 2 movable members,
The second moving mechanism cover member is provided adjacent to the second rail member and the second movable member so as to cover at least the lubrication sites of the second rail member and the second movable member. The display manufacturing apparatus according to claim 9, comprising a member.
前記第2移動機構は、前記真空チャンバーの下部に設置され、
前記第3カバー部材は、前記第2移動可能部材の上面の少なくとも一部を覆うように形成され、前記第2方向に延びる請求項10に記載のディスプレイ製造装置。
The second moving mechanism is installed in a lower part of the vacuum chamber,
The display manufacturing apparatus according to claim 10, wherein the third cover member is formed to cover at least a part of an upper surface of the second movable member and extends in the second direction.
前記第3カバー部材は、前記第2方向から見て前記第2レール部材の内側で前記第2レール部材及び第2移動可能部材の側面の少なくとも一部を覆うように形成される請求項11に記載のディスプレイ製造装置。   The said 3rd cover member is formed so that it may cover at least one part of the side surface of the said 2nd rail member and a 2nd movable member inside the said 2nd rail member seeing from the said 2nd direction. The display manufacturing apparatus as described. 前記第2移動機構は、前記第2方向に延びるように設けられる第2レール部材と、前記第1移動機構を支持し、前記第2レール部材上で前記第2方向に移動可能に設けられる第2移動可能部材とを含み、
前記第2移動機構カバー部材は、前記第2方向から見て、前記第2レール部材と前記第2移動可能部材の側面のうち、前記真空チャンバーの壁面に向かう外側の側面の少なくとも一部を覆うように形成される第4カバー部材を含む請求項9乃至請求項12のいずれか1項に記載のディスプレイ製造装置。
The second moving mechanism includes a second rail member provided so as to extend in the second direction, and a second rail member that supports the first moving mechanism and is movable on the second rail member in the second direction. 2 movable members,
The second moving mechanism cover member covers at least a part of an outer side surface facing the wall surface of the vacuum chamber among the side surfaces of the second rail member and the second movable member when viewed from the second direction. The display manufacturing apparatus according to claim 9, further comprising a fourth cover member formed as described above.
前記第2移動機構は、前記第2方向に延びるように設けられる第2レール部材と、前記
第1移動機構を支持し、前記第2レール部材上で前記第2方向に移動可能に設けられる第2移動可能部材と、前記第2移動可能部材を前記第2方向に移動させるための駆動力を発生させる第2モーターと、前記第2モーターの回転駆動力を直線駆動力に転換させるための第2駆動力転換機構とを含み、
前記第2移動機構カバー部材は、少なくとも前記第2駆動力転換機構の潤滑部位を覆うように前記第2駆動力転換機構に隣接して設けられる第5カバー部材を含む請求項9乃至請求項13のいずれか1項に記載のディスプレイ製造装置。
The second moving mechanism includes a second rail member provided so as to extend in the second direction, and a second rail member that supports the first moving mechanism and is movable on the second rail member in the second direction. A second movable member, a second motor for generating a driving force for moving the second movable member in the second direction, and a second motor for converting the rotational driving force of the second motor into a linear driving force. 2 driving force conversion mechanism,
The said 2nd moving mechanism cover member contains the 5th cover member provided adjacent to the said 2nd driving force conversion mechanism so that the lubrication site | part of the said 2nd driving force conversion mechanism may be covered at least. The display manufacturing apparatus according to any one of the above.
前記第2移動機構は、前記真空チャンバーの下部に設置され、
前記第2駆動力転換機構は、前記第2モーターの回転軸に連結された第2ピニオンと、前記第2ピニオンとかみ合い、第2方向に延びる第2ラックとを含み、
前記第5カバー部材は、前記第2ピニオンの上面及び前記第2ラックの上面の少なくとも一部を覆うように形成される請求項14に記載のディスプレイ製造装置。
The second moving mechanism is installed in a lower part of the vacuum chamber,
The second driving force conversion mechanism includes a second pinion connected to a rotation shaft of the second motor, and a second rack that meshes with the second pinion and extends in the second direction,
The display manufacturing apparatus according to claim 14, wherein the fifth cover member is formed to cover at least a part of an upper surface of the second pinion and an upper surface of the second rack.
前記第5カバー部材は、前記第2方向から見て、前記第2ピニオンの側面のうち第2ピニオンの外側の側面の少なくとも一部をさらに覆うように形成される請求項15に記載のディスプレイ製造装置。   The display manufacturing method according to claim 15, wherein the fifth cover member is formed so as to further cover at least a part of an outer side surface of the second pinion among side surfaces of the second pinion when viewed from the second direction. apparatus. 前記第1移動機構が固定設置され、前記第2移動機構によって前記第2方向に移動するベースプレートをさらに含み、
前記第2移動機構カバー部材は、前記ベースプレートから前記第1方向及び前記第2方向と交差する第3方向に延びる第6カバー部材を含む請求項9乃至請求項16のいずれか1項に記載のディスプレイ製造装置。
The first moving mechanism is fixedly installed, and further includes a base plate that moves in the second direction by the second moving mechanism,
The second moving mechanism cover member according to any one of claims 9 to 16, including a sixth cover member extending from the base plate in a first direction and a third direction intersecting the second direction. Display manufacturing equipment.
ディスプレイ製造装置において、
被移動体が収納されるチャンバーと、
前記チャンバー内の被移動体を移動させるための移動機構であって、潤滑部材が加えられる潤滑部位を含む移動機構と、
少なくとも前記移動機構の前記潤滑部位を覆うように、前記移動機構の移動可能部材固定して設けられる移動機構カバー部材とを含むディスプレイ製造装置。
In display manufacturing equipment,
A chamber in which the object to be moved is stored;
A moving mechanism for moving the object to be moved in the chamber, the moving mechanism including a lubricating part to which a lubricating member is added;
A display manufacturing apparatus comprising: a moving mechanism cover member fixed to a movable member of the moving mechanism so as to cover at least the lubrication part of the moving mechanism.
ディスプレイ製造装置において、
マスクが収納されるチャンバーと、
使用前後のマスクを区分して収納する複数のカセットと、
前記カセットを昇降させるための昇降機構であって、潤滑部材が加えられる潤滑部位を含む昇降機構と、
少なくとも前記昇降機構の前記潤滑部位を覆うように、前記昇降機構の移動可能部材から延長して設けられる昇降機構カバー部材とを含むディスプレイ製造装置。
In display manufacturing equipment,
A chamber for storing the mask;
A plurality of cassettes for storing and storing masks before and after use;
An elevating mechanism for elevating the cassette, including an elevating mechanism to which a lubricating member is added; and
A display manufacturing apparatus comprising: an elevating mechanism cover member extended from a movable member of the elevating mechanism so as to cover at least the lubricating part of the elevating mechanism.
前記昇降機構は、前記昇降機構の昇降方向に延びるボールねじと、前記ボールねじの両側に形成される第3レール部材と、前記第3レール部材上で前記昇降方向に移動可能に設けられる第3移動可能部材とを含み、
前記昇降機構カバー部材は、少なくとも前記ボールねじの潤滑部位を覆うように、前記ボールねじと前記カセットとの間で前記ボールねじに隣接して設けられる第7カバー部材を含む請求項19に記載のディスプレイ製造装置。
The elevating mechanism includes a ball screw extending in the elevating direction of the elevating mechanism, a third rail member formed on both sides of the ball screw, and a third movably provided on the third rail member in the elevating direction. A movable member,
The said elevating-mechanism cover member contains the 7th cover member provided adjacent to the said ball screw between the said ball screw and the said cassette so that the lubrication site | part of the said ball screw may be covered at least. Display manufacturing equipment.
前記昇降機構は、前記昇降機構の昇降方向に延びるボールねじと、前記ボールねじの両側に形成される第3レール部材と、前記第3レール部材上で前記昇降方向に移動可能に設けられる第3移動可能部材とを含み、
前記昇降機構カバー部材は、前記第3移動可能部材の前記昇降方向の端部から前記昇降
方向に所定の長さで延び、前記第3レール部材の周囲を囲むように形成される第8カバー部材を含む請求項19又は請求項20に記載のディスプレイ製造装置。
The elevating mechanism includes a ball screw extending in the elevating direction of the elevating mechanism, a third rail member formed on both sides of the ball screw, and a third movably provided on the third rail member in the elevating direction. A movable member,
The elevating mechanism cover member extends from the end of the third movable member in the elevating direction by a predetermined length in the elevating direction and is formed to surround the third rail member. 21. The display manufacturing apparatus according to claim 19 or 20, comprising:
請求項1乃至請求項2のいずれか1項に記載のディスプレイ製造装置を用いてデバイスを製造することを特徴とするデバイス製造方法。 Device manufacturing method characterized by manufacturing a device using a display manufacturing apparatus according to any one of claims 1 to 2 1.
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