KR20180132498A - Vacuum deposition apparatus and device manufacturing method using the same - Google Patents

Abstract

The present invention provides a vacuum deposition apparatus which defines a deposition space in which a deposition process with respect to an object to be deposited is performed, and comprises: a vacuum chamber maintained in a vacuum state; an evaporation source unit installed move in the vacuum chamber, and having an evaporator source in which a deposited material is accommodated to be deposited in the object to be deposited; and a rotation moving unit arranged between a side forming the vacuum chamber and the evaporation source unit, wherein one end portion is rotationally connected to the evaporation source unit, and the other end portion is rotationally connected to the side forming the vacuum chamber, wherein the other end portion of the rotation moving unit is rotationally connected to the side forming the vacuum chamber, and the side forming the vacuum chamber is connected to relatively move in a first direction that is a direction heading for the evaporation source unit.

Description

FIELD OF THE INVENTION [0001] The present invention relates to a vacuum deposition apparatus and a device manufacturing method using the same,

The present invention relates to a vacuum deposition apparatus and a method of manufacturing a device using the vacuum deposition apparatus. More particularly, the present invention relates to a vacuum deposition apparatus, in which a rotary moving section for accommodating electrical wiring and piping connected to the evaporation source unit in the vacuum chamber from the outside of the vacuum chamber, To a surface constituting the connection structure.

Recently, an organic electroluminescent display (OLED) has been spotlighted as a flat panel display. The organic electroluminescence display is a self-luminous display, and its characteristics such as response speed, viewing angle, and thinness are superior to liquid crystal panel display, and thus various types of portable terminals represented by monitors, televisions, and smart phones are rapidly replacing existing liquid crystal panel displays . In addition, automotive displays are expanding their applications.

The organic electroluminescence display has a basic structure in which an organic layer for emitting light is formed between two opposing electrodes (a cathode electrode and an anode electrode). The organic layer of the organic electroluminescence display is accommodated in a decompression vacuum chamber in an evaporation source And then depositing the evaporated material on the evaporated material in the vacuum chamber. In such a vacuum vapor deposition apparatus used for deposition of organic materials, wiring and piping (a cooling water pipe for cooling an evaporation source, etc.) for supplying power to various parts and devices included in an evaporation source unit including an evaporation source in a vacuum chamber, Should be connected from the outside of the vacuum chamber.

To this end, in the prior art, a standby arm portion is provided between the bottom surface constituting the vacuum chamber and the evaporation source unit. The standby arm portion is composed of two arms (a first arm and a second arm), the first arm being rotatably connected to the bottom surface constituting the vacuum chamber, and the second arm being rotatably connected to the evaporation source unit. The first arm and the second arm are also rotatably connected to each other.

The inside of the standby arm is a hollow through which various wires and pipes can pass. In order to maintain the inside of the standby arm at an atmospheric pressure, as shown in Patent Documents 1 and 2, each connection portion, that is, a first arm and a vacuum chamber The connecting portion between the bottom surfaces, the connecting portion between the first arm and the second arm, and the connecting portion between the second arm and the evaporation source unit are connected by a magnetic fluid seal that seals a vacuum inside the vacuum chamber.

[Prior Art Literature]

[Patent Document 1]

Japanese Patent Application Laid-Open No. 2009-130559

[Patent Document 2]

Japanese Patent No. 1665380

In the vacuum vapor deposition apparatus, when the interior of the vacuum chamber is depressurized for vapor deposition of organic substances, there is a problem that the surface constituting the vacuum chamber is deformed by the pressure difference between the inside and the outside of the vacuum chamber.

In the conventional vacuum vapor deposition apparatus, since the standby arm (the first arm connected to the surface constituting the vacuum chamber) is fixed to the surface constituting the vacuum chamber through the magnetic fluid seal, the inside of the vacuum chamber is evacuated The deforming force was directly transmitted to the connecting portion between the standby arm and the surface constituting the vacuum chamber. That is, the deformation force of the vacuum chamber at the time of vacuum evacuation mainly occurs in a direction perpendicular to the surface constituting the vacuum chamber. Since the atmospheric arm and the bottom surface constituting the vacuum chamber are connected to fix each other, When the deforming force is large, the deforming force is directly transmitted to each connecting portion of the atmospheric arm, so that the magnetic fluid seal provided for each of the connecting portions of the atmospheric arm is broken or the life is shortened. Vibration or noise may occur in some cases.

SUMMARY OF THE INVENTION It is an object of the present invention to reduce the influence of a load in a vertical direction due to deformation of a surface constituting a vacuum chamber on a standby arm portion and to prevent breakage of a magnetic fluid seal of a connection portion between a standby arm portion and a surface constituting a vacuum chamber And a vacuum evaporation apparatus which prevents the problem that the lifetime is shortened.

A vacuum vapor deposition apparatus according to one aspect of the present invention includes a vacuum chamber in which deposition is performed on an object to be vapor deposited, an evaporation source movably installed in the vacuum chamber, and an evaporation source accommodating a deposition material deposited on the object to be vapor deposited An evaporation source unit, a rotation member disposed between the surface constituting the vacuum chamber and the evaporation source unit, one end rotatably connected to the evaporation source unit and the other end rotatably connected to a surface constituting the vacuum chamber, Wherein the surface of the other end of the rotary movement part and the vacuum chamber rotatably connected to the surface of the vacuum chamber is movable in a first direction that is a direction toward the evaporation source unit So that they are connected to each other.

According to another aspect of the present invention, there is provided a vacuum evaporation apparatus comprising: a vacuum chamber having a first chamber and a second chamber, the vacuum chamber having a first chamber and a second chamber, And an inclination regulating portion for regulating the inclination.

According to the present invention, the rotary moving part provided between the surface constituting the vacuum chamber and the evaporation source unit is relatively movable (i.e., in a floating state) in a direction (first direction) perpendicular to the surface constituting the vacuum chamber Therefore, it is possible to absorb the deformation in the direction (first direction) perpendicular to the plane constituting the vacuum chamber, which occurs when the inside of the vacuum chamber is evacuated to vacuum, so that breakage of the magnetic fluid seal and noise during rotation / Vibration can be reduced. According to the present invention, by providing the inclination regulating portion, it is possible to suppress inclination of the connecting portion between the rotating moving portion and the surfaces constituting the vacuum chamber in the direction parallel to the plane constituting the vacuum chamber (second direction) It is possible to reduce the problem of vacuuming at the connection portion and the noise / vibration at the time of rotation of the rotation moving portion.

FIG. 1 is a schematic view illustrating a vacuum deposition apparatus according to an embodiment of the present invention. Referring to FIG.
FIG. 2 is a view schematically showing an evaporation source moving mechanism and a rotation moving unit for moving the evaporation source unit of the vacuum evaporation apparatus of FIG. 1;
FIG. 3 is a cross-sectional view of a connecting portion of the bottom surface constituting the rotary chamber and the vacuum chamber of FIG. 2;
FIG. 4 is a cross-sectional view of a connecting portion between a rotary moving part and a bottom surface constituting a vacuum chamber according to another embodiment of the present invention.
5 is a flowchart for explaining a device manufacturing method according to the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Various modifications may be made to the present invention and various embodiments may be made, and specific embodiments will be illustrated and illustrated in the drawings. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

(Embodiment 1)

FIG. 1 is a view schematically showing the overall structure of a vacuum deposition apparatus according to an embodiment of the present invention. 1 (a), a vacuum vapor deposition apparatus 1 according to an embodiment of the present invention includes a vacuum chamber (not shown) defining a space in which deposition is performed on an evaporated material (for example, a substrate) 3), and an evaporation source unit (2) for evaporating and discharging the evaporation material.

The evaporation source unit (2) includes an evaporation source (21) composed of a receiving part for receiving the evaporation material and a heating part for evaporating the evaporation material by heating. The evaporation source 21 has a structure in which a plurality of discharge holes or nozzles for discharging the evaporation material toward the deposition surface of the evaporation bodies 4 and 5 are provided but the present invention is not limited thereto, The pattern of the mask, the kind of the evaporation material, and the like. For example, an evaporation source having a structure in which a diffusion chamber having a plurality of discharge holes for discharging an evaporation material is connected to a point evaporation source, a linear evaporation source, and a small evaporation material receiving portion may be used.

1 (b), the evaporation source 1 evaporates from the evaporation source 21 to block or pass the evaporation material sprayed toward the evaporation sources 4 and 5, A film thickness monitor 218 for monitoring an evaporation rate of the evaporation material emitted from the evaporation source 21, a film thickness monitor 218 for receiving an input signal from the film thickness monitor 218, A power source 216 for controlling the heating device provided in the measuring device 217 and the evaporation source 21 and supports the objects to be vapor deposited 4 and 5 to move the object to be vaporized relative to the mask 214 or the evaporation source And a mask holder 215 that supports the mask 214 and can relatively move the mask 214 relative to the evaporation source or the evaporation source.

The vacuum vapor deposition apparatus 1 having such a configuration heats and evaporates the evaporation material contained in the evaporation source 21 of the evaporation source unit 2 in a state where the inside of the vacuum chamber 3 is set to a reduced pressure atmosphere , The evaporated evaporation material is deposited on the evaporation material 4 or 5 via a mask 214 or a pattern sheet having a predetermined pattern formed thereon to form a thin film of evaporation material of a desired pattern on the evaporation material. A specific method for manufacturing the organic electroluminescence display device using the vacuum vapor deposition apparatus 1 of the present invention will be described later.

The evaporation source unit 2 including the evaporation source 21 is usually disposed at a lower portion of the vacuum chamber 3. In order to deposit a thin film having a uniform thickness over the entire evaporated material while using one evaporation source unit , The evaporation source unit 2 is slid along the longitudinal direction of the body to be vapor-deposited, and deposition is performed.

The vacuum vapor deposition apparatus 1 shown in Fig. 1 (a) has a structure in which two deposited materials are introduced into one vacuum chamber 3 and deposition is performed on one of the evaporated substances 4 (for example, Quot; dual stage " configuration in which alignment (alignment) between the mask and the deposited body is performed with respect to another evaporated body 5 (e.g., the B-side stage).

In addition to the above-described sliding movement in which the evaporation source unit 2 is moved along the longitudinal direction of the evaporated material when the vapor deposition process is performed in each stage, in the vacuum deposition apparatus of the dual stage configuration, the evaporation source unit 2 An operation of moving between the stages is also performed. Hereinafter, the structure of the present invention will be described as an example of a dual-stage vacuum vapor deposition apparatus. However, the present invention is not limited thereto. When the evaporation source unit moves in the vacuum chamber, The invention is applicable.

The evaporation source unit 2 including the evaporation source 21 is moved horizontally in the plane facing the evaporation source 4 along the evaporation source moving mechanism 6 disposed at the lower part of the vacuum chamber 3, (4). ≪ / RTI > The evaporation source moving mechanism 6 is a mechanism for providing the driving force of the linear movement to the evaporation source 21 and guiding the movement of the evaporation source 21. The mechanism includes a linear motor for providing driving force and a rack / pinion And a component such as a linear motor for generating a driving force may be accommodated in an atmospheric box provided under the evaporation source 21. [

In the vacuum vapor deposition apparatus 1 thus configured, the heating section of the evaporation source 21 for heating and evaporating the evaporation material described above during the evaporation process, the linear motor for providing the moving driving force to the evaporation source 21, The power supply must be made for this, and the electric wiring for power supply from the outside of the vacuum chamber must be connected thereto. In addition to the electrical wiring, various piping and the like for circulating the cooling water used for cooling the heated evaporation source 21 may be connected to the evaporation source unit 2 from the outside of the vacuum chamber 3

In the present invention, as the structure for providing electrical wiring and piping from the outside of the vacuum chamber 3 to the evaporation source unit 2, the rotary moving part 7 of hollow hollow is used. The rotary movement part 7 is provided between the inlet 31 formed on the bottom surface of the vacuum chamber 3 and the evaporation source unit 2 and has a hollow part 71 which is maintained at atmospheric pressure. Various electrical wirings and pipes connected to the evaporation source unit 2 from the outside of the vacuum chamber are disposed in the hollow portion 71 of the rotary movement portion 7. The evaporation source unit 2 performs a deposition process while moving through the vacuum chamber 2 in a state where electrical wiring and piping are connected through the rotary movement unit 7.

Hereinafter, the configuration of the rotation shifter 7 will be described in detail.

As described above, the rotary movement unit 7 is disposed between the bottom surface of the vacuum chamber 3 and the evaporation source unit 2. One end of the rotation movement unit 7 is pivotally connected to the evaporation source unit 2, (Not shown). More specifically, as shown in Fig. 2, the rotary movement section 7 includes two arms 72, 73 (hereinafter, referred to as " first rotary shaft ") rotatably connected to the bottom surface side of the vacuum chamber 3 and the evaporation source unit 2 side, ) Are interconnected by a link structure. The rotary movement unit 7 includes a first arm 72 one end of which is rotatably connected to the inlet 31 of the bottom surface of the vacuum chamber 3, And a second arm 73 rotatably connected to the lower portion of the box. The other end of the first arm 72 and the other end of the second arm 73 are also pivotally connected so that the first arm and the second arm are disposed between the bottom surface of the vacuum chamber 3 and the evaporation source unit 2 as a whole Thereby forming a link structure of the link structure. Through this structure, the rotary movement section 7 moves along with the movement of the evaporation source unit 2 while providing electrical wiring and piping connection to the evaporation source unit 2.

The connection portions of the evaporation source unit 2 and the second arm 73 and the connection between the second arm 73 and the bottom surface constituting the evaporation source unit 2 and the vacuum chamber 3 The connecting portion of the first arm 72 and the connecting portion of the bottom surface constituting the first arm 72 and the vacuum chamber 3 are connected to the hollow portion 71 in the rotary moving portion 7, So that the space inside the vacuum chamber 3 outside the rotary moving part 7 maintained in the state of being kept in the state of being kept at the atmospheric pressure and the vacuum can be basically connected by using a connecting member such as a magnetic fluid seal, . The magnetic fluid seal is suitable for use as a basic connecting portion of the rotationally moving portion 7, because it can perform the function of a vacuum seal while allowing relative rotation between the connecting members.

In the vacuum vapor deposition apparatus 1 of the present invention, the bottom surface constituting the rotary moving unit 7 or the first arm 72 and the vacuum chamber 3 is moved in the direction toward the evaporation source unit 2, (That is, to flow to the bottom surface constituting the deposition chamber) in a first direction which is a direction perpendicular to the bottom surface constituting the deposition chamber 3. Thus, the load in the direction perpendicular to the plane constituting the vacuum chamber (first direction) due to the deformation of the vacuum chamber can be absorbed, and the deformation force transmitted to the rotary moving unit 7 can be reduced.

3, in the vacuum deposition apparatus 1 according to the embodiment of the present invention, the rotary shaft portion 721 of the first arm 72 is connected to the bottom surface 711 of the vacuum chamber 3, Is inserted and connected to the inlet 31 of the bottom surface constituting the vacuum chamber 3 with the connection portion 8 being movable relatively (i.e., in a floating state) in the first direction perpendicular to the first direction. At this time, vacuum sealing is performed between the rotary shaft portion 721 of the first arm and the connecting portion 8 in such a manner that relative rotation is allowed only through the magnetic fluid seal 9 such as ferroseal, An O-ring 10 is used between the connecting portion on the other end side of the connecting portion 8 connected to the constituting surface side, that is, between the connecting portion 8 and the inner wall of the inlet 31 of the bottom surface constituting the vacuum chamber Vacuum sealing is performed. The magnetic fluid seal 9 ensures the relative rotation of the rotation axis 721 of the first arm 72 to the connection portion 8 without friction loss while ensuring the seal ring between the first arm and the connection portion 8. On the other hand, an O-ring 10, which allows relative movement in the first direction between the other end side of the connecting portion 8, that is, between the connecting portion 8 and the inner wall of the inlet 31 of the bottom surface constituting the vacuum chamber, The first arm 72 including the connecting portion 8 can be pivotally moved relative to the surface constituting the vacuum chamber 3 as a whole and can be rotated in the first direction To the surface constituting the vacuum chamber 3 in a floating state, that is, in a state in which relative movement is possible. Therefore, even when deformation occurs on the surface constituting the vacuum chamber at the time of vacuum evacuation as described above, the load in the first direction due to such deformation is absorbed by the first arm 72 constituting the rotational moving portion 7, Or at least at a relatively small size, thereby avoiding problems such as breakage of the magnetic fluid seal during the deposition process as in the prior art.

Although the present invention has been described based on the configuration of the embodiment, the present invention can have various modifications.

For example, in the embodiment described above, the connection between the first arm 72 and the connection portion 8 is established between the first arm 72 of the rotary movement portion 7 and the bottom surface constituting the vacuum chamber 3, The seal between the connection portion 8 and the bottom surface of the vacuum chamber 3 is performed by using an O-ring, but the first arm (not shown) 72 and the bottom surface constituting the vacuum chamber 3 can be vacuum-sealed in a state of being floated in the first direction. It is also possible to connect the rotary shaft 721 of the first arm 72 and the inlet 31 of the bottom surface constituting the vacuum chamber 3 by using an o-ring and a bearing without separately providing the connecting portion 8, for example. Even in this case, the first arm 72 is connected to the bottom surface of the vacuum chamber 3 in such a manner that the first arm 72 can rotate relative to the bottom surface of the vacuum chamber 3, but permits relative movement in the first direction , The effect of the present invention can be achieved. However, as in the case of the above-described embodiment, the vacuum sealing of the rotating portion is performed with the magnetic fluid seal having little frictional loss through the connecting portion 8, and only the portion for allowing relative movement in the first direction It is more preferable to connect through the connection terminal.

In the present embodiment, the rotary movement unit 7 is provided between the bottom surface of the vacuum chamber 3 and the evaporation source unit 2. However, the present invention is not limited to this, and the evaporation source unit 2 is provided adjacent to a wall surface such as an upper surface or a side surface other than the bottom surface constituting the vacuum chamber 3 and the rotary movement portion 7 is provided between the evaporation source unit 2 and the upper surface or the side surface constituting the vacuum chamber Or when the rotating portion 7 is provided between the moving body and the surface constituting the vacuum chamber so as to supply power and wiring to another moving body provided in the vacuum chamber.

(Second Embodiment)

Hereinafter, the configuration of the second embodiment according to the present invention will be described with reference to FIG.

The second embodiment of the present invention is characterized in that the rotary movement part 7 that is rotatably connected to the bottom surface of the vacuum chamber 3, that is, the first direction in which the first arm 72 intersects the first direction 4 is different from the structure of the first embodiment in that an inclination restricting means 12 for restricting inclination in a direction parallel to the bottom surface of the vacuum chamber is further added. Other configurations are the same as those of the first embodiment, and thus description of the same configuration is omitted.

The configuration of the first embodiment is the same as the configuration of the first embodiment except that as the vacuum chamber 3 is evacuated inside the vacuum chamber 3, It is a structure for solving the influence mainly. However, when the vacuum chamber is deformed during vacuum evacuation, a load in the second direction intersecting with the load in the first direction may also act on the rotationally moving portion 7.

Therefore, in the second embodiment, the inclination restricting means 12 is additionally provided to prevent the tilting of the connecting portion 8 in the second direction. 4, the inclination restricting means 12 of the present invention includes an engagement portion 121 having one end fixed to the upper portion of the connection portion 8 and extending in the second direction, and a vacuum chamber 3, (For example, a cylindrical shape) extending in the first direction from the bottom surface constituting the chamber-side fixing portion 122. The fitting portion 121 and the chamber side fixing portion 122 are provided in such a manner that the other end of the fitting portion 121 is sandwiched by the shaft-like chamber side fixing portion 122. That is, the other end of the fitting portion 121 includes a concave portion into which the chamber-side fixing portion 122 is fitted, and the chamber-side fixing portion 122 includes a projection having a shape corresponding to the shape of the concave portion of the fitting portion 121 . The fitting portion 121 and the chamber-side fixing portion 122 are coupled to each other with the predetermined space 123 in the first direction so as to allow relative movement in the first direction. The length of the space 123 in the first direction is preferably determined in consideration of the amount of deformation of the surface of the vacuum chamber during the vacuum evacuation in the first direction. With this arrangement, the movement of the mating part 121 is not regulated in the first direction (floating state), but the movement is regulated by the chamber side fixing part 122 in the second direction.

The fitting portion 121 is formed in the shape of a concave portion to be fitted in the chamber side fixing portion 122 fixed to the bottom surface of the vacuum chamber and is formed by the friction between the fitting portion 121 and the chamber side fixing portion 122 The present invention is not limited to this. For example, the other end of the fitting portion 121 may have a shape of a shaft extending in the first direction, and the fitting portion 121 May be provided so as to be fitted in the concave portion as the chamber side fixing portion 122 fixed to the bottom surface constituting the vacuum chamber. However, in this modified example, it is preferable to provide the particle scattering prevention mechanism so that the metallic particles generated by the friction between the mating portion 121 and the chamber side fixing portion 122 do not affect the deposited body. For example, a scattering prevention mechanism made of a magnetic material may be provided to prevent scattering of metallic particles.

With this structure, the lower portion of the connecting portion 8 is fixed by the bushing 11, and the upper portion of the connecting portion 8 is regulated by the fitting portion 121 as the inclination restricting means 12 and the chamber- So that inclination in the second direction is prevented. In other words, since the distance between the upper and lower portions of the connecting portion 8 and the supporting points for supporting the connecting portion becomes larger, the angle of inclination of the connecting portion in the entire second direction becomes smaller and the connecting portion 8 and the lower surface A plurality of O-rings for vacuum sealing the inlet 31 can be effectively operated.

It is preferable that a plurality of, for example, three or more such inclined restricting means 12 including the fitting portion 121 and the chamber-side fixing portion 122 are arranged around the connecting portion 8, It may be formed continuously around the connection portion 8 to further improve the performance.

Although the configuration of the second embodiment according to the present invention has been described above, various further modified configurations are also possible. In the configuration of the second embodiment, the fitting portion 121 and the chamber-side fixing portion 122 are basically provided so as to be floatable in the first direction as described above. Therefore, there is a possibility that metallic particles are generated and fall due to the friction due to the relative movement in the first direction. In order to prevent such metallic particles from affecting the deposited body, it may be desirable to further form a tray 13 around the lower portion of the chamber-side fixing portion 122 for collecting the fall of such metallic particles . The particle collecting tray 13 has an L-shaped cross section to prevent the metallic particles from scattering into the deposition space of the vacuum chamber 3 and affecting the deposited body, It is preferable that they are formed continuously around the periphery. The material of the particle collecting tray 13 is not particularly limited, but may be made of a magnetic material in consideration of the ease of collection of metallic particles.

(Method of Manufacturing Device Using Vacuum Deposition Apparatus of Present Invention)

Hereinafter, with reference to Figs. 1 and 5, a method of manufacturing a device using the vacuum vapor deposition apparatus of the present invention will be described in detail.

First, the evaporation source 21 controls the heating device provided in the evaporation source 21 by the power source 216 in order to vaporize the evaporation material. At this time, since the shutter (not shown) provided in the evaporation source 21 is closed, the vaporized evaporation material is not emitted into the vacuum chamber 3. When the shutter is closed, power is supplied to the heating device installed in the evaporation source 21 (S1)

Subsequently, a mask 214 having a pattern to be deposited is formed on the object to be vapor-deposited is placed in a mask holder 215 carrying the mask into the vacuum chamber 3 by carrying means (not shown). The mask holder 215 has a moving mechanism, and moves the position of the mask 214 to a predetermined position (S2). At this time, the control section (not shown) for managing the mask sets the number of times of mask use M to 1.

In this state, the object 4 to be deposited on which the evaporation material is deposited is carried into the vacuum chamber 3 by the conveying means, and placed in the object holder 213 for deposition. The alignment mechanism between the mask 214 and the deposition source 4 is controlled by controlling the movement mechanism of the deposition target holder 213 using the alignment marks formed on the mask 214 and the alignment marks formed on the deposition target body 4 (S3). The object to be deposited 4 is carried into the vacuum chamber 3 and the object to be processed is held by the object holder 213 in place of performing the alignment between the object to be deposited and the mask by controlling the movement of the object holder 213 The mask 214 may be moved by the moving mechanism of the mask holder 215 to perform the alignment between the mask 214 and the object 4 to be vapor deposited.

After completion of the alignment, the shutter of the evaporation source 21 is opened, the vaporized evaporation material is discharged, and the evaporation material is deposited on the evaporation material 4 according to the pattern of the mask 214.

At this time, the evaporation source 21 is moved (for example, by sliding movement) in the direction perpendicular to the paper surface of Fig. 1 (b) by the evaporation source moving mechanism in order to deposit the uniform thickness of the entire evaporable material 4, do. The bottom surface constituting the rotational movement portion 7 and the vacuum chamber 3 disposed between the evaporation source 21 and the bottom surface constituting the vacuum chamber for supplying the power source or the like to the evaporation source 21 or the like includes the vacuum chamber 3 The deformation of the surface constituting the vacuum chamber during the deposition while the evaporation source 21 is moving can be suppressed by the movement of the evaporation source 21 in the direction perpendicular to the bottom surface (the first direction) And it is possible to deposit a uniform thickness on the object 4 to be vapor-deposited.

At this time, the film thickness monitor 218 such as a quartz crystal vibrator measures the evaporation rate and converts the film thickness in the film thickness meter 217. The deposition is continued until the film thickness calculated by the film thickness meter 217 reaches a target film thickness (S5). After the film thickness calculated by the film thickness meter 217 reaches the target value, the shutter of the evaporation source 21 is closed to complete the deposition. After that, the mask 4 is taken out of the vacuum chamber 3 by the conveying means (S6). The mask 214 is set so that the above-mentioned number of times of use of the mask M exceeds a predetermined number (n 2) Replace it every time. When the number M of times of use is smaller than the predetermined number n, the number of times of use M is increased by 1, and the next deposition body 4 is carried in and the deposition is performed in the same step (S7). The frequency of replacement of the mask 214 can be appropriately determined in accordance with the deposition degree of the deposition material in the mask 214. [

Through such a process, a device such as an organic electroluminescent display device can be manufactured. However, the device manufacturing method of the present invention is not limited to this, and the specific configuration of each process can be appropriately changed.

According to the present invention described above, the influence of the load in the first direction and / or the second direction due to the deformation of the surface constituting the vacuum chamber generated during vacuum evacuation of the vacuum chamber on the rotary movement portion 7 is reduced, It is possible to prevent the breakage of the magnetic fluid seal at the connecting portion of the rotary shifting portion 7 and the noise and vibration at the time of rotation of the rotary shifting portion and to solve the problem of vacuum leaking.

1: Vacuum deposition apparatus
2: evaporation source unit
21: evaporation source
3: Vacuum chamber
31: Inlet
4: Deposited body (A stage)
5: Deposited body (B stage)
6: evaporation source moving mechanism
7:
71: hollow part
72: first arm
721:
73: second arm
8: Connection
9: Magnetic fluid seal
10: O ring
11: Bushing
12:
121:
122: chamber side fixing portion
123: Space
13: Particle collecting tray

Claims (13)

In the vacuum vapor deposition apparatus,
A vacuum chamber in which vapor deposition is carried out on an evaporated material,
An evaporation source unit movably installed in the vacuum chamber, the evaporation source unit including an evaporation source in which a deposition material to be deposited on the evaporation material is accommodated;
And a rotation shifting unit disposed between the surface constituting the vacuum chamber and the evaporation source unit and having one end rotatably connected to the evaporation source unit and the other end rotatably connected to a surface constituting the vacuum chamber, ,
The other end portion of the rotary movement portion rotatably connected to the surface constituting the vacuum chamber floats in the first direction which is the direction toward the evaporation source unit with respect to the surface constituting the vacuum chamber so that the relative movement is possible Wherein the vacuum deposition apparatus is connected to the vacuum deposition apparatus.
The method according to claim 1,
Wherein the rotary movement unit includes a first arm rotatably connected at one end to a surface of the vacuum chamber and a second arm rotatably connected to the other end of the first arm and the evaporation source unit,
Wherein one end of the first arm pivotally connected to a surface of the vacuum chamber is floated in the first direction with respect to the surface constituting the vacuum chamber and is connected to allow relative movement.
3. The method of claim 2,
The one end of the first arm rotatably connected to the surface constituting the vacuum chamber includes a rotating shaft portion and a connecting portion rotatably connected to the rotating shaft portion,
Wherein the connection portion is floated in the first direction with respect to the surface constituting the vacuum chamber and is connected so as to be capable of relative movement.
The vacuum evaporation apparatus according to claim 3, wherein a surface constituting the connection portion and the vacuum chamber is sealed by an O-ring.
5. The vacuum deposition apparatus of claim 4, wherein the face constituting the vacuum chamber includes an inlet, the connection is inserted into the inlet, and the inner wall of the inlet and the inlet are sealed by an O-ring.
The vacuum evaporation apparatus according to claim 3, wherein the connecting portion and the rotating shaft portion are sealed by a magnetic fluid seal.
3. The method of claim 2,
The one end of the first arm rotatably connected to the surface of the vacuum chamber includes a rotating shaft portion,
Wherein the rotary shaft portion is connected to a surface of the vacuum chamber so as to be floated in the first direction so as to be capable of relative movement.
The vacuum evaporation apparatus according to claim 7, wherein a surface constituting the rotary shaft portion and the vacuum chamber is sealed by an O-ring.
9. The vacuum evaporation apparatus according to claim 8, wherein the face constituting the vacuum chamber includes an inlet, the rotary shaft portion is inserted into the inlet, and the inner wall of the rotary shaft and the inlet is sealed by an O-ring.
2. The vacuum evaporation apparatus according to claim 1, wherein the first direction is a direction perpendicular to the surface constituting the vacuum chamber.
In the vacuum vapor deposition apparatus,
A vacuum chamber defining a deposition space in which a deposition process for the deposition subject material is carried out and which can be maintained in a vacuum state,
A movable body movably installed in the vacuum chamber,
And a rotation moving part including a hollow part whose one end is rotatably connected to the moving body and the other end is rotatably connected to a surface constituting the vacuum chamber and whose inside is maintained at atmospheric pressure,
And the other end of the rotary moving part is connected to a surface constituting the vacuum chamber in a first direction which is a direction toward the movable body so as to be relatively movable.
12. The vacuum evaporation apparatus according to claim 11, wherein the first direction is a direction perpendicular to the surface constituting the vacuum chamber.
A device manufacturing method, wherein a device is manufactured using the vacuum vapor deposition apparatus according to any one of claims 1 to 12.

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