JP6399173B1 - シリコンウェーハの洗浄方法 - Google Patents
シリコンウェーハの洗浄方法 Download PDFInfo
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- JP6399173B1 JP6399173B1 JP2017158174A JP2017158174A JP6399173B1 JP 6399173 B1 JP6399173 B1 JP 6399173B1 JP 2017158174 A JP2017158174 A JP 2017158174A JP 2017158174 A JP2017158174 A JP 2017158174A JP 6399173 B1 JP6399173 B1 JP 6399173B1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 83
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 83
- 239000010703 silicon Substances 0.000 title claims abstract description 83
- 238000000034 method Methods 0.000 title claims abstract description 58
- 238000004140 cleaning Methods 0.000 title claims abstract description 38
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 92
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 58
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000002245 particle Substances 0.000 abstract description 17
- 239000000126 substance Substances 0.000 description 15
- 230000007547 defect Effects 0.000 description 14
- 230000001133 acceleration Effects 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 11
- 238000001035 drying Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000010306 acid treatment Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000003111 delayed effect Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000010405 reoxidation reaction Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Inorganic Chemistry (AREA)
Abstract
Description
図1に示した本発明のフロー図に従って、シリコンウェーハの洗浄を行った。工程1〜4におけるシリコンウェーハの回転速度は図2に示した回転速度の範囲を満たすようにした。すなわち、酸化膜除去工程(工程1)は100rpm以下の低速回転で行い、回転速度200rpm以下で薬液振り切り工程(工程2)を行った後、500rpm以上の高速回転の加速工程(工程3)へ移行し、500rpm以上の高速回転状態でオゾン水によって酸化膜生成工程(工程4)を行い、その後、乾燥(工程5)を行った。
図6に示した従来洗浄フローに従って、シリコンウェーハの洗浄を行った。各工程における回転速度は図5に示した範囲内になるようにした。この従来洗浄フローでは100rpm以下の低速回転でフッ酸による酸化膜除去を行い(図5(a))、高速回転(500rpm以上)へ移行しながら純水やオゾン水によるリンス処理を行った(図5(b)、(c))。その後、乾燥(図5(d))を行った。
図1に示した本発明のフロー図に従って、シリコンウェーハの洗浄を行った。ただし、工程1〜4におけるシリコンウェーハの回転速度は図3に示した回転速度の範囲を満たすようにした。工程2の回転速度(第2の回転速度)が異なる範囲であること以外は、その他の条件は実施例1〜9と同様である。すなわち、酸化膜除去工程(工程1)は100rpm以下の低速回転で行ったが、第2の回転速度として200rpmより速い速度で薬液振り切り工程(工程2)を行ったことが、実施例1〜9と異なる。その後は実施例1〜9と同様に500rpm以上の高速回転の加速工程(工程3)へ移行し、500rpm以上の高速回転状態でオゾン水によって酸化膜生成工程(工程4)を行い、その後、乾燥(工程5)を行った。実施例10〜15では、第2の回転速度(薬液振り切り回転数)、第3の回転速度(加速処理、酸化膜生成時回転数)を表3に示したように設定した。
図1に示した本発明のフロー図に従って、シリコンウェーハの洗浄を行った。ただし、工程1〜4におけるシリコンウェーハの回転速度は図4に示した回転速度の範囲を満たすようにした。工程3、工程4の回転速度が異なる範囲であること以外、その他の条件は実施例1〜9と同様である。すなわち、酸化膜除去工程(工程1)は100rpm以下の低速回転で行い、回転速度200rpm以下の速度で薬液振り切り工程(工程2)を行った。その後、実施例1〜9とは異なり、500rpm未満の回転速度で加速工程(工程3)へ移行し、500rpm未満の回転速度でオゾン水によって酸化膜生成工程(工程4)を行い、その後、乾燥(工程5)を行った。実施例16〜21では、第2の回転速度(薬液振り切り回転数)、第3の回転速度(加速処理、酸化膜生成時回転数)を表4に示したように設定した。
Claims (1)
- シリコンウェーハの洗浄方法であって、
前記シリコンウェーハを第1の回転速度で回転させながら、前記シリコンウェーハの表面に対して、フッ酸を供給して処理する工程と、
前記フッ酸の供給を停止するとともに、前記シリコンウェーハの表面に対して純水を供給することなく、前記シリコンウェーハを、前記第1の回転速度と同じかそれよりも速い第2の回転速度で回転させながら、前記シリコンウェーハの表面に存在するフッ酸を振り切る工程と、
前記表面のフッ酸を振り切った後の前記シリコンウェーハを前記第2の回転速度よりも速い第3の回転速度で回転させながら、前記シリコンウェーハの表面にオゾン水を供給して処理する工程と
を、この順序で含み、
前記第1の回転速度を100rpm以下とし、
前記第2の回転速度を200rpm以下とし、
前記第3の回転速度を500rpm以上とすることを特徴とするシリコンウェーハの洗浄方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017158174A JP6399173B1 (ja) | 2017-08-18 | 2017-08-18 | シリコンウェーハの洗浄方法 |
DE112018003722.3T DE112018003722T5 (de) | 2017-08-18 | 2018-07-31 | Verfahren zum Reinigen von Silicium-Wafern |
KR1020207004456A KR20200038255A (ko) | 2017-08-18 | 2018-07-31 | 실리콘 웨이퍼의 세정방법 |
CN201880052419.8A CN111033696B (zh) | 2017-08-18 | 2018-07-31 | 硅晶圆的清洗方法 |
SG11202001374SA SG11202001374SA (en) | 2017-08-18 | 2018-07-31 | Method for cleaning silicon wafer |
US16/637,012 US11878329B2 (en) | 2017-08-18 | 2018-07-31 | Method for cleaning silicon wafer |
PCT/JP2018/028519 WO2019035345A1 (ja) | 2017-08-18 | 2018-07-31 | シリコンウェーハの洗浄方法 |
TW107127330A TWI778110B (zh) | 2017-08-18 | 2018-08-07 | 矽晶圓的洗淨方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2017158174A JP6399173B1 (ja) | 2017-08-18 | 2017-08-18 | シリコンウェーハの洗浄方法 |
Publications (2)
Publication Number | Publication Date |
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JP6399173B1 true JP6399173B1 (ja) | 2018-10-03 |
JP2019036665A JP2019036665A (ja) | 2019-03-07 |
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JP2017158174A Active JP6399173B1 (ja) | 2017-08-18 | 2017-08-18 | シリコンウェーハの洗浄方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US11878329B2 (ja) |
JP (1) | JP6399173B1 (ja) |
KR (1) | KR20200038255A (ja) |
CN (1) | CN111033696B (ja) |
DE (1) | DE112018003722T5 (ja) |
SG (1) | SG11202001374SA (ja) |
TW (1) | TWI778110B (ja) |
WO (1) | WO2019035345A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060011214A1 (en) * | 2004-07-09 | 2006-01-19 | Zhi Liu | System and method for pre-gate cleaning of substrates |
JP2012004450A (ja) * | 2010-06-18 | 2012-01-05 | Tokyo Electron Ltd | 液処理装置、液処理方法及び記憶媒体 |
JP2012074475A (ja) * | 2010-09-28 | 2012-04-12 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
JP2012129409A (ja) * | 2010-12-16 | 2012-07-05 | Shin Etsu Handotai Co Ltd | 半導体ウェーハの洗浄方法 |
JP2013123001A (ja) * | 2011-12-12 | 2013-06-20 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3838823B2 (ja) | 1999-08-23 | 2006-10-25 | 大日本スクリーン製造株式会社 | 基板処理装置及び基板処理方法 |
US20050271985A1 (en) | 2004-06-07 | 2005-12-08 | Dainippon Screen Mfg. Co., Ltd. | Method, apparatus and system for rinsing substrate with pH-adjusted rinse solution |
JP4484639B2 (ja) | 2004-09-06 | 2010-06-16 | 大日本スクリーン製造株式会社 | 基板処理方法および基板処理装置 |
JP5317529B2 (ja) | 2008-05-02 | 2013-10-16 | Sumco Techxiv株式会社 | 半導体ウェーハの処理方法及び処理装置 |
KR101806191B1 (ko) | 2010-06-17 | 2017-12-07 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치 |
-
2017
- 2017-08-18 JP JP2017158174A patent/JP6399173B1/ja active Active
-
2018
- 2018-07-31 KR KR1020207004456A patent/KR20200038255A/ko not_active Application Discontinuation
- 2018-07-31 SG SG11202001374SA patent/SG11202001374SA/en unknown
- 2018-07-31 WO PCT/JP2018/028519 patent/WO2019035345A1/ja active Application Filing
- 2018-07-31 CN CN201880052419.8A patent/CN111033696B/zh active Active
- 2018-07-31 DE DE112018003722.3T patent/DE112018003722T5/de active Pending
- 2018-07-31 US US16/637,012 patent/US11878329B2/en active Active
- 2018-08-07 TW TW107127330A patent/TWI778110B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060011214A1 (en) * | 2004-07-09 | 2006-01-19 | Zhi Liu | System and method for pre-gate cleaning of substrates |
JP2012004450A (ja) * | 2010-06-18 | 2012-01-05 | Tokyo Electron Ltd | 液処理装置、液処理方法及び記憶媒体 |
JP2012074475A (ja) * | 2010-09-28 | 2012-04-12 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
JP2012129409A (ja) * | 2010-12-16 | 2012-07-05 | Shin Etsu Handotai Co Ltd | 半導体ウェーハの洗浄方法 |
JP2013123001A (ja) * | 2011-12-12 | 2013-06-20 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2019035345A1 (ja) | 2019-02-21 |
US11878329B2 (en) | 2024-01-23 |
JP2019036665A (ja) | 2019-03-07 |
TW201913804A (zh) | 2019-04-01 |
CN111033696B (zh) | 2023-10-20 |
SG11202001374SA (en) | 2020-03-30 |
KR20200038255A (ko) | 2020-04-10 |
DE112018003722T5 (de) | 2020-04-09 |
CN111033696A (zh) | 2020-04-17 |
US20200164410A1 (en) | 2020-05-28 |
TWI778110B (zh) | 2022-09-21 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |