JP6397906B2 - 安定した反応性スパッタリング処理を行うためのターゲットエイジの補償方法 - Google Patents
安定した反応性スパッタリング処理を行うためのターゲットエイジの補償方法 Download PDFInfo
- Publication number
- JP6397906B2 JP6397906B2 JP2016522326A JP2016522326A JP6397906B2 JP 6397906 B2 JP6397906 B2 JP 6397906B2 JP 2016522326 A JP2016522326 A JP 2016522326A JP 2016522326 A JP2016522326 A JP 2016522326A JP 6397906 B2 JP6397906 B2 JP 6397906B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- reactive
- gas
- coating
- coating process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3476—Testing and control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3322—Problems associated with coating
- H01J2237/3323—Problems associated with coating uniformity
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
− スパッタリング特性(特に、ターゲット電圧、ターゲット電流密度)について、特に約+/−10%以下、
− 堆積率について、特に約+/−15%以下、である。
これらの目標値は、好ましくは、被覆処理を実施するための製造時の状態におけるターゲットを用いることで得られる被覆状態で定義される。
− ターゲット重量Wtargetによって決まる反応性ガス分圧Preactive_gasを調整することで、スパッタリング特性及び/又は被覆率値の目標値からの偏差を、工業生産において許容偏差の範囲内に維持する。
a)被覆装置と、工業生産において目標値から許容偏差範囲内であるスパッタリング特性及び/又は被覆率値の偏差を有する上記スパッタリング被覆処理のような同じ被覆条件下で、被覆処理を達成するために必要な同じタイプの少なくとも1つのターゲット(好ましくは新しい状態のターゲット)と、さらに必要な要素とを準備する。
b)被覆処理iを遂行する前に、ターゲット重量を測定してWtarget_i_initialを取得する。
c)被覆処理iの始めから反応性ガス分圧値Preactive_gas_iをスパッタリング特性に関する所定の目標値に調整するまで変化する、反応性ガス分圧を除き、前に参照した被覆膜処理にしたがって全ての被覆パラメータを維持して膜fiを堆積する被覆処理を達成し、以後、被覆時間tiが完了するまで反応性ガス分圧値Preactive_gas_iを一定に維持する。
d)被覆処理iを遂行した後、ターゲット重量を測定してWtarget_i_finalを取得し、好ましくは被覆処理iの間に堆積された膜fiの厚さも測定する。
e)工程b、c及びdを、i=1、2、...、n(但し、n>2)まで繰り返す。
f)相関関係Preactive_gasvs.Wtargetを、測定値Preactive_gas_iとWtarget_i_initial、又はPreactive_gas_iと(Wtarget_i_initial+Wtarget_i_final)/2により求める。
− ターゲット重量Wtargetによって決まる反応性ガス分圧Preactive_gas、好ましくは、対応する被覆条件の下で前もって決定された相関関係Preactive_gasvs.Wtargetを調整することにより、スパッタリング特性及び/又は被覆率値の目標値からの偏差を、工業生産において、ターゲット重量に依存せず許容偏差範囲内に維持することからなる工程を含む方法である。
Claims (15)
- 少なくとも1つのターゲットが、少なくとも1つの反応性ガスを含む雰囲気中でスパッタされ、スパッタリング特性値及び/又は被覆率が、可能な限り所定の目標値内に維持されるスパッタリング法を含む被覆処理を実施するための方法であって、
ターゲット重量Wtargetによって決まる反応性ガス分圧Preactive_gasを調整することで、スパッタリング特性及び/又は被覆率値の目標値からの偏差を、工業生産において許容偏差の範囲内に維持する方法において、
前記反応性ガス分圧P reactive_gas は、対応する被覆条件下で予め決定された相関関係P reactive_gas vs.W target に準じる前記ターゲット重量W target により調整されること、及び
前記相関関係P reactive_gas vs.W target は、前記被覆処理を行う前に、少なくとも以下の工程、
a)被覆装置と、前記被覆処理を達成するために必要な同じタイプの少なくとも1つの新しい状態のターゲットと、さらに必要な要素とを準備する工程と、
b)被覆処理iを遂行する前に、ターゲット重量を測定してW target_i_initial を取得する工程と、
c)被覆処理iの始めから反応性ガス分圧値P reactive_gas_i をスパッタリング特性に関する所定の目標値に調整するまで変化する、前記反応性ガス分圧を除き、全ての被覆パラメータを維持して膜f i を堆積する被覆処理iを達成し、その後被覆時間t i が完了するまで前記反応性ガス分圧値P reactive_gas_i を一定に維持する工程と、
d)被覆処理iを遂行した後、ターゲット重量を測定してW target_i_final を取得し、被覆処理iの間に堆積された膜f i の厚さも測定する工程と、
e)工程b、c及びdを、i=1、2、...、n(但し、n>2)まで繰り返す工程と、
f)前記相関関係P reactive_gas vs.W target を、測定値P reactive_gas_i とW target_i_initial 、又はP reactive_gas_i と(W target_i_initial +W target_i_final )/2により求める工程と、
を含む方法を用いて決定することを特徴とする方法。 - 前記ターゲットは、前記ターゲットにおける電力密度が前記ターゲットのスパッタリング中に一定に維持されるように、電力供給によってカソードとして作動されることを特徴とする請求項1に記載の方法。
- 前記相関関係Preactive_gasvs.Wtargetを決定するために遂行されるべき被覆処理の合計数に対応する前記番号i=nは、ターゲット厚さを考慮して選択され、最大数nは、前記ターゲットの機械的安定性が依然として損なわれていない最低ターゲット厚さに到達することで限定されることを特徴とする請求項1又は2に記載の方法。
- 前記被覆時間tiは、前記被覆処理i中の平均堆積率の信頼性の高い評価を行うのに十分な厚さを有する膜fiを堆積するように、可能な限り長く選択され、t i は、全ての被覆処理iで同じであることを特徴とする請求項1乃至3のいずれか一項に記載の方法。
- それぞれの被覆処理iの前記被覆時間tiは、スパッタリング特性及び/又は被覆率値の目標値からの偏差が、それぞれの被覆処理i中、工業生産において許容偏差範囲内に維持されるように選択し、t i は、各被覆処理iで同じであることを特徴とする請求項1乃至4のいずれか一項に記載の方法。
- 当初ターゲット重量Wtarget_initialは前記被覆処理が開始される前に測定され、前記反応性ガス分圧Preactive_gasは前記被覆処理の最初に調整され、前記被覆処理中一定に保たれることを特徴とする請求項1乃至5のいずれか一項に記載の方法。
- 前記ターゲット重量Wtargetは最初に及び/又は被覆処理中に測定され、前記反応性ガス分圧Preactive_gasは最初に及び/又は被覆処理中に調整されることを特徴とする請求項1乃至6のいずれか一項に記載の方法。
- 前記反応性ガス分圧Preactive_gasは、自動的に調整されることを特徴とする請求項1乃至7のいずれか一項に記載の方法。
- 前記少なくとも1つのターゲットは、Ti(チタン)、Al(アルミニウム)、Si(シリコン)、Zr(ジルコニウム)、Hf(ハフニウム)、V(バナジウム)、Nb(ニオブ)、Ta(タンタル)、Mn(マンガン)、Fe(鉄)、Co(コバルト)、Ni(ニッケル)、Pd(パラジウム)、Pt(白金)、Cu(銅)、Ag(銀)、Au(銅)、Zn(亜鉛)、Cd(カドミウム)から少なくとも1つの元素を含むことを特徴とする請求項1乃至8のいずれか一項に記載の方法。
- 前記少なくとも1種の反応性ガスは、窒素、酸素、炭素含有ガス又はそれらの少なくとも2つを含む混合物であることを特徴とする請求項1乃至9のいずれか一項に記載の方法。
- 前記雰囲気は少なくとも1種類の不活性ガスを含み、それは、アルゴン、ネオン、クリプトン又はそれらの少なくとも2つを含む混合物であることを特徴とする請求項1乃至10のいずれか一項に記載の方法。
- 前記スパッタリング法は、マグネトロンスパッタリング法、マグネトロンスパッタリングイオンプレーティング法及び/又はHIPIMS法を含むことを特徴とする請求項1乃至11のいずれか一項に記載の方法。
- 請求項1乃至12のいずれか一項に記載の方法にしたがって実施された被覆処理により生成された少なくとも1つの膜を含む皮膜で、基材を被覆する方法。
- 請求項1乃至13のいずれか一項に記載の方法にしたがって、被覆処理を遂行する装置であって、ターゲット重量Wtargetを自動的に測定する機器を備えることを特徴とする装置。
- 請求項1乃至13のいずれか一項に記載の方法にしたがって、被覆処理を遂行する装置又は請求項14に記載の装置であって、前記反応性ガス分圧を自動的に調整する機器を備えることを特徴とする装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013011068.8A DE102013011068A1 (de) | 2013-07-03 | 2013-07-03 | Targetalter-Kompensationsverfahren zur Durchführung von stabilen reaktiven Sputterverfahren |
DE102013011068.8 | 2013-07-03 | ||
PCT/EP2014/001780 WO2015000575A1 (en) | 2013-07-03 | 2014-06-30 | Target age compensation method for performing stable reactive sputtering processes |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016526604A JP2016526604A (ja) | 2016-09-05 |
JP6397906B2 true JP6397906B2 (ja) | 2018-09-26 |
Family
ID=51134002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016522326A Active JP6397906B2 (ja) | 2013-07-03 | 2014-06-30 | 安定した反応性スパッタリング処理を行うためのターゲットエイジの補償方法 |
Country Status (15)
Country | Link |
---|---|
US (1) | US9957600B2 (ja) |
EP (1) | EP3017077B1 (ja) |
JP (1) | JP6397906B2 (ja) |
KR (1) | KR102233345B1 (ja) |
CN (1) | CN105339521B (ja) |
BR (1) | BR112015032133B1 (ja) |
CA (1) | CA2916765C (ja) |
DE (1) | DE102013011068A1 (ja) |
HK (1) | HK1219517A1 (ja) |
IL (1) | IL243138B (ja) |
MX (1) | MX2015016577A (ja) |
PH (1) | PH12015502622A1 (ja) |
RU (1) | RU2016103226A (ja) |
SG (1) | SG11201510185VA (ja) |
WO (1) | WO2015000575A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7153290B2 (ja) * | 2017-06-01 | 2022-10-14 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | 脆性材料の安全で経済的な蒸発のためのターゲットアセンブリ |
CN107740053B (zh) * | 2017-10-30 | 2019-10-15 | 广东工业大学 | 一种AlCrSiN/VSiN纳米多层涂层及其制备方法 |
WO2019162041A1 (en) * | 2018-02-26 | 2019-08-29 | Evatec Ag | Stabilizing stress in a layer with respect to thermal loading |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288772A (ja) * | 1988-09-22 | 1990-03-28 | Hitachi Metals Ltd | スパッタ装置の膜厚制御方法 |
JP2734588B2 (ja) * | 1988-12-28 | 1998-03-30 | 日本電気株式会社 | スパッタ装置 |
US6224724B1 (en) | 1995-02-23 | 2001-05-01 | Tokyo Electron Limited | Physical vapor processing of a surface with non-uniformity compensation |
JP3814764B2 (ja) | 1995-02-23 | 2006-08-30 | 東京エレクトロン株式会社 | スパッタ処理方式 |
JPH08260142A (ja) * | 1995-03-24 | 1996-10-08 | Kawasaki Steel Corp | スパッタリング装置のターゲット消費量推算方法 |
DE19605316C1 (de) * | 1996-02-14 | 1996-12-12 | Fraunhofer Ges Forschung | Verfahren und Einrichtung zur Regelung von plasmagestützten Vakuumbeschichtungsprozessen |
US6537428B1 (en) | 1999-09-02 | 2003-03-25 | Veeco Instruments, Inc. | Stable high rate reactive sputtering |
US6562715B1 (en) * | 2000-08-09 | 2003-05-13 | Applied Materials, Inc. | Barrier layer structure for copper metallization and method of forming the structure |
US7324865B1 (en) * | 2001-05-09 | 2008-01-29 | Advanced Micro Devices, Inc. | Run-to-run control method for automated control of metal deposition processes |
TWI269815B (en) * | 2002-05-20 | 2007-01-01 | Tosoh Smd Inc | Replaceable target sidewall insert with texturing |
DE10347521A1 (de) * | 2002-12-04 | 2004-06-24 | Leybold Optics Gmbh | Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens |
DE102004024351A1 (de) * | 2004-05-17 | 2005-12-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Aufbringen eines Dünnschichtsystems mittels Zerstäuben |
JP4040607B2 (ja) | 2004-06-14 | 2008-01-30 | 芝浦メカトロニクス株式会社 | スパッタリング装置及び方法並びにスパッタリング制御用プログラム |
US7891536B2 (en) * | 2005-09-26 | 2011-02-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | PVD target with end of service life detection capability |
US8133360B2 (en) * | 2007-12-20 | 2012-03-13 | Applied Materials, Inc. | Prediction and compensation of erosion in a magnetron sputtering target |
DE102011115145A1 (de) | 2011-09-27 | 2013-03-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Magnetronsputtern mit Ausgleich der Targeterosion |
-
2013
- 2013-07-03 DE DE102013011068.8A patent/DE102013011068A1/de not_active Withdrawn
-
2014
- 2014-06-30 JP JP2016522326A patent/JP6397906B2/ja active Active
- 2014-06-30 WO PCT/EP2014/001780 patent/WO2015000575A1/en active Application Filing
- 2014-06-30 CA CA2916765A patent/CA2916765C/en active Active
- 2014-06-30 US US14/902,575 patent/US9957600B2/en active Active
- 2014-06-30 CN CN201480034388.5A patent/CN105339521B/zh active Active
- 2014-06-30 MX MX2015016577A patent/MX2015016577A/es unknown
- 2014-06-30 RU RU2016103226A patent/RU2016103226A/ru not_active Application Discontinuation
- 2014-06-30 BR BR112015032133-0A patent/BR112015032133B1/pt active IP Right Grant
- 2014-06-30 EP EP14735854.3A patent/EP3017077B1/en active Active
- 2014-06-30 KR KR1020167001988A patent/KR102233345B1/ko active IP Right Grant
- 2014-06-30 SG SG11201510185VA patent/SG11201510185VA/en unknown
-
2015
- 2015-11-24 PH PH12015502622A patent/PH12015502622A1/en unknown
- 2015-12-15 IL IL24313815A patent/IL243138B/en active IP Right Grant
-
2016
- 2016-06-29 HK HK16107569.8A patent/HK1219517A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN105339521B (zh) | 2018-05-04 |
PH12015502622A1 (en) | 2016-03-07 |
CN105339521A (zh) | 2016-02-17 |
EP3017077A1 (en) | 2016-05-11 |
RU2016103226A (ru) | 2017-08-08 |
US9957600B2 (en) | 2018-05-01 |
CA2916765A1 (en) | 2015-01-08 |
KR20160027022A (ko) | 2016-03-09 |
KR102233345B1 (ko) | 2021-03-30 |
HK1219517A1 (zh) | 2017-04-07 |
IL243138B (en) | 2019-11-28 |
US20160168686A1 (en) | 2016-06-16 |
CA2916765C (en) | 2022-05-03 |
EP3017077B1 (en) | 2019-11-27 |
DE102013011068A1 (de) | 2015-01-08 |
SG11201510185VA (en) | 2016-01-28 |
BR112015032133B1 (pt) | 2021-11-30 |
JP2016526604A (ja) | 2016-09-05 |
MX2015016577A (es) | 2017-01-18 |
BR112015032133A2 (pt) | 2017-07-25 |
WO2015000575A1 (en) | 2015-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8790791B2 (en) | Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings | |
JP2010529295A (ja) | Pvd被膜形成方法 | |
Constantin et al. | Magnetron sputtering technique used for coatings deposition; technologies and applications | |
Leroy et al. | Angular-resolved energy flux measurements of a dc-and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere | |
EP2599892B1 (en) | Sputtering target and/or coil and process for producing same | |
JP6397906B2 (ja) | 安定した反応性スパッタリング処理を行うためのターゲットエイジの補償方法 | |
KR20150053959A (ko) | 기판 상에 금속-보로카바이드 층을 제조하는 방법 | |
US20230135238A1 (en) | TICN Having Reduced Growth Defects by Means of HIPIMS | |
CA2916769A1 (en) | Tib2 layers and manufacture thereof | |
EP2829635B1 (en) | Method for controlled production of diffusion based coatings by vacuum cathodic arc systems | |
CN106048539B (zh) | 一种金属钛铝氮化物复合硬质膜的制备方法 | |
KR20140090754A (ko) | Max 상 박막의 제조방법 | |
US7279078B2 (en) | Thin-film coating for wheel rims | |
NL8702404A (nl) | Werkwijze en inrichting voor vacuuemboogplasma-depositie van decoratieve en slijtvaste bekledingen. | |
WO2020169847A1 (en) | Method for producing targets for physical vapor deposition (pvd) | |
KR20130070433A (ko) | Max 상 박막의 제조방법 | |
CN114411098A (zh) | 一种TiNb涂层的镀膜方法 | |
US20140110248A1 (en) | Chamber pasting method in a pvd chamber for reactive re-sputtering dielectric material | |
US20140255286A1 (en) | Method for manufacturing cubic boron nitride thin film with reduced compressive residual stress and cubic boron nitride thin film manufactured using the same | |
CA2932841C (en) | Target for the reactive sputter deposition of electrically insulating layers | |
KR20150061617A (ko) | 고 경도 저마찰 Cr―Ti―B―N 코팅 및 그 제조방법 | |
JPH0995763A (ja) | 耐摩耗性皮膜形成方法 | |
KR20140101120A (ko) | 고 경도 저마찰 Cr―Ti―B―N 코팅 및 그 제조방법 | |
KR100237166B1 (ko) | 이온빔을 이용한 TiN박막의 코팅방법 | |
JP2017529459A (ja) | 改善された耐摩耗性を有する2層コーティングされた切削工具を製造するための方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170502 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180222 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180320 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180619 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180807 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180903 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6397906 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |