JP6392171B2 - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- JP6392171B2 JP6392171B2 JP2015108811A JP2015108811A JP6392171B2 JP 6392171 B2 JP6392171 B2 JP 6392171B2 JP 2015108811 A JP2015108811 A JP 2015108811A JP 2015108811 A JP2015108811 A JP 2015108811A JP 6392171 B2 JP6392171 B2 JP 6392171B2
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- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
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- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
Landscapes
- Engineering & Computer Science (AREA)
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- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Geometry (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Combinations Of Printed Boards (AREA)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
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| JP2015108811A JP6392171B2 (ja) | 2015-05-28 | 2015-05-28 | 半導体装置及びその製造方法 |
| US15/155,175 US9564421B2 (en) | 2015-05-28 | 2016-05-16 | Semiconductor device |
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| JP2015108811A JP6392171B2 (ja) | 2015-05-28 | 2015-05-28 | 半導体装置及びその製造方法 |
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| KR102420126B1 (ko) | 2016-02-01 | 2022-07-12 | 삼성전자주식회사 | 반도체 소자 |
| JP7078821B2 (ja) * | 2017-04-28 | 2022-06-01 | 東北マイクロテック株式会社 | 固体撮像装置 |
| WO2018230534A1 (ja) * | 2017-06-16 | 2018-12-20 | 株式会社村田製作所 | 回路基板および回路モジュール、ならびに回路基板の製造方法および回路モジュールの製造方法 |
| JP7015721B2 (ja) * | 2018-04-05 | 2022-02-03 | 新光電気工業株式会社 | 配線基板、電子装置 |
| US11569159B2 (en) * | 2019-08-30 | 2023-01-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and formation method of chip package with through vias |
| CN110782799B (zh) | 2019-11-21 | 2022-01-04 | 昆山国显光电有限公司 | 一种显示面板及其制备方法 |
| US11094668B2 (en) * | 2019-12-12 | 2021-08-17 | Micron Technology, Inc. | Solderless interconnect for semiconductor device assembly |
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| JP2003347722A (ja) | 2002-05-23 | 2003-12-05 | Ibiden Co Ltd | 多層電子部品搭載用基板及びその製造方法 |
| US6974330B2 (en) * | 2002-08-08 | 2005-12-13 | Micron Technology, Inc. | Electronic devices incorporating electrical interconnections with improved reliability and methods of fabricating same |
| JP4765468B2 (ja) * | 2005-08-03 | 2011-09-07 | 株式会社村田製作所 | セラミック基板の製造方法およびセラミック基板 |
| JP2007123595A (ja) * | 2005-10-28 | 2007-05-17 | Nec Corp | 半導体装置及びその実装構造 |
| JP2009192309A (ja) * | 2008-02-13 | 2009-08-27 | Shinko Electric Ind Co Ltd | 半導体検査装置 |
| JP2010135671A (ja) * | 2008-12-08 | 2010-06-17 | Panasonic Corp | 半導体装置及びその製造方法 |
| JP5707902B2 (ja) * | 2010-12-02 | 2015-04-30 | ソニー株式会社 | 半導体装置及びその製造方法 |
| US8404520B1 (en) * | 2011-10-17 | 2013-03-26 | Invensas Corporation | Package-on-package assembly with wire bond vias |
| US8372741B1 (en) * | 2012-02-24 | 2013-02-12 | Invensas Corporation | Method for package-on-package assembly with wire bonds to encapsulation surface |
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| JP2016225414A (ja) | 2016-12-28 |
| US20160351544A1 (en) | 2016-12-01 |
| US9564421B2 (en) | 2017-02-07 |
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