JP6391495B2 - フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法 - Google Patents

フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法 Download PDF

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Publication number
JP6391495B2
JP6391495B2 JP2015032683A JP2015032683A JP6391495B2 JP 6391495 B2 JP6391495 B2 JP 6391495B2 JP 2015032683 A JP2015032683 A JP 2015032683A JP 2015032683 A JP2015032683 A JP 2015032683A JP 6391495 B2 JP6391495 B2 JP 6391495B2
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JP
Japan
Prior art keywords
photomask
semi
film
light
pattern
Prior art date
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JP2015032683A
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English (en)
Japanese (ja)
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JP2016156857A5 (zh
JP2016156857A (ja
Inventor
山口　昇
昇 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
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Hoya Corp
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Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2015032683A priority Critical patent/JP6391495B2/ja
Priority to TW105100976A priority patent/TWI622849B/zh
Priority to KR1020160019967A priority patent/KR101815368B1/ko
Priority to CN201610097419.2A priority patent/CN105911812B/zh
Publication of JP2016156857A publication Critical patent/JP2016156857A/ja
Publication of JP2016156857A5 publication Critical patent/JP2016156857A5/ja
Application granted granted Critical
Publication of JP6391495B2 publication Critical patent/JP6391495B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2015032683A 2015-02-23 2015-02-23 フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法 Active JP6391495B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015032683A JP6391495B2 (ja) 2015-02-23 2015-02-23 フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法
TW105100976A TWI622849B (zh) 2015-02-23 2016-01-13 光罩、光罩組、光罩之製造方法、及顯示裝置之製造方法
KR1020160019967A KR101815368B1 (ko) 2015-02-23 2016-02-19 포토마스크, 포토마스크 세트, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
CN201610097419.2A CN105911812B (zh) 2015-02-23 2016-02-23 光掩模组及其制造方法、光掩模及显示装置的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015032683A JP6391495B2 (ja) 2015-02-23 2015-02-23 フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2016156857A JP2016156857A (ja) 2016-09-01
JP2016156857A5 JP2016156857A5 (zh) 2017-05-18
JP6391495B2 true JP6391495B2 (ja) 2018-09-19

Family

ID=56744416

Family Applications (1)

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JP2015032683A Active JP6391495B2 (ja) 2015-02-23 2015-02-23 フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法

Country Status (4)

Country Link
JP (1) JP6391495B2 (zh)
KR (1) KR101815368B1 (zh)
CN (1) CN105911812B (zh)
TW (1) TWI622849B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6716427B2 (ja) * 2016-11-07 2020-07-01 Hoya株式会社 フォトマスク、近接露光用フォトマスクの製造方法、及び、表示装置の製造方法
JP7080070B2 (ja) * 2017-03-24 2022-06-03 Hoya株式会社 フォトマスク、及び表示装置の製造方法
JP6987912B2 (ja) * 2020-03-16 2022-01-05 アルバック成膜株式会社 マスクブランクス、位相シフトマスク、製造方法
CN115704993A (zh) * 2021-08-04 2023-02-17 株式会社Sk电子 图案修正方法以及光掩模

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3173314B2 (ja) * 1995-03-30 2001-06-04 凸版印刷株式会社 位相シフトマスクの製造方法
JP2917879B2 (ja) * 1995-10-31 1999-07-12 日本電気株式会社 フォトマスク及びその製造方法
TW449672B (en) 1997-12-25 2001-08-11 Nippon Kogaku Kk Process and apparatus for manufacturing photomask and method of manufacturing the same
JP2002151381A (ja) * 2000-11-09 2002-05-24 Nec Kagoshima Ltd パターン形成方法
JP2003121977A (ja) * 2001-10-12 2003-04-23 Hitachi Ltd 半導体集積回路装置の製造方法およびマスク
JP2007178662A (ja) * 2005-12-27 2007-07-12 Dainippon Printing Co Ltd カラーフィルタの製造方法
JP4509050B2 (ja) * 2006-03-10 2010-07-21 信越化学工業株式会社 フォトマスクブランク及びフォトマスク
JP5274393B2 (ja) * 2009-06-30 2013-08-28 アルバック成膜株式会社 ハーフトーンマスクの製造方法
JP2012008545A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法
JP2012008546A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法
JP5728223B2 (ja) * 2010-12-27 2015-06-03 アルバック成膜株式会社 ハーフトーンマスク、ハーフトーンマスクブランクス及びハーフトーンマスクの製造方法
JP5605917B2 (ja) * 2011-12-27 2014-10-15 Ｈｏｙａ株式会社 フォトマスクの製造方法、パターン転写方法及びフラットパネルディスプレイの製造方法
JP6081716B2 (ja) * 2012-05-02 2017-02-15 Hoya株式会社 フォトマスク、パターン転写方法及びフラットパネルディスプレイの製造方法
KR102004399B1 (ko) * 2012-11-05 2019-07-29 삼성디스플레이 주식회사 패턴 형성용 광 마스크
JP5668745B2 (ja) 2012-11-30 2015-02-12 大日本印刷株式会社 階調マスク
WO2014103875A1 (ja) * 2012-12-27 2014-07-03 アルバック成膜株式会社 位相シフトマスクおよびその製造方法
JP6324756B2 (ja) * 2013-03-19 2018-05-16 Hoya株式会社 位相シフトマスクブランク及びその製造方法、位相シフトマスクの製造方法、並びに表示装置の製造方法
JP6389375B2 (ja) * 2013-05-23 2018-09-12 Hoya株式会社 マスクブランクおよび転写用マスク並びにそれらの製造方法

Also Published As

Publication number Publication date
KR101815368B1 (ko) 2018-01-04
TWI622849B (zh) 2018-05-01
KR20160102904A (ko) 2016-08-31
CN105911812A (zh) 2016-08-31
CN105911812B (zh) 2019-12-27
TW201704842A (zh) 2017-02-01
JP2016156857A (ja) 2016-09-01

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