JP6377578B2 - Ｘ線発生装置、及びその調整方法 - Google Patents

Ｘ線発生装置、及びその調整方法 Download PDF

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Publication number
JP6377578B2
JP6377578B2 JP2015132907A JP2015132907A JP6377578B2 JP 6377578 B2 JP6377578 B2 JP 6377578B2 JP 2015132907 A JP2015132907 A JP 2015132907A JP 2015132907 A JP2015132907 A JP 2015132907A JP 6377578 B2 JP6377578 B2 JP 6377578B2
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JP
Japan
Prior art keywords
electron beam
electron
target
magnetic field
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2015132907A
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English (en)
Japanese (ja)
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JP2017016903A5 (enExample
JP2017016903A (ja
Inventor
野々口　雅弘
雅弘 野々口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Corp
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Rigaku Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Rigaku Corp filed Critical Rigaku Corp
Priority to JP2015132907A priority Critical patent/JP6377578B2/ja
Priority to EP16001290.2A priority patent/EP3113206B1/en
Priority to US15/196,493 priority patent/US20170004950A1/en
Publication of JP2017016903A publication Critical patent/JP2017016903A/ja
Publication of JP2017016903A5 publication Critical patent/JP2017016903A5/ja
Application granted granted Critical
Publication of JP6377578B2 publication Critical patent/JP6377578B2/ja
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/147—Spot size control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/153—Spot position control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015132907A 2015-07-01 2015-07-01 Ｘ線発生装置、及びその調整方法 Expired - Fee Related JP6377578B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015132907A JP6377578B2 (ja) 2015-07-01 2015-07-01 Ｘ線発生装置、及びその調整方法
EP16001290.2A EP3113206B1 (en) 2015-07-01 2016-06-08 X-ray generator and adjustment method therefor
US15/196,493 US20170004950A1 (en) 2015-07-01 2016-06-29 X-ray generator and adjustment method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015132907A JP6377578B2 (ja) 2015-07-01 2015-07-01 Ｘ線発生装置、及びその調整方法

Publications (3)

Publication Number Publication Date
JP2017016903A JP2017016903A (ja) 2017-01-19
JP2017016903A5 JP2017016903A5 (enExample) 2018-03-08
JP6377578B2 true JP6377578B2 (ja) 2018-08-22

Family

ID=56131268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015132907A Expired - Fee Related JP6377578B2 (ja) 2015-07-01 2015-07-01 Ｘ線発生装置、及びその調整方法

Country Status (3)

Country Link
US (1) US20170004950A1 (enExample)
EP (1) EP3113206B1 (enExample)
JP (1) JP6377578B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3579664A1 (en) * 2018-06-08 2019-12-11 Excillum AB Method for controlling an x-ray source
DE102020134487A1 (de) * 2020-12-21 2022-06-23 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Röntgenquelle und Betriebsverfahren hierfür
US12035451B2 (en) * 2021-04-23 2024-07-09 Carl Zeiss X-Ray Microscopy Inc. Method and system for liquid cooling isolated x-ray transmission target
US11961694B2 (en) 2021-04-23 2024-04-16 Carl Zeiss X-ray Microscopy, Inc. Fiber-optic communication for embedded electronics in x-ray generator
US11864300B2 (en) 2021-04-23 2024-01-02 Carl Zeiss X-ray Microscopy, Inc. X-ray source with liquid cooled source coils

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217086A (ja) * 2001-01-16 2002-08-02 Sony Corp 電子ビーム照射装置および電子ビーム照射方法
JP2003173755A (ja) 2001-12-06 2003-06-20 Nikon Corp アクティブ磁場キャンセラーを備える荷電粒子線装置
EP1679733A3 (en) * 2004-01-23 2007-04-04 Tohken Co., Ltd. X-ray microscopic inspection apparatus
US7416335B2 (en) * 2005-07-15 2008-08-26 Sterotaxis, Inc. Magnetically shielded x-ray tube
DE102006046734A1 (de) * 2006-09-29 2008-04-03 Siemens Ag Verfahren zur Einstellung einer von einem magnetischen Störfeld verschobenen Fokusposition und Röntgenrohre und medizinisches Röntgenaufnahmesystem
JP2008159317A (ja) * 2006-12-21 2008-07-10 Hitachi Medical Corp Ｘ線管装置およびそれを用いたｘ線装置
US9380690B2 (en) * 2010-12-22 2016-06-28 Excillum Ab Aligning and focusing an electron beam in an X-ray source

Also Published As

Publication number Publication date
EP3113206A1 (en) 2017-01-04
US20170004950A1 (en) 2017-01-05
EP3113206B1 (en) 2018-10-24
JP2017016903A (ja) 2017-01-19

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