JP6343818B2 - Method for forming plating film on stereolithography products - Google Patents

Method for forming plating film on stereolithography products Download PDF

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JP6343818B2
JP6343818B2 JP2016111369A JP2016111369A JP6343818B2 JP 6343818 B2 JP6343818 B2 JP 6343818B2 JP 2016111369 A JP2016111369 A JP 2016111369A JP 2016111369 A JP2016111369 A JP 2016111369A JP 6343818 B2 JP6343818 B2 JP 6343818B2
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晃 榎本
晃 榎本
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IXS Co Ltd
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Description

本発明は、光造形品へのめっき皮膜形成方法に関する。   The present invention relates to a method for forming a plating film on an optically shaped product.

光造形法によりエポキシ系樹脂を層状に硬化・積層して作製した光造形品が知られている。このような光造形品は、三次元構造を有し、製品の試作品(又はマスターモデル)として使用されるのみならず、近年は最終製品そのものとしても使用されている。このため、光造形品の表面にめっき皮膜を形成することが求められている。また、光造形品を製品の試作品として使用する場合であっても、最終製品に近いリアリティを出すため、光造形品の表面にめっき皮膜を形成することが求められている。そして、このように、光造形品の表面にめっき皮膜を形成する技術として、例えば、特許文献1に記載された技術が知られている。   There is known a stereolithographic product produced by curing and laminating epoxy resins in layers by stereolithography. Such an optically shaped product has a three-dimensional structure and is used not only as a prototype product (or master model) but also as a final product itself in recent years. For this reason, it is required to form a plating film on the surface of the stereolithographic product. In addition, even when the stereolithography product is used as a prototype of a product, it is required to form a plating film on the surface of the stereolithography product in order to produce a reality close to the final product. As a technique for forming a plating film on the surface of an optically shaped article as described above, for example, a technique described in Patent Document 1 is known.

特許文献1に記載された技術は、光造形品の表面を研磨材を用いて磨くA工程と、その後光造形品を加熱するB工程と、その後光造形品の表面に着色された合成樹脂塗料(サーフェイサー)を吹き付けてA工程で生成された傷を目立たせるC工程と、A工程より細かい研磨材を用いて表面を磨くD工程と、その後光造形品を加熱するE工程と、その後光造形品の表面に着色された合成樹脂塗料(サーフェイサー)を吹き付けてD工程で生成された傷を目立たせるF工程と、D工程より細かい研磨材を用いて表面を磨くG工程と、その後光造形品の表面にめっき皮膜を形成するH工程を実施する。   The technique described in Patent Document 1 includes a process A for polishing the surface of an optical modeling article using an abrasive, a process B for heating the optical modeling article, and then a synthetic resin paint colored on the surface of the optical modeling article. (Surfacer) is sprayed to make the scratches generated in the A process conspicuous, the D process to polish the surface using an abrasive finer than the A process, the E process to heat the optical modeling product, and then the optical modeling F process to spray the colored synthetic resin paint (surfacer) on the surface of the product to make the scratches generated in the D step stand out, the G step to polish the surface using a finer abrasive than the D step, and then the optical modeling product H process which forms a plating film on the surface of this is implemented.

このため、特許文献1に記載された技術によれば、加熱により光造形品の残留応力を発散できるので、めっき皮膜形成工程(H工程)中の加熱によって光造形品の残留応力が発散されてめっき表面に段差が現れることがなくなる。また、その際に加熱により段差等が生じても、加熱後に合成樹脂塗料(サーフェイサー)を吹き付けてから表面の研磨を行うので、加熱により生じた段差を消滅できる。   For this reason, according to the technique described in Patent Document 1, since the residual stress of the optical modeling product can be dissipated by heating, the residual stress of the optical modeling product is dissipated by heating during the plating film forming process (H process). No steps appear on the plating surface. In addition, even if a step or the like is generated by heating at that time, the surface is polished after spraying a synthetic resin paint (surfacer) after the heating, so that the step generated by the heating can be eliminated.

特開2004−190099号公報JP 2004-190099 A

しかしながら、従来の光造形品へのめっき皮膜形成方法においては、めっき皮膜形成工程中に、光造形品とめっき皮膜との剥離強度を高めるためにエッチングにより光造形品の表面を粗化しているため、エッチング液により光造形品の材料であるエポキシ樹脂や合成樹脂塗料(サーフェイサー)が劣化して、光造形品の品質が劣化するという問題がある。   However, in the conventional method for forming a plating film on an optical modeling product, the surface of the optical modeling product is roughened by etching in order to increase the peel strength between the optical modeling product and the plating film during the plating film forming process. The epoxy resin and synthetic resin paint (surfacer), which are materials of the optical modeling product, are deteriorated by the etching solution, and there is a problem that the quality of the optical modeling product is deteriorated.

そこで、本発明は、上記した問題を解決するためになされたものであり、めっき皮膜形成工程中に光造形品の品質が劣化するという問題のない、光造形品へのめっき皮膜形成方法を提供することを目的とする。   Therefore, the present invention has been made to solve the above-described problems, and provides a plating film forming method for an optical modeling product that does not have a problem that the quality of the optical modeling product deteriorates during the plating film forming process. The purpose is to do.

[1]本発明の光造形品へのめっき皮膜形成方法は、光造形法によりエポキシ系樹脂を層状に硬化・積層して作製した三次元構造の光造形品を準備する第1工程と、前記光造形品の表面を機械的処理により、前記表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げする第2工程と、エッチング工程を実施することなく前記光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成する第3工程とを含むことを特徴とする。 [1] A plating film forming method for an optically shaped article of the present invention includes a first step of preparing an optically shaped article having a three-dimensional structure prepared by curing and laminating an epoxy-based resin into a layer by an optical shaping method; The surface of the stereolithographic product is mechanically processed to form a surface on the surface of the stereolithographic product without performing an etching step, and a second step of finishing the arithmetic average roughness Ra of the surface to a range of 0.141 μm or more. And a third step of forming a plating film by performing electroless nickel plating.

本発明の光造形品へのめっき皮膜形成方法によれば、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することから、従来の光造形品へのめっき皮膜形成方法とは異なり、めっき皮膜形成工程中に光造形品の品質が劣化するという問題がなくなる。なお、本発明の光造形品へのめっき皮膜形成方法においては、第2工程で、光造形品の表面を機械的処理により所定の表面粗さに表面仕上げすることから、第3工程で必要であったエッチング工程を実施することなく、光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することが可能となる。   According to the method for forming a plating film on an optical modeling product according to the present invention, since the plating film is formed by performing electroless nickel plating on the surface of the optical modeling product without performing an etching step, the conventional optical modeling product is obtained. Unlike the plating film forming method, the problem that the quality of the optically shaped article deteriorates during the plating film forming process is eliminated. In addition, in the plating film formation method to the optical modeling product of this invention, since the surface of an optical modeling product is surface-finished to predetermined surface roughness by a mechanical process at a 2nd process, it is required at a 3rd process. Without performing the etching process, the surface of the stereolithographic product can be subjected to electroless nickel plating to form a plating film.

また、本発明の光造形品へのめっき皮膜形成方法によれば、第2工程において、表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げすることから、後述する試験例1の結果からも明らかなように、光造形品とめっき皮膜との間の剥離強度を所定の値(例えば0.5N/cm)以上にすることができる(図2参照。)。この0.5N/cmという剥離強度は、製品として用いる場合には十分な剥離強度とはいえない場合もあるが、製品の試作品として用いる場合には許容される剥離強度である。   Further, according to the plating film forming method on the optically shaped article of the present invention, in the second step, the surface is finished in a range where the arithmetic average roughness Ra of the surface is 0.141 μm or more, so that Test Example 1 to be described later is performed. As is clear from the results, the peel strength between the optically shaped article and the plating film can be set to a predetermined value (for example, 0.5 N / cm) or more (see FIG. 2). This peel strength of 0.5 N / cm may not be a sufficient peel strength when used as a product, but is an acceptable peel strength when used as a product prototype.

なお、近年では、エポキシ樹脂の改良をはじめとする光造形技術の進歩により、加熱により段差が生じることがなくなったため、本発明の光造形品へのめっき皮膜形成方法においては、特許文献1に記載された技術の場合に必要であった、加熱のたびに合成樹脂塗料(サーフェイサー)を吹き付けるという工程も必ずしも必要がなくなっている。   In recent years, due to the progress of optical modeling technology including improvement of epoxy resin, there is no step caused by heating. Therefore, the method for forming a plating film on the optical modeling product of the present invention is described in Patent Document 1. The process of spraying a synthetic resin paint (surfacer) every time heating, which is necessary in the case of the developed technology, is not necessarily required.

この明細書において、算術平均粗さRaとは、粗さ曲線から、その平均線の方向に基準長さだけ抜き取り、この抜き取り部分の平均線から測定曲線までの偏差の絶対値を合計し、平均した値をいう(日本工業規格 JIS B 0601参照。)。   In this specification, the arithmetic average roughness Ra is extracted from the roughness curve by the reference length in the direction of the average line, and the absolute value of the deviation from the average line of the extracted portion to the measurement curve is summed, and the average (Refer to Japanese Industrial Standards JIS B 0601.)

[2]本発明の光造形品へのめっき皮膜形成方法において、前記第2工程においては、前記表面の算術平均粗さRaが0.458μm以下となる範囲に表面仕上げすることが好ましい。 [2] In the method for forming a plated film on an optically shaped article according to the present invention, in the second step, it is preferable to finish the surface in a range where the arithmetic average roughness Ra of the surface is 0.458 μm or less.

このような方法とすることにより、後述する試験例2の結果からも明らかなように、鏡面性のよいめっき皮膜を形成することが可能となる(図1参照。)。   By setting it as such a method, it becomes possible to form a plating film with a good specularity so that it may become clear also from the result of the test example 2 mentioned later (refer FIG. 1).

[3]本発明の光造形品へのめっき皮膜形成方法においては、♯2000以下の研磨材を用いて前記第2工程を行うことが好ましい。 [3] In the method for forming a plating film on an optically shaped article of the present invention, it is preferable to perform the second step using an abrasive of # 2000 or less.

このような方法とすることにより、後述する試験例1の結果からも明らかなように、光造形品とめっき皮膜との間の剥離強度を所定の値(例えば0.5N/cm)以上にすることができる(図2参照。)。   By setting it as such a method, as evident also from the result of Test Example 1 described later, the peel strength between the optically shaped article and the plating film is set to a predetermined value (for example, 0.5 N / cm) or more. (See FIG. 2).

[4]本発明の光造形品へのめっき皮膜形成方法においては、♯800以上の研磨材を用いて前記第2工程を行うことが好ましい。 [4] In the method for forming a plating film on an optically shaped product of the present invention, it is preferable to perform the second step using an abrasive of # 800 or more.

このような方法とすることにより、後述する試験例2の結果からも明らかなように、鏡面性のよいめっき皮膜を形成することが可能となる(図1参照。)。   By setting it as such a method, it becomes possible to form a plating film with a good specularity so that it may become clear also from the result of the test example 2 mentioned later (refer FIG. 1).

[5]本発明の光造形品へのめっき皮膜形成方法において、前記機械的処理は、研磨処理、研削処理若しくはブラスト処理又はこれらを組み合わせた処理であることが好ましい。 [5] In the method for forming a plated film on an optically shaped article according to the present invention, the mechanical treatment is preferably a polishing treatment, a grinding treatment, a blast treatment, or a combination thereof.

このような方法とすることにより、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することが可能となる。   By setting it as such a method, it becomes possible to form a plating film by performing electroless nickel plating on the surface of an optical modeling article, without performing an etching process.

なお、上記した研磨材としては、機械的処理に応じて、研磨紙、研磨布、研磨粉などの研磨材を用いることができる。   In addition, as the above-described abrasive, an abrasive such as abrasive paper, abrasive cloth, or abrasive powder can be used depending on the mechanical treatment.

[6]本発明の光造形品へのめっき皮膜形成方法において、前記第3工程においては、スズのゾル溶液を用いて前記光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、パラジウムイオンを含有する溶液を用いて前記光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、前記光造形品の表面に前記無電解ニッケルめっきを施すことが好ましい。 [6] In the method for forming a plating film on an optical modeling product according to the present invention, in the third step, a sensitizing step of forming a coating film of a tin compound on the surface of the optical modeling product using a sol solution of tin And an activation step of adsorbing a plating catalyst made of palladium on the surface of the stereolithographic product using a solution containing palladium ions, It is preferable to apply electrolytic nickel plating.

このような方法とすることにより、強酸を用いることなく光造形品の表面に無電解ニッケルめっきを施すことが可能となる。その結果、光造形品を構成するエポキシ樹脂が劣化しなくなり、また、強酸を用いる必要がないため、環境への負担を軽減することができる。   By setting it as such a method, it becomes possible to apply electroless nickel plating to the surface of an optical modeling article, without using a strong acid. As a result, the epoxy resin constituting the stereolithography product does not deteriorate, and it is not necessary to use a strong acid, so the burden on the environment can be reduced.

また、後述する[7]に記載の方法と比較して、工程を1つ少なくでき、高い生産性でもって無電解ニッケルめっきを施することができる。   Further, compared with the method described in [7] described later, one step can be reduced, and electroless nickel plating can be performed with high productivity.

[7]本発明の光造形品へのめっき皮膜形成方法において、前記第3工程においては、スズのゾル溶液を用いて前記光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、銀イオンを含有する溶液を用いてスズと銀の置換反応を起こさせて前記光造形品の表面に銀を析出させる中間処理工程と、パラジウムイオンを含有する溶液を用いて銀とパラジウムとの置換反応を起こさせて前記光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、前記光造形品の表面に前記無電解ニッケルめっきを施すことが好ましい。 [7] In the method for forming a plating film on an optical modeling product according to the present invention, in the third step, a sensitizing step of forming a coating film of a tin compound on the surface of the optical modeling product using a sol solution of tin And an intermediate treatment step in which a silver and silver solution is used to cause a tin and silver substitution reaction to deposit silver on the surface of the stereolithography product, and a solution containing palladium ions and silver and palladium are used. The electroless nickel plating is performed on the surface of the stereolithographic product after performing a pretreatment step including an activation step of causing a substitution reaction of the catalyst to adsorb a plating catalyst made of palladium on the surface of the stereolithography product. It is preferable to apply.

このような方法とすることによっても、強酸を用いることなく光造形品の表面に無電解ニッケルめっきを施すことが可能となる。その結果、光造形品を構成するエポキシ樹脂が劣化しなくなり、また、強酸を用いる必要がないため、環境への負担を軽減することができる。   Even with this method, it is possible to apply electroless nickel plating to the surface of the optically shaped article without using a strong acid. As a result, the epoxy resin constituting the stereolithography product does not deteriorate, and it is not necessary to use a strong acid, so the burden on the environment can be reduced.

また、上記した[6]に記載の方法と比較して、パラジウムの使用量を減ずることができる。   Moreover, the usage-amount of palladium can be reduced compared with the method as described in [6] above.

[8]本発明の光造形品へのめっき皮膜形成方法において、前記第3工程においては、前記光造形品の表面に前記無電解ニッケルめっきを施した後、電解めっきを施して複合めっき皮膜を形成することが好ましい。 [8] In the method for forming a plating film on an optical modeling product according to the present invention, in the third step, after applying the electroless nickel plating to the surface of the optical modeling product, electrolytic plating is performed to form a composite plating film. It is preferable to form.

このような方法とすることにより、無電解ニッケルめっきの上層に様々な電解めっきを施すことができることから、本発明の光造形品へのめっき皮膜形成方法を種々の応用分野に適用できる。   By adopting such a method, it is possible to apply various electrolytic plating to the upper layer of electroless nickel plating, and therefore, the plating film forming method for the optically shaped article of the present invention can be applied to various application fields.

[9]本発明の光造形品へのめっき皮膜形成方法において、前記第3工程においては、前記光造形品の表面に前記電解めっきを施す際に光沢剤又はレベリング剤を用いることが好ましい。 [9] In the method for forming a plating film on an optical modeling product according to the present invention, in the third step, it is preferable to use a brightener or a leveling agent when the electrolytic plating is performed on the surface of the optical modeling product.

このような方法とすることにより、アンカー効果を大きくするためにめっき皮膜の算術平均粗さRaを比較的大きくしても、表面に傷が見えにくくなり、光造形品の外観上の品質を高くできる。   By adopting such a method, even if the arithmetic average roughness Ra of the plating film is relatively large in order to increase the anchor effect, it becomes difficult to see scratches on the surface and the appearance quality of the optical modeling product is increased. it can.

[10]本発明の光造形品へのめっき皮膜形成方法においては、前記光造形品の表面に直接前記めっき皮膜を形成することとしてもよい。 [10] In the method for forming a plating film on an optical modeling product of the present invention, the plating film may be directly formed on the surface of the optical modeling product.

[11]本発明の光造形品へのめっき皮膜形成方法においては、前記光造形品の表面にサーフェイサーとしての合成樹脂材料を介して前記めっき皮膜を形成することとしてもよい。 [11] In the method for forming a plating film on an optical modeling product of the present invention, the plating film may be formed on the surface of the optical modeling product via a synthetic resin material as a surfacer.

試験例1及び2で用いた各試料の諸元及び試験例1及び2の結果を説明するために示す図表であるIt is a chart shown in order to explain the specifications of each sample used in Test Examples 1 and 2 and the results of Test Examples 1 and 2 試験例1の結果を説明するために示す図である。It is a figure shown in order to demonstrate the result of Test Example 1. 試験例1の結果を説明するために示す図である。It is a figure shown in order to demonstrate the result of Test Example 1.

以下、本発明の実施の形態を図面に基づいて詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[実施形態1]
<光造形品へのめっき皮膜形成方法>
実施形態1に係る光造形品へのめっき皮膜形成方法は、三次元構造の光造形品を準備する第1工程と、光造形品表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げをする第2工程と、光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成する第3工程とを含む。以下、実施形態に係る光造形品へのめっき皮膜形成方法を詳細に説明する。
[Embodiment 1]
<Method for forming plating film on stereolithography product>
The plating film forming method on the stereolithography product according to the first embodiment includes a first step of preparing a stereolithography product having a three-dimensional structure, and an arithmetic average roughness Ra of the stereolithography product surface within a range of 0.141 μm or more. It includes a second step of surface finishing and a third step of forming a plating film by applying electroless nickel plating to the surface of the stereolithographic product. Hereinafter, the method for forming a plating film on the optically shaped product according to the embodiment will be described in detail.

1.第1工程
第1工程は、光造形法によりエポキシ系樹脂を層状に硬化・積層して作製した三次元構造の光造形品を準備する工程である。この工程は、樹脂用の様々な光造形システムを用いることができる。
1. First Step The first step is a step of preparing a three-dimensional stereolithographic product produced by curing and laminating an epoxy resin in a layered manner by stereolithography. In this step, various optical modeling systems for resin can be used.

2.第2工程
第2工程は、光造形品の表面を機械的処理により、表面の算術平均粗さRaが0.141μm以上、かつ、0.458μm以下となる範囲に表面仕上げする工程である。実施形態1においては、♯2000以下、かつ、♯800以上の研磨材を用いて第2工程を行う。機械的処理としては、研削処理及び研磨処理を用いる。
2. Second Step The second step is a step in which the surface of the stereolithographic product is surface-finished by mechanical treatment so that the arithmetic average roughness Ra of the surface is 0.141 μm or more and 0.458 μm or less. In the first embodiment, the second step is performed using an abrasive of # 2000 or less and # 800 or more. As the mechanical treatment, grinding treatment and polishing treatment are used.

3.第3工程
第3工程は、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成する工程である。
3. Third Step The third step is a step of forming a plating film by performing electroless nickel plating on the surface of the stereolithographic product without performing an etching step.

第3工程においては、スズのゾル溶液を用いて光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、パラジウムイオンを含有する溶液を用いて光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、光造形品の表面に無電解ニッケルめっきを施す。当該第3工程は、特開2014−141712号公報に記載に方法に従って行う。   In the third step, a sensitizing step of forming a tin compound coating film on the surface of the stereolithographic product using a sol solution of tin, and palladium on the surface of the stereolithography product using a solution containing palladium ions. After performing a pretreatment process including an activating process for adsorbing the plating catalyst, electroless nickel plating is applied to the surface of the stereolithographic product. The third step is performed according to the method described in JP-A No. 2014-141712.

第3工程においては、光造形品の表面に無電解ニッケルめっきを施した後、電解めっきを施して複合めっき皮膜を形成する。電解めっきとしては、種々の電解めっきを実施することができる。複数の電解めっきを組み合わせて実施することもできる。例えば、電解銅めっき、電解ニッケルめっき及び電解クロムめっきを順次施して複合めっき皮膜を形成することもできる。なお、光造形品の表面に電解めっきを施す際には、光沢剤及びレベリング剤を用いる。   In the third step, after electroless nickel plating is applied to the surface of the stereolithographic product, electrolytic plating is applied to form a composite plating film. Various electrolytic plating can be performed as the electrolytic plating. A combination of a plurality of electrolytic platings can also be performed. For example, a composite plating film can be formed by sequentially performing electrolytic copper plating, electrolytic nickel plating, and electrolytic chromium plating. In addition, a brightener and a leveling agent are used when performing electrolytic plating on the surface of the stereolithography product.

<実施形態に係る光造形品へのめっき皮膜形成方法の効果>
実施形態1に係る光造形品へのめっき皮膜形成方法によれば、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することから、従来の光造形品へのめっき皮膜形成方法とは異なり、めっき皮膜形成工程中に光造形品の品質が劣化するという問題がなくなる。
<Effect of plating film forming method on stereolithography product according to embodiment>
According to the method for forming a plating film on an optical modeling product according to Embodiment 1, since the plating film is formed by performing electroless nickel plating on the surface of the optical modeling product without performing an etching process, the conventional optical modeling is performed. Unlike the method of forming a plating film on a product, there is no problem that the quality of the optically shaped product deteriorates during the plating film forming process.

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、第2工程において、表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げすることから、後述する試験例1の結果からも明らかなように、光造形品とめっき皮膜との間の剥離強度を所定の値(例えば0.5N/cm)以上にすることができる(図2参照。)。   In addition, according to the plating film forming method on the optically shaped article according to the first embodiment, in the second step, the surface is finished in a range in which the arithmetic average roughness Ra of the surface becomes 0.141 μm or more, the test described later As is clear from the results of Example 1, the peel strength between the optically shaped article and the plating film can be set to a predetermined value (for example, 0.5 N / cm) or more (see FIG. 2).

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、第2工程において、表面の算術平均粗さRaが0.458μm以下となる範囲に表面仕上げすることから、後述する試験例2の結果からも明らかなように、鏡面性のよいめっき皮膜を形成することが可能となる(図1参照。)。   In addition, according to the plating film forming method on the optically shaped product according to the first embodiment, in the second step, the surface is finished in a range where the arithmetic average roughness Ra of the surface becomes 0.458 μm or less, and the test described later As is clear from the results of Example 2, it is possible to form a plating film with good specularity (see FIG. 1).

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、♯2000以下の研磨材を用いて第2工程を行うことから、後述する試験例1の結果からも明らかなように、光造形品とめっき皮膜との間の剥離強度を所定の値(例えば0.5N/cm)以上にすることができる(図2参照。)。   Further, according to the plating film forming method on the optically shaped article according to the first embodiment, the second step is performed using an abrasive of # 2000 or less, and as is apparent from the results of Test Example 1 described later. The peel strength between the stereolithographic product and the plating film can be set to a predetermined value (for example, 0.5 N / cm) or more (see FIG. 2).

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、♯800以上の研磨材を用いて第2工程を行うことから、後述する試験例2の結果からも明らかなように、鏡面性のよいめっき皮膜を形成することが可能となる(図1参照。)。   In addition, according to the plating film forming method for the optically shaped article according to the first embodiment, the second step is performed using an abrasive of # 800 or more, and as is apparent from the results of Test Example 2 described later. Thus, it is possible to form a plating film having a good specularity (see FIG. 1).

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、機械的処理が、研削処理及び研磨処理であることから、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することが可能となる。   Moreover, according to the plating film formation method to the stereolithography product which concerns on Embodiment 1, since a mechanical process is a grinding process and a grinding | polishing process, it is electroless on the surface of a stereolithography product, without implementing an etching process. It is possible to form a plating film by applying nickel plating.

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、第3工程においては、スズのゾル溶液を用いて光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、パラジウムイオンを含有する溶液を用いて光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、光造形品の表面に無電解ニッケルめっきを施すことから、強酸を用いることなく光造形品の表面に無電解ニッケルめっきを施すことが可能となる。その結果、光造形品を構成するエポキシ樹脂が劣化しなくなり、また、強酸を用いる必要がないため、環境への負担を軽減することができる。   Moreover, according to the plating film formation method to the optical modeling article which concerns on Embodiment 1, in the 3rd process, the sensitizing which forms the coating film of a tin compound on the surface of an optical modeling article using the sol solution of tin After performing a pretreatment process including a process and an activation process for adsorbing a plating catalyst made of palladium on the surface of the optical modeling article using a solution containing palladium ions, the surface of the optical modeling article is electroless nickel Since plating is performed, it is possible to apply electroless nickel plating to the surface of the optically shaped product without using a strong acid. As a result, the epoxy resin constituting the stereolithography product does not deteriorate, and it is not necessary to use a strong acid, so the burden on the environment can be reduced.

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、第3工程においては、光造形品の表面に無電解ニッケルめっきを施した後、電解めっきを施して複合めっき皮膜を形成することから、無電解ニッケルめっきの上層に様々な電解めっきを施すことができることから、本発明の光造形品へのめっき皮膜形成方法を種々の応用分野に適用できる。   Moreover, according to the plating film formation method to the stereolithography product according to Embodiment 1, in the third step, after electroless nickel plating is applied to the surface of the stereolithography product, electrolytic plating is performed to form a composite plating membrane. Since various electroplating can be performed on the upper layer of the electroless nickel plating from the formation, the plating film forming method for the optically shaped article of the present invention can be applied to various application fields.

また、実施形態1に係る光造形品へのめっき皮膜形成方法によれば、第3工程においては、光造形品の表面に電解めっきを施す際に光沢剤及びレベリング剤を用いることから、アンカー効果を大きくするためにめっき皮膜の算術平均粗さRaを比較的大きくしても、表面に傷が見えにくくなり、光造形品の外観上の品質を高くできる。   Moreover, according to the plating film formation method to the optical modeling article which concerns on Embodiment 1, since a brightener and a leveling agent are used in the 3rd process when performing electrolytic plating on the surface of an optical modeling article, an anchor effect Even if the arithmetic average roughness Ra of the plating film is made relatively large in order to increase the thickness, it becomes difficult to see scratches on the surface, and the quality of the optically shaped article can be improved.

[実施形態2]
実施形態2に係る光造形品へのめっき皮膜形成方法は、基本的には、実施形態1に係る光造形品へのめっき皮膜形成方法と同様の工程を有するが、第3工程の内容が実施形態1に係る光造形品へのめっき皮膜形成方法の場合と異なる。
[Embodiment 2]
The method for forming a plating film on an optical modeling product according to Embodiment 2 basically includes the same steps as the method for forming a plating film on an optical modeling product according to Embodiment 1, but the contents of the third step are implemented. This is different from the method of forming a plating film on the optically shaped product according to the first aspect.

すなわち、実施形態2に係る光造形品へのめっき皮膜形成方法においては、第3工程において、スズのゾル溶液を用いて光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、銀イオンを含有する溶液を用いてスズと銀の置換反応を起こさせて光造形品の表面に銀を析出させる中間処理工程と、パラジウムイオンを含有する溶液を用いて銀とパラジウムとの置換反応を起こさせて光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、光造形品の表面に無電解ニッケルめっきを施すこととしている。   That is, in the plating film forming method on the optical modeling product according to the second embodiment, in the third step, a sensitizing step of forming a tin compound coating film on the surface of the optical modeling product using a tin sol solution; An intermediate treatment step in which a silver-containing solution is used to cause a tin-silver substitution reaction to deposit silver on the surface of the stereolithography product; and a solution containing palladium ions is used to replace silver with palladium. After performing a pretreatment step including an activation step of causing a reaction to cause the plating catalyst made of palladium to be adsorbed on the surface of the stereolithographic product, electroless nickel plating is applied to the surface of the stereolithography product.

このように、実施形態2に係る光造形品へのめっき皮膜形成方法は、第3工程の内容が実施形態1に係る光造形品へのめっき皮膜形成方法の場合と異なるが、実施形態1に係る光造形品へのめっき皮膜形成方法の場合と同様に、エッチング工程を実施することなく光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成することから、従来の光造形品へのめっき皮膜形成方法とは異なり、めっき皮膜形成工程中に光造形品の品質が劣化するという問題がなくなる。   As described above, the plating film forming method on the optical modeling product according to the second embodiment is different from the case of the plating film forming method on the optical modeling product according to the first embodiment, although the contents of the third step are different from those in the first embodiment. As in the case of the plating film forming method on the stereolithographic product, the electroplated nickel surface is formed on the surface of the stereolithography product without performing the etching step, so that the plating coating is formed. Unlike the plating film forming method, the problem that the quality of the optically shaped article deteriorates during the plating film forming process is eliminated.

また、実施形態2に係る光造形品へのめっき皮膜形成方法によれば、第2工程において、表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げすることから、後述する試験例1の結果からも明らかなように、光造形品とめっき皮膜との間の剥離強度を所定の値(例えば0.5N/cm)以上にすることができる(図2参照。)。   In addition, according to the plating film forming method for the optically shaped article according to the second embodiment, in the second step, the surface is finished in a range where the arithmetic average roughness Ra of the surface is 0.141 μm or more, so that a test described later is performed. As is clear from the results of Example 1, the peel strength between the optically shaped article and the plating film can be set to a predetermined value (for example, 0.5 N / cm) or more (see FIG. 2).

また、実施形態2に係る光造形品へのめっき皮膜形成方法によれば、第2工程において、表面の算術平均粗さRaが0.458μm以下となる範囲に表面仕上げすることから、後述する試験例2の結果からも明らかなように、鏡面性のよいめっき皮膜を形成することが可能となる(図1参照。)。   In addition, according to the plating film forming method on the optically shaped article according to the second embodiment, in the second step, the surface is finished in a range where the arithmetic average roughness Ra of the surface becomes 0.458 μm or less, so that a test described later is performed. As is clear from the results of Example 2, it is possible to form a plating film with good specularity (see FIG. 1).

[試験例]
以下、試験例により本発明をさらに具体的に説明する。
[Test example]
Hereinafter, the present invention will be described in more detail with reference to test examples.

[試験例1]
試験例1は、光造形品へのめっき皮膜形成方法において、光造形品表面の算術平均粗さRaと、光造形品とめっき皮膜との間の剥離強度との関係を明らかにするための試験例である。
[Test Example 1]
Test Example 1 is a test for clarifying the relationship between the arithmetic average roughness Ra of the surface of the optical modeling product and the peel strength between the optical modeling product and the plating film in the method of forming the plating film on the optical modeling product. It is an example.

1.試料の調製
基本的には、上記の実施形態1に係る光造形品へのめっき皮膜形成方法と同様の方法によって、試料1〜19(光造形品)を作製した。各試料は、いずれも、シーメット株式会社製の光造形システム(型番:RM−6000)を用いて作製した。原料の樹脂は、株式会社ADEKA製の紫外線硬化型エポキシ系樹脂(製品番号:HS−696)を用いた。各試料は、長さ60mm×幅15mm×厚さ3mmの直方体であり、積層ピッチは厚さ方向に沿って0.13mmである。
1. Preparation of Samples Samples 1 to 19 (stereolithography products) were basically produced by the same method as the plating film forming method on the stereolithography product according to the first embodiment. Each sample was produced using an optical modeling system (model number: RM-6000) manufactured by Seamet Corporation. As a raw material resin, UV curing type epoxy resin (product number: HS-696) manufactured by ADEKA Corporation was used. Each sample is a rectangular parallelepiped having a length of 60 mm, a width of 15 mm, and a thickness of 3 mm, and the stacking pitch is 0.13 mm along the thickness direction.

その後、図1に記載の条件で研磨工程を実施することにより各試料について表面仕上げを行った。図1は、試験例1及び2で用いた各試料の諸元及び試験例1及び2の結果を説明するために示す図表である。なお、図1中、研磨工程に用いた研磨紙の入手先のうち、RC社は理研コランダム株式会社を示し、KV社は株式会社コバックスを示し、ZS社はZibo Sisha Mt Coated Abrasives Co., Ltd. (中国)を示し、NK社は日本研紙株式会社を示し、FJ社は有限会社富士研磨を示し、SK社は三共理化学株式会社を示し、3M社はスリーエムジャパン株式会社を示す。   Then, the surface finishing was performed about each sample by implementing the grinding | polishing process on the conditions as described in FIG. FIG. 1 is a chart for explaining the specifications of each sample used in Test Examples 1 and 2 and the results of Test Examples 1 and 2. In FIG. 1, among the sources of the abrasive paper used in the polishing process, RC represents Riken Corundum Co., Ltd., KV represents Kovacs Co., Ltd., and ZS represents Zibo Sisha Mt Coated Abrasives Co., Ltd. (China), NK represents Nihon Kenshi Co., Ltd., FJ represents Fuji Polish Co., Ltd., SK represents Sankyo Rikagaku, and 3M represents 3M Japan.

各試料についての算術平均粗さRaの測定は、英国テーラーホブソン社製の三次元表面粗さ測定器(型番:フォームタリサーフS5K型、長野県工業技術総合センター保有設備)を用いて行った。   The arithmetic average roughness Ra of each sample was measured using a three-dimensional surface roughness measuring instrument (model number: Form Talysurf S5K, owned by Nagano Prefectural Industrial Technology Center) manufactured by Taylor Hobson, UK.

その後、上記の実施形態1に係る光造形品へのめっき皮膜形成方法と同様の方法によって、各試料の表面にめっき皮膜を形成した。めっき皮膜の形成は、センシタイジング工程とアクティベーティング工程とを含む前処理工程を行った後、各試料の表面にめっき皮膜を形成することにより行った。但し、めっき皮膜の形成は、各試料の表面に無電解ニッケルめっきを施した後、電解銅めっきを施して複合めっき皮膜を形成した。   Then, the plating film was formed in the surface of each sample by the method similar to the plating film formation method to the optical modeling article which concerns on said Embodiment 1. FIG. The plating film was formed by forming a plating film on the surface of each sample after performing a pretreatment process including a sensitizing process and an activating process. However, the plating film was formed by electroless nickel plating on the surface of each sample and then electrolytic copper plating to form a composite plating film.

2.評価方法
剥離強度の測定は、株式会社イマダ製デジタルフォースゲージDS2−50Nを用いて行った。まず、各試料の電解銅めっき面にカッターナイフで下地のエポキシ系樹脂に届くまで短冊状の切込み(長方形の長辺2辺及び短辺1辺に沿った切込み)を入れる。長方形の長辺の長さは25mmとし短辺の幅は8mmとする。その後、短冊状の切り込みのうち短辺1辺に沿った切り込みの部分からめっき皮膜を数mm剥がして、上記デジタルフォースゲージのクリップに挟む。その後、各試料に対して上記デジタルフォースゲージが垂直の関係になるように保持しながら、ゆっくりとデジタルフォースゲージを引き上げていき、そのときの最大の引き上げ力を剥離強度として読み取る。
2. Evaluation Method The peel strength was measured using a digital force gauge DS2-50N manufactured by Imada Corporation. First, strip-like cuts (cuts along two long sides of the rectangle and one short side) are made on the electrolytic copper-plated surface of each sample with a cutter knife until reaching the base epoxy resin. The long side of the rectangle has a length of 25 mm and the short side has a width of 8 mm. Then, several mm of the plating film is peeled off from the cut portion along one short side of the strip-shaped cut and sandwiched between the clips of the digital force gauge. Thereafter, while holding the digital force gauge in a vertical relationship with respect to each sample, the digital force gauge is slowly pulled up, and the maximum pulling force at that time is read as the peel strength.

3.評価結果
図2及び図3は、試験例1の結果を説明するために示す図である。すなわち、図2は、横軸に算術平均粗さRaを取り、縦軸に剥離強度を取るとともに、各試料について光造形品表面の算術平均粗さRa及び光造形品とめっき皮膜との剥離強度をプロットしたものである。また、図3は、横軸に研磨材(この場合研磨紙)の粗さ(番手)を取り、縦軸に剥離強度を取るとともに、各試料(試料1〜19)について研磨工程に用いた研磨紙の番手及び光造形品とめっき皮膜との剥離強度をプロットしたものである。
3. Evaluation Results FIGS. 2 and 3 are diagrams for explaining the results of Test Example 1. FIG. That is, FIG. 2 shows the arithmetic average roughness Ra on the horizontal axis and the peel strength on the vertical axis, and the arithmetic average roughness Ra on the surface of the optical modeled product and the peel strength between the optical modeled product and the plating film for each sample. Are plotted. 3 shows the roughness (count) of the abrasive (in this case, abrasive paper) on the horizontal axis, the peel strength on the vertical axis, and the polishing used for the polishing process for each sample (samples 1 to 19). It is a plot of the peel strength between the paper count and the stereolithographic product and the plating film.

図2からは、光造形品表面の算術平均粗さRaが大きいほど光造形品とめっき皮膜の剥離強度が大きいことが分かった。そして、試料1〜17が0.5N/cm以上の剥離強度を有することから、光造形品表面の算術平均粗さRaが0.141μm以上の場合に0.5N/cm以上の剥離強度が得られることが分かった。   From FIG. 2, it was found that as the arithmetic average roughness Ra on the surface of the optical modeling product is large, the peel strength between the optical modeling product and the plating film is large. Since Samples 1 to 17 have a peel strength of 0.5 N / cm or more, a peel strength of 0.5 N / cm or more is obtained when the arithmetic average roughness Ra of the surface of the optically shaped article is 0.141 μm or more. I found out that

また、図3からは、研磨工程に用いる研磨紙の番手が小さいほど光造形品とめっき皮膜の剥離強度が大きいことが分かった。そして、試料1〜17が0.5N/cm以上の剥離強度を有することから、研磨工程で用いる研磨紙の番手が♯2000以下の場合に0.5N/cm以上の剥離強度が得られることが分かった。   Further, FIG. 3 shows that the smaller the count of the polishing paper used in the polishing process, the higher the peel strength between the optically shaped product and the plating film. Since Samples 1 to 17 have a peel strength of 0.5 N / cm or more, a peel strength of 0.5 N / cm or more can be obtained when the count of the abrasive paper used in the polishing process is # 2000 or less. I understood.

[試験例2]
試験例2は、本発明の光造形品へのめっき皮膜形成方法において、光造形品表面の算術平均粗さRaと、めっき皮膜の鏡面性との関係を明らかにするための試験である。
[Test Example 2]
Test Example 2 is a test for clarifying the relationship between the arithmetic average roughness Ra of the surface of the optical modeling product and the specularity of the plating film in the method for forming the plating film on the optical modeling product of the present invention.

1.試料の調製
基本的には、試験例1の場合と同様の方法によって、試料1〜19を作製した。但し、めっき皮膜の形成は、各試料の表面に無電解ニッケルめっきを施した後、電解銅めっき、電解ニッケルめっき及び電解クロムめっきを順次施して複合めっき皮膜を形成した。
1. Preparation of Samples Samples 1 to 19 were basically produced by the same method as in Test Example 1. However, the plating film was formed by electroless nickel plating on the surface of each sample, and then electrolytic copper plating, electrolytic nickel plating, and electrolytic chromium plating were sequentially applied to form a composite plating film.

2.評価方法
めっき皮膜の鏡面性は、評価者の目視による評価により行った。評価基準は以下の通りである。すなわち、めっき皮膜の鏡面性が非常に良い場合(表面全面が均一な鏡面である場合)にA評価を与え、めっき皮膜の鏡面性が良い場合(部分的に下地のエポキシ系樹脂が露出している部分が見られる場合)にB評価を与え、めっき皮膜の鏡面性が悪い(明らかに仕上げ傷が観察できる場合)にC評価を与えた。評価者は3人とし、3人のうち一番低い評価を当該試料についての評価とした。
2. Evaluation method The specularity of the plating film was evaluated by visual evaluation by an evaluator. The evaluation criteria are as follows. That is, when the specularity of the plating film is very good (when the entire surface is a uniform mirror surface), A evaluation is given, and when the specularity of the plating film is good (partially the epoxy resin of the base is exposed) B evaluation was given to the case where the part is present), and C evaluation was given to the case where the specularity of the plating film was poor (when the finished scratch could be clearly observed). There were three evaluators, and the lowest evaluation among the three was the evaluation for the sample.

3.評価結果
評価の結果、光造形品表面の算術平均粗さRaが小さいほどめっき皮膜の鏡面性が高いことが分かった。そして、試料6〜19がA評価を有することから、光造形品表面の算術平均粗さRaが0.458μm以下の場合に鏡面性の良いめっき皮膜を形成可能であることが分かった。
3. Evaluation result As a result of the evaluation, it was found that the smaller the arithmetic average roughness Ra of the surface of the optical modeling product, the higher the specularity of the plating film. And since samples 6-19 have A evaluation, when the arithmetic mean roughness Ra of the optical modeling article surface was 0.458 micrometer or less, it turned out that a plating film with good specularity can be formed.

また、研磨工程に用いる研磨紙の番手が大きいほどさいほどめっき皮膜の鏡面性が高いことが分かった。そして、試料6〜19がA評価を有することから、研磨工程に用いる研磨紙の番手が♯800以上の場合に鏡面性の良いめっき皮膜を形成可能であることが分かった。   Moreover, it turned out that the mirror surface property of a plating film is so high that the count of the abrasive paper used for a grinding | polishing process is large. Since Samples 6 to 19 have an A rating, it was found that a plating film with good specularity can be formed when the count of the abrasive paper used in the polishing process is # 800 or more.

なお、本発明は上記の実施形態に限られるものではなく、本発明の要旨を逸脱しない範囲で種々変形実施可能となるものである。たとえば、下記に示すような変形実施も可能である。   The present invention is not limited to the above embodiment, and various modifications can be made without departing from the scope of the present invention. For example, the following modifications are possible.

(1)上記実施形態1及び2においては、機械的処理として、研削処理及び研磨処理を用いたが、本発明はこれに限定されるものでない。研削処理及び研磨処理に代えて、研削処理単独の処理、研磨処理単独の処理、又は、ブラスト処理を用いてもよい。 (1) In the first and second embodiments, the grinding process and the polishing process are used as the mechanical process, but the present invention is not limited to this. Instead of the grinding process and the polishing process, a single grinding process, a single polishing process, or a blasting process may be used.

(2)上記実施形態1及び2においては、電解めっきを施す際に光沢剤及びレベリング剤の両方を用いたが、本発明はこれに限定されるものではない。電解めっきを施す際に光沢剤及びレベリング剤の一方だけを用いてもよい。また、電解めっきを施す際に光沢剤及びレベリング剤の両方を用いなくてもよい。 (2) In Embodiments 1 and 2 described above, both the brightening agent and the leveling agent are used when electrolytic plating is performed, but the present invention is not limited to this. Only one of the brightener and the leveling agent may be used when the electrolytic plating is performed. Moreover, when performing electroplating, it is not necessary to use both a brightener and a leveling agent.

(3)上記実施形態1及び2においては、光造形品の表面に直接めっき皮膜を形成したが、本発明はこれに限定されるものではない。光造形品の表面にサーフェイサーとしての合成樹脂材料を介してめっき皮膜を形成してもよい。 (3) In the said Embodiment 1 and 2, although the plating film was directly formed on the surface of the optical modeling article, this invention is not limited to this. A plating film may be formed on the surface of the stereolithographic product via a synthetic resin material as a surfacer.

Claims (11)

光造形法によりエポキシ系樹脂を層状に硬化・積層して作製した三次元構造の光造形品を準備する第1工程と、
前記光造形品の表面を機械的処理により、前記表面の算術平均粗さRaが0.141μm以上となる範囲に表面仕上げする第2工程と、
エッチング工程を実施することなく前記光造形品の表面に無電解ニッケルめっきを施してめっき皮膜を形成する第3工程とを含む光造形品へのめっき皮膜形成方法であって、
前記表面の算術平均粗さRaは、前記表面の粗さ曲線から、その平均線の方向に基準長さだけ抜き取り、この抜き取り部分の平均線から測定曲線までの偏差の絶対値を合計し、平均することにより算出した算術平均粗さRa(日本工業規格 JIS B 0601)であることを特徴とする光造形品へのめっき皮膜形成方法。
A first step of preparing a three-dimensional structure stereolithography product prepared by curing and laminating epoxy resins in layers by stereolithography;
A second step of surface-finishing the surface of the stereolithographic product in a range in which the arithmetic average roughness Ra of the surface is 0.141 μm or more by mechanical treatment;
A method of forming a plating film on an optical modeling product, including a third step of forming a plating film by performing electroless nickel plating on the surface of the optical modeling product without performing an etching process ,
The arithmetic average roughness Ra of the surface is extracted from the surface roughness curve by a reference length in the direction of the average line, and the absolute values of deviations from the average line of the extracted part to the measurement curve are summed, and the average A method for forming a plating film on an optically shaped article, characterized in that the arithmetic average roughness Ra (Japanese Industrial Standards JIS B 0601) is calculated .
前記第2工程においては、前記表面の算術平均粗さRaが0.458μm以下となる範囲に表面仕上げすることを特徴とする請求項1に記載の光造形品へのめっき皮膜形成方法。   2. The method for forming a plating film on an optically shaped article according to claim 1, wherein in the second step, the surface is finished in a range where the arithmetic average roughness Ra of the surface is 0.458 μm or less. ♯2000以下の研磨材を用いて前記第2工程を行うことを特徴とする請求項1又は2に記載の光造形品へのめっき皮膜形成方法。   The method of forming a plating film on an optically shaped article according to claim 1 or 2, wherein the second step is performed using an abrasive of # 2000 or less. ♯800以上の研磨材を用いて前記第2工程を行うことを特徴とする請求項1〜3のいずれかに記載の光造形品へのめっき皮膜形成方法。   The method of forming a plating film on an optically shaped article according to claim 1, wherein the second step is performed using an abrasive of # 800 or more. 前記機械的処理は、研磨処理、研削処理若しくはブラスト処理又はこれらを組み合わせた処理であることを特徴とする請求項1〜4のいずれかに記載の光造形品へのめっき皮膜形成方法。   The method of forming a plating film on an optically shaped article according to any one of claims 1 to 4, wherein the mechanical treatment is a polishing treatment, a grinding treatment, a blast treatment, or a combination thereof. 前記第3工程においては、スズのゾル溶液を用いて前記光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、パラジウムイオンを含有する溶液を用いて前記光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、前記光造形品の表面に前記無電解ニッケルめっきを施すことを特徴とする請求項1〜5のいずれかに記載の光造形品へのめっき皮膜形成方法。   In the third step, a sensitizing step of forming a tin compound coating film on the surface of the stereolithographic product using a sol solution of tin, and a surface of the stereolithography product using a solution containing palladium ions The electroless nickel plating is performed on the surface of the stereolithography product after performing a pretreatment step including an activation step of adsorbing a plating catalyst made of palladium on the surface. A method for forming a plating film on an optically shaped article according to claim 1. 前記第3工程においては、スズのゾル溶液を用いて前記光造形品の表面にスズ化合物のコーティング膜を形成するセンシタイジング工程と、銀イオンを含有する溶液を用いてスズと銀の置換反応を起こさせて前記光造形品の表面に銀を析出させる中間処理工程と、パラジウムイオンを含有する溶液を用いて銀とパラジウムとの置換反応を起こさせて前記光造形品の表面にパラジウムからなるめっき触媒を吸着させるアクティベーティング工程とを含む前処理工程を行なった後、前記光造形品の表面に前記無電解ニッケルめっきを施すことを特徴とする請求項1〜5のいずれかに記載の光造形品へのめっき皮膜形成方法。   In the third step, a sensitizing step of forming a tin compound coating film on the surface of the stereolithographic product using a sol solution of tin, and a substitution reaction of tin and silver using a solution containing silver ions And an intermediate treatment step for depositing silver on the surface of the stereolithographic product and a substitution reaction between silver and palladium using a solution containing palladium ions to form palladium on the surface of the stereolithography product. The electroless nickel plating is performed on the surface of the stereolithographic product after performing a pretreatment step including an activation step of adsorbing a plating catalyst. A method for forming a plating film on an optically shaped product. 前記第3工程においては、前記光造形品の表面に前記無電解ニッケルめっきを施した後、電解めっきを施して複合めっき皮膜を形成することを特徴とする請求項1〜7のいずれかに記載の光造形品へのめっき皮膜形成方法。   The said 3rd process WHEREIN: After giving the said electroless nickel plating to the surface of the said optical shaping | molding article, electrolytic plating is given and a composite plating film is formed, The one in any one of Claims 1-7 characterized by the above-mentioned. Of forming a plating film on a stereolithographic product. 前記第3工程においては、前記光造形品の表面に前記電解めっきを施す際に光沢剤又はレベリング剤を用いることを特徴とする請求項8に記載の光造形品へのめっき皮膜形成方法。   The method for forming a plating film on an optical modeling product according to claim 8, wherein, in the third step, a brightener or a leveling agent is used when the electrolytic plating is performed on the surface of the optical modeling product. 前記光造形品の表面に直接前記めっき皮膜を形成することを特徴とする請求項1〜9のいずれかに記載の光造形品へのめっき皮膜形成方法。   The method for forming a plating film on an optical modeling product according to claim 1, wherein the plating film is directly formed on the surface of the optical modeling product. 前記光造形品の表面にサーフェイサーとしての合成樹脂材料を介して前記めっき皮膜を形成することを特徴とする請求項1〜9のいずれかに記載の光造形品へのめっき皮膜形成方法。   The method for forming a plating film on an optical modeling product according to any one of claims 1 to 9, wherein the plating film is formed on a surface of the optical modeling product via a synthetic resin material as a surfacer.
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