JP3434508B1 - Plating base treatment method for stereolithography - Google Patents
Plating base treatment method for stereolithographyInfo
- Publication number
- JP3434508B1 JP3434508B1 JP2002360365A JP2002360365A JP3434508B1 JP 3434508 B1 JP3434508 B1 JP 3434508B1 JP 2002360365 A JP2002360365 A JP 2002360365A JP 2002360365 A JP2002360365 A JP 2002360365A JP 3434508 B1 JP3434508 B1 JP 3434508B1
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- Japan
- Prior art keywords
- stereolithography product
- stereolithography
- product
- plating
- polishing
- Prior art date
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Abstract
【要約】
【課題】 めっき処理によって光造形品が変形すること
なく、さらに、滑らかなめっき表面が得られる光造形品
のめっき下地処理方法を提供すること。
【解決手段】 本発明のめっき下地処理方法は、光造形
品のめっきが施される表面を研磨材を用いて磨く第１工
程と、前記光造形品を加熱する第２工程と、前記表面へ
の着色により前記第１工程で生成された傷を目立たせる
第３工程と、前記第１工程より細かい研磨材を用いて前
記表面を磨く第４工程と、を含んでいることを特徴とす
る。An object of the present invention is to provide a plating base treatment method for an optically molded article that can obtain a smooth plating surface without deforming the optically molded article by a plating process. SOLUTION: The plating base treatment method of the present invention includes a first step of polishing a surface of an optically shaped article to be plated with an abrasive, a second step of heating the optically shaped article, And a fourth step of polishing the surface by using an abrasive finer than the first step to make the scratches generated in the first step noticeable by coloring.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光造形品のめっき
下地処理方法に関し、より詳細には、光造形によって製
造された製品の表面にめっきを施すための下地を形成す
る下地処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plating undercoating method for a stereolithography product, and more particularly to a undercoating treatment method for forming an undercoat for plating the surface of a product manufactured by stereolithography.
【０００２】[0002]
【従来の技術】三次元形状データに基づいて、エポキシ
系の紫外線硬化性樹脂に紫外線を照射して順次、硬化さ
せ、これを積層させていくことにより、三次元構造の製
品（光造形品）を製造する光造形システムが知られてい
る。2. Description of the Related Art A three-dimensional structure product (stereolithography product) is obtained by irradiating an ultraviolet ray-curable epoxy resin with ultraviolet rays on the basis of three-dimensional shape data to cure the resin sequentially and stacking the layers. Stereolithography systems for manufacturing are known.
【０００３】このような光造形システムで製造された光
造形品は、最終製品のマスターモデルとして利用される
ことが多かったが、近年では、最終製品としても使用さ
れている。このため、光造形品の表面にめっきを施すこ
とが求められている。また、光造形品をマスターモデル
として利用する場合であっても、最終製品に近いリアリ
ティを出すため、表面にめっきを施すことが求められる
ことが多くなってきている。光造形品の表面にめっきを
施す技術としては、例えば、特許文献１ないし３に記載
されている技術が知られている。The stereolithography product manufactured by such a stereolithography system is often used as a master model of the final product, but in recent years, it is also used as the final product. Therefore, it is required to plate the surface of the stereolithography product. Further, even when the stereolithography product is used as a master model, it is often required to apply plating to the surface in order to obtain a reality close to that of the final product. As a technique for plating the surface of a stereolithography product, for example, the techniques described in Patent Documents 1 to 3 are known.
【０００４】光造形品にめっきを施す場合には、光造形
品を構成する層の間に形成される微小な段差を消すため
の前処理が行われていた。この前処理は、まず、＃２０
０程度の粗いのペーパヤスリでめっきを施す表面を磨
き、次いで、色つき合成樹脂塗料による着色して表面の
細かい傷を目立たせ、次いで、＃４００程度のペーパヤ
スリで光造形品の表面を磨いて＃２００のペーパヤスリ
の磨き傷を消し、再び、色つき合成樹脂塗料による着色
して表面の細かい傷を目立たせ、さらに、＃６００程度
細かいペーパヤスリで表面を磨いて前の磨きの傷を消す
という作業を繰り返し、最終的には、＃１０００番程度
の細かいペーパヤスリで磨くという下地処理であった。In the case of plating an optically shaped product, a pretreatment for eliminating a minute step formed between layers constituting the optically shaped product has been performed. This pre-processing starts with # 20.
Polish the surface to be plated with a rough paper file of about 0, then color it with a colored synthetic resin paint to make fine scratches on the surface conspicuous, then polish the surface of the stereolithography product with about 400 paper files # Erasing the scratches on 200 paper files, again coloring with a colored synthetic resin paint to make fine scratches on the surface conspicuous, and further polishing the surface with a fine # 600 paper file to erase the scratches on the previous polish. Repeatedly, the final treatment was polishing with a fine paper file of # 1000.
【０００５】[0005]
【特許文献１】 特開平１０−１２９９５号公報[Patent Document 1] Japanese Patent Application Laid-Open No. 10-12995
【特許文献２】 特開平１０−３２９１４５号公報[Patent Document 2] Japanese Patent Laid-Open No. 10-329145
【特許文献３】 特開平１１−８２３７７号公報[Patent Document 3] Japanese Patent Laid-Open No. 11-82377
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、このよ
うな前処理を施しても、光造形品では、めっき表面に段
差が現れる「浮き現象」が起こり、滑らかな表面が得ら
れないという問題があった。この問題は、緩やかに傾斜
した滑らかな曲面において、特に顕著であった。さら
に、光造形品の形状が薄かったり、細長い場合には、め
っき処理中に製品自身が変形してしまうことがあるとい
う問題があった。However, even if such pretreatment is carried out, there is a problem in that in the stereolithography product, a "floating phenomenon" in which a step appears on the plating surface occurs and a smooth surface cannot be obtained. It was This problem was particularly noticeable on a smooth curved surface that was gently inclined. Furthermore, when the shape of the stereolithography product is thin or long and slender, the product itself may be deformed during the plating process.
【０００７】本発明は、このような問題に鑑みなされた
ものであり、めっき処理によって光造形品が変形するこ
となく、さらに、滑らかなめっき表面が得られる光造形
品のめっき下地処理方法を提供することを目的とする。The present invention has been made in view of the above problems, and provides a plating undercoating method for a stereolithography product, which does not deform the stereolithography product by the plating treatment and can obtain a smooth plating surface. The purpose is to do.
【０００８】[0008]
【課題を解決するための手段】本願発明の発明者は、上
記問題は、めっき処理中の乾燥工程で、めっきされた光
造形品が６０℃前後の温度の乾燥炉で乾燥されるとき、
光造形品内部の残留応力が、光造形品の表面の各層の境
界から発散させることによって生じることを見出し、こ
れに基づいて、本願発明を構成したものである。Means for Solving the Problems The inventor of the present invention has the above-mentioned problem in the drying step during the plating treatment, when the plated stereolithography product is dried in a drying oven at a temperature of about 60 ° C.
It is found that the residual stress inside the stereolithography product is generated by diverging from the boundary of each layer on the surface of the stereolithography product, and the present invention is configured based on this.
【０００９】本発明によれば、光造形品のめっきが施さ
れる表面を研磨材を用いて磨く第１工程と、前記光造形
品を加熱する第２工程と、前記表面への着色により前記
第１工程で生成された傷を目立たせる第３工程と、前記
第１工程より細かい研磨材を用いて前記表面を磨く第４
工程と、を含んでいることを特徴とする光造形品のめっ
き下地処理方法が提供される。According to the present invention, the first step of polishing the surface of the stereolithography product to be plated with an abrasive, the second step of heating the stereolithography product, and the step of coloring the surface A third step of highlighting the scratches generated in the first step, and a fourth step of polishing the surface with a finer abrasive than in the first step.
The present invention provides a method for plating-treating a stereolithographic article, which comprises the steps of:
【００１０】このような構成によれば、加熱により光造
形品の残留応力が発散されてしまうので、後に行われる
めっき処理中の加熱によって光造形品の残留応力が発散
されてめっき表面に段差が現れることがなくなる。ま
た、本発明の下地処理では、加熱により段差等が生じて
も、その後に表面の研磨が行われるので、加熱により生
じた段差が研磨により消滅させられる。According to this structure, the residual stress of the photo-fabricated product is radiated by heating, so that the residual stress of the photo-fabricated product is diverged by the heating during the plating process to be performed later, and a step is formed on the plating surface. It will never appear. Further, in the base treatment of the present invention, even if a step or the like occurs due to heating, the surface is polished thereafter, so the step caused by heating is eliminated by the polishing.
【００１１】本発明の他の態様によれば、光造形品のめ
っきが施される表面を研磨材を用いて磨く第１工程と、
前記光造形品を加熱する第２工程と、前記表面への着色
により前記第１工程で生成された傷を目立たせる第３工
程と、前記第１工程より細かい研磨材を用いて前記表面
を磨く第４工程と、前記光造形品を加熱する第５工程
と、前記表面への着色により前記第４工程で生成された
傷を目立たせる第６工程と、前記第４工程より細かい研
磨材を用いて前記表面を磨く第７工程と、を含んでいる
ことを特徴とする光造形品のめっき下地処理方法が提供
される。このような態様によれば、加熱が２回に分けて
行われるので、残留応力が発散がより良く行われる。According to another aspect of the present invention, a first step of polishing the plated surface of the stereolithography product with an abrasive,
A second step of heating the stereolithographic article, a third step of making the scratches generated in the first step noticeable by coloring the surface, and a step of polishing the surface with a finer abrasive than in the first step. A fourth step, a fifth step of heating the stereolithographic article, a sixth step of making the scratches generated in the fourth step conspicuous by coloring the surface, and an abrasive finer than the fourth step are used. And a seventh step of polishing the surface. According to such a mode, since the heating is performed twice, the residual stress is more effectively diverged.
【００１２】[0012]
【００１３】[0013]
【００１４】本発明のもう一つの態様によれば、光造形
品のめっきが施される表面を研磨材を用いて磨く磨き工
程を備えた光造形品のめっき下地処理方法であって、さ
らに、前記磨き工程に先立って光造形品を加熱する加熱
工程を備えていることを特徴とする光造形品のめっき下
地処理方法が提供される。According to another aspect of the present invention, there is provided a method for plating a stereolithography product, which comprises a polishing step of polishing the surface of the stereolithography product to be plated with an abrasive. There is provided a method for treating an underlayer for plating a stereolithography product, which comprises a heating step of heating the stereolithography product prior to the polishing step.
【００１５】このような構成によれば、加熱により光造
形品の残留応力が発散されてしまうので、後に行われる
めっき処理中の加熱によって光造形品の残留応力が発散
されてめっき表面に段差が現れることがなくなる。ま
た、加熱による残留応力の発散によって生じた段差が、
磨きによって確実に消される。According to such a configuration, the residual stress of the photofabricated product is radiated by heating, so that the residual stress of the photofabricated product is diverged by the heating during the plating process performed later, and a step is formed on the plating surface. It will never appear. In addition, the step caused by the divergence of residual stress due to heating is
It is surely erased by polishing.
【００１６】本発明の好ましい態様によれば、前記光造
形品の加熱温度が、めっき工程における光造形品の加熱
温度より高く設定されている。このような構成によれ
ば、残留応力の発散が確実に行われ、めっき工程で残留
応力が発散されることが防止される。According to a preferred aspect of the present invention, the heating temperature of the stereolithography product is set higher than the heating temperature of the stereolithography product in the plating step. With such a configuration, the residual stress is surely diffused, and the residual stress is prevented from being diffused in the plating process.
【００１７】本発明の他の好ましい態様によれば、前記
光造形品の加熱温度が、前記光造形品の残留応力を発散
できる温度に設定されている。また、本発明の他の好ま
しい態様によれば、前記光造形品の加熱が、前記光造形
品の残留応力を発散できる時間、継続される。このよう
な構成によれば、めっき作業に先立って、光造形品の残
留応力を確実に除去しておくことができる。本発明の他
の好ましい態様によれば、光造形品がエポキシ系樹脂で
ある。According to another preferred aspect of the present invention, the heating temperature of the stereolithography product is set to a temperature at which residual stress of the stereolithography product can be diffused. Further, according to another preferred aspect of the present invention, the heating of the stereolithography product is continued for a time period during which residual stress of the stereolithography product can be dissipated. With such a configuration, the residual stress of the stereolithography product can be surely removed before the plating operation. According to another preferred embodiment of the present invention, the stereolithography product is an epoxy resin.
【００１８】[0018]
【発明の実施の形態】以下、本発明の好ましい実施形態
の光造形品のめっき下地処理方法について説明する。ま
ず、光造形品を準備する。本実施形態の光造形品は、紫
外線硬化性のエポキシ樹脂に、光造形品の三次元形状デ
ータに基づいて紫外線を照射して、積層構造に形成され
た公知の光造形品である。光造型機としては、例えば、
米国の３D SYSTEMS社の光造型機が用いられ、エポキシ
樹脂としては、例えばバンティコ社から入手可能な、光
造形システム用のエポキシ樹脂が用いられる。また、光
造形品の各層の厚さは、例えば、０．０２５ｍｍ乃至
０．２５ｍｍの範囲で、適宜選択される。このようにし
て製造された光造形品に対してめっきを施すのに先立っ
て、本実施形態のめっき下地処理が行われる。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a plating undercoating method for a stereolithography product according to a preferred embodiment of the present invention will be described. First, a stereolithography product is prepared. The stereolithography product of this embodiment is a known stereolithography product formed in a laminated structure by irradiating an ultraviolet curable epoxy resin with ultraviolet rays based on the three-dimensional shape data of the stereolithography product. As an optical molding machine, for example,
An optical molding machine manufactured by 3D SYSTEMS of the US is used, and as the epoxy resin, for example, an epoxy resin for a stereolithography system available from Bantico is used. The thickness of each layer of the stereolithography product is appropriately selected, for example, in the range of 0.025 mm to 0.25 mm. Prior to plating the thus-fabricated stereolithography product, the plating base treatment of the present embodiment is performed.
【００１９】本実施形態のめっき下地処理では、まず、
光造形品のデサインラインと寸法をコントロールしなが
ら、光造形品のめっきが施される表面を粗さ＃１００〜
＃２４０のペーパやすりで磨き、光造形による積層間の
段差を落とす。磨き作業では、電動の研磨機による磨き
と、手作業による磨きとが併用されるが、何れか一方に
よってもよい。In the plating base treatment of this embodiment, first,
While controlling the design line and dimensions of the stereolithography product, the surface of the photolithography product to be plated will have a roughness of # 100-
Polish with # 240 paper and remove the step between the laminated layers by stereolithography. In the polishing work, polishing by an electric polishing machine and polishing by manual work are used together, but either one may be used.
【００２０】次いで、磨きが完了した光造形品の表面に
グレーの合成樹脂塗料を吹き付け、光造形品の表面の細
かい傷（例えば、前工程の＃１００〜＃２４０のペーパ
やすりによる磨きの傷）を目立たせる。Next, a gray synthetic resin paint is sprayed on the surface of the optically shaped product that has been polished, and fine scratches on the surface of the optically shaped product (for example, polishing scratches due to the sandpaper of # 100 to # 240 in the previous step). Stand out.
【００２１】さらに、光造形品のデサインラインと寸法
をコントロールしながら、合成樹脂塗料が吹き付けられ
た光造形品の表面を粗さ＃３２０〜＃４００のペーパや
すりで磨き、前の工程での磨きによる傷を消す。Further, while controlling the design line and the dimension of the stereolithography product, the surface of the stereolithography product sprayed with the synthetic resin coating is polished with a paper file having a roughness of # 320 to # 400, and then polished in the previous step. Erase the scratches caused by.
【００２２】次いで、磨きが完了した光造形品の表面に
グレーの合成樹脂塗料を吹き付け、光造形品の表面の細
かい傷（例えば、前工程の＃３２０〜＃４００のペーパ
やすりによる磨きの傷）を目立たせる。Next, a gray synthetic resin paint is sprayed on the surface of the optically shaped product that has been polished, and fine scratches on the surface of the optically shaped product (for example, polishing scratches caused by the sandpaper of # 320 to # 400 in the previous step). Stand out.
【００２３】さらに、光造形品のデサインラインと寸法
をコントロールしながら、合成樹脂塗料が吹き付けられ
た光造形品の表面を粗さ＃５００〜＃６００のペーパや
すりで磨き、前の工程での磨きによる傷を消す。Further, while controlling the design line and the dimension of the stereolithography product, the surface of the stereolithography product sprayed with the synthetic resin paint is polished with a paper file having a roughness of # 500 to # 600, and is polished in the previous step. Erase the scratches caused by.
【００２４】次いで、光造形品を加熱して、内部の残留
応力を発散させる。本実施形態では、光造形品を工業用
のオーブンに入れて、強制送風循環方式による８０℃の
熱風の循環の雰囲気で、３０分間、光造形品を加熱す
る。オーブン内の湿度は、５０％以下に設定される。本
実施形態では、この加熱温度及び時間は、光造形品の内
部残留応力を発散させるのに十分な温度および時間に設
定されている。また、加熱温度は、後に行われるめっき
処理における光造形品の加熱温度６０℃より高く設定さ
れている。Next, the stereolithographic product is heated to dissipate the residual stress inside. In the present embodiment, the stereolithography product is placed in an industrial oven, and the stereolithography product is heated for 30 minutes in a hot air circulation atmosphere of 80 ° C. by a forced air circulation system. The humidity in the oven is set to 50% or less. In the present embodiment, the heating temperature and time are set to temperatures and times sufficient to diffuse the internal residual stress of the stereolithography product. In addition, the heating temperature is set to be higher than the heating temperature of 60 ° C. of the stereolithography product in the plating process performed later.
【００２５】この加熱処理による残留応力の発散によっ
て、各層間の段差が浮き出てくる。次いで、磨きが完了
した光造形品の表面にグレーの合成樹脂塗料を吹き付
け、光造形品の表面の細かい傷（例えば、前工程の＃５
００〜＃６００ペーパやすりによる磨きの傷）、内部残
留応力の発散による段差を目立たせる。Due to the divergence of the residual stress due to this heat treatment, the step difference between the layers emerges. Next, a gray synthetic resin paint is sprayed onto the surface of the stereolithography-finished product, and fine scratches on the surface of the stereolithography product (for example, # 5 in the previous step)
(00- # 600 polishing scratches due to sandpaper), and the steps due to the divergence of internal residual stress are conspicuous.
【００２６】さらに、光造形品のデサインラインと寸法
をコントロールしながら、合成樹脂塗料が吹き付けられ
た光造形品の表面を粗さ＃７００〜＃８００のペーパや
すりで磨き、前の工程での磨きによる傷を消す。Further, while controlling the design line and the dimension of the stereolithography product, the surface of the stereolithography product sprayed with the synthetic resin coating is polished with a paper file having a roughness of # 700 to # 800 and polished in the previous step. Erase the scratches caused by.
【００２７】次いで、光造形品を加熱して、内部の残留
応力を発散させる。本実施形態では、光造形品を工業用
のオーブンに入れて、強制送風循環方式による８０℃の
熱風の循環の雰囲気で、３０分間、光造形品を加熱す
る。オーブン内の湿度は、５０％以下に設定される。本
実施形態では、この加熱温度及び時間は、光造形品の内
部残留応力を発散させるのに十分な温度および時間に設
定されている。また、加熱温度は、後に行われるめっき
処理における光造形品の加熱温度６０℃より高く設定さ
れている。この加熱処理によって、前回の加熱処理では
発散しきれなかった残留応力が発散され、各層間の段差
が浮き出てくる。Next, the stereolithography product is heated to dissipate the residual stress inside. In the present embodiment, the stereolithography product is placed in an industrial oven, and the stereolithography product is heated for 30 minutes in a hot air circulation atmosphere of 80 ° C. by a forced air circulation system. The humidity in the oven is set to 50% or less. In the present embodiment, the heating temperature and time are set to temperatures and times sufficient to diffuse the internal residual stress of the stereolithography product. In addition, the heating temperature is set to be higher than the heating temperature of 60 ° C. of the stereolithography product in the plating process performed later. By this heat treatment, residual stress that could not be completely diffused by the previous heat treatment is diffused, and a step between layers is exposed.
【００２８】次いで、磨きが完了した光造形品の表面に
グレーの合成樹脂塗料を吹き付け、光造形品の表面の細
かい傷（例えば、前工程の＃７００〜＃８００のペーパ
やすりによる磨きの傷）、内部残留応力の発散による段
差を目立たせる。Next, a gray synthetic resin paint is sprayed on the surface of the optically modeled product that has been polished, and fine scratches on the surface of the optically modeled product (for example, polishing scratches due to the sandpaper of # 700 to # 800 in the previous step). , The step due to the divergence of the internal residual stress is conspicuous.
【００２９】最後に、光造形品のデサインラインと寸法
をコントロールしながら、合成樹脂塗料が吹き付けられ
た光造形品の表面を粗さ＃９００〜＃１０００のペーパ
やすりで磨き、前の工程での磨きによる傷を消し下地処
理を完了する。Finally, while controlling the design line and the dimension of the stereolithography product, the surface of the stereolithography product sprayed with the synthetic resin paint is polished with a paper file having a roughness of # 900 to # 1000, and the surface of the prefabricated product is removed. The scratches caused by polishing are erased and the base treatment is completed.
【００３０】下地処理が行われた光造形品には、めっき
が施される。めっき作業では、例えば、浸漬脱脂、水
洗、エッチング、水洗、触媒化、水洗を行った後に、無
電解めっきが施される。次いで、水洗の後、電気銅めっ
き、水洗ニッケルめっきが施される。さらに、水洗を行
い、クロムまたは合金めっきが施される。尚、めっき作
業は、この作業に限定されるものではない。本発明は上
述した実施形態に限定されるものではなく、特許請求の
範囲に記載された事項の範囲内で種々の変更、変形が可
能である。Plating is applied to the stereolithography product subjected to the base treatment. In the plating operation, for example, electroless plating is performed after immersion degreasing, washing with water, etching, washing with water, catalysis, and washing with water. Then, after washing with water, electrolytic copper plating and washing nickel plating are performed. Further, it is washed with water and plated with chromium or alloy. The plating work is not limited to this work. The present invention is not limited to the embodiments described above, and various changes and modifications can be made within the scope of the matters described in the claims.
【００３１】上記実施形態では、加熱処理が２回行われ
る構成であるが、本発明はこれに限定されるものではな
く、加熱処理が少なくとも１回おこなわれればよい。こ
の場合、加熱温度及び時間は、一回の加熱処理で、光造
形品の内部残留応力を発散させるのに十分な温度および
時間に設定されるのが好ましい。また、着色工程は、必
ずしも必要ではなく、この着色工程を省略したものであ
ってもよい。In the above embodiment, the heat treatment is performed twice, but the present invention is not limited to this, and the heat treatment may be performed at least once. In this case, it is preferable that the heating temperature and time are set to a temperature and time sufficient to diffuse the internal residual stress of the stereolithography product by one heat treatment. The coloring step is not always necessary, and the coloring step may be omitted.
【００３２】上記実施形態では、エポキシ系樹脂を使用
したが、本発明は、他の樹脂にも適用可能である。更
に、上記実施形態では、ペーパヤスリで研磨を行ってい
るが、他の研磨材、例えば、スポンジヤスリを使用して
もよい。また、本件において、研磨材とは、ペーパヤス
リ、スポンジヤスリ等の他に、粉末、あるいは、粒子状
の研磨剤（研磨材料）等、光造形品の表面を研磨するこ
とができる全てのものを含む。Although the epoxy resin is used in the above embodiment, the present invention can be applied to other resins. Furthermore, in the above-described embodiment, the polishing is performed with a paper file, but other abrasives such as a sponge file may be used. Further, in the present case, the abrasive includes not only paper files, sponge files, etc., but also powder or particulate abrasives (abrasive materials), etc., all of which are capable of polishing the surface of the stereolithography product. .
【００３３】[0033]
【発明の効果】本発明によれば、めっき処理によって光
造形品が変形することなく、さらに、滑らかなめっき表
面が得られる光造形品のめっき下地処理方法が提供され
る。According to the present invention, there is provided a method for plating-treating a stereolithography product which does not deform the stereolithography product due to the plating treatment and can obtain a smooth plating surface.
Claims (7)
材を用いて磨く第１工程と、 前記光造形品を加熱する第２工程と、 前記表面への着色により前記第１工程で生成された傷を
目立たせる第３工程と、 前記第１工程より細かい研磨材を用いて前記表面を磨く
第４工程と、を含んでいる、 ことを特徴とする光造形品のめっき下地処理方法。1. A first step of polishing a surface of a stereolithography product to be plated with an abrasive, a second step of heating the stereolithography product, and a step of coloring the surface in the first step. A plating base treatment method for a stereolithography product, comprising: a third step of making the generated scratches noticeable; and a fourth step of polishing the surface by using a finer abrasive than the first step. .
材を用いて磨く第１工程と、 前記光造形品を加熱する第２工程と、 前記表面への着色により前記第１工程で生成された傷を
目立たせる第３工程と、 前記第１工程より細かい研磨材を用いて前記表面を磨く
第４工程と、 前記光造形品を加熱する第５工程と、 前記表面への着色により前記第４工程で生成された傷を
目立たせる第６工程と、 前記第４工程より細かい研磨材を用いて前記表面を磨く
第７工程と、を含んでいる、 ことを特徴とする光造形品のめっき下地処理方法。2. A first step of polishing a surface of a stereolithography product to be plated with an abrasive, a second step of heating the stereolithography product, and a step of coloring the surface in the first step. The third step of making the generated scratches noticeable, the fourth step of polishing the surface with a finer abrasive than the first step, the fifth step of heating the stereolithography product, and the coloring of the surface A stereolithography product comprising: a sixth step of making the scratches generated in the fourth step conspicuous; and a seventh step of polishing the surface with a finer abrasive than in the fourth step. Plating ground treatment method.
材を用いて磨く磨き工程を備えた光造形品のめっき下地
処理方法であって、さらに、前記磨き工程に先立って光
造形品を加熱する加熱工程を備えている、 ことを特徴とする光造形品のめっき下地処理方法。3. A method for plating-treating a stereolithography product, which comprises a polishing step of polishing a surface of the stereolithography product to be plated with an abrasive, further comprising a stereolithography product prior to the polishing step. A method for plating undercoating of a stereolithography product, which comprises a heating step of heating.
における光造形品の加熱温度より高く設定されている、 請求項１ないし３のいずれか１項に記載の光造形品のめ
っき下地処理方法。4. The plating base treatment of the stereolithography product according to claim 1, wherein the heating temperature of the stereolithography product is set higher than the heating temperature of the stereolithography product in the plating step. Method.
品の残留応力を発散できる温度に設定されている、 請求項１ないし４のいずれか１項に記載の光造形品のめ
っき下地処理方法。5. The plating base of the stereolithography product according to claim 1, wherein a heating temperature of the stereolithography product is set to a temperature at which residual stress of the stereolithography product can be diffused. Processing method.
残留応力を発散できる時間、継続される、 請求項１ないし５のいずれか１項に記載の光造形品のめ
っき下地処理方法。6. The plating undercoating method for a stereolithography product according to claim 1, wherein the heating of the stereolithography product is continued for a time during which residual stress of the stereolithography product can be dissipated. .
っき下地処理方法。7. The plating undercoating method for a stereolithography product according to claim 1, wherein the stereolithography product is an epoxy resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002360365A JP3434508B1 (en) | 2002-12-12 | 2002-12-12 | Plating base treatment method for stereolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002360365A JP3434508B1 (en) | 2002-12-12 | 2002-12-12 | Plating base treatment method for stereolithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP3434508B1 true JP3434508B1 (en) | 2003-08-11 |
| JP2004190099A JP2004190099A (en) | 2004-07-08 |
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ID=27751492
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
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| Country | Link |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1012995A (en) * | 1996-06-24 | 1998-01-16 | Hitachi Cable Ltd | Manufacture of circuit component provided with three-dimensional structure |
| JPH10329145A (en) * | 1997-05-30 | 1998-12-15 | Olympus Optical Co Ltd | Optical shaping simple mold |
| JPH1182377A (en) * | 1997-09-02 | 1999-03-26 | Ebara Corp | Manufacture of impeller |
| WO1999039021A1 (en) * | 1998-01-30 | 1999-08-05 | E.I. Du Pont De Nemours And Company | Process for metal plating liquid crystalline polymers and compositions related thereto |
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