JP6342778B2 - 正孔を保有する基材−シリカゾル乾燥物複合体及びその製造方法 - Google Patents

正孔を保有する基材−シリカゾル乾燥物複合体及びその製造方法 Download PDF

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JP6342778B2
JP6342778B2 JP2014209438A JP2014209438A JP6342778B2 JP 6342778 B2 JP6342778 B2 JP 6342778B2 JP 2014209438 A JP2014209438 A JP 2014209438A JP 2014209438 A JP2014209438 A JP 2014209438A JP 6342778 B2 JP6342778 B2 JP 6342778B2
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silica sol
substrate
dried
dried product
silica
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JP2016068543A5 (https=
JP2016068543A (ja
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入江 敏夫
敏夫 入江
浩 白澤
浩 白澤
謙爾 鈴木
謙爾 鈴木
憲一 増原
憲一 増原
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  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Treating Waste Gases (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Compounds (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Laminated Bodies (AREA)
  • Catalysts (AREA)
JP2014209438A 2014-09-24 2014-09-24 正孔を保有する基材−シリカゾル乾燥物複合体及びその製造方法 Active JP6342778B2 (ja)

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JP2014209438A JP6342778B2 (ja) 2014-09-24 2014-09-24 正孔を保有する基材−シリカゾル乾燥物複合体及びその製造方法

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JP2014209438A JP6342778B2 (ja) 2014-09-24 2014-09-24 正孔を保有する基材−シリカゾル乾燥物複合体及びその製造方法

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JP2016068543A JP2016068543A (ja) 2016-05-09
JP2016068543A5 JP2016068543A5 (https=) 2017-04-06
JP6342778B2 true JP6342778B2 (ja) 2018-06-13

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Publication number Priority date Publication date Assignee Title
US10543660B2 (en) 2015-03-30 2020-01-28 Panasonic Intellectual Property Managment Co., Ltd. Heat-insulation sheet, electronic device using same, and method for producing heat-insulation sheet
JP2017172068A (ja) * 2016-03-23 2017-09-28 入江 敏夫 基材−シリカゾル乾燥物複合体、その応用物品及びその製造方法
JP6484771B2 (ja) * 2017-04-27 2019-03-13 入江 敏夫 基材―シリカゾル乾燥物複合体及びその製造方法
KR20200113184A (ko) * 2019-03-20 2020-10-06 선전 캉펑 인바이론먼털 테크놀로지 디벨롭먼트 컴퍼니 리미티드 보호 기구, 살균소독 복합 시트재 및 그의 제조방법

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JP2009155262A (ja) * 2007-12-26 2009-07-16 Lion Corp 抗ウイルス剤
JP2011068628A (ja) * 2009-09-22 2011-04-07 Isi:Kk 生体防御物質およびその複合体及びそれらの使用法
JP2013126623A (ja) * 2011-12-19 2013-06-27 Tokushu Muki Zairyo Kenkyusho 光の照射を受けない状態で正孔を保有する触媒体、その製造方法及び抗ウイルス性・抗菌クロス

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