JP6322172B2 - Ｘ線小角光学系装置 - Google Patents

Ｘ線小角光学系装置 Download PDF

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Publication number
JP6322172B2
JP6322172B2 JP2015179651A JP2015179651A JP6322172B2 JP 6322172 B2 JP6322172 B2 JP 6322172B2 JP 2015179651 A JP2015179651 A JP 2015179651A JP 2015179651 A JP2015179651 A JP 2015179651A JP 6322172 B2 JP6322172 B2 JP 6322172B2
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Prior art keywords
ray
optical system
multilayer mirror
sample
angle optical
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Japanese (ja)
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JP2017053803A5 (enExample
JP2017053803A (ja
Inventor
和輝 伊藤
和輝 伊藤
表　和彦
和彦 表
ジャン リーサイ
ジャン リーサイ
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Rigaku Corp
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Rigaku Corp
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Priority to JP2015179651A priority Critical patent/JP6322172B2/ja
Priority to EP16001944.4A priority patent/EP3141889B1/en
Priority to US15/259,581 priority patent/US10429325B2/en
Publication of JP2017053803A publication Critical patent/JP2017053803A/ja
Publication of JP2017053803A5 publication Critical patent/JP2017053803A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/054—Investigating materials by wave or particle radiation by diffraction, scatter or reflection small angle scatter

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  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2015179651A 2015-09-11 2015-09-11 Ｘ線小角光学系装置 Active JP6322172B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015179651A JP6322172B2 (ja) 2015-09-11 2015-09-11 Ｘ線小角光学系装置
EP16001944.4A EP3141889B1 (en) 2015-09-11 2016-09-06 X-ray small angle optical system with multilayer mirror
US15/259,581 US10429325B2 (en) 2015-09-11 2016-09-08 X-ray small angle optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015179651A JP6322172B2 (ja) 2015-09-11 2015-09-11 Ｘ線小角光学系装置

Publications (3)

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JP2017053803A JP2017053803A (ja) 2017-03-16
JP2017053803A5 JP2017053803A5 (enExample) 2018-03-08
JP6322172B2 true JP6322172B2 (ja) 2018-05-09

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JP2015179651A Active JP6322172B2 (ja) 2015-09-11 2015-09-11 Ｘ線小角光学系装置

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US (1) US10429325B2 (enExample)
EP (1) EP3141889B1 (enExample)
JP (1) JP6322172B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
EP2778665B1 (en) * 2013-03-15 2019-05-08 Bruker AXS GmbH X-ray analyzing system for x-ray scattering analysis
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6501275B2 (ja) * 2017-03-17 2019-04-17 株式会社大一商会 遊技機
JP6478421B2 (ja) * 2017-03-21 2019-03-06 株式会社大一商会 遊技機
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
DE102018219751A1 (de) * 2018-07-09 2020-01-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Probenuntersuchungsvorrichtung mittels röntgen-ultrakleinwinkelstreuung
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6069934A (en) * 1998-04-07 2000-05-30 Osmic, Inc. X-ray diffractometer with adjustable image distance
US6504902B2 (en) * 2000-04-10 2003-01-07 Rigaku Corporation X-ray optical device and multilayer mirror for small angle scattering system
US7072442B1 (en) * 2002-11-20 2006-07-04 Kla-Tencor Technologies Corporation X-ray metrology using a transmissive x-ray optical element
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
JP3697246B2 (ja) * 2003-03-26 2005-09-21 株式会社リガク Ｘ線回折装置
US7280634B2 (en) * 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US7439492B1 (en) * 2005-02-04 2008-10-21 The United States Of America As Represented By The United States Department Of Energy Nondispersive neutron focusing method beyond the critical angle of mirrors
JP4861284B2 (ja) * 2007-09-28 2012-01-25 株式会社リガク Ｘ線回折装置およびｘ線回折方法
ATE545858T1 (de) * 2007-12-31 2012-03-15 Xenocs S A Röntgenstrahlvorrichtung
DE112010006114A5 (de) * 2009-07-01 2016-03-17 Rigaku Corp. Röntgenvorrichtung, verfahren zum verwenden der röntgenvorrichtung und röntgenbestrahlungsverfahren
JP2015078835A (ja) * 2012-01-18 2015-04-23 株式会社リガク Ｘ線回折装置
CA2875680A1 (en) * 2012-06-08 2013-12-12 Rigaku Innovative Technologies, Inc. Dual mode small angle scattering camera

Also Published As

Publication number Publication date
EP3141889A1 (en) 2017-03-15
EP3141889B1 (en) 2022-03-16
US10429325B2 (en) 2019-10-01
JP2017053803A (ja) 2017-03-16
US20170074809A1 (en) 2017-03-16

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