JP6316908B2 - Fet−バイポーラトランジスタの組み合わせ - Google Patents
Fet−バイポーラトランジスタの組み合わせ Download PDFInfo
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- JP6316908B2 JP6316908B2 JP2016217966A JP2016217966A JP6316908B2 JP 6316908 B2 JP6316908 B2 JP 6316908B2 JP 2016217966 A JP2016217966 A JP 2016217966A JP 2016217966 A JP2016217966 A JP 2016217966A JP 6316908 B2 JP6316908 B2 JP 6316908B2
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- field effect
- current flow
- flow control
- control device
- effect transistor
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- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
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- Bipolar Transistors (AREA)
Description
本開示は、電界効果トランジスタとバイポーラトランジスタとの組み合わせに関する。
典型的に最大で200ボルト〜300ボルトの範囲の比較的高い電圧をスイッチできる必要性がしばしば存在する。これを達成するトランジスタは、より低電圧の処理回路および制御回路を含む集積回路パッケージに統合され得る。多くの例では、このような高電圧トランジスタがより低電圧の制御回路と同じウェハ上にあることは、便利であり、費用効果がある。結果として、このような高電圧トランジスタへの全ての接続は、ウェハの同じ側でなされることが極めて望ましいことがあり得る。この電圧範囲におけるスイッチの用途としては、モータ制御およびインバータ、調光器、誘導負荷による過渡電圧が潜在的に発生し得る自動車スイッチ、並びに工業用および家庭用器具並びにそのような器具のための電源装置における多数の幹線電圧関連スイッチングが挙げられる。
本開示の第1の態様によれば、半導体の分離された領域内部の電界効果トランジスタと組み合わせられたバイポーラトランジスタを含む電流フロー制御デバイスが提供される。半導体の第1の領域は、バイポーラトランジスタおよび電界効果トランジスタによって共有される。
例えば、本発明は、以下を提供する。
(項目1)
電流フロー制御デバイスであって、
バイポーラトランジスタと、
前記バイポーラトランジスタと直列の電界効果トランジスタとを備え、
前記バイポーラトランジスタおよび前記電界効果トランジスタが、半導体の分離された領域内に配され、
前記バイポーラトランジスタが、前記電界効果トランジスタの空乏領域内にキャリアを注入して前記電界効果トランジスタをオンにするように構成されている、電流フロー制御デバイス。
(項目2)
分離されたゲートを有する駆動電界効果トランジスタを更に備え、前記駆動電界効果トランジスタが、前記電界効果トランジスタおよび前記バイポーラトランジスタの両方に連結されている、上記項目に記載の電流フロー制御デバイス。
(項目3)
前記電流フロー制御デバイスの第1の側に配され、前記駆動電界効果トランジスタの前記分離されたゲートに接続されたゲート端子と、
前記電流フロー制御デバイスの前記第1の側に配され、前記バイポーラトランジスタに接続されたエミッタ端子と、
前記電流フロー制御デバイスの前記第1の側に配され、前記電界効果トランジスタに接続されたコレクタ端子と、を更に備えた、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目4)
前記駆動トランジスタのソースが、前記バイポーラトランジスタのベースに電気的に接続されている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目5)
前記電界効果トランジスタが、前記ゲートを前記バイポーラトランジスタから分離するように配置されたトレンチ内に形成されたゲートを備えている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目6)
前記バイポーラトランジスタが、50超の利得を有する、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目7)
電流フロー制御デバイスであって、
半導体の分離された領域内部の電界効果トランジスタと直列に組み合わせられたバイポーラトランジスタと、
トレンチ内に形成されたゲートを有する駆動電界効果トランジスタであって、前記駆動電界効果トランジスタの前記ゲートを前記バイポーラトランジスタから分離するように配置されている、駆動電界効果トランジスタと、を備えた、電流フロー制御デバイス。
(項目8)
前記電流フロー制御デバイスが、3端子デバイスであり、前記バイポーラトランジスタのエミッタ領域に接続された第1の端子と、前記電界効果トランジスタのドレイン領域に接続された第2の端子と、前記駆動電界効果トランジスタの前記ゲートに接続され、前記電流フロー制御デバイスを通る電流フローを制御する制御端子と、を有し、前記3つの端子が、前記電流フロー制御デバイスの同じ側に設けられている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目9)
前記電流フロー制御デバイスが、前記分離された領域内に縦に形成され、前記電界効果トランジスタのドレイン領域が、前記電流フロー制御デバイスへの接続のための端子を有する電流フロー制御デバイスの表面より下の、前記電流フロー制御デバイスの最も低い部分に形成されている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目10)
前記ドレイン/コレクタ電流が金属接点への接続のために前記電流フロー制御デバイスの表面に持ってこられ得るように、前記ドレイン領域と同様にドープされ、前記バイポーラトランジスタのエミッタ領域から離間して配された縦の領域を更に含む、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目11)
前記バイポーラトランジスタが、50超の利得を有するNPNトランジスタである、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目12)
前記トレンチが、前記ゲートに対する接点に対向して塞がれている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目13)
前記電界効果トランジスタのドレイン領域における前記電圧が前記駆動電界効果トランジスタの前記ゲートにおける前記電圧を所定のしきい値上回るとき、前記電界効果トランジスタがピンチオフするように構成されている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目14)
前記駆動トランジスタの前記ゲートが、前記駆動電界効果トランジスタの前記ゲートを前記バイポーラトランジスタから分離するように配置された第2のトレンチ内にもあり、前記トレンチと前記第2のトレンチとが、対向する構造物であり、前記電界効果トランジスタが、前記対抗する構造物の間に形成されて、前記対抗する構造物間のチャネルを画定し、前記電界効果トランジスタのピンチオフ電圧が、前記対抗する構造物間の距離に基づいている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目15)
前記対抗する構造物が、5マイクロメートル未満離隔されている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目16)
前記電界効果トランジスタの前記ピンチオフ電圧が、前記対抗する構造物間の領域内のコレクタドーピング濃度に基づいている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目17)
前記電流フロー制御デバイス内のチャネルの導電性が、前記駆動電界効果トランジスタの前記ゲートで受け取られた信号によって制御される、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目18)
電流フロー制御デバイスであって、
バイポーラトランジスタと、
前記バイポーラトランジスタと直列の第1の電界効果トランジスタと、
前記バイポーラトランジスタのベースに電気的に接続されたソースと、前記第1の電界効果トランジスタおよび前記バイポーラトランジスタの間のノードに電気的に接続されたドレインと、を備えた第2の電界効果トランジスタと、
前記バイポーラトランジスタ、前記第1の電界効果トランジスタ、および前記第2の電界効果トランジスタを取り囲む絶縁ウェルであって、前記デバイスを前記デバイスと同じダイ上に配された他の回路要素から絶縁するように構成されている、絶縁ウェルと、を備えた、電流フロー制御デバイス。
(項目19)
前記第1の電界効果トランジスタのソースおよび前記バイポーラトランジスタのコレクタが、各々、前記絶縁ウェル内に共通領域を備える、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(項目20)
前記バイポーラトランジスタが、前記第1の電界効果トランジスタの空乏領域内にキャリアを注入して、前記第1の電界効果トランジスタをオンにするように構成されている、上記項目のいずれか一項に記載の電流フロー制御デバイス。
(摘要)
デバイスをオンオフするための比較的良好な電圧能力および比較的容易な駆動要件を呈するトランジスタスイッチデバイスが設けられる。これは、他のコンポーネントを乱し得る過渡駆動電流フローを低減し得る。
以下の特定の実施形態の詳細な説明は、具体的な実施形態の様々な説明を提示する。しかしながら、本明細書に記載の新機軸は、例えば請求項によって定義され、包含されるような多数の異なる方法で具現化され得る。本明細書では、似た参照番号が同一または機能的に類似した要素を指し示し得る図面への参照がなされる。図面に示される要素は必ずしも一定の縮尺で描かれていないことが理解されるであろう。その上、特定の実施形態は図面に示されるよりも多くの要素および/または図面に示される要素のサブセットを含み得ることが理解されるであろう。更に、いくつかの実施形態は、2つ以上の図面からの特長の任意の好適な組み合わせを組み込み得る。
NPNシリコントランジスタについてはm=4であり、PNPシリコントランジスタについてはm=2である。
Claims (19)
- 電流フロー制御デバイスであって、
バイポーラトランジスタと、
前記バイポーラトランジスタと直列の電界効果トランジスタと、
駆動電界効果トランジスタとを備え、
前記バイポーラトランジスタおよび前記電界効果トランジスタが、半導体の分離された領域内に配され、
前記駆動電界効果トランジスタが、該駆動電界効果トランジスタのゲートを前記バイポーラトランジスタから分離するように配置されたトレンチ内に形成されたゲートを有する、電流フロー制御デバイス。 - 前記駆動電界効果トランジスタが、前記電界効果トランジスタおよび前記バイポーラトランジスタの両方に連結されている、請求項1に記載の電流フロー制御デバイス。
- 前記電流フロー制御デバイスの第1の側に配され、前記駆動電界効果トランジスタの前記分離されたゲートに接続されたゲート端子と、
前記電流フロー制御デバイスの前記第1の側に配され、前記バイポーラトランジスタに接続されたエミッタ端子と、
前記電流フロー制御デバイスの前記第1の側に配され、前記電界効果トランジスタに接続されたコレクタ端子と、を更に備えた、請求項2に記載の電流フロー制御デバイス。 - 前記駆動電界効果トランジスタのソースが、前記バイポーラトランジスタのベースに電気的に接続されている、請求項2に記載の電流フロー制御デバイス。
- 前記バイポーラトランジスタが、50超の利得を有する、請求項1に記載の電流フロー制御デバイス。
- 電流フロー制御デバイスであって、
半導体の分離された領域内部の電界効果トランジスタと直列に組み合わせられたバイポーラトランジスタと、
トレンチ内に形成されたゲートを有する駆動電界効果トランジスタであって、前記駆動電界効果トランジスタの前記ゲートを前記バイポーラトランジスタから分離するように配置されている、駆動電界効果トランジスタと、を備えた、電流フロー制御デバイス。 - 前記電流フロー制御デバイスが、3端子デバイスであり、前記バイポーラトランジスタのエミッタ領域に接続された第1の端子と、前記電界効果トランジスタのドレイン領域に接続された第2の端子と、前記駆動電界効果トランジスタの前記ゲートに接続され、前記電流フロー制御デバイスを通る電流フローを制御する制御端子と、を有し、前記3つの端子が、前記電流フロー制御デバイスの同じ側に設けられている、請求項6に記載の電流フロー制御デバイス。
- 前記電流フロー制御デバイスが、前記分離された領域内に縦に形成され、前記電界効果トランジスタのドレイン領域が、前記電流フロー制御デバイスへの接続のための端子を有する電流フロー制御デバイスの表面より下の、前記電流フロー制御デバイスの最も低い部分に形成されている、請求項6に記載の電流フロー制御デバイス。
- 前記ドレイン/コレクタ電流が金属接点への接続のために前記電流フロー制御デバイスの表面に持ってこられ得るように、前記ドレイン領域と同様にドープされ、前記バイポーラトランジスタのエミッタ領域から離間して配された縦の領域を更に含む、請求項8に記載の電流フロー制御デバイス。
- 前記バイポーラトランジスタが、50超の利得を有するNPNトランジスタである、請求項6に記載の電流フロー制御デバイス。
- 前記トレンチが、前記ゲートに対する接点に対向して塞がれている、請求項6に記載の電流フロー制御デバイス。
- 前記電界効果トランジスタのドレイン領域における電圧が前記駆動電界効果トランジスタの前記ゲートにおける電圧を所定のしきい値上回るとき、前記電界効果トランジスタがピンチオフするように構成されている、請求項6に記載の電流フロー制御デバイス。
- 前記駆動電界効果トランジスタの前記ゲートが、前記駆動電界効果トランジスタの前記ゲートを前記バイポーラトランジスタから分離するように配置された第2のトレンチ内にもあり、前記トレンチと前記第2のトレンチとが、対向する構造物であり、前記電界効果トランジスタが、前記対向する構造物の間に形成されて、前記対向する構造物間のチャネルを画定し、前記電界効果トランジスタのピンチオフ電圧が、前記対向する構造物間の距離に基づいている、請求項12に記載の電流フロー制御デバイス。
- 前記対向する構造物が、5マイクロメートル未満離隔されている、請求項13に記載の電流フロー制御デバイス。
- 前記電界効果トランジスタの前記ピンチオフ電圧が、前記対向する構造物間の領域内のコレクタドーピング濃度に基づいている、請求項13に記載の電流フロー制御デバイス。
- 前記電流フロー制御デバイス内のチャネルの導電性が、前記駆動電界効果トランジスタの前記ゲートで受け取られた信号によって制御される、請求項6に記載の電流フロー制御デバイス。
- 電流フロー制御デバイスであって、
バイポーラトランジスタと、
前記バイポーラトランジスタと直列の第1の電界効果トランジスタと、
前記バイポーラトランジスタのベースに電気的に接続されたソースと、前記第1の電界効果トランジスタおよび前記バイポーラトランジスタの間のノードに電気的に接続されたドレインと、を備えた第2の電界効果トランジスタと、
前記バイポーラトランジスタ、前記第1の電界効果トランジスタ、および前記第2の電界効果トランジスタを取り囲む絶縁ウェルであって、前記デバイスを前記デバイスと同じダイ上に配された他の回路要素から絶縁するように構成されている、絶縁ウェルと、を備え、
前記第2の電界効果トランジスタが、該第2の電界効果トランジスタのゲートを前記バイポーラトランジスタから分離するように配置されたトレンチ内に形成されたゲートを有する、電流フロー制御デバイス。 - 前記第1の電界効果トランジスタのソースおよび前記バイポーラトランジスタのコレクタが、各々、前記絶縁ウェル内に共通領域を備える、請求項17に記載の電流フロー制御デバイス。
- 前記バイポーラトランジスタが、前記第1の電界効果トランジスタの空乏領域内にキャリアを注入して、前記第1の電界効果トランジスタをオンにするように構成されている、請求項17に記載の電流フロー制御デバイス。
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