JP6304921B2 - インプリント方法およびインプリント装置、それを用いた物品の製造方法 - Google Patents

インプリント方法およびインプリント装置、それを用いた物品の製造方法 Download PDF

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Publication number
JP6304921B2
JP6304921B2 JP2012128157A JP2012128157A JP6304921B2 JP 6304921 B2 JP6304921 B2 JP 6304921B2 JP 2012128157 A JP2012128157 A JP 2012128157A JP 2012128157 A JP2012128157 A JP 2012128157A JP 6304921 B2 JP6304921 B2 JP 6304921B2
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gas
imprint
mold
resin
carbon
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JP2013254782A (ja
JP2013254782A5 (enExample
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啓子 千葉
啓子 千葉
羽生　由紀夫
由紀夫 羽生
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Canon Inc
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Canon Inc
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JP2012128157A 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法 Expired - Fee Related JP6304921B2 (ja)

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JP2012128157A JP6304921B2 (ja) 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法

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JP2012128157A JP6304921B2 (ja) 2012-06-05 2012-06-05 インプリント方法およびインプリント装置、それを用いた物品の製造方法

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JP2013254782A JP2013254782A (ja) 2013-12-19
JP2013254782A5 JP2013254782A5 (enExample) 2015-07-16
JP6304921B2 true JP6304921B2 (ja) 2018-04-04

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014112495A1 (ja) * 2013-01-17 2014-07-24 キヤノン株式会社 インプリント方法、およびインプリント装置
JP5882922B2 (ja) * 2012-01-19 2016-03-09 キヤノン株式会社 インプリント方法、およびインプリント装置
JP6420571B2 (ja) * 2014-06-13 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
JP2006210601A (ja) * 2005-01-27 2006-08-10 Asahi Glass Co Ltd 転写層にパターンを形成する方法
JP5175771B2 (ja) * 2009-02-27 2013-04-03 株式会社日立ハイテクノロジーズ 微細構造転写装置及び微細構造転写方法
JP2011016351A (ja) * 2009-06-10 2011-01-27 Asahi Glass Co Ltd 子モールドの製造方法および物品の製造方法
JP5364533B2 (ja) * 2009-10-28 2013-12-11 株式会社東芝 インプリントシステムおよびインプリント方法
JP5546893B2 (ja) * 2010-02-16 2014-07-09 東京エレクトロン株式会社 インプリント方法

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