JP6302548B2 - アナログ技術におけるシリコンimpattダイオードのインテグレーション - Google Patents
アナログ技術におけるシリコンimpattダイオードのインテグレーション Download PDFInfo
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- JP6302548B2 JP6302548B2 JP2016527144A JP2016527144A JP6302548B2 JP 6302548 B2 JP6302548 B2 JP 6302548B2 JP 2016527144 A JP2016527144 A JP 2016527144A JP 2016527144 A JP2016527144 A JP 2016527144A JP 6302548 B2 JP6302548 B2 JP 6302548B2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 19
- 229910052710 silicon Inorganic materials 0.000 title description 19
- 239000010703 silicon Substances 0.000 title description 19
- 238000005516 engineering process Methods 0.000 title description 3
- 230000010354 integration Effects 0.000 title description 2
- 230000015556 catabolic process Effects 0.000 claims description 56
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 21
- 239000002210 silicon-based material Substances 0.000 claims 5
- 230000007704 transition Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 30
- 239000000758 substrate Substances 0.000 description 28
- 230000005684 electric field Effects 0.000 description 15
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000002131 composite material Substances 0.000 description 9
- 239000000969 carrier Substances 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000005641 tunneling Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000002500 effect on skin Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- VCEXCCILEWFFBG-UHFFFAOYSA-N mercury telluride Chemical compound [Hg]=[Te] VCEXCCILEWFFBG-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/864—Transit-time diodes, e.g. IMPATT, TRAPATT diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0635—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors and diodes, or resistors, or capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/161—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table including two or more of the elements provided for in group H01L29/16, e.g. alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/6609—Diodes
- H01L29/66159—Transit time diodes, e.g. IMPATT, TRAPATT diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/161—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table including two or more of the elements provided for in group H01L29/16, e.g. alloys
- H01L29/165—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table including two or more of the elements provided for in group H01L29/16, e.g. alloys in different semiconductor regions, e.g. heterojunctions
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Element Separation (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Description
Claims (8)
- 垂直衝撃電子雪崩遷移時間(IMPATT)ダイオードであって、
p型層と、
前記p型層の上に位置するn型埋め込み層と、
前記n型埋め込み層の上に位置する低位部分と前記低位部分の上に位置する高位部分とを有するnウェルと、
前記n型埋め込み層の上に位置して前記nウェルの低位部分を横方向に囲むドープされない層と、
前記ドープされない層の上に位置して前記nウェルの高位部分を横方向に囲む浅いトレンチ層と、
前記n型埋め込み層の上に位置して前記ドープされない層と前記浅いトレンチ層とを横方向に囲み、前記n型埋め込み層を介して前記nウェルに結合されるシンカー層と、
前記nウェルの高位部分に形成されるブレークダウン層と、
を含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ブレークダウン層が高度にドープされたp+シリコン材料を含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ブレークダウン層がp型SiGe材料を含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ブレークダウン層が、前記nウェルの低位部分の上に位置するn+シリコン材料と、前記n+シリコン材料の上に位置するp+シリコン材料とを含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ブレークダウン層が、前記nウェルの低位部分の上に位置するn型SiGe材料と、前記n型SiGe材料の上に位置するp+シリコン材料とを含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ブレークダウン層が、前記nウェルの低位部分の上に位置するn型SiGe材料と、前記n型SiGe材料の上に位置するp型SiGe材料とを含む、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記ドープされない層が、前記シンカー層と前記nウェルの低位部分とに隣接する、垂直IMPATTダイオード。 - 請求項1に記載の垂直IMPATTダイオードであって、
前記シンカー層と前記n型埋め込み層とを横方向に囲む深い伸張層を更に含む、垂直IMPATTダイオード。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361847742P | 2013-07-18 | 2013-07-18 | |
US61/847,742 | 2013-07-18 | ||
US14/327,157 US9412879B2 (en) | 2013-07-18 | 2014-07-09 | Integration of the silicon IMPATT diode in an analog technology |
US14/327,157 | 2014-07-09 | ||
PCT/US2014/047298 WO2015010089A1 (en) | 2013-07-18 | 2014-07-18 | Integration of silicon impatt diode in analog technology |
Publications (3)
Publication Number | Publication Date |
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JP2016528731A JP2016528731A (ja) | 2016-09-15 |
JP2016528731A5 JP2016528731A5 (ja) | 2017-08-17 |
JP6302548B2 true JP6302548B2 (ja) | 2018-03-28 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016527144A Active JP6302548B2 (ja) | 2013-07-18 | 2014-07-18 | アナログ技術におけるシリコンimpattダイオードのインテグレーション |
Country Status (4)
Country | Link |
---|---|
US (2) | US9412879B2 (ja) |
JP (1) | JP6302548B2 (ja) |
CN (1) | CN105393340B (ja) |
WO (1) | WO2015010089A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9525077B1 (en) * | 2015-11-04 | 2016-12-20 | Texas Instruments Incorporated | Integration of a baritt diode |
CN108875193B (zh) * | 2018-06-12 | 2020-01-17 | 温州大学 | 评估SiC同质异构结IMPATT二极管性能的方法 |
CN109616552B (zh) * | 2018-11-21 | 2020-04-14 | 温州大学 | GaN/SiC异质结侧向型光控IMPATT二极管及其制备方法 |
CN109509808B (zh) * | 2018-11-21 | 2020-01-14 | 温州大学 | 一种SiC/Si异质结侧向型光敏IMPATT二极管及其制备方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3649386A (en) * | 1968-04-23 | 1972-03-14 | Bell Telephone Labor Inc | Method of fabricating semiconductor devices |
FR2160759B1 (ja) | 1971-11-26 | 1974-05-31 | Thomson Csf | |
JPS5622147B2 (ja) * | 1972-06-28 | 1981-05-23 | ||
US4064620A (en) | 1976-01-27 | 1977-12-27 | Hughes Aircraft Company | Ion implantation process for fabricating high frequency avalanche devices |
US4030943A (en) | 1976-05-21 | 1977-06-21 | Hughes Aircraft Company | Planar process for making high frequency ion implanted passivated semiconductor devices and microwave integrated circuits |
US4230505A (en) | 1979-10-09 | 1980-10-28 | Rca Corporation | Method of making an impatt diode utilizing a combination of epitaxial deposition, ion implantation and substrate removal |
US4596070A (en) | 1984-07-13 | 1986-06-24 | Texas Instruments Incorporated | Interdigitated IMPATT devices |
US4692791A (en) | 1984-07-13 | 1987-09-08 | Texas Instruments Incorporated | Monolithic IMPATT with stripline leads |
US4859633A (en) | 1985-01-31 | 1989-08-22 | Texas Instruments Incorporated | Process for fabricating monolithic microwave diodes |
DE3725214A1 (de) | 1986-09-27 | 1988-03-31 | Licentia Gmbh | Impatt-diode |
US5422508A (en) * | 1992-09-21 | 1995-06-06 | Siliconix Incorporated | BiCDMOS structure |
GB9823115D0 (en) | 1998-10-23 | 1998-12-16 | Secr Defence | Improvements in impatt diodes |
US6660616B2 (en) * | 2001-01-31 | 2003-12-09 | Texas Instruments Incorporated | P-i-n transit time silicon-on-insulator device |
US8816443B2 (en) * | 2001-10-12 | 2014-08-26 | Quantum Semiconductor Llc | Method of fabricating heterojunction photodiodes with CMOS |
US7384854B2 (en) * | 2002-03-08 | 2008-06-10 | International Business Machines Corporation | Method of forming low capacitance ESD robust diodes |
SG107645A1 (en) * | 2002-09-10 | 2004-12-29 | Sarnoff Corp | Electrostatic discharge protection silicon controlled rectifier (esd-scr) for silicon germanium technologies |
JP2006173437A (ja) * | 2004-12-17 | 2006-06-29 | Toshiba Corp | 半導体装置 |
-
2014
- 2014-07-09 US US14/327,157 patent/US9412879B2/en active Active
- 2014-07-18 WO PCT/US2014/047298 patent/WO2015010089A1/en active Application Filing
- 2014-07-18 CN CN201480040871.4A patent/CN105393340B/zh active Active
- 2014-07-18 JP JP2016527144A patent/JP6302548B2/ja active Active
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2016
- 2016-07-07 US US15/204,030 patent/US10103278B2/en active Active
Also Published As
Publication number | Publication date |
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CN105393340B (zh) | 2020-03-27 |
US10103278B2 (en) | 2018-10-16 |
CN105393340A (zh) | 2016-03-09 |
US20150021740A1 (en) | 2015-01-22 |
US9412879B2 (en) | 2016-08-09 |
JP2016528731A (ja) | 2016-09-15 |
US20160322511A1 (en) | 2016-11-03 |
WO2015010089A1 (en) | 2015-01-22 |
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