JP6290199B2 - 径方向ナノワイヤエサキダイオードデバイスおよび方法 - Google Patents
径方向ナノワイヤエサキダイオードデバイスおよび方法 Download PDFInfo
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- JP6290199B2 JP6290199B2 JP2015519381A JP2015519381A JP6290199B2 JP 6290199 B2 JP6290199 B2 JP 6290199B2 JP 2015519381 A JP2015519381 A JP 2015519381A JP 2015519381 A JP2015519381 A JP 2015519381A JP 6290199 B2 JP6290199 B2 JP 6290199B2
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- 239000002070 nanowire Substances 0.000 title claims description 127
- 238000000034 method Methods 0.000 title claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 67
- 230000005641 tunneling Effects 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 29
- 230000005684 electric field Effects 0.000 claims description 25
- 230000004888 barrier function Effects 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 19
- 239000000969 carrier Substances 0.000 claims description 15
- 239000012777 electrically insulating material Substances 0.000 claims description 6
- 230000005669 field effect Effects 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 2
- 239000011162 core material Substances 0.000 claims 26
- 239000011257 shell material Substances 0.000 claims 22
- 239000002800 charge carrier Substances 0.000 claims 1
- 210000004027 cell Anatomy 0.000 description 27
- 229910000673 Indium arsenide Inorganic materials 0.000 description 18
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 17
- 229910005542 GaSb Inorganic materials 0.000 description 14
- 238000004088 simulation Methods 0.000 description 11
- 230000000873 masking effect Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000002441 reversible effect Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- -1 conductive (eg Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004871 chemical beam epitaxy Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 210000004692 intercellular junction Anatomy 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001127 nanoimprint lithography Methods 0.000 description 1
- 239000002073 nanorod Substances 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000013139 quantization Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- H—ELECTRICITY
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- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7391—Gated diode structures
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- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
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- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
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- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- H01L29/66977—Quantum effect devices, e.g. using quantum reflection, diffraction or interference effects, i.e. Bragg- or Aharonov-Bohm effects
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- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description
Claims (12)
- 径方向ナノワイヤエサキダイオードを備えるデバイスであって、前記径方向ナノワイヤが第1の導電型の半導体コア、および前記第1の導電型と異なる第2の導電型の半導体シェルを備え、さらに、ゲート制御された径方向ナノワイヤエサキダイオードを備えている、デバイス。
- トンネリング電界効果トランジスタ(TFET)を備え、さらに、前記シェルのまわりに位置するゲート絶縁層、および前記ゲート絶縁層に隣接して位置するゲート電極を備える、請求項1に記載のデバイス。
- 前記コアと前記シェル間のトンネル電流の方向が前記ナノワイヤを支持する基板の主表面と実質的に平行であり、
前記コアと前記シェル間のトンネル電流の方向が前記ナノワイヤおよび前記ゲート絶縁層に面する前記ゲート電極の表面と実質的に垂直であり、
前記コアと前記シェル間のトンネル電流の方向がゲート電界の方向と実質的に平行である、請求項2に記載のデバイス。 - 前記ナノワイヤコアの軸方向でみてソース領域側を下方としたときに、前記ナノワイヤコアが、第1のドーピング濃度を有する前記第1の導電型の下方の半導体部分、および前記下方部分上に位置する上方部分を備え、
前記上方部分が、電気的絶縁材料、または前記下方部分の前記第1のドーピング濃度よりも低く、前記シェルのドーピング濃度よりも低い第2のドーピング濃度を有する半導体材料を含み、
前記コアの前記下方部分が前記第1の導電型の半導体ソース領域と電気的に接触し、前記シェルが前記第2の導電型のドレイン領域と電気的に接触し、
前記シェルが前記コアの前記上方部分に隣接して位置し、pn接合を形成するように前記コアの前記下方部分と少なくとも部分的にオーバーラップし、
前記ゲート電極が前記pn接合と少なくとも部分的にオーバーラップする、
請求項3に記載のデバイス。 - 前記シェルが前記ゲート絶縁層と前記コア間に量子井戸を形成するのに十分に薄く、
前記コアおよび前記シェルの少なくとも1つが前記デバイス中の電荷キャリヤのエネルギーを増加させるのに十分に薄い、請求項3に記載のデバイス。 - 前記コアと前記TFETのソース領域およびドレイン領域の少なくとも1つとの間に位置するバリア領域をさらに備え、
前記バリア領域の材料が前記半導体コアの材料および前記半導体シェルの材料の両方よりも高いバンドギャップを有し、
前記バリア領域が漏れ電流を抑えるために伝導帯端および価電子帯エッジの両方で十分に高いバンドオフセットを有するプラグ形の領域を備え、
前記バリア領域が、電気的絶縁材料、あるいは1016cm−3以下のドーピング濃度を有する軽くドープされた、真性の、または半絶縁性半導体材料を備える、請求項3に記載のデバイス。 - 径方向半導体ナノワイヤを備えるゲート制御されたエサキダイオードを動作させる方法であって、前記径方向半導体ナノワイヤの反対にドープされたコアとシェル間のトンネル電流が、ゲート電極によって前記径方向半導体ナノワイヤに提供される電界と実質的に平行に流れる、方法。
- 前記シェルのまわりに位置するゲート絶縁層、および前記ゲート絶縁層に隣接して位置する前記ゲート電極をさらに備え、
前記コアが第1の導電型の半導体コアを備え、前記シェルが前記第1の導電型と異なる第2の導電型の半導体シェルを備える、請求項7に記載の方法。 - 前記コアと前記シェル間の前記トンネル電流が前記ナノワイヤを支持する基板の主表面と実質的に平行に流れる、請求項8に記載の方法。
- 前記コアと前記シェル間の前記トンネル電流が前記ナノワイヤおよび前記ゲート絶縁層に面する前記ゲート電極の表面と実質的に垂直に流れる、請求項9に記載の方法。
- 前記コアと前記シェル間の前記トンネル電流が前記ナノワイヤを支持する前記基板の主表面と実質的に平行に流れ、前記コアと前記シェル間の前記トンネル電流が前記ナノワイヤおよび前記ゲート絶縁層に面する前記ゲート電極の表面と実質的に垂直に流れる、請求項8に記載の方法。
- 前記ゲート制御されたエサキダイオードがTFETを備え、
前記ナノワイヤコアの軸方向でみてソース領域側を下方としたときに、前記ナノワイヤコアが、第1のドーピング濃度を有する前記第1の導電型の下方の半導体部分および前記下方部分上に位置する上方部分を備え、
前記上方部分が、電気的絶縁材料、または下方部分の前記第1のドーピング濃度よりも低く、前記シェルのドーピング濃度よりも低い第2のドーピング濃度を有する半導体材料を含み、
前記コアの前記下方部分が、前記第1の導電型の半導体ソース領域と電気的に接触し、前記シェルが前記第2の導電型のドレイン領域と電気的に接触し、
前記シェルが前記コアの前記上方部分に隣接して位置し、pn接合を形成するように前記コアの前記下方部分と少なくとも部分的にオーバーラップし
前記ゲート電極が前記pn接合と少なくとも部分的にオーバーラップし、
前記コアの前記上方部分が、印加されたソースドレイン間電界と平行なトンネルキャリヤの大きな横方向の生成を阻止し、
前記ゲート電極が、ソースドレイン間およびゲート電界を含む前記pn接合を横切る全電界が、前記pn接合と本質的に垂直となるように、前記pn接合に垂直な電界を提供し、
フェルミ準位が前記pn接合の両面で実質的に一定であり、
前記pn接合を横切るフェルミ準位の実質的に階段状に誘起される変化が、60mV/dec未満のサブスレッショルドスイングを提供するサブサーマルなトンネルキャリヤの生成を提供する、請求項8に記載の方法。
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PCT/IB2013/001856 WO2014006503A2 (en) | 2012-07-06 | 2013-07-05 | Radial nanowire esaki diode devices and methods |
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US9748379B2 (en) * | 2015-06-25 | 2017-08-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Double exponential mechanism controlled transistor |
US10381489B2 (en) * | 2015-09-30 | 2019-08-13 | National University Corporation Hokkaido University | Tunnel field effect trasnsistor |
JP6730598B2 (ja) * | 2016-07-19 | 2020-07-29 | 富士通株式会社 | 半導体装置 |
JP6741943B2 (ja) * | 2016-08-31 | 2020-08-19 | 富士通株式会社 | 半導体装置及びその製造方法 |
US10475673B2 (en) * | 2016-09-28 | 2019-11-12 | Stmicroelectronics S.R.L. | Apparatus for manufacturing a silicon carbide wafer |
JP6631458B2 (ja) * | 2016-09-29 | 2020-01-15 | 富士通株式会社 | 電子デバイス及びその製造方法 |
US10325993B2 (en) * | 2017-09-28 | 2019-06-18 | Taiwan Semiconductor Manufacturing Co., Ltd. | Gate all around device and fabrication thereof |
US10868157B2 (en) * | 2018-09-26 | 2020-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Gated metal-insulator-semiconductor (MIS) tunnel diode having negative transconductance |
US11309177B2 (en) | 2018-11-06 | 2022-04-19 | Stmicroelectronics S.R.L. | Apparatus and method for manufacturing a wafer |
JP7371366B2 (ja) * | 2019-06-27 | 2023-10-31 | 富士通株式会社 | 半導体デバイス、及びこれを用いた無線受信器 |
IT201900015416A1 (it) | 2019-09-03 | 2021-03-03 | St Microelectronics Srl | Apparecchio per la crescita di una fetta di materiale semiconduttore, in particolare di carburo di silicio, e procedimento di fabbricazione associato |
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