JP6285666B2 - 検出装置、リソグラフィ装置、物品の製造方法及び検出方法 - Google Patents

検出装置、リソグラフィ装置、物品の製造方法及び検出方法 Download PDF

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Publication number
JP6285666B2
JP6285666B2 JP2013182473A JP2013182473A JP6285666B2 JP 6285666 B2 JP6285666 B2 JP 6285666B2 JP 2013182473 A JP2013182473 A JP 2013182473A JP 2013182473 A JP2013182473 A JP 2013182473A JP 6285666 B2 JP6285666 B2 JP 6285666B2
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JP
Japan
Prior art keywords
mark
optical system
detection
light
detected
Prior art date
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Active
Application number
JP2013182473A
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English (en)
Japanese (ja)
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JP2015049197A (ja
JP2015049197A5 (enExample
Inventor
隆文 宮春
隆文 宮春
和彦 三島
和彦 三島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013182473A priority Critical patent/JP6285666B2/ja
Priority to US14/474,980 priority patent/US9594315B2/en
Publication of JP2015049197A publication Critical patent/JP2015049197A/ja
Publication of JP2015049197A5 publication Critical patent/JP2015049197A5/ja
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2013182473A 2013-09-03 2013-09-03 検出装置、リソグラフィ装置、物品の製造方法及び検出方法 Active JP6285666B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013182473A JP6285666B2 (ja) 2013-09-03 2013-09-03 検出装置、リソグラフィ装置、物品の製造方法及び検出方法
US14/474,980 US9594315B2 (en) 2013-09-03 2014-09-02 Detection apparatus, lithography apparatus and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013182473A JP6285666B2 (ja) 2013-09-03 2013-09-03 検出装置、リソグラフィ装置、物品の製造方法及び検出方法

Publications (3)

Publication Number Publication Date
JP2015049197A JP2015049197A (ja) 2015-03-16
JP2015049197A5 JP2015049197A5 (enExample) 2016-10-20
JP6285666B2 true JP6285666B2 (ja) 2018-02-28

Family

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JP2013182473A Active JP6285666B2 (ja) 2013-09-03 2013-09-03 検出装置、リソグラフィ装置、物品の製造方法及び検出方法

Country Status (2)

Country Link
US (1) US9594315B2 (enExample)
JP (1) JP6285666B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101631410B1 (ko) * 2015-03-24 2016-06-17 주식회사 엘지실트론 웨이퍼 에지부의 저온산화막 검출 장치 및 검출 방법
JP6207671B1 (ja) * 2016-06-01 2017-10-04 キヤノン株式会社 パターン形成装置、基板配置方法及び物品の製造方法
JP6993782B2 (ja) * 2017-03-09 2022-01-14 キヤノン株式会社 インプリント装置および物品製造方法
JP7278135B2 (ja) * 2019-04-02 2023-05-19 キヤノン株式会社 インプリント装置および物品製造方法
CN111766414B (zh) * 2020-08-14 2020-12-25 强一半导体（苏州）有限公司 面向导引板mems探针结构模板烧刻的探针定位方法
JP2023043534A (ja) * 2021-09-16 2023-03-29 キオクシア株式会社 測定方法、測定装置、及びマーク
US12222659B2 (en) 2023-01-18 2025-02-11 Applied Materials, Inc. Metrology system for packaging applications

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07119570B2 (ja) * 1988-05-27 1995-12-20 株式会社ニコン アライメント方法
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
JPH0864500A (ja) * 1994-08-25 1996-03-08 Hitachi Ltd 信号処理方法および位置検出光学系の調整方法およびターゲットパターンならびに露光方法および露光装置
JPH0922864A (ja) * 1995-07-07 1997-01-21 Sumitomo Heavy Ind Ltd 半導体基板の位置検出方法及び半導体基板とフォトマスク
JP3327781B2 (ja) * 1995-10-13 2002-09-24 キヤノン株式会社 位置検出装置及びその検定方法と調整方法
JP2000315642A (ja) * 1999-04-30 2000-11-14 Nec Corp 収差による位置ずれ及びディストーションの計測方法と装置並びにレチクル
JP2002093691A (ja) * 2000-09-20 2002-03-29 Canon Inc 露光装置、結像性能測定方法、デバイス製造方法、半導体製造工場および露光装置の保守方法
US7009704B1 (en) * 2000-10-26 2006-03-07 Kla-Tencor Technologies Corporation Overlay error detection
JP3894836B2 (ja) 2002-05-07 2007-03-22 株式会社ミツトヨ エッジ検出装置
JP2007042965A (ja) 2005-08-05 2007-02-15 Nikon Corp 観察光学系の検査装置、観察光学系の検査方法、位置検出装置、露光装置及びマイクロデバイスの製造方法
US8842294B2 (en) * 2011-06-21 2014-09-23 Canon Kabushiki Kaisha Position detection apparatus, imprint apparatus, and position detection method
JP5706861B2 (ja) * 2011-10-21 2015-04-22 キヤノン株式会社 検出器、検出方法、インプリント装置及び物品製造方法
US10107621B2 (en) * 2012-02-15 2018-10-23 Nanometrics Incorporated Image based overlay measurement with finite gratings
NL2010458A (en) * 2012-04-16 2013-10-17 Asml Netherlands Bv Lithographic apparatus, substrate and device manufacturing method background.
NL2010734A (en) * 2012-05-29 2013-12-02 Asml Netherlands Bv Metrology method and apparatus, substrate, lithographic system and device manufacturing method.
CN106164775B (zh) * 2014-02-03 2019-07-19 Asml荷兰有限公司 量测方法和设备、衬底、光刻系统和器件制造方法

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US9594315B2 (en) 2017-03-14
US20150062553A1 (en) 2015-03-05
JP2015049197A (ja) 2015-03-16

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