JP6267530B2 - 露光装置、および物品の製造方法 - Google Patents

露光装置、および物品の製造方法 Download PDF

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Publication number
JP6267530B2
JP6267530B2 JP2014019768A JP2014019768A JP6267530B2 JP 6267530 B2 JP6267530 B2 JP 6267530B2 JP 2014019768 A JP2014019768 A JP 2014019768A JP 2014019768 A JP2014019768 A JP 2014019768A JP 6267530 B2 JP6267530 B2 JP 6267530B2
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JP
Japan
Prior art keywords
measurement
substrate
exposure
shot
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2014019768A
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English (en)
Japanese (ja)
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JP2015149316A5 (enExample
JP2015149316A (ja
Inventor
肇 竹内
肇 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014019768A priority Critical patent/JP6267530B2/ja
Priority to US14/608,731 priority patent/US9746789B2/en
Publication of JP2015149316A publication Critical patent/JP2015149316A/ja
Publication of JP2015149316A5 publication Critical patent/JP2015149316A5/ja
Application granted granted Critical
Publication of JP6267530B2 publication Critical patent/JP6267530B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2014019768A 2014-02-04 2014-02-04 露光装置、および物品の製造方法 Expired - Fee Related JP6267530B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014019768A JP6267530B2 (ja) 2014-02-04 2014-02-04 露光装置、および物品の製造方法
US14/608,731 US9746789B2 (en) 2014-02-04 2015-01-29 Exposure apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014019768A JP6267530B2 (ja) 2014-02-04 2014-02-04 露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015149316A JP2015149316A (ja) 2015-08-20
JP2015149316A5 JP2015149316A5 (enExample) 2017-03-16
JP6267530B2 true JP6267530B2 (ja) 2018-01-24

Family

ID=53754743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014019768A Expired - Fee Related JP6267530B2 (ja) 2014-02-04 2014-02-04 露光装置、および物品の製造方法

Country Status (2)

Country Link
US (1) US9746789B2 (enExample)
JP (1) JP6267530B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6806509B2 (ja) * 2016-09-15 2021-01-06 キヤノン株式会社 露光装置及び物品の製造方法
CA2962809C (en) * 2017-03-31 2019-02-26 Centre De Recherche Industrielle Du Quebec System and method for color scanning a moving article
JP6882091B2 (ja) * 2017-06-21 2021-06-02 キヤノン株式会社 露光装置及び物品の製造方法
JP7022611B2 (ja) * 2018-02-06 2022-02-18 キヤノン株式会社 露光装置の制御方法、露光装置、及び物品製造方法
JP7137363B2 (ja) * 2018-06-11 2022-09-14 キヤノン株式会社 露光方法、露光装置、物品の製造方法及び計測方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09306833A (ja) * 1996-03-14 1997-11-28 Nikon Corp 露光方法
JP2008277468A (ja) * 2007-04-27 2008-11-13 Canon Inc 露光装置及びデバイス製造方法
JP2008288347A (ja) * 2007-05-16 2008-11-27 Canon Inc 露光装置及びデバイス製造方法
JP4953923B2 (ja) * 2007-05-30 2012-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
JP5084432B2 (ja) * 2007-10-05 2012-11-28 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
JP2009186628A (ja) * 2008-02-05 2009-08-20 Ricoh Co Ltd 電子線描画方法及び電子線描画装置
JP2009302344A (ja) * 2008-06-13 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
JP5498243B2 (ja) * 2010-05-07 2014-05-21 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
JP2015149316A (ja) 2015-08-20
US9746789B2 (en) 2017-08-29
US20150220004A1 (en) 2015-08-06

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