JP6263441B2 - 水晶発振式膜厚モニタによる膜厚制御方法 - Google Patents
水晶発振式膜厚モニタによる膜厚制御方法 Download PDFInfo
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- JP6263441B2 JP6263441B2 JP2014107511A JP2014107511A JP6263441B2 JP 6263441 B2 JP6263441 B2 JP 6263441B2 JP 2014107511 A JP2014107511 A JP 2014107511A JP 2014107511 A JP2014107511 A JP 2014107511A JP 6263441 B2 JP6263441 B2 JP 6263441B2
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- 239000013078 crystal Substances 0.000 title claims description 93
- 230000010355 oscillation Effects 0.000 title claims description 63
- 238000000034 method Methods 0.000 title claims description 24
- 239000010408 film Substances 0.000 claims description 161
- 238000005259 measurement Methods 0.000 claims description 93
- 239000000758 substrate Substances 0.000 claims description 59
- 238000012937 correction Methods 0.000 claims description 54
- 239000010409 thin film Substances 0.000 claims description 42
- 230000015572 biosynthetic process Effects 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 22
- 238000000151 deposition Methods 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000012806 monitoring device Methods 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012883 sequential measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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- Engineering & Computer Science (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014107511A JP6263441B2 (ja) | 2014-05-23 | 2014-05-23 | 水晶発振式膜厚モニタによる膜厚制御方法 |
| KR1020150064419A KR102008046B1 (ko) | 2014-05-23 | 2015-05-08 | 수정 발진식 막두께 모니터에 의한 막두께 제어 방법 |
| CN201510262480.3A CN105088171B (zh) | 2014-05-23 | 2015-05-21 | 基于石英振荡式膜厚监视器的膜厚控制方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014107511A JP6263441B2 (ja) | 2014-05-23 | 2014-05-23 | 水晶発振式膜厚モニタによる膜厚制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015222244A JP2015222244A (ja) | 2015-12-10 |
| JP6263441B2 true JP6263441B2 (ja) | 2018-01-17 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014107511A Active JP6263441B2 (ja) | 2014-05-23 | 2014-05-23 | 水晶発振式膜厚モニタによる膜厚制御方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6263441B2 (zh) |
| KR (1) | KR102008046B1 (zh) |
| CN (1) | CN105088171B (zh) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105091843B (zh) * | 2015-06-25 | 2018-01-23 | 深圳市华星光电技术有限公司 | 一种测量膜缩的方法 |
| CN106092002A (zh) * | 2016-06-07 | 2016-11-09 | 应达利电子股份有限公司 | 用于成膜厚度监测的石英晶体谐振器、监测仪及监测方法 |
| JP6564745B2 (ja) * | 2016-09-06 | 2019-08-21 | 株式会社アルバック | 膜厚センサ |
| CN106987821B (zh) * | 2017-03-21 | 2019-05-21 | 武汉华星光电技术有限公司 | 有机发光二极管蒸镀膜补偿的方法 |
| KR102217755B1 (ko) * | 2018-01-03 | 2021-02-18 | 주식회사 엘지화학 | 박막 증착 방법 및 장치 |
| JP7064407B2 (ja) * | 2018-08-31 | 2022-05-10 | キヤノントッキ株式会社 | 成膜装置及び成膜装置の制御方法 |
| JP7188973B2 (ja) * | 2018-10-15 | 2022-12-13 | キヤノントッキ株式会社 | 成膜装置、製造システム、有機ｅｌパネルの製造システム、成膜方法、及び有機ｅｌ素子の製造方法 |
| CN111829428B (zh) * | 2020-06-17 | 2022-02-15 | 华中科技大学 | 一种双石英晶振膜厚控制仪及误差校正方法 |
| JP7329005B2 (ja) * | 2021-03-01 | 2023-08-17 | キヤノントッキ株式会社 | 成膜装置、成膜方法、及び電子デバイスの製造方法 |
| CN118308701A (zh) * | 2024-05-07 | 2024-07-09 | 苏州玖凌光宇科技有限公司 | 用于磁控溅射的薄膜精确沉积方法以及沉积薄膜 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07180055A (ja) * | 1993-12-22 | 1995-07-18 | Toshiba Glass Co Ltd | 真空成膜装置 |
| JP3393934B2 (ja) * | 1994-09-12 | 2003-04-07 | 株式会社アルバック | 膜厚監視制御方法 |
| JP2007171028A (ja) * | 2005-12-22 | 2007-07-05 | Nippon Seiki Co Ltd | 蒸着膜厚測定方法及びその装置 |
| JP4818073B2 (ja) * | 2006-11-10 | 2011-11-16 | 株式会社アルバック | 膜厚測定方法 |
| JP5854731B2 (ja) * | 2010-11-04 | 2016-02-09 | キヤノン株式会社 | 成膜装置及びこれを用いた成膜方法 |
| JP2012112037A (ja) * | 2010-11-04 | 2012-06-14 | Canon Inc | 成膜装置及びこれを用いた成膜方法 |
-
2014
- 2014-05-23 JP JP2014107511A patent/JP6263441B2/ja active Active
-
2015
- 2015-05-08 KR KR1020150064419A patent/KR102008046B1/ko active IP Right Grant
- 2015-05-21 CN CN201510262480.3A patent/CN105088171B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105088171B (zh) | 2019-04-30 |
| KR20150135082A (ko) | 2015-12-02 |
| KR102008046B1 (ko) | 2019-08-06 |
| CN105088171A (zh) | 2015-11-25 |
| JP2015222244A (ja) | 2015-12-10 |
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