JP6262914B2 - ゲル粒子の水分散物及びその製造方法、並びに画像形成方法 - Google Patents
ゲル粒子の水分散物及びその製造方法、並びに画像形成方法 Download PDFInfo
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- JP6262914B2 JP6262914B2 JP2017501879A JP2017501879A JP6262914B2 JP 6262914 B2 JP6262914 B2 JP 6262914B2 JP 2017501879 A JP2017501879 A JP 2017501879A JP 2017501879 A JP2017501879 A JP 2017501879A JP 6262914 B2 JP6262914 B2 JP 6262914B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/16—Aqueous medium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/16—Aqueous medium
- C08F2/22—Emulsion polymerisation
- C08F2/24—Emulsion polymerisation with the aid of emulsifying agents
- C08F2/26—Emulsion polymerisation with the aid of emulsifying agents anionic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
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- C—CHEMISTRY; METALLURGY
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- C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
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- C—CHEMISTRY; METALLURGY
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- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
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- C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
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- C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
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| JP6935313B2 (ja) * | 2016-12-01 | 2021-09-15 | 三洋化成工業株式会社 | 硬化性組成物及び硬化膜 |
| JP6861135B2 (ja) * | 2017-09-22 | 2021-04-21 | Ｄｉｃグラフィックス株式会社 | 活性エネルギー線硬化型コーティングニス及び印刷物 |
| US20220106485A1 (en) * | 2020-10-01 | 2022-04-07 | Facebook Technologies, Llc | Surface coated electrically conductive elastomers |
| WO2022080405A1 (fr) * | 2020-10-14 | 2022-04-21 | 昭和電工マテリアルズ株式会社 | Composition photodurcissable, produit durci de celle-ci, composition de résine photodurcissable et ensemble adhésif |
| CN113193228B (zh) * | 2021-04-27 | 2022-08-23 | 山东玉皇新能源科技有限公司 | 一种交联固态电解质及其制备方法和应用 |
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| JPH08259888A (ja) * | 1995-03-24 | 1996-10-08 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化性水分散体 |
| JP2005081801A (ja) * | 2003-09-11 | 2005-03-31 | Konica Minolta Holdings Inc | インクジェット記録用紙 |
| US7449501B2 (en) * | 2004-11-09 | 2008-11-11 | Eastman Kodak Company | Ink jet composition containing microgel particles |
| JP2006206664A (ja) * | 2005-01-26 | 2006-08-10 | Konica Minolta Holdings Inc | インクジェットインク及びそれを用いたインクジェット記録方法 |
| EP1777269A1 (fr) * | 2005-10-18 | 2007-04-25 | Dainippon Ink And Chemicals, Inc. | Composition durcissable et oligomère durcissable contenant des groupes acryliques et procédé de production de l' oligomère durcissable contenant des groupes acryliques |
| JP2007203636A (ja) * | 2006-02-02 | 2007-08-16 | Fujifilm Corp | インクジェット記録用セット、及びインクジェット記録方法 |
| JP2008081594A (ja) * | 2006-09-27 | 2008-04-10 | Seiren Co Ltd | 紫外線硬化型インクジェット用インク |
| WO2008047620A1 (fr) * | 2006-10-10 | 2008-04-24 | Osaka Organic Chemical Industry Co., Ltd. | Polymère hyperramifié, son procédé de fabrication et composition de résine |
| JP2010024255A (ja) * | 2008-07-15 | 2010-02-04 | Nippon Synthetic Chem Ind Co Ltd:The | 活性エネルギー線硬化型樹脂組成物及びコーティング剤組成物 |
| WO2010017264A2 (fr) * | 2008-08-05 | 2010-02-11 | Cornell University | Hydrogels d’acides nucléiques photoréticulés |
| JP5945902B2 (ja) * | 2010-12-27 | 2016-07-05 | セイコーエプソン株式会社 | インクジェット用インク組成物 |
| JP6047904B2 (ja) * | 2012-03-28 | 2016-12-21 | セイコーエプソン株式会社 | インクジェット記録方法、光硬化型インクジェットインク組成物、インクジェット記録装置 |
| JP2015003396A (ja) * | 2013-06-19 | 2015-01-08 | セイコーエプソン株式会社 | インクジェット記録装置 |
| US20150151387A1 (en) * | 2013-12-04 | 2015-06-04 | Honeywell International Inc. | Zinc-based lead-free solder compositions |
| CN104861216B (zh) * | 2015-04-28 | 2017-03-15 | 武汉纺织大学 | 一种紫外光3d打印用水凝胶基质的制备方法 |
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| US20170342171A1 (en) | 2017-11-30 |
| CN107250217B (zh) | 2021-06-22 |
| CN107250217A (zh) | 2017-10-13 |
| EP3263624B1 (fr) | 2022-08-03 |
| EP3263624A1 (fr) | 2018-01-03 |
| EP3263624A4 (fr) | 2018-02-21 |
| WO2016136113A1 (fr) | 2016-09-01 |
| JPWO2016136113A1 (ja) | 2017-06-15 |
| JP2018087331A (ja) | 2018-06-07 |
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